KR20080106855A - 감광성 수지 조성물 및 그것을 이용하여 얻어지는 플렉시블배선판 - Google Patents
감광성 수지 조성물 및 그것을 이용하여 얻어지는 플렉시블배선판 Download PDFInfo
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- KR20080106855A KR20080106855A KR1020080052168A KR20080052168A KR20080106855A KR 20080106855 A KR20080106855 A KR 20080106855A KR 1020080052168 A KR1020080052168 A KR 1020080052168A KR 20080052168 A KR20080052168 A KR 20080052168A KR 20080106855 A KR20080106855 A KR 20080106855A
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- South Korea
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- carbon atoms
- resin composition
- substituted
- photosensitive resin
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- 239000011342 resin composition Substances 0.000 title claims abstract description 65
- -1 oxime ester Chemical class 0.000 claims abstract description 101
- 229920005989 resin Polymers 0.000 claims abstract description 75
- 239000011347 resin Substances 0.000 claims abstract description 75
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 56
- 239000003999 initiator Substances 0.000 claims abstract description 43
- 239000000203 mixture Substances 0.000 claims abstract description 33
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 31
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 24
- 239000011574 phosphorus Substances 0.000 claims abstract description 24
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical group C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 16
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims abstract description 14
- 125000003118 aryl group Chemical group 0.000 claims abstract description 10
- 235000010290 biphenyl Nutrition 0.000 claims abstract description 7
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- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical group C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 68
- 125000000217 alkyl group Chemical group 0.000 claims description 60
- 229920000647 polyepoxide Polymers 0.000 claims description 52
- 239000003822 epoxy resin Substances 0.000 claims description 48
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 27
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 18
- 125000005843 halogen group Chemical group 0.000 claims description 16
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 14
- 238000001035 drying Methods 0.000 claims description 13
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 13
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims description 12
- 125000002252 acyl group Chemical group 0.000 claims description 10
- 125000004122 cyclic group Chemical group 0.000 claims description 10
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 10
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- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 9
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical compound NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 claims description 8
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 238000000016 photochemical curing Methods 0.000 claims description 4
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims description 3
- 125000005011 alkyl ether group Chemical group 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 150000002430 hydrocarbons Chemical group 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 claims description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 2
- 230000007613 environmental effect Effects 0.000 abstract description 6
- 229910052736 halogen Inorganic materials 0.000 abstract description 5
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- 238000000034 method Methods 0.000 description 17
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- 239000000047 product Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- 239000003513 alkali Substances 0.000 description 8
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
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- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 8
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- 238000003786 synthesis reaction Methods 0.000 description 8
- 230000001588 bifunctional effect Effects 0.000 description 7
- 238000011161 development Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical group S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 150000004056 anthraquinones Chemical class 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 6
- 125000005442 diisocyanate group Chemical group 0.000 description 6
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 229940106691 bisphenol a Drugs 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000003086 colorant Substances 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 5
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- 238000007650 screen-printing Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
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- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910001507 metal halide Inorganic materials 0.000 description 4
- 150000005309 metal halides Chemical class 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
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- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical group OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
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- 238000005452 bending Methods 0.000 description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N benzo-alpha-pyrone Natural products C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
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- 125000004663 dialkyl amino group Chemical group 0.000 description 3
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- 229920003986 novolac Polymers 0.000 description 3
- 125000003566 oxetanyl group Chemical group 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- FBOUIAKEJMZPQG-AWNIVKPZSA-N (1E)-1-(2,4-dichlorophenyl)-4,4-dimethyl-2-(1,2,4-triazol-1-yl)pent-1-en-3-ol Chemical compound C1=NC=NN1/C(C(O)C(C)(C)C)=C/C1=CC=C(Cl)C=C1Cl FBOUIAKEJMZPQG-AWNIVKPZSA-N 0.000 description 2
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 2
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
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- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 2
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- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
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- VMKBJESZDNXQHG-UHFFFAOYSA-N [(9-oxothioxanthen-2-yl)methylideneamino] acetate Chemical group C1=CC=C2C(=O)C3=CC(C=NOC(=O)C)=CC=C3SC2=C1 VMKBJESZDNXQHG-UHFFFAOYSA-N 0.000 description 2
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- MYONAGGJKCJOBT-UHFFFAOYSA-N benzimidazol-2-one Chemical compound C1=CC=CC2=NC(=O)N=C21 MYONAGGJKCJOBT-UHFFFAOYSA-N 0.000 description 2
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- 238000007766 curtain coating Methods 0.000 description 2
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- 238000004090 dissolution Methods 0.000 description 2
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- 125000000623 heterocyclic group Chemical group 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
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- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
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Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
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Abstract
Description
Claims (19)
- (A) 카르복실기 함유 수지, (B) 인 원소 함유 아크릴레이트, (C) 광중합 개시제를 함유하는 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 상기 광중합 개시제 (C)가 옥심에스테르계 광중합 개시제 (C') 또는 인 원소 함유 광중합 개시제 (C'')를 포함하는 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 상기 카르복실기 함유 수지 (A)가 비스페놀 A 골격, 비스페놀 F 골격, 비페닐 골격, 비크실레놀 골격 또는 그의 수소 첨가 골격인 구조를 갖는 수지인 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 상기 카르복실기 함유 수지 (A)가 우레탄 구조를 갖는 수지인 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 상기 카르복실기 함유 수지 (A)가 2개 이상의 라디칼 중합성 불포화 이중 결합을 갖는 수지인 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 상기 광중합 개시제 (C)가, 하기 화학식 II로 표시되는 옥심에스테르계 광중합 개시제 (C1), 하기 화학식 III으로 표시되는 α-아미노아세토 페논계 광중합 개시제 (C2), 하기 화학식 IV로 표시되는 아실포스핀옥시드계 광중합 개시제 (C3)으로 이루어지는 군에서 선택되는 1종 이상의 광중합 개시제인 것을 특징으로 하는 감광성 수지 조성물.<화학식 II><화학식 III><화학식 IV>(식 중, R2는 수소 원자, 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타내고,R3은 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타내고,R4 및 R5는 각각 독립적으로 탄소수 1 내지 12의 알킬기 또는 아릴알킬기를 나타내고,R6 및 R7은 각각 독립적으로 수소 원자, 탄소수 1 내지 6의 알킬기, 또는 2개가 결합한 환상 알킬에테르기를 나타내고,R8 및 R9는 각각 독립적으로 탄소수 1 내지 10의 직쇄상 또는 분지상의 알킬기, 탄소수 1 내지 10의 직쇄상 또는 분지상의 알콕시기, 시클로헥실기, 시클로펜틸기, 아릴기, 또는 할로겐 원자, 알킬기 또는 알콕시기로 치환된 아릴기를 나타내되, 단 R8 및 R9 중 한쪽은 R-C(=O)-기(여기서 R은 탄소수 1 내지 20의 탄화수소기)를 나타낼 수도 있음)
- 제1항에 있어서, 상기 광중합 개시제 (C)가, 하기 화학식 II로 표시되는 옥심에스테르계 광중합 개시제 (C1), 상기 옥심에스테르계 광중합 개시제 (C1)과 하기 화학식 III으로 표시되는 α-아미노아세토페논계 광중합 개시제 (C2)의 혼합물, 상기 옥심에스테르계 광중합 개시제 (C1)과 하기 화학식 IV로 표시되는 아실포스핀옥시드계 광중합 개시제 (C3)의 혼합물, 상기 옥심에스테르계 광중합 개시제 (C1)과 하기 화학식 III으로 표시되는 α-아미노아세토페논계 광중합 개시제 (C2)와 하기 화학식 IV로 표시되는 아실포스핀옥시드계 광중합 개시제 (C3)의 혼합물 중 어느 하나인 것을 특징으로 하는 감광성 수지 조성물.<화학식 II><화학식 III><화학식 IV>(식 중, R2는 수소 원자, 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소 수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타내고,R3은 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타내고,R4 및 R5는 각각 독립적으로 탄소수 1 내지 12의 알킬기 또는 아릴알킬기를 나타내고,R6 및 R7은 각각 독립적으로 수소 원자, 탄소수 1 내지 6의 알킬기, 또는 2개가 결합한 환상 알킬에테르기를 나타내고,R8 및 R9는 각각 독립적으로 탄소수 1 내지 10의 직쇄상 또는 분지상의 알킬기, 탄소수 1 내지 10의 직쇄상 또는 분지상의 알콕시기, 시클로헥실기, 시클로펜틸기, 아릴기, 또는 할로겐 원자, 알킬기 또는 알콕시기로 치환된 아릴기를 나타내되, 단 R8 및 R9 중 한쪽은 R-C(=O)-기(여기서 R은 탄소수 1 내지 20의 탄화수소기)를 나타낼 수도 있음)
- 제7항에 있어서, 상기 화학식 II로 표시되는 옥심에스테르계 광중합 개시제 (C1)이, 하기 화학식 VI으로 표시되는 옥심에스테르계 광중합 개시제인 것을 특징으로 하는 감광성 수지 조성물.<화학식 VI>(식 중, R10은 수소 원자, 할로겐 원자, 탄소수 1 내지 12의 알킬기, 시클로펜틸기, 시클로헥실기, 페닐기, 벤질기, 벤조일기, 탄소수 2 내지 12의 알카노일 기, 탄소수 2 내지 12의 알콕시카르보닐기(알콕실기를 구성하는 알킬기의 탄소수가 2 이상인 경우, 알킬기는 1개 이상의 수산기로 치환될 수도 있고, 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음) 또는 페녹시카르보닐기를 나타내고,R11, R13은 각각 독립적으로 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고, 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타내고,R12는 수소 원자, 페닐기(탄소수 1 내지 6의 알킬기, 페닐기 또는 할로겐 원자로 치환될 수도 있음), 탄소수 1 내지 20의 알킬기(1개 이상의 수산기로 치환될 수도 있고, 알킬쇄의 중간에 1개 이상의 산소 원자를 가질 수도 있음), 탄소수 5 내지 8의 시클로알킬기, 탄소수 2 내지 20의 알카노일기 또는 벤조일기(탄소수가 1 내지 6인 알킬기 또는 페닐기로 치환될 수도 있음)를 나타냄)
- 제1항에 있어서, 추가로 (D) 열경화 성분을 함유하는 것을 특징으로 하는 감광성 수지 조성물.
- 제11항에 있어서, 상기 열경화 성분 (D)가 에폭시 수지인 것을 특징으로 하는 감광성 수지 조성물.
- 제1항에 있어서, 추가로 유기 인계 난연제 (E)를 함유하는 것을 특징으로 하는 감광성 수지 조성물.
- 제13항에 있어서, 상기 유기 인계 난연제 (E)가 에폭시 수지와 반응 가능한 반응성기를 갖는 유기 인계 난연제인 것을 특징으로 하는 감광성 수지 조성물.
- 제1항 내지 제14항 중 어느 한 항에 기재된 감광성 수지 조성물을 캐리어 필름에 도포·건조하여 얻어지는 감광성 드라이 필름.
- 제1항 내지 제14항 중 어느 한 항에 기재된 감광성 수지 조성물, 또는 상기 감광성 수지 조성물을 캐리어 필름에 도포·건조하여 얻어지는 감광성 드라이 필름을 구리 상에서 광경화시켜서 얻어지는 경화물.
- 제1항 내지 제14항 중 어느 한 항에 기재된 감광성 수지 조성물, 또는 상기 감광성 수지 조성물을 캐리어 필름에 도포·건조하여 얻어지는 감광성 드라이 필름을 광경화시켜서 얻어지는 레지스트 패턴을 갖는 플렉시블 배선판.
- 제1항 내지 제14항 중 어느 한 항에 있어서, 감광성 수지 조성물이 플렉시블 배선판용 솔더 레지스트인 것을 특징으로 하는 감광성 수지 조성물.
- 제15항에 있어서, 감광성 드라이 필름이 플렉시블 배선판용 솔더 레지스트인 것을 특징으로 하는 감광성 드라이 필름.
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JP2009251585A (ja) * | 2008-04-11 | 2009-10-29 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びそれを用いた感光性エレメント |
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KR101464926B1 (ko) * | 2009-09-18 | 2014-11-25 | 다이요 홀딩스 가부시키가이샤 | 감광성 수지 조성물, 그의 드라이 필름 및 경화물, 및 이들을 이용한 인쇄 배선판 |
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