KR20050086366A - 광 기록매체의 반사막용의 은합금 - Google Patents

광 기록매체의 반사막용의 은합금 Download PDF

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Publication number
KR20050086366A
KR20050086366A KR1020047012143A KR20047012143A KR20050086366A KR 20050086366 A KR20050086366 A KR 20050086366A KR 1020047012143 A KR1020047012143 A KR 1020047012143A KR 20047012143 A KR20047012143 A KR 20047012143A KR 20050086366 A KR20050086366 A KR 20050086366A
Authority
KR
South Korea
Prior art keywords
reflectance
silver alloy
silver
optical recording
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020047012143A
Other languages
English (en)
Korean (ko)
Inventor
히로유키 게즈카
히로시 야나기하라
Original Assignee
다나까 기낀조꾸 고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다나까 기낀조꾸 고교 가부시끼가이샤 filed Critical 다나까 기낀조꾸 고교 가부시끼가이샤
Publication of KR20050086366A publication Critical patent/KR20050086366A/ko
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
KR1020047012143A 2002-12-10 2003-12-09 광 기록매체의 반사막용의 은합금 Ceased KR20050086366A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002358040A JP2004192702A (ja) 2002-12-10 2002-12-10 光記録媒体の反射膜用の銀合金
JPJP-P-2002-00358040 2002-12-10

Publications (1)

Publication Number Publication Date
KR20050086366A true KR20050086366A (ko) 2005-08-30

Family

ID=32500889

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020047012143A Ceased KR20050086366A (ko) 2002-12-10 2003-12-09 광 기록매체의 반사막용의 은합금

Country Status (8)

Country Link
US (1) US20050089439A1 (enExample)
EP (1) EP1569215A4 (enExample)
JP (1) JP2004192702A (enExample)
KR (1) KR20050086366A (enExample)
CN (1) CN1323397C (enExample)
AU (1) AU2003289251A1 (enExample)
TW (1) TW200419000A (enExample)
WO (1) WO2004053861A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7572517B2 (en) 2002-07-08 2009-08-11 Target Technology Company, Llc Reflective or semi-reflective metal alloy coatings
JP4379602B2 (ja) * 2003-08-20 2009-12-09 三菱マテリアル株式会社 半透明反射膜または反射膜を構成層とする光記録媒体および前記反射膜の形成に用いられるＡｇ合金スパッタリングターゲット
JP4309227B2 (ja) * 2003-10-16 2009-08-05 石福金属興業株式会社 スパッタリングターゲット材
CN101260484A (zh) * 2005-02-07 2008-09-10 株式会社神户制钢所 记录膜、光学信息记录介质以及溅射靶
JP2006240289A (ja) * 2005-02-07 2006-09-14 Kobe Steel Ltd 光情報記録媒体用記録膜および光情報記録媒体ならびにスパッタリングターゲット
JP4575211B2 (ja) * 2005-03-31 2010-11-04 株式会社東芝 記憶媒体、再生方法及び記録方法
JP2007035104A (ja) * 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
FR2893632B1 (fr) * 2005-11-18 2008-01-25 Commissariat Energie Atomique Revetement a base d'argent resistant a la sulfuration, procede de depot et utilisation
JP2008004151A (ja) * 2006-06-21 2008-01-10 Toshiba Corp 片面多層光ディスク、ｂｃａ記録装置、ｂｃａ記録方法及び光ディスク装置
CN101449184B (zh) * 2006-11-17 2012-04-04 田中贵金属工业株式会社 反射膜或半透反射膜用的薄膜及溅射靶材以及光记录介质
US7910190B2 (en) * 2006-11-17 2011-03-22 Tanaka Kinkinzoku Kogyo K.K. Thin film for reflection film or for semi-transparent reflection film, sputtering target and optical recording medium
US20110151276A1 (en) * 2008-07-07 2011-06-23 Sandvik Intellectual Property Ab Anti tarnish silver alloy
SE536911C2 (sv) * 2011-02-09 2014-10-28 Impact Coatings Ab Material för att åstadkomma ett elektriskt ledande kontaktskikt, ett kontaktelement med sådant skikt, metod för att åstadkomma kontaktelementet, samt användning av materialet
KR20140015432A (ko) * 2011-04-06 2014-02-06 미쓰비시 마테리알 가부시키가이샤 도전성 막 형성용 은 합금 스퍼터링 타깃 및 그 제조 방법
JP5830907B2 (ja) * 2011-04-06 2015-12-09 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP5830908B2 (ja) * 2011-04-06 2015-12-09 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP2013077547A (ja) * 2011-09-15 2013-04-25 Mitsubishi Materials Corp 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法
JP5159962B1 (ja) * 2012-01-10 2013-03-13 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP5850077B2 (ja) * 2014-04-09 2016-02-03 三菱マテリアル株式会社 Ａｇ合金膜及びＡｇ合金膜形成用スパッタリングターゲット

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2011002C3 (de) * 1970-03-09 1978-10-05 Fa. Dr. Eugen Duerrwaechter Doduco, 7530 Pforzheim Schmelzmetallurgisch hergestellter innenoxidierter Kontaktwerkstoff auf Silber-Kadmiumoxid-Basis
JPS616220A (ja) * 1984-06-21 1986-01-11 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS616223A (ja) * 1984-06-21 1986-01-11 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS6173847A (ja) * 1984-09-18 1986-04-16 Tanaka Kikinzoku Kogyo Kk 耐硫化性銀合金
US4636270A (en) * 1985-09-23 1987-01-13 Chugai Denki Kogyo K.K. Internal oxidized Ag-Sn system alloy contact materials
JPS62130245A (ja) * 1985-11-29 1987-06-12 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS62243725A (ja) * 1986-04-16 1987-10-24 Seiko Epson Corp 耐硫化性銀合金
JP2727729B2 (ja) * 1989-03-24 1998-03-18 三菱マテリアル株式会社 太陽電池のインターコネクタ用Ａｇ合金箔材
JPH06243509A (ja) * 1993-02-19 1994-09-02 Ricoh Co Ltd 光反射膜及び該膜を用いた光記録情報媒体
JPH081374A (ja) * 1994-06-17 1996-01-09 Tanaka Kikinzoku Kogyo Kk 白金装飾品用ろう付合金
TW446637B (en) * 1996-05-28 2001-07-21 Mitsui Chemicals Inc Transparent laminates and optical filters for displays using the same
JPH10143917A (ja) * 1996-11-08 1998-05-29 Kao Corp 光記録媒体
US6139652A (en) * 1997-01-23 2000-10-31 Stern-Leach Tarnish-resistant hardenable fine silver alloys
JP3570607B2 (ja) * 1998-03-13 2004-09-29 トヨタ自動車株式会社 摺動部材
US6544616B2 (en) * 2000-07-21 2003-04-08 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP3840345B2 (ja) * 1999-03-19 2006-11-01 富士写真フイルム株式会社 光情報記録媒体
JP2001035014A (ja) * 1999-07-19 2001-02-09 Ricoh Co Ltd 光情報記録媒体及びその製造方法並びにその製造に用いるスパッタ装置
CN1217028C (zh) * 2001-03-16 2005-08-31 石福金属兴业株式会社 溅射靶材
JP3915114B2 (ja) * 2001-11-26 2007-05-16 三菱マテリアル株式会社 光記録媒体の反射膜形成用銀合金スパッタリングターゲット

Also Published As

Publication number Publication date
US20050089439A1 (en) 2005-04-28
JP2004192702A (ja) 2004-07-08
CN1703746A (zh) 2005-11-30
TW200419000A (en) 2004-10-01
EP1569215A1 (en) 2005-08-31
WO2004053861A1 (ja) 2004-06-24
EP1569215A4 (en) 2009-03-18
AU2003289251A1 (en) 2004-06-30
CN1323397C (zh) 2007-06-27

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