CN1323397C - 光记录介质的反射膜用的银合金 - Google Patents

光记录介质的反射膜用的银合金 Download PDF

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Publication number
CN1323397C
CN1323397C CNB2003801002061A CN200380100206A CN1323397C CN 1323397 C CN1323397 C CN 1323397C CN B2003801002061 A CNB2003801002061 A CN B2003801002061A CN 200380100206 A CN200380100206 A CN 200380100206A CN 1323397 C CN1323397 C CN 1323397C
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CN
China
Prior art keywords
weight
silver
reflectance
silver alloy
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2003801002061A
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English (en)
Chinese (zh)
Other versions
CN1703746A (zh
Inventor
毛冢弘之
柳原浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Publication of CN1703746A publication Critical patent/CN1703746A/zh
Application granted granted Critical
Publication of CN1323397C publication Critical patent/CN1323397C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
CNB2003801002061A 2002-12-10 2003-12-09 光记录介质的反射膜用的银合金 Expired - Lifetime CN1323397C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002358040A JP2004192702A (ja) 2002-12-10 2002-12-10 光記録媒体の反射膜用の銀合金
JP358040/2002 2002-12-10

Publications (2)

Publication Number Publication Date
CN1703746A CN1703746A (zh) 2005-11-30
CN1323397C true CN1323397C (zh) 2007-06-27

Family

ID=32500889

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2003801002061A Expired - Lifetime CN1323397C (zh) 2002-12-10 2003-12-09 光记录介质的反射膜用的银合金

Country Status (8)

Country Link
US (1) US20050089439A1 (enExample)
EP (1) EP1569215A4 (enExample)
JP (1) JP2004192702A (enExample)
KR (1) KR20050086366A (enExample)
CN (1) CN1323397C (enExample)
AU (1) AU2003289251A1 (enExample)
TW (1) TW200419000A (enExample)
WO (1) WO2004053861A1 (enExample)

Families Citing this family (19)

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Publication number Priority date Publication date Assignee Title
US7572517B2 (en) 2002-07-08 2009-08-11 Target Technology Company, Llc Reflective or semi-reflective metal alloy coatings
JP4379602B2 (ja) * 2003-08-20 2009-12-09 三菱マテリアル株式会社 半透明反射膜または反射膜を構成層とする光記録媒体および前記反射膜の形成に用いられるＡｇ合金スパッタリングターゲット
JP4309227B2 (ja) * 2003-10-16 2009-08-05 石福金属興業株式会社 スパッタリングターゲット材
CN101260484A (zh) * 2005-02-07 2008-09-10 株式会社神户制钢所 记录膜、光学信息记录介质以及溅射靶
JP2006240289A (ja) * 2005-02-07 2006-09-14 Kobe Steel Ltd 光情報記録媒体用記録膜および光情報記録媒体ならびにスパッタリングターゲット
JP4575211B2 (ja) * 2005-03-31 2010-11-04 株式会社東芝 記憶媒体、再生方法及び記録方法
JP2007035104A (ja) * 2005-07-22 2007-02-08 Kobe Steel Ltd 光情報記録媒体用Ａｇ合金反射膜、光情報記録媒体および光情報記録媒体用Ａｇ合金反射膜の形成用のＡｇ合金スパッタリングターゲット
FR2893632B1 (fr) * 2005-11-18 2008-01-25 Commissariat Energie Atomique Revetement a base d'argent resistant a la sulfuration, procede de depot et utilisation
JP2008004151A (ja) * 2006-06-21 2008-01-10 Toshiba Corp 片面多層光ディスク、ｂｃａ記録装置、ｂｃａ記録方法及び光ディスク装置
CN101449184B (zh) * 2006-11-17 2012-04-04 田中贵金属工业株式会社 反射膜或半透反射膜用的薄膜及溅射靶材以及光记录介质
US7910190B2 (en) * 2006-11-17 2011-03-22 Tanaka Kinkinzoku Kogyo K.K. Thin film for reflection film or for semi-transparent reflection film, sputtering target and optical recording medium
US20110151276A1 (en) * 2008-07-07 2011-06-23 Sandvik Intellectual Property Ab Anti tarnish silver alloy
SE536911C2 (sv) * 2011-02-09 2014-10-28 Impact Coatings Ab Material för att åstadkomma ett elektriskt ledande kontaktskikt, ett kontaktelement med sådant skikt, metod för att åstadkomma kontaktelementet, samt användning av materialet
KR20140015432A (ko) * 2011-04-06 2014-02-06 미쓰비시 마테리알 가부시키가이샤 도전성 막 형성용 은 합금 스퍼터링 타깃 및 그 제조 방법
JP5830907B2 (ja) * 2011-04-06 2015-12-09 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP5830908B2 (ja) * 2011-04-06 2015-12-09 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP2013077547A (ja) * 2011-09-15 2013-04-25 Mitsubishi Materials Corp 導電性膜及びその製造方法並びに導電性膜形成用銀合金スパッタリングターゲット及びその製造方法
JP5159962B1 (ja) * 2012-01-10 2013-03-13 三菱マテリアル株式会社 導電性膜形成用銀合金スパッタリングターゲットおよびその製造方法
JP5850077B2 (ja) * 2014-04-09 2016-02-03 三菱マテリアル株式会社 Ａｇ合金膜及びＡｇ合金膜形成用スパッタリングターゲット

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06243509A (ja) * 1993-02-19 1994-09-02 Ricoh Co Ltd 光反射膜及び該膜を用いた光記録情報媒体
JP2001035014A (ja) * 1999-07-19 2001-02-09 Ricoh Co Ltd 光情報記録媒体及びその製造方法並びにその製造に用いるスパッタ装置
WO2002077317A1 (en) * 2001-03-16 2002-10-03 Ishifuku Metal Industry Co., Ltd. Sputtering target material

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JPS616220A (ja) * 1984-06-21 1986-01-11 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS616223A (ja) * 1984-06-21 1986-01-11 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS6173847A (ja) * 1984-09-18 1986-04-16 Tanaka Kikinzoku Kogyo Kk 耐硫化性銀合金
US4636270A (en) * 1985-09-23 1987-01-13 Chugai Denki Kogyo K.K. Internal oxidized Ag-Sn system alloy contact materials
JPS62130245A (ja) * 1985-11-29 1987-06-12 Tanaka Kikinzoku Kogyo Kk 装飾品用銀材料
JPS62243725A (ja) * 1986-04-16 1987-10-24 Seiko Epson Corp 耐硫化性銀合金
JP2727729B2 (ja) * 1989-03-24 1998-03-18 三菱マテリアル株式会社 太陽電池のインターコネクタ用Ａｇ合金箔材
JPH081374A (ja) * 1994-06-17 1996-01-09 Tanaka Kikinzoku Kogyo Kk 白金装飾品用ろう付合金
TW446637B (en) * 1996-05-28 2001-07-21 Mitsui Chemicals Inc Transparent laminates and optical filters for displays using the same
JPH10143917A (ja) * 1996-11-08 1998-05-29 Kao Corp 光記録媒体
US6139652A (en) * 1997-01-23 2000-10-31 Stern-Leach Tarnish-resistant hardenable fine silver alloys
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US6544616B2 (en) * 2000-07-21 2003-04-08 Target Technology Company, Llc Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
JP3840345B2 (ja) * 1999-03-19 2006-11-01 富士写真フイルム株式会社 光情報記録媒体
JP3915114B2 (ja) * 2001-11-26 2007-05-16 三菱マテリアル株式会社 光記録媒体の反射膜形成用銀合金スパッタリングターゲット

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06243509A (ja) * 1993-02-19 1994-09-02 Ricoh Co Ltd 光反射膜及び該膜を用いた光記録情報媒体
JP2001035014A (ja) * 1999-07-19 2001-02-09 Ricoh Co Ltd 光情報記録媒体及びその製造方法並びにその製造に用いるスパッタ装置
WO2002077317A1 (en) * 2001-03-16 2002-10-03 Ishifuku Metal Industry Co., Ltd. Sputtering target material

Also Published As

Publication number Publication date
US20050089439A1 (en) 2005-04-28
JP2004192702A (ja) 2004-07-08
CN1703746A (zh) 2005-11-30
TW200419000A (en) 2004-10-01
EP1569215A1 (en) 2005-08-31
WO2004053861A1 (ja) 2004-06-24
KR20050086366A (ko) 2005-08-30
EP1569215A4 (en) 2009-03-18
AU2003289251A1 (en) 2004-06-30

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Granted publication date: 20070627