KR20040101237A - 티올 화합물, 광중합 개시제 조성물 및 감광성 조성물 - Google Patents
티올 화합물, 광중합 개시제 조성물 및 감광성 조성물 Download PDFInfo
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- KR20040101237A KR20040101237A KR10-2004-7013107A KR20047013107A KR20040101237A KR 20040101237 A KR20040101237 A KR 20040101237A KR 20047013107 A KR20047013107 A KR 20047013107A KR 20040101237 A KR20040101237 A KR 20040101237A
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- South Korea
- Prior art keywords
- group
- thiol compound
- compound
- photopolymerization initiator
- composition
- Prior art date
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- -1 Thiol compound Chemical class 0.000 title claims abstract description 150
- 239000000203 mixture Substances 0.000 title claims abstract description 138
- 239000003999 initiator Substances 0.000 title claims abstract description 57
- 125000003396 thiol group Chemical group [H]S* 0.000 claims abstract description 58
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 48
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 27
- 125000001424 substituent group Chemical group 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims description 58
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 37
- TXJZAWRTHMZECY-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)ethyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCOC(=O)CC(C)S TXJZAWRTHMZECY-UHFFFAOYSA-N 0.000 claims description 33
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 30
- 125000000217 alkyl group Chemical group 0.000 claims description 30
- WBEKRAXYEBAHQF-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O.CC(S)CC(O)=O.CC(S)CC(O)=O.CCC(CO)(CO)CO WBEKRAXYEBAHQF-UHFFFAOYSA-N 0.000 claims description 24
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 21
- WQECNJBUYKDLGS-UHFFFAOYSA-N 2-(2-methyl-2-sulfanylpropanoyl)oxyethyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(C)(S)C(=O)OCCOC(=O)C(C)(C)S WQECNJBUYKDLGS-UHFFFAOYSA-N 0.000 claims description 20
- HFGWEGUVPBZOEA-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2-methyl-2-sulfanylpropanoic acid Chemical compound CC(C)(S)C(O)=O.CC(C)(S)C(O)=O.CC(C)(S)C(O)=O.CCC(CO)(CO)CO HFGWEGUVPBZOEA-UHFFFAOYSA-N 0.000 claims description 18
- 239000000049 pigment Substances 0.000 claims description 18
- 239000000243 solution Substances 0.000 claims description 18
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 15
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 15
- 229920000642 polymer Polymers 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 15
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 claims description 11
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 10
- ZUWFDHPIBGDTSU-UHFFFAOYSA-N 2-(2-methyl-2-sulfanylpropanoyl)oxypropyl 2-methyl-2-sulfanylpropanoate Chemical compound CC(S)(C)C(=O)OC(C)COC(=O)C(C)(C)S ZUWFDHPIBGDTSU-UHFFFAOYSA-N 0.000 claims description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 150000004056 anthraquinones Chemical class 0.000 claims description 5
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 claims description 5
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical class NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 claims description 4
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical class OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 4
- 239000012965 benzophenone Substances 0.000 claims description 4
- UJCUIGVRXJDWNI-UHFFFAOYSA-N propane-1,2-diol;3-sulfanylbutanoic acid Chemical compound CC(O)CO.CC(S)CC(O)=O UJCUIGVRXJDWNI-UHFFFAOYSA-N 0.000 claims description 4
- 239000007983 Tris buffer Substances 0.000 claims description 3
- 150000008366 benzophenones Chemical group 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 abstract description 16
- 238000003860 storage Methods 0.000 abstract description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 37
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 24
- 150000001721 carbon Chemical group 0.000 description 23
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 20
- 239000000126 substance Substances 0.000 description 19
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- 239000000758 substrate Substances 0.000 description 18
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 17
- 238000005160 1H NMR spectroscopy Methods 0.000 description 17
- 238000004949 mass spectrometry Methods 0.000 description 17
- 238000005259 measurement Methods 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 14
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000011541 reaction mixture Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 10
- JTMBCYAUSCBSEY-UHFFFAOYSA-N 2-methyl-2-sulfanylpropanoic acid Chemical compound CC(C)(S)C(O)=O JTMBCYAUSCBSEY-UHFFFAOYSA-N 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000000975 dye Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000000741 silica gel Substances 0.000 description 7
- 229910002027 silica gel Inorganic materials 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- RQPNXPWEGVCPCX-UHFFFAOYSA-N 3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O RQPNXPWEGVCPCX-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 239000000499 gel Substances 0.000 description 6
- 229940099596 manganese sulfate Drugs 0.000 description 6
- 239000011702 manganese sulphate Substances 0.000 description 6
- 235000007079 manganese sulphate Nutrition 0.000 description 6
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 6
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 6
- 238000000746 purification Methods 0.000 description 6
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 6
- 235000017557 sodium bicarbonate Nutrition 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- KQBUONNTLMDRIE-UHFFFAOYSA-N 2-(3-sulfanylbutanoyloxy)propyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(C)OC(=O)CC(C)S KQBUONNTLMDRIE-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 239000002270 dispersing agent Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000000977 initiatory effect Effects 0.000 description 5
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- 239000003921 oil Substances 0.000 description 5
- 229940059574 pentaerithrityl Drugs 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- 238000000016 photochemical curing Methods 0.000 description 5
- 238000010898 silica gel chromatography Methods 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- MHRDCHHESNJQIS-UHFFFAOYSA-N 2-methyl-3-sulfanylpropanoic acid Chemical compound SCC(C)C(O)=O MHRDCHHESNJQIS-UHFFFAOYSA-N 0.000 description 4
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- HOXINJBQVZWYGZ-UHFFFAOYSA-N fenbutatin oxide Chemical compound C=1C=CC=CC=1C(C)(C)C[Sn](O[Sn](CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C=1C=CC=CC=1)(CC(C)(C)C=1C=CC=CC=1)CC(C)(C)C1=CC=CC=C1 HOXINJBQVZWYGZ-UHFFFAOYSA-N 0.000 description 4
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 3
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 3
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 3
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 3
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 235000002597 Solanum melongena Nutrition 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 241000860832 Yoda Species 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 3
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 3
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- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 2
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- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
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- CFOLPWIGJLXQPE-UHFFFAOYSA-N bis(3-sulfanylbutyl) benzene-1,2-dicarboxylate Chemical compound CC(S)CCOC(=O)C1=CC=CC=C1C(=O)OCCC(C)S CFOLPWIGJLXQPE-UHFFFAOYSA-N 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- JMWLIBYMTSAPGR-UHFFFAOYSA-N decane-2,9-dithiol Chemical compound CC(S)CCCCCCC(C)S JMWLIBYMTSAPGR-UHFFFAOYSA-N 0.000 description 1
- 239000000645 desinfectant Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- SVTDYSXXLJYUTM-UHFFFAOYSA-N disperse red 9 Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2NC SVTDYSXXLJYUTM-UHFFFAOYSA-N 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- HGVSZIWPYBQNOR-UHFFFAOYSA-N ethane-1,2-diol;propane-1,3-diol Chemical compound OCCO.OCCCO HGVSZIWPYBQNOR-UHFFFAOYSA-N 0.000 description 1
- LFERIADMTHYVKZ-UHFFFAOYSA-N ethyl 4-(2-hydroxy-2-methylpropanoyl)benzoate Chemical compound CCOC(=O)C1=CC=C(C(=O)C(C)(C)O)C=C1 LFERIADMTHYVKZ-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
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- 238000001879 gelation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MHLUCOKRQATVES-UHFFFAOYSA-N hexane-2,5-dithiol Chemical compound CC(S)CCC(C)S MHLUCOKRQATVES-UHFFFAOYSA-N 0.000 description 1
- PRERWTIRVMYUMG-UHFFFAOYSA-N hydroxymethyl(trimethyl)azanium Chemical compound C[N+](C)(C)CO PRERWTIRVMYUMG-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- QFVDKARCPMTZCS-UHFFFAOYSA-N methylrosaniline Chemical compound C1=CC(N(C)C)=CC=C1C(O)(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 QFVDKARCPMTZCS-UHFFFAOYSA-N 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- JQZWHMOVSQRYRN-UHFFFAOYSA-M n-(2-chloroethyl)-n-ethyl-3-methyl-4-[2-(1,3,3-trimethylindol-1-ium-2-yl)ethenyl]aniline;chloride Chemical compound [Cl-].CC1=CC(N(CCCl)CC)=CC=C1C=CC1=[N+](C)C2=CC=CC=C2C1(C)C JQZWHMOVSQRYRN-UHFFFAOYSA-M 0.000 description 1
- ZTBANYZVKCGOKD-UHFFFAOYSA-M n-(2-chloroethyl)-n-methyl-4-[2-(1,3,3-trimethylindol-1-ium-2-yl)ethenyl]aniline;chloride Chemical compound [Cl-].C1=CC(N(CCCl)C)=CC=C1C=CC1=[N+](C)C2=CC=CC=C2C1(C)C ZTBANYZVKCGOKD-UHFFFAOYSA-M 0.000 description 1
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 1
- NMJKIRUDPFBRHW-UHFFFAOYSA-N titanium Chemical compound [Ti].[Ti] NMJKIRUDPFBRHW-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- GZBUMTPCIKCWFW-UHFFFAOYSA-N triethylcholine Chemical compound CC[N+](CC)(CC)CCO GZBUMTPCIKCWFW-UHFFFAOYSA-N 0.000 description 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
- G03F3/106—Checking the colour or tonal value of separation negatives or positives using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
Abstract
Description
No. | 증감제(0.2부) | 광중합 개시제(0.8부) | 티올 화합물 |
실시예 | |||
1 | 없음 | 2-히드록시-2-메틸-1-페닐프로판-1-온 | TPMB |
2 | 없음 | 1-히드록시시클로헥실페닐케톤 | TPMB |
3 | 없음 | 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노-프로판-1-온 | TPMB |
4 | 이소프로필티옥산톤 | 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노-프로판-1-온 | TPMB |
5 | 없음 | 2-벤질-2-디메틸아미노-1-(몰포리노페닐)부탄-1-온 | TPMB |
6 | 없음 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | TPMB |
7 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | TPMB |
8 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | TPMIB |
9 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | EGMB |
10 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | EGMIB |
11 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | PGMB |
12 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | PGMIB |
비교예 | |||
1 | 이소프로필티옥산톤 | 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노-프로판-1-온 | 없음 |
2 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | 없음 |
3 | 이소프로필티옥산톤 | 2-메틸-1-[4-(메틸티오)페닐]-2-몰포리노-프로판-1-온 | TPMP |
4 | 4,4'-비스(디에틸아미노)벤조페논 | 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸 | TPMP |
공정수 | 노광량(mJ/cm2) |
13 | 1.00 |
12 | 1.78 |
11 | 3.16 |
10 | 5.62 |
9 | 10.0 |
8 | 17.8 |
7 | 31.6 |
6 | 56.2 |
5 | 100 |
4 | 177 |
3 | 316 |
2 | 562 |
1 | 1,000 |
0일 | 28일 | |||||
i선 | h선 | g선 | i선 | h선 | g선 | |
실시예1 | 4 | 0 | 0 | 4 | 0 | 0 |
실시예2 | 4 | 0 | 0 | 4 | 0 | 0 |
실시예3 | 6 | 0 | 0 | 6 | 0 | 0 |
실시예4 | 7 | 3 | 0 | 7 | 3 | 0 |
실시예5 | 7 | 4 | 1 | 7 | 4 | 1 |
실시예6 | 5 | 0 | 0 | 5 | 0 | 0 |
실시예7 | 8 | 4 | 0 | 8 | 4 | 0 |
실시예8 | 7 | 3 | 0 | 7 | 3 | 0 |
실시예9 | 8 | 4 | 0 | 8 | 4 | 0 |
실시예10 | 7 | 3 | 0 | 7 | 3 | 0 |
실시예11 | 8 | 4 | 0 | 8 | 4 | 0 |
실시예12 | 7 | 3 | 0 | 7 | 3 | 0 |
비교예1 | 1 | 0 | 0 | 0 | 0 | 0 |
비교예2 | 1 | 0 | 0 | 0 | 0 | 0 |
비교예3 | 8 | 4 | 0 | 4 | 1 | 0 |
비교예4 | 9 | 5 | 0 | 4 | 1 | 0 |
Claims (29)
- 메르캅토기에 대해 α- 및/또는 β-위치의 탄소원자(들) 상에 1개 이상의 치환기를 보유하는 메르캅토기 함유기를 갖는 티올 화합물 및 광중합 개시제를 포함하는 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항에 있어서, 상기 메르캅토기에 대해 α- 및/또는 β-위치의 탄소원자 상의 치환기 중 1개 이상이 알킬기인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 2항에 있어서, 상기 알킬기는 1∼10의 탄소원자를 갖는 직쇄상 또는 분기상 알킬기인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항에 있어서, 상기 티올 화합물은 2개 이상의 메르캅토기 함유기를 갖는 화합물인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항 또는 제 4항에 있어서, 상기 티올 화합물은 일반식(1)으로 나타내어지는 메르캅토기 함유기를 포함하는 화합물인 것을 특징으로 하는 광중합 개시제 조성물.(여기서, R1및 R2는 각각 독립적으로 수소원자, 1∼10의 탄소원자를 갖는 알킬기를 나타내고, 단, R1및 R2중 하나 이상은 알킬기이고, m은 0 또는 1∼2의 정수이며, n은 0 또는 1이다.)
- 제 5항에 있어서, 상기 메르캅토기 함유기를 갖는 티올 화합물은 일반식(2)으로 나타내어지는 메르캅토기 함유 카르복실산 및 다관능 알콜로부터 유래되는 에스테르 화합물인 것을 특징으로 하는 광중합 개시제 조성물.(여기서, 기호들은 제 5항에서 정의한 것과 동일한 의미를 갖는다.)
- 제 6항에 있어서, 상기 다관능 알콜은 알킬렌글리콜(단, 상기 알킬렌기는 2∼10의 탄소원자를 가지며, 분기되어도 좋다), 디에틸렌글리콜, 디프로필렌글리콜, 글리세롤, 트리메틸올프로판, 펜타에리트리톨, 및 디펜타에리트리톨로 이루어지는 군으로부터 선택되는 1종 이상의 화합물인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 7항에 있어서, 상기 알킬렌글리콜은 에틸렌글리콜, 1,2-프로필렌글리콜 또는 1,2-부탄디올인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 6항에 있어서, 상기 티올 화합물은 일반식(A)으로 나타내어지는 화합물인 것을 특징으로 하는 광중합 개시제 조성물.(여기서, R3∼R6은 각각 독립적으로 수소원자 또는 1∼10의 탄소원자를 갖는 알킬기를 나타내고, L은 일반식(1)으로 나타내어지는 기이다.)(여기서, R1, R2, m 및 n은 제 5항에서 정의한 것과 동일한 의미를 갖는다.)
- 제 6항에 있어서, 상기 티올 화합물은 일반식(B)으로 나타내어지는 화합물인것을 특징으로 하는 광중합 개시제 조성물.(여기서, L은 일반식(1)으로 나타내어지는 기이다.)(여기서, R1, R2, m 및 n은 제 5항에서 정의한 것과 동일한 의미를 갖는다.)
- 제 5항, 제 6항, 제 9항 또는 제 10항 중 어느 한 항에 있어서, n은 0인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 5항, 제 6항, 제 9항 또는 제 10항 중 어느 한 항에 있어서, m은 0 또는 1인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 6항에 있어서, 상기 메르캅토기 함유기를 갖는 티올 화합물은 에틸렌글리콜비스(3-메르캅토부티레이트), 1,2-프로필렌글리콜(3-메르캅토부티레이트), 트리메틸올프로판트리스(3-메르캅토부티레이트), 에틸렌글리콜비스(2-메르캅토이소부티레이트), 1,2-프로필렌글리콜비스(2-메르캅토이소부티레이트) 및 트리메틸올프로판트리스(2-메르캅토이소부티레이트)로부터 선택되는 화합물인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항에 있어서, 상기 광중합 개시제는 α-히드록시아세토페논류, α-아미노아세토페논류 및 비이미다졸류로 이루어지는 군으로부터 선택되는 1종 이상의 광중합 개시제인 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항에 있어서, 상기 조성물은 증감제를 더 포함하는 것을 특징으로 하는 광중합 개시제 조성물.
- 제 15항에 있어서, 상기 증감제는 벤조페논류 및 안트라퀴논류로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 광중합 개시제 조성물.
- 제 1항 내지 제 16항 중 어느 한 항에 기재된 광중합 개시제 조성물을 함유하는 것을 특징으로 하는 감광성 조성물.
- 제 17항에 있어서, 상기 조성물은 폴리머 화합물 및/또는 에틸렌성 불포화 결합을 갖는 화합물을 함유하는 것을 특징으로 하는 감광성 조성물.
- 제 18항에 있어서, 상기 폴리머 화합물은 용제 또는 알칼리 수용액 중에서 가용성인 것을 특징으로 하는 감광성 조성물.
- 제 17항에 있어서, 상기 조성물은 안료를 함유하는 것을 특징으로 하는 감광성 조성물.
- 하기 일반식(2)으로 나타내어지는 메르캅토기 함유 카르복실산 및 다관능 알콜로부터 유래되는 에스테르 화합물인 것을 특징으로 하는 티올 화합물.(여기서, R1및 R2는 각각 독립적으로 수소원자 또는 1∼10의 탄소원자를 갖는 알킬기를 나타내고, 단, R1및 R2중 하나 이상은 알킬기이고, m은 0 또는 1∼2의 정수이며, n은 0 또는 1이다.)
- 제 21항에 있어서, 상기 다관능 알콜은 알킬렌글리콜(단, 상기 알킬렌기는 2∼10의 탄소원자를 가지며, 분기되어도 좋다), 디에틸렌글리콜, 디프로필렌글리콜, 글리세롤, 트리메틸올프로판, 펜타에리트리톨 및 디펜타에리트리톨로 이루어지는 군으로부터 선택되는 1종 이상의 화합물인 것을 특징으로 하는 티올 화합물.
- 제 22항에 있어서, 상기 알킬렌글리콜은 에틸렌글리콜, 1,2-프로필렌글리콜 또는 1,2-부탄디올인 것을 특징으로 하는 티올 화합물.
- 제 21항에 있어서, 상기 티올 화합물은 일반식(A)으로 나타내어지는 것을 특징으로 하는 티올 화합물.(여기서, R3∼R6은 각각 독립적으로 수소원자, 또는 1∼10의 탄소원자를 갖는 알킬기를 나타내고, L은 일반식(1)으로 나타내어지는 기이다.)(여기서, R1, R2, m 및 n은 제 21항에서 정의된 것과 동일한 의미를 갖는다.)
- 제 21항에 있어서, 상기 티올 화합물은 일반식(B)으로 나타내어지는 것을 특징으로 하는 티올 화합물.(여기서, L은 일반식(1)으로 나타내어지는 기이다.)(여기서, R1, R2, m 및 n은, 제 21항에서 정의된 것과 동일한 의미를 갖는다.)
- 제 21항, 제 24항 또는 제 25항 중 어느 한 항에 있어서, n은 0인 것을 특징으로 하는 티올 화합물.
- 제 21항, 제 24항 또는 제 25항 중 어느 한 항에 있어서, m은 0 또는 1인 것을 특징으로 하는 티올 화합물.
- 제 21항에 있어서, 상기 티올 화합물은 200∼1,000의 분자량을 갖는 것을 특징으로 하는 티올 화합물.
- 제 21항에 있어서, 상기 메르캅토기 함유기를 갖는 티올 화합물은, 에틸렌글리콜비스(3-메르캅토부티레이트), 1,2-프로필렌글리콜(3-메르캅토부티레이트), 트리메틸올프로판트리스(3-메르캅토부티레이트), 에틸렌글리콜비스(2-메르캅토이소부티레이트), 1,2-프로필렌글리콜비스(2-메르캅토이소부티레이트), 및 트리메틸올프로판트리스(2-메르캅토이소부티레이트)로부터 선택되는 화합물인 것을 특징으로 하는 티올 화합물.
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WO2006046733A1 (en) * | 2004-10-26 | 2006-05-04 | Showa Denko K.K | Thiol compound, and photosensitive composition and black matrix resist composition using the compound |
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- 2003-02-27 EP EP03720880.8A patent/EP1478668B1/en not_active Expired - Lifetime
- 2003-02-27 US US10/505,778 patent/US7341828B2/en not_active Expired - Lifetime
- 2003-02-27 CN CNB038046660A patent/CN100523008C/zh not_active Expired - Lifetime
- 2003-02-27 AU AU2003224454A patent/AU2003224454A1/en not_active Abandoned
- 2003-02-27 WO PCT/JP2003/002219 patent/WO2003072614A2/en active Application Filing
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100736295B1 (ko) * | 2005-02-09 | 2007-07-06 | 다이요 잉키 세이조 가부시키가이샤 | 표시 패널용 감광성 수지 조성물, 및 그의 경화물 및 표시패널용 스페이서 |
KR100741295B1 (ko) * | 2005-05-03 | 2007-07-20 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
KR101027811B1 (ko) * | 2007-12-24 | 2011-04-07 | 한국생산기술연구원 | 저열팽창계수를 갖는 폴리카보네이트 수지 조성물 |
Also Published As
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AU2003224454A8 (en) | 2003-09-09 |
AU2003224454A1 (en) | 2003-09-09 |
JP4902608B2 (ja) | 2012-03-21 |
CN1656127A (zh) | 2005-08-17 |
EP1478668B1 (en) | 2013-04-10 |
US20050153231A1 (en) | 2005-07-14 |
US7341828B2 (en) | 2008-03-11 |
JP2009035555A (ja) | 2009-02-19 |
WO2003072614A3 (en) | 2004-04-22 |
KR100976995B1 (ko) | 2010-08-19 |
WO2003072614A2 (en) | 2003-09-04 |
CN100523008C (zh) | 2009-08-05 |
EP1478668A2 (en) | 2004-11-24 |
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