KR20040048298A - 묘화헤드, 묘화장치 및 묘화방법 - Google Patents
묘화헤드, 묘화장치 및 묘화방법 Download PDFInfo
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- KR20040048298A KR20040048298A KR1020030079980A KR20030079980A KR20040048298A KR 20040048298 A KR20040048298 A KR 20040048298A KR 1020030079980 A KR1020030079980 A KR 1020030079980A KR 20030079980 A KR20030079980 A KR 20030079980A KR 20040048298 A KR20040048298 A KR 20040048298A
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- 238000000034 method Methods 0.000 title claims description 9
- 238000001459 lithography Methods 0.000 title 3
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 239000004973 liquid crystal related substance Substances 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims description 2
- 210000002858 crystal cell Anatomy 0.000 claims description 2
- 238000003384 imaging method Methods 0.000 abstract 14
- 239000013307 optical fiber Substances 0.000 description 30
- 239000000463 material Substances 0.000 description 26
- 239000000835 fiber Substances 0.000 description 22
- 239000004065 semiconductor Substances 0.000 description 19
- 238000012937 correction Methods 0.000 description 13
- 230000003287 optical effect Effects 0.000 description 13
- 230000002159 abnormal effect Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 5
- 210000004027 cell Anatomy 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- 241001147444 Giardia lamblia virus Species 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000001454 recorded image Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/485—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes
- B41J2/505—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes from an assembly of identical printing elements
- B41J2/5056—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes from an assembly of identical printing elements using dot arrays providing selective dot disposition modes, e.g. different dot densities for high speed and high-quality printing, array line selections for multi-pass printing, or dot shifts for character inclination
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
- B41J2/46—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources characterised by using glass fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J25/00—Actions or mechanisms not otherwise provided for
- B41J25/001—Mechanisms for bodily moving print heads or carriages parallel to the paper surface
- B41J25/003—Mechanisms for bodily moving print heads or carriages parallel to the paper surface for changing the angle between a print element array axis and the printing line, e.g. for dot density changes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K15/00—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers
- G06K15/02—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers
- G06K15/12—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers
- G06K15/1238—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Quality & Reliability (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Facsimile Scanning Arrangements (AREA)
- Fax Reproducing Arrangements (AREA)
Abstract
Description
Claims (9)
- 묘화면에 대해서 이 묘화면에 걸친 소정의 주사방향으로 상대이동되는 묘화헤드로서,묘화면과 실질적으로 평행한 면내에서 복수의 묘화소자를 2차원으로 배열하여 구성되고, 묘화면에서 전체적으로 상기 주사방향에 대해서 소정의 경사각도로 경사진 2차원 형상의 묘화화소군을 생성하는 묘화소자군; 및상기 묘화소자군의 소정의 경사각도와 상기 묘화화소군의 실제 경사각도의 오차에 기초하여 상기 주사방향으로부터 상기 경사각도만큼 경사진 방향의 묘화화소수를 변경하는 변경수단을 구비한 것을 특징으로 하는 묘화헤드.
- 제1항에 있어서, 상기 상대이동의 방향과 직교하는 방향의 화상데이터의 해상도를, 상기 상대이동의 방향과 직교하는 방향의 상기 묘화화소수의 해상도가 되도록 변환하는 해상도 변환수단을 구비하는 것을 특징으로 하는 묘화헤드.
- 제2항에 있어서, 상기 화상데이터의 변환은 화상데이터의 확대 또는 축소를 포함하고 있는 것을 특징으로 하는 묘화헤드.
- 제1항 내지 제3항 중 어느 한 항에 있어서, 상기 묘화소자군은 화상정보에 대응하여 각 화소마다 변조된 광을 묘화면으로서의 노광면에 조사하는 변조광 조사장치인 것을 특징으로 하는 묘화헤드.
- 제4항에 있어서, 상기 변조광 조사장치는,레이저광을 조사하는 레이저장치;각각 제어신호에 따라서 광변조상태가 변화하는 다수의 묘화소자부가 2차원 형상으로 배열되고, 상기 레이저장치로부터 조사된 레이저광을 변조하는 공간 광변조소자; 및상기 묘화소자부를 노광정보에 따라서 생성한 제어신호에 의해서 제어하는 제어수단을 포함하는 것을 특징으로 하는 묘화헤드.
- 제4항에 있어서, 상기 공간 광변조소자를, 각각 제어신호에 따라서 반사면의 각도를 변경할 수 있는 다수의 마이크로 미러가 2차원 형상으로 배열되어 구성된 마이크로 미러 장치로 구성한 것을 특징으로 하는 묘화헤드.
- 제5항에 있어서, 상기 공간 광변조소자를, 각각 제어신호에 따라서 투과광을 차단할 수 있는 다수의 액정셀이 2차원 형상으로 배열되어 구성된 액정 셔터 어레이로 구성한 것을 특징으로 하는 묘화헤드.
- 제1항 내지 제7항 중 어느 한 항에 기재된 묘화헤드; 및상기 묘화헤드를 적어도 상기 소정방향으로 상대이동시키는 이동수단을 갖는것을 특징으로 하는 묘화장치.
- 제1항 내지 제7항 중 어느 한 항에 기재된 묘화헤드를 사용하고, 이 묘화헤드를 묘화면에 걸친 소정의 주사방향으로 상대이동시켜 묘화하는 묘화방법으로서,상기 묘화소자군의 소정의 경사각도와 상기 묘화화소군의 실제 경사각도의 오차에 기초하여 상기 주사방향으로부터 상기 경사각도만큼 경사진 방향의 묘화화소수를 변경하여 묘화면에 묘화하는 것을 특징으로 하는 묘화방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00349961 | 2002-12-02 | ||
JP2002349961A JP4150250B2 (ja) | 2002-12-02 | 2002-12-02 | 描画ヘッド、描画装置及び描画方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040048298A true KR20040048298A (ko) | 2004-06-07 |
KR100986218B1 KR100986218B1 (ko) | 2010-10-07 |
Family
ID=32310682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030079980A KR100986218B1 (ko) | 2002-12-02 | 2003-11-13 | 묘화헤드, 묘화장치 및 묘화방법 |
Country Status (7)
Country | Link |
---|---|
US (2) | US6980348B2 (ko) |
EP (1) | EP1426190B1 (ko) |
JP (1) | JP4150250B2 (ko) |
KR (1) | KR100986218B1 (ko) |
CN (2) | CN1827383A (ko) |
DE (1) | DE60303857T2 (ko) |
TW (1) | TWI231700B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101369217B1 (ko) * | 2006-03-27 | 2014-03-04 | 후지필름 가부시키가이샤 | 묘화 상태 조정 방법 및 장치 |
KR101414538B1 (ko) * | 2006-03-27 | 2014-07-03 | 가부시키가이샤 아도테크 엔지니어링 | 묘화 상태 조정 방법 및 장치 |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6876494B2 (en) * | 2002-09-30 | 2005-04-05 | Fuji Photo Film Co., Ltd. | Imaging forming apparatus |
JP4150250B2 (ja) * | 2002-12-02 | 2008-09-17 | 富士フイルム株式会社 | 描画ヘッド、描画装置及び描画方法 |
US7417782B2 (en) | 2005-02-23 | 2008-08-26 | Pixtronix, Incorporated | Methods and apparatus for spatial light modulation |
JP2005022247A (ja) * | 2003-07-02 | 2005-01-27 | Fuji Photo Film Co Ltd | 画像記録方法及び画像記録装置 |
JP4373731B2 (ja) * | 2003-07-22 | 2009-11-25 | 富士フイルム株式会社 | 描画装置及び描画方法 |
JP4823581B2 (ja) * | 2004-06-17 | 2011-11-24 | 富士フイルム株式会社 | 描画装置および描画方法 |
JP4601482B2 (ja) | 2004-07-29 | 2010-12-22 | 新光電気工業株式会社 | 描画装置および描画方法 |
JP4532200B2 (ja) * | 2004-08-10 | 2010-08-25 | 株式会社オーク製作所 | 描画装置 |
JP4532202B2 (ja) * | 2004-08-11 | 2010-08-25 | 株式会社オーク製作所 | 描画装置 |
US9261694B2 (en) | 2005-02-23 | 2016-02-16 | Pixtronix, Inc. | Display apparatus and methods for manufacture thereof |
US20070205969A1 (en) | 2005-02-23 | 2007-09-06 | Pixtronix, Incorporated | Direct-view MEMS display devices and methods for generating images thereon |
US9158106B2 (en) | 2005-02-23 | 2015-10-13 | Pixtronix, Inc. | Display methods and apparatus |
US8519945B2 (en) | 2006-01-06 | 2013-08-27 | Pixtronix, Inc. | Circuits for controlling display apparatus |
US7755582B2 (en) | 2005-02-23 | 2010-07-13 | Pixtronix, Incorporated | Display methods and apparatus |
US8482496B2 (en) | 2006-01-06 | 2013-07-09 | Pixtronix, Inc. | Circuits for controlling MEMS display apparatus on a transparent substrate |
US7746529B2 (en) | 2005-02-23 | 2010-06-29 | Pixtronix, Inc. | MEMS display apparatus |
US8159428B2 (en) | 2005-02-23 | 2012-04-17 | Pixtronix, Inc. | Display methods and apparatus |
US7675665B2 (en) | 2005-02-23 | 2010-03-09 | Pixtronix, Incorporated | Methods and apparatus for actuating displays |
US8310442B2 (en) | 2005-02-23 | 2012-11-13 | Pixtronix, Inc. | Circuits for controlling display apparatus |
US9229222B2 (en) | 2005-02-23 | 2016-01-05 | Pixtronix, Inc. | Alignment methods in fluid-filled MEMS displays |
US7999994B2 (en) | 2005-02-23 | 2011-08-16 | Pixtronix, Inc. | Display apparatus and methods for manufacture thereof |
CN101128766B (zh) * | 2005-02-23 | 2011-01-12 | 皮克斯特罗尼克斯公司 | 显示装置及其制造方法 |
US7742016B2 (en) | 2005-02-23 | 2010-06-22 | Pixtronix, Incorporated | Display methods and apparatus |
US9082353B2 (en) | 2010-01-05 | 2015-07-14 | Pixtronix, Inc. | Circuits for controlling display apparatus |
JP2006284842A (ja) * | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | パターン形成方法 |
JP4606949B2 (ja) * | 2005-03-31 | 2011-01-05 | 富士フイルム株式会社 | 描画装置および描画方法 |
CA2603170A1 (en) * | 2005-04-02 | 2006-10-12 | Punch Graphix Prepress Germany Gmbh | Exposure device for press plates |
JP2006337601A (ja) * | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | 描画装置及び描画方法 |
JP2007003661A (ja) * | 2005-06-22 | 2007-01-11 | Fujifilm Holdings Corp | パターン形成方法 |
JP2007010785A (ja) * | 2005-06-28 | 2007-01-18 | Fujifilm Holdings Corp | 永久パターン形成方法 |
JP2007024969A (ja) * | 2005-07-12 | 2007-02-01 | Fujifilm Holdings Corp | セル内構造の製造方法及びセル内構造並びに表示装置 |
JP2007078894A (ja) * | 2005-09-12 | 2007-03-29 | Fujifilm Corp | 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法 |
US8526096B2 (en) | 2006-02-23 | 2013-09-03 | Pixtronix, Inc. | Mechanical light modulators with stressed beams |
US7876489B2 (en) | 2006-06-05 | 2011-01-25 | Pixtronix, Inc. | Display apparatus with optical cavities |
DE102006029088A1 (de) | 2006-06-24 | 2007-12-27 | Man Roland Druckmaschinen Ag | Verfahren zum Bedrucken eines Bedruckstoffs |
WO2008051362A1 (en) | 2006-10-20 | 2008-05-02 | Pixtronix, Inc. | Light guides and backlight systems incorporating light redirectors at varying densities |
US9176318B2 (en) | 2007-05-18 | 2015-11-03 | Pixtronix, Inc. | Methods for manufacturing fluid-filled MEMS displays |
US7852546B2 (en) | 2007-10-19 | 2010-12-14 | Pixtronix, Inc. | Spacers for maintaining display apparatus alignment |
JP5253916B2 (ja) * | 2008-03-10 | 2013-07-31 | 株式会社ジャパンディスプレイイースト | マスクレス露光方法 |
US8248560B2 (en) | 2008-04-18 | 2012-08-21 | Pixtronix, Inc. | Light guides and backlight systems incorporating prismatic structures and light redirectors |
KR20100042864A (ko) * | 2008-10-17 | 2010-04-27 | 삼성전자주식회사 | 노광장치 및 그 진직도 측정방법 |
US8169679B2 (en) | 2008-10-27 | 2012-05-01 | Pixtronix, Inc. | MEMS anchors |
KR20120132680A (ko) | 2010-02-02 | 2012-12-07 | 픽스트로닉스 인코포레이티드 | 저온 실 유체 충전된 디스플레이 장치의 제조 방법 |
BR112012019383A2 (pt) | 2010-02-02 | 2017-09-12 | Pixtronix Inc | Circuitos para controlar aparelho de exibição |
GB2483625A (en) * | 2010-02-17 | 2012-03-21 | Cambridge Display Tech Ltd | Printing an array of channels on a substrate |
JP2012049433A (ja) * | 2010-08-30 | 2012-03-08 | Orc Mfg Co Ltd | 露光装置 |
EP2471666B1 (en) * | 2010-12-30 | 2012-09-12 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus and method for operating a marking apparatus |
US10149390B2 (en) | 2012-08-27 | 2018-12-04 | Mycronic AB | Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs |
US9134552B2 (en) | 2013-03-13 | 2015-09-15 | Pixtronix, Inc. | Display apparatus with narrow gap electrostatic actuators |
US9446586B2 (en) * | 2013-08-09 | 2016-09-20 | The Procter & Gamble Company | Systems and methods for image distortion reduction in web printing |
KR102151254B1 (ko) * | 2013-08-19 | 2020-09-03 | 삼성디스플레이 주식회사 | 노광장치 및 그 방법 |
CN112764324B (zh) * | 2021-01-07 | 2022-08-23 | 江苏迪盛智能科技有限公司 | 光刻系统的扫描方法和光刻系统 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US140801A (en) * | 1873-07-15 | Improvement in refining petroleum | ||
US196377A (en) * | 1877-10-23 | Improvement in lazy-backs for vehicle-seats | ||
JPH08314150A (ja) * | 1995-05-19 | 1996-11-29 | Dainippon Screen Mfg Co Ltd | 画像記録装置 |
JPH1039241A (ja) | 1996-07-19 | 1998-02-13 | Konica Corp | レーザ記録装置 |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
CN1159628C (zh) | 1997-04-14 | 2004-07-28 | 迪科公司 | 用于点照明介质的照明装置和照明方法 |
JPH1141473A (ja) * | 1997-07-15 | 1999-02-12 | Toshiba Corp | 画像処理装置と画像記録装置と画像形成装置 |
US6189991B1 (en) * | 1998-08-14 | 2001-02-20 | Eastman Kodak Company | Compensating for receiver skew and changing resolution in ink jet printer |
JP2000131628A (ja) | 1998-10-27 | 2000-05-12 | Fuji Photo Film Co Ltd | 画像記録装置 |
JP3416643B2 (ja) * | 2000-11-30 | 2003-06-16 | 大日本スクリーン製造株式会社 | 画像記録装置 |
US6753898B2 (en) * | 2001-03-29 | 2004-06-22 | Masanori Kubota | Method and apparatus for high speed digitized exposure |
JP4174195B2 (ja) * | 2001-05-28 | 2008-10-29 | キヤノン株式会社 | 画像表示装置 |
US6951666B2 (en) * | 2001-10-05 | 2005-10-04 | Cabot Corporation | Precursor compositions for the deposition of electrically conductive features |
JP4150250B2 (ja) * | 2002-12-02 | 2008-09-17 | 富士フイルム株式会社 | 描画ヘッド、描画装置及び描画方法 |
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Cited By (2)
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KR101369217B1 (ko) * | 2006-03-27 | 2014-03-04 | 후지필름 가부시키가이샤 | 묘화 상태 조정 방법 및 장치 |
KR101414538B1 (ko) * | 2006-03-27 | 2014-07-03 | 가부시키가이샤 아도테크 엔지니어링 | 묘화 상태 조정 방법 및 장치 |
Also Published As
Publication number | Publication date |
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KR100986218B1 (ko) | 2010-10-07 |
US7212327B2 (en) | 2007-05-01 |
JP2004181723A (ja) | 2004-07-02 |
EP1426190A1 (en) | 2004-06-09 |
US20040109216A1 (en) | 2004-06-10 |
TW200414748A (en) | 2004-08-01 |
DE60303857D1 (de) | 2006-05-04 |
CN1251878C (zh) | 2006-04-19 |
US20060055998A1 (en) | 2006-03-16 |
US6980348B2 (en) | 2005-12-27 |
EP1426190B1 (en) | 2006-03-08 |
DE60303857T2 (de) | 2006-08-17 |
CN1510904A (zh) | 2004-07-07 |
JP4150250B2 (ja) | 2008-09-17 |
CN1827383A (zh) | 2006-09-06 |
TWI231700B (en) | 2005-04-21 |
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