KR20030064602A - 센터링 장치 및 반도체 제조 장치 - Google Patents
센터링 장치 및 반도체 제조 장치 Download PDFInfo
- Publication number
- KR20030064602A KR20030064602A KR1020020066467A KR20020066467A KR20030064602A KR 20030064602 A KR20030064602 A KR 20030064602A KR 1020020066467 A KR1020020066467 A KR 1020020066467A KR 20020066467 A KR20020066467 A KR 20020066467A KR 20030064602 A KR20030064602 A KR 20030064602A
- Authority
- KR
- South Korea
- Prior art keywords
- centering
- wafer
- semiconductor manufacturing
- support
- manufacturing apparatus
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/141—Associated with semiconductor wafer handling includes means for gripping wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/26—Chucks or sockets with centering means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (12)
- 피처리체를 한장씩 수취하여 센터링하는 센터링 장치로,상기 피처리체를 한장씩 주고받는 승강가능한 지지체와,이 지지체로부터 수취한 상기 피처리체를 센터링하는 센터링 기구를 구비하며,상기 센터링 기구는 상기 지지체의 양측에 배치되며 또한 상기 피처리체의 외주면에 입각한 걸어맞춤면이 형성된 지지부를 갖는 한쌍의 센터링 플레이트와, 이들 센터링 플레이트를 확대·축소시키는 구동 기구를 갖는 것을 특징으로 하는 센터링 장치.
- 제1항에 있어서, 상기 센터링 플레이트는 크기를 달리 하는 복수의 걸어맞춤면을 복수단에 걸쳐서 갖는 것을 특징으로 하는 센터링 장치.
- 제1항에 있어서, 상기 구동 기구는 상기 각 센터링 플레이트로부터 각각 늘어뜨린 축에 연결된 링크 기구와, 이 링크 기구에 연결된 실린더 기구를 갖는 것을 특징으로 하는 센터링 장치.
- 제1항에 있어서, 복수의 피처리체를 수납하는 수납부를 갖는 것을 특징으로 하는 센터링 장치.
- 제4항에 있어서, 상기 수납부는 크기를 달리 하는 복수종의 피처리체를 수납하는 부분을 갖는 것을 특징으로 하는 센터링 장치.
- 제1항에 있어서, 상기 피처리체를 자동 반송 장치와의 사이에서 주고받는 것을 특징으로 하는 센터링 장치.
- 피처리체를 한장씩 수취하여 센터링하는 센터링 장치와,이 센터링 장치와 탑재대 사이에서 상기 피처리체를 반송하는 반송 기구를 구비하며, 상기 탑재대상에 탑재된 상기 피처리체에 대하여 소정의 처리를 실행하는 반도체 제조 장치로,상기 센터링 장치는 상기 피처리체를 한장씩 주고받는 승강가능한 지지체와, 이 지지체로부터 수취한 상기 피처리체를 센터링하는 센터링 기구를 구비하며,상기 센터링 기구는 상기 지지체의 양측에 배치되며 또한 상기 피처리체의 외주면에 입각한 걸어맞춤면이 형성된 지지부를 갖는 한쌍의 센터링 플레이트와, 이들 센터링 플레이트를 확대·축소시키는 구동 기구를 갖는 것을 특징으로 하는 반도체 제조 장치.
- 제7항에 있어서, 상기 센터링 플레이트는 크기를 달리하는 복수의 걸어맞춤면을 복수단에 걸쳐서 갖는 것을 특징으로 하는 반도체 제조 장치.
- 제7항에 있어서, 상기 구동 기구는 상기 각 센터링 플레이트로부터 각각 늘어뜨린 축에 연결된 링크 기구와, 이 링크 기구에 연결된 실린더 기구를 갖는 것을 특징으로 하는 반도체 제조 장치.
- 제7항에 있어서, 복수의 피처리체를 수납하는 수납부를 갖는 것을 특징으로 하는 특징으로 하는 반도제 제조 장치.
- 제10항에 있어서, 상기 수납부는 크기를 달리 하는 복수종의 피처리체를 수납하는 부분을 갖는 것을 특징으로 하는 반도제 제조 장치.
- 제7항에 있어서, 상기 피처리체를 자동 반송 장치와의 사이에서 주고받는 것을 특징으로 하는 반도체 제조 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002018848A JP4173309B2 (ja) | 2002-01-28 | 2002-01-28 | センタリング装置及び枚葉式検査装置 |
JPJP-P-2002-00018848 | 2002-01-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030064602A true KR20030064602A (ko) | 2003-08-02 |
KR100479161B1 KR100479161B1 (ko) | 2005-03-25 |
Family
ID=19192102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0066467A KR100479161B1 (ko) | 2002-01-28 | 2002-10-30 | 센터링 장치 및 반도체 제조 장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7153087B2 (ko) |
EP (1) | EP1331659B1 (ko) |
JP (1) | JP4173309B2 (ko) |
KR (1) | KR100479161B1 (ko) |
CN (1) | CN1276467C (ko) |
TW (1) | TWI298186B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100796052B1 (ko) * | 2005-04-27 | 2008-01-21 | 동경 엘렉트론 주식회사 | 처리장치 시스템 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4515133B2 (ja) * | 2004-04-02 | 2010-07-28 | 株式会社アルバック | 搬送装置及びその制御方法並びに真空処理装置 |
JP4559801B2 (ja) * | 2004-09-06 | 2010-10-13 | 東京エレクトロン株式会社 | ウエハチャック |
JP4523513B2 (ja) | 2005-08-05 | 2010-08-11 | 東京エレクトロン株式会社 | 基板受け渡し装置、基板受け渡し方法及び記憶媒体 |
JP5120018B2 (ja) * | 2007-05-15 | 2013-01-16 | 東京エレクトロン株式会社 | プローブ装置 |
CN101279673B (zh) * | 2008-05-23 | 2011-09-21 | 安东石油技术(集团)有限公司 | 一种液压旋转举升掉头机构 |
JP2011032001A (ja) * | 2009-07-30 | 2011-02-17 | Murata Machinery Ltd | 搬送車システム |
JP2011064659A (ja) * | 2009-09-21 | 2011-03-31 | Tokyo Electron Ltd | プローブカードのクランプ機構及び検査装置 |
US8544317B2 (en) * | 2009-10-09 | 2013-10-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor processing apparatus with simultaneously movable stages |
JP5449239B2 (ja) * | 2010-05-12 | 2014-03-19 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及びプログラムを記録した記憶媒体 |
JP5572575B2 (ja) * | 2010-05-12 | 2014-08-13 | 東京エレクトロン株式会社 | 基板位置決め装置、基板処理装置、基板位置決め方法及びプログラムを記録した記憶媒体 |
JP5243491B2 (ja) * | 2010-06-18 | 2013-07-24 | 東京エレクトロン株式会社 | 位置決め装置、基板処理装置及び基準部材の固定方法 |
CN103730400B (zh) * | 2012-10-16 | 2016-06-29 | 沈阳芯源微电子设备有限公司 | 一种多尺寸晶圆对中装置 |
CN103295730B (zh) * | 2012-12-27 | 2015-09-16 | 浙江省东阳市诚基电机有限公司 | 充磁夹具 |
CN102992063A (zh) * | 2012-12-28 | 2013-03-27 | 上海凯思尔电子有限公司 | 全自动收板机的拍板居中对齐机构 |
US9606532B2 (en) | 2014-01-29 | 2017-03-28 | Taiwan Semiconductor Manufacturing Company Limited | Method and manufacturing system |
JP6276053B2 (ja) * | 2014-02-13 | 2018-02-07 | 東京エレクトロン株式会社 | プローバ |
JP6880364B2 (ja) * | 2015-08-18 | 2021-06-02 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
TW201714243A (zh) * | 2015-10-05 | 2017-04-16 | Els System Technology Co Ltd | 承載裝置 |
CN108955974A (zh) * | 2017-05-23 | 2018-12-07 | 太仓飞顺温控设备有限公司 | 一种磁性材料检测治具 |
CN109445472B (zh) * | 2018-12-10 | 2021-11-23 | 三一汽车制造有限公司 | 臂架回转对中装置及臂架回转对中控制方法 |
JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
CN111483754B (zh) * | 2020-03-30 | 2020-12-29 | 科捷智能装备有限公司 | 顶升托盘对中方法 |
EP4285403A2 (de) | 2021-01-29 | 2023-12-06 | PINK GmbH Thermosysteme | Anlage und verfahren zum verbinden von elektronischen baugruppen |
JP7546617B2 (ja) | 2022-03-22 | 2024-09-06 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法、プログラム及び基板搬送方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4507078A (en) * | 1983-03-28 | 1985-03-26 | Silicon Valley Group, Inc. | Wafer handling apparatus and method |
US4655584A (en) * | 1984-05-11 | 1987-04-07 | Nippon Kogaku K. K. | Substrate positioning apparatus |
EP0250064A2 (en) * | 1986-06-20 | 1987-12-23 | Varian Associates, Inc. | Wafer processing chuck using multiple thin clamps |
JPS6372138A (ja) * | 1986-09-12 | 1988-04-01 | Metsukusu:Kk | シリコンウエハ−の位置決め装置 |
US4880348A (en) * | 1987-05-15 | 1989-11-14 | Roboptek, Inc. | Wafer centration device |
ATE95949T1 (de) * | 1988-07-15 | 1993-10-15 | Balzers Hochvakuum | Haltevorrichtung fuer eine scheibe sowie anwendung derselben. |
KR100294062B1 (ko) * | 1992-10-27 | 2001-10-24 | 조셉 제이. 스위니 | 웨이퍼 처리 챔버에서의 돔형 페데스탈용 클램프 링 |
JP3238246B2 (ja) * | 1993-05-31 | 2001-12-10 | 東京エレクトロン株式会社 | 半導体ウエハの検査リペア装置及びバーンイン検査装置 |
JPH077069A (ja) | 1993-06-15 | 1995-01-10 | Toshiba Corp | ウェハ位置決め装置及びその方法 |
FR2711125B1 (fr) * | 1993-10-13 | 1996-01-26 | Dubuit Mach | Chargeur pour machine d'impression pour objets présentés en pile. |
US5673922A (en) * | 1995-03-13 | 1997-10-07 | Applied Materials, Inc. | Apparatus for centering substrates on support members |
JPH09107018A (ja) * | 1995-10-13 | 1997-04-22 | Tokyo Seimitsu Co Ltd | ウェーハセンタリング装置 |
US5980195A (en) * | 1996-04-24 | 1999-11-09 | Tokyo Electron, Ltd. | Positioning apparatus for substrates to be processed |
JPH09321124A (ja) | 1996-05-29 | 1997-12-12 | Jeol Ltd | ウエハのアライメント方法および装置 |
KR100272252B1 (ko) | 1997-04-17 | 2000-11-15 | 윤종용 | 웨이퍼카세트반송방법 |
US6309163B1 (en) * | 1997-10-30 | 2001-10-30 | Applied Materials, Inc. | Wafer positioning device with storage capability |
US6073576A (en) * | 1997-11-25 | 2000-06-13 | Cvc Products, Inc. | Substrate edge seal and clamp for low-pressure processing equipment |
US6146463A (en) * | 1998-06-12 | 2000-11-14 | Applied Materials, Inc. | Apparatus and method for aligning a substrate on a support member |
IL128925A (en) * | 1999-03-10 | 2004-03-28 | Nova Measuring Instr Ltd | Positioning assembly |
KR20010058704A (ko) * | 1999-12-30 | 2001-07-06 | 서성원 | 반도체 웨이퍼용 정렬모듈 및 수동 트레이 모듈의 일체형장치 |
US6409463B1 (en) * | 2000-02-08 | 2002-06-25 | Seh America, Inc. | Apparatuses and methods for adjusting a substrate centering system |
JP3825232B2 (ja) * | 2000-07-28 | 2006-09-27 | 株式会社 Sen−Shi・アクセリス カンパニー | ウエハ搬送システム及びその搬送方法 |
-
2002
- 2002-01-28 JP JP2002018848A patent/JP4173309B2/ja not_active Expired - Fee Related
- 2002-10-30 KR KR10-2002-0066467A patent/KR100479161B1/ko active IP Right Grant
-
2003
- 2003-01-22 EP EP03001451A patent/EP1331659B1/en not_active Expired - Lifetime
- 2003-01-27 TW TW092101732A patent/TWI298186B/zh not_active IP Right Cessation
- 2003-01-27 US US10/351,088 patent/US7153087B2/en not_active Expired - Fee Related
- 2003-01-28 CN CNB031035310A patent/CN1276467C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100796052B1 (ko) * | 2005-04-27 | 2008-01-21 | 동경 엘렉트론 주식회사 | 처리장치 시스템 |
Also Published As
Publication number | Publication date |
---|---|
TW200302545A (en) | 2003-08-01 |
EP1331659A3 (en) | 2004-12-08 |
US20030160401A1 (en) | 2003-08-28 |
CN1437240A (zh) | 2003-08-20 |
JP4173309B2 (ja) | 2008-10-29 |
CN1276467C (zh) | 2006-09-20 |
EP1331659A2 (en) | 2003-07-30 |
KR100479161B1 (ko) | 2005-03-25 |
TWI298186B (en) | 2008-06-21 |
EP1331659B1 (en) | 2007-05-02 |
US7153087B2 (en) | 2006-12-26 |
JP2003224177A (ja) | 2003-08-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100479161B1 (ko) | 센터링 장치 및 반도체 제조 장치 | |
JP4589853B2 (ja) | 基板搬送システム及び基板搬送方法 | |
TWI452643B (zh) | Inspection device and inspection method | |
EP0837333A2 (en) | Apparatus for aligning a semiconductor wafer with an inspection contactor | |
US7457680B2 (en) | Conveyance method for transporting objects | |
CN107112264A (zh) | 晶片对准器 | |
KR101386331B1 (ko) | 웨이퍼 반송 장치 | |
KR100909494B1 (ko) | 처리장치 | |
CN111742399A (zh) | 接触精度保证方法、接触精度保证机构和检查装置 | |
KR100849511B1 (ko) | 피처리체의 반송 시스템, 반송 방법, 및 반도체 제조 장치 | |
US7826918B2 (en) | Transfer system and transfer method of object to be processed | |
JP4820008B2 (ja) | 被処理体の搬送システム及び被処理体の搬送方法 | |
JPH11238767A (ja) | ウエハと接触子の位置合わせ装置 | |
JP4820006B2 (ja) | 被処理体の搬送システム及び被処理体の搬送方法 | |
JP4820007B2 (ja) | 被処理体の搬送方法 | |
JPH10189684A (ja) | キャリア検出装置および基板処理装置、基板移替装置 | |
KR20000014177A (ko) | 웨이퍼 이송장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130228 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20140228 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20150302 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20170228 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20180228 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20190228 Year of fee payment: 15 |
|
FPAY | Annual fee payment |
Payment date: 20200228 Year of fee payment: 16 |