KR20030015208A - 기판 세정방법 및 세정장치 - Google Patents

기판 세정방법 및 세정장치 Download PDF

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Publication number
KR20030015208A
KR20030015208A KR1020027011888A KR20027011888A KR20030015208A KR 20030015208 A KR20030015208 A KR 20030015208A KR 1020027011888 A KR1020027011888 A KR 1020027011888A KR 20027011888 A KR20027011888 A KR 20027011888A KR 20030015208 A KR20030015208 A KR 20030015208A
Authority
KR
South Korea
Prior art keywords
substrate
washing water
cleaning
reservoir
washing
Prior art date
Application number
KR1020027011888A
Other languages
English (en)
Korean (ko)
Inventor
미즈카와시게루
나카타가츠토시
마츠모토순지
Original Assignee
스미토모 세이미츠 고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미토모 세이미츠 고교 가부시키가이샤 filed Critical 스미토모 세이미츠 고교 가부시키가이샤
Publication of KR20030015208A publication Critical patent/KR20030015208A/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
KR1020027011888A 2001-04-13 2002-04-08 기판 세정방법 및 세정장치 KR20030015208A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00115129 2001-04-13
JP2001115129A JP3441717B2 (ja) 2001-04-13 2001-04-13 洗浄装置

Publications (1)

Publication Number Publication Date
KR20030015208A true KR20030015208A (ko) 2003-02-20

Family

ID=18966082

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027011888A KR20030015208A (ko) 2001-04-13 2002-04-08 기판 세정방법 및 세정장치

Country Status (5)

Country Link
JP (1) JP3441717B2 (zh)
KR (1) KR20030015208A (zh)
CN (1) CN1221330C (zh)
TW (1) TW538438B (zh)
WO (1) WO2002083331A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100396387C (zh) * 2004-07-16 2008-06-25 鸿富锦精密工业（深圳）有限公司 涂布装置
JP4407944B2 (ja) * 2004-12-21 2010-02-03 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
CN100369228C (zh) * 2004-12-24 2008-02-13 中国电子科技集团公司第二十四研究所 硅键合片界面缺陷的检测方法
JP2011071385A (ja) * 2009-09-28 2011-04-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
CN101844141B (zh) * 2010-06-03 2012-11-07 金华市怡达玻璃机械有限公司 太阳能玻璃清洗机
CN105592944B (zh) * 2013-07-29 2018-05-11 贝克太阳能有限公司 对基板进行的空间有限的加工
KR101757599B1 (ko) 2015-09-30 2017-07-12 스미또모 가가꾸 가부시키가이샤 필름 제조 방법 및 필름 제조 장치
CN106066547A (zh) * 2016-07-11 2016-11-02 合肥通泰光电科技有限公司 一种超音波清洗液晶显示器胶框的工艺

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0195521A (ja) * 1987-10-07 1989-04-13 Hitachi Ltd 洗浄方法および装置
JPH02250324A (ja) * 1989-03-23 1990-10-08 Hitachi Ltd 半導体装置の製造方法およびそれに使用される洗浄装置
JP3322163B2 (ja) * 1997-05-08 2002-09-09 凸版印刷株式会社 超音波洗浄方法及び装置
JP2001007017A (ja) * 1999-04-21 2001-01-12 Sharp Corp レジスト剥離装置

Also Published As

Publication number Publication date
JP2002307025A (ja) 2002-10-22
CN1455708A (zh) 2003-11-12
JP3441717B2 (ja) 2003-09-02
TW538438B (en) 2003-06-21
WO2002083331A1 (fr) 2002-10-24
CN1221330C (zh) 2005-10-05

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WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid