JP3441717B2 - 洗浄装置 - Google Patents

洗浄装置

Info

Publication number
JP3441717B2
JP3441717B2 JP2001115129A JP2001115129A JP3441717B2 JP 3441717 B2 JP3441717 B2 JP 3441717B2 JP 2001115129 A JP2001115129 A JP 2001115129A JP 2001115129 A JP2001115129 A JP 2001115129A JP 3441717 B2 JP3441717 B2 JP 3441717B2
Authority
JP
Japan
Prior art keywords
substrate
water
cleaning
storage tank
cleaning water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001115129A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002307025A (ja
Inventor
茂 水川
勝利 中田
俊二 松元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Precision Products Co Ltd
Original Assignee
Sumitomo Precision Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Precision Products Co Ltd filed Critical Sumitomo Precision Products Co Ltd
Priority to JP2001115129A priority Critical patent/JP3441717B2/ja
Priority to TW091106945A priority patent/TW538438B/zh
Priority to PCT/JP2002/003514 priority patent/WO2002083331A1/ja
Priority to CNB028000293A priority patent/CN1221330C/zh
Priority to KR1020027011888A priority patent/KR20030015208A/ko
Publication of JP2002307025A publication Critical patent/JP2002307025A/ja
Application granted granted Critical
Publication of JP3441717B2 publication Critical patent/JP3441717B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B08B3/123—Cleaning travelling work, e.g. webs, articles on a conveyor

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
JP2001115129A 2001-04-13 2001-04-13 洗浄装置 Expired - Fee Related JP3441717B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001115129A JP3441717B2 (ja) 2001-04-13 2001-04-13 洗浄装置
TW091106945A TW538438B (en) 2001-04-13 2002-04-08 Method and apparatus for cleaning substrate
PCT/JP2002/003514 WO2002083331A1 (fr) 2001-04-13 2002-04-08 Procede et equipement pour nettoyer un substrat
CNB028000293A CN1221330C (zh) 2001-04-13 2002-04-08 基板洗净装置
KR1020027011888A KR20030015208A (ko) 2001-04-13 2002-04-08 기판 세정방법 및 세정장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001115129A JP3441717B2 (ja) 2001-04-13 2001-04-13 洗浄装置

Publications (2)

Publication Number Publication Date
JP2002307025A JP2002307025A (ja) 2002-10-22
JP3441717B2 true JP3441717B2 (ja) 2003-09-02

Family

ID=18966082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001115129A Expired - Fee Related JP3441717B2 (ja) 2001-04-13 2001-04-13 洗浄装置

Country Status (5)

Country Link
JP (1) JP3441717B2 (zh)
KR (1) KR20030015208A (zh)
CN (1) CN1221330C (zh)
TW (1) TW538438B (zh)
WO (1) WO2002083331A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100396387C (zh) * 2004-07-16 2008-06-25 鸿富锦精密工业（深圳）有限公司 涂布装置
JP4407944B2 (ja) * 2004-12-21 2010-02-03 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
CN100369228C (zh) * 2004-12-24 2008-02-13 中国电子科技集团公司第二十四研究所 硅键合片界面缺陷的检测方法
JP2011071385A (ja) * 2009-09-28 2011-04-07 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
CN101844141B (zh) * 2010-06-03 2012-11-07 金华市怡达玻璃机械有限公司 太阳能玻璃清洗机
WO2015017331A1 (en) * 2013-07-29 2015-02-05 Baker Solar, Inc. Spatially limited processing of a substrate
CN109585752B (zh) 2015-09-30 2020-02-18 住友化学株式会社 膜制造方法以及膜制造装置
CN106066547A (zh) * 2016-07-11 2016-11-02 合肥通泰光电科技有限公司 一种超音波清洗液晶显示器胶框的工艺

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0195521A (ja) * 1987-10-07 1989-04-13 Hitachi Ltd 洗浄方法および装置
JPH02250324A (ja) * 1989-03-23 1990-10-08 Hitachi Ltd 半導体装置の製造方法およびそれに使用される洗浄装置
JP3322163B2 (ja) * 1997-05-08 2002-09-09 凸版印刷株式会社 超音波洗浄方法及び装置
JP2001007017A (ja) * 1999-04-21 2001-01-12 Sharp Corp レジスト剥離装置

Also Published As

Publication number Publication date
WO2002083331A1 (fr) 2002-10-24
JP2002307025A (ja) 2002-10-22
CN1455708A (zh) 2003-11-12
KR20030015208A (ko) 2003-02-20
CN1221330C (zh) 2005-10-05
TW538438B (en) 2003-06-21

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