538438 A7 ___jB7_ 五、發明說明（1 ) 技術領域 (請先閱讀背面之注意事項再填寫本頁) 本發明係關於用以對液晶顯示器、光罩等之玻璃基板 、印刷配線基板及半導體晶圓％之各種基板施行超音波洗 淨之基板洗淨方法及洗淨裝置。 背景技術 向來，於液晶顯示器、光罩等之玻璃基板、印刷配線 基板及半導體晶圓等之各種基板的製程中，於對基板的表 面供給既定的處理液進行處理後，須施行將此處理液自基 板的表面除去之洗淨製程。而且，於此洗淨製程中，係使 用著單純地以純水噴洗者，或藉由刷子將基板表面洗淨者 等之各種洗淨裝置。其中尤以將基板浸漬於經賦予超音波 振動的洗淨水中進行洗淨之超音波洗淨，其對於除去附著 在基板裏面之極細的塵埃（所謂的粒子）方面甚是有效。 然而，近年來，基板日趨大型化，如同習用的作法般 ，將基板全體浸漬到超音波洗淨用之儲水槽內的方法之中 ，含有儲水槽之超音波洗淨裝置亦須大型化，因此在技術 上及成本上都有問題。是以，與純水噴洗同樣地，對流動 水賦予超音波振動來洗淨基板的方法受到考慮’惟’此方 法中，由於必須對基板的上下兩面供給經賦予超音波振動 的洗淨水，須有兩組超音波賦予裝置，故無法抑制裝置的 大型化及高成本化。 另一方面，於只作單面洗淨時，附著在未被洗淨側的 面上之粒子，經由背光的點亮等會浮現，是問題點所在。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 538438 B7________^ 五、發明說明（少） 本發明，係有鑑於上述的現狀而提出者，目的在於提 供一種基板洗淨方法及洗淨裝置，其係在不損及洗淨效果 之下，可實現裝置的小型化及低成本化者。 發明之揭示 本發明係關於一種基板洗淨方法，其特徵在於，係使 得基板裏面的至少一部份與洗淨水接觸，並對該接觸部分 之相反側的基板表面供給經賦予超音波振動之洗淨水，來 將該基板洗淨。 此方法中，於使基板裏面的至少一部份與洗淨水接觸 之狀態下，對該接觸部分之相反側的基板表面供給經賦予 超音波振動之洗淨水。對供給至基板表面的洗淨水所賦予 之超音波振動，係透過基板傳遞到與基板裏面接觸之洗淨 水，而對與該基板裏面接觸之洗淨水賦予超音波振動。如 此，基板的表裏兩面可同樣地藉由經賦予超音波振動的洗 淨水進行洗淨，表裏兩面可有效地洗淨。因而，賦予超音 波振動之裝置，只要有一台即足夠，因此，可抑制裝置全 體之大型化及高成本化。 又，亦可使該基板作水平移動，讓該基板裏面的全面 與該洗淨水做接觸。 如此作法，則藉由基板之水平移動，基板裏面的全面 會與洗淨水接觸，藉此可將基板的表裏兩面的全面洗淨。 因此之故，並不須要使基板裏面的全面與洗淨水接觸之巨 大的裝置，可期洗淨裝置的小型化、低成本化。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） C請先閱讀背面之注意事項再填寫本頁} - 訂---------線丨-- 538438 A7 __-____B7__ 五、發明說明（）） 又，上述的方法之發明，可經由下述的裝置之發明有 效地實施。亦即，此裝置之發明，係關於一種基板洗淨裝 置，其特徵在於，係具備：儲水槽，其上部具有開口部， 而將洗淨水儲存於內部；支持機構，係用以支持基板使該 基板可作水平移動且其裏面可與該儲水槽中儲存的洗淨水 接觸；洗淨水供給機構，係配置於該儲水槽的上方，可對 基板之與洗淨水接觸之相反側的表面供給經賦予超音波振 動之洗淨水；以及移送機構，係在該儲水槽與該洗淨水供 給機構之間移送該基板。 又，該洗淨水供給機構，亦可構成爲··具有沿與該基 板的移送方向正交之方向配置之長形噴嘴；該儲水槽的開 口部，在與該基板的移送方向正交方向上之尺寸，係較該 基板的該正交方向上的寬度尺寸爲長。 又，該支持機構，亦可具有支持輥，該支持輥係配置 於儲水槽內且其上端係與該儲水槽內的洗淨水面一致。 經由這樣的構成，以使基板的裏面能與儲水槽內的洗 淨水確實地接觸之方式來支持基板，且可防止因自洗淨水 供給機構供給至基板裏面之洗淨水的壓力造成基板之彎曲 ，從而沒入水面下的現象之發生。又’此支持輥’由於承 受到超音波，以使用可避免因此而遭受損傷之金屬等的材 料爲佳。又，與基板接觸之外圍部分，以形成爲緩和的曲 面爲佳。 又，於構成該儲水槽之側壁中’與該基板的移送方向 正交之一對的側壁係設成可上下移動，其上端部的高度位 (請先閱讀背面之注意事項再填寫本頁) ;p -------訂------- !線丨_丨丨 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 x 297公釐） A7 538438 _______B7____ 五、發明說明（& ) 置可調整，且藉由該側壁的上端部所決定之該洗淨水面的 高度位置可調整。 依據上述構成，藉由使側壁可上下移動，其上端部的 高度可調整，則由該側壁的上端部所決定之該洗淨水面的 高度位置亦可調整，藉此，對於基板裏面，可使其以更佳 的狀態與洗淨水接觸，可使基板裏面的洗淨效果成爲良好。 圖式之簡單說明 第1圖爲表示本發明之較佳的基板洗淨裝置的槪略構 成之示意俯視圖； 第2圖爲第1圖的側截面圖。 用以實施發明之最佳形態 以下，爲了就本發明更詳細地加以說明，依據附圖’來 作說明。又，基板w的移送方向，於第1圖中，爲左右方 向；於第2圖中，則爲與紙面正交的方向。 如第1圖所示般，本發明之基板洗淨裝置，係由具備 :用以供給經賦予超音波振動之洗淨水的洗淨水供給機構 1，及於內部儲存著洗淨水之儲水槽3等所構成。又，基 板W，係經由移送機構之移送輥R及輔助輥r，依箭頭A 方向移送。 洗淨水供給機構1，具備有：形成有隙縫2a (用以將 自給水源20所供給的洗淨水形成爲膜狀而噴吐出者）的超 音波噴嘴2、對通過隙縫2a內之洗淨水賦予超音波振動的 (請先閱讀背面之注意事項再填寫本頁)538438 A7 ___jB7_ V. Description of the invention (1) Technical field (please read the precautions on the back before filling out this page) The present invention relates to glass substrates, printed wiring substrates and semiconductor wafers for liquid crystal displays, photomasks, etc. A substrate cleaning method and a cleaning device for performing ultrasonic cleaning on various substrates. 2. Description of the Related Art In the manufacturing process of glass substrates such as liquid crystal displays, photomasks, printed wiring substrates, and semiconductor wafers, conventionally, after a predetermined processing liquid is supplied to the surface of the substrate for processing, the processing liquid must be applied. Cleaning process for removing from the surface of a substrate. Furthermore, in this cleaning process, various cleaning devices such as those who are simply sprayed with pure water or those who clean the substrate surface with a brush are used. Among them, ultrasonic cleaning, in which a substrate is immersed in washing water to which ultrasonic vibration is given, is particularly effective for removing extremely fine dust (so-called particles) adhering to the substrate. However, in recent years, substrates have become increasingly large. As is customary, the entire substrate is immersed in a water storage tank for ultrasonic cleaning. The ultrasonic cleaning device containing the water storage tank must also be large. There are technical and cost problems. Therefore, in the same way as pure water spray cleaning, a method of washing substrates by applying ultrasonic vibration to flowing water is considered. However, in this method, it is necessary to supply the upper and lower surfaces of the substrate with ultrasonic water-supplying washing water. There must be two sets of ultrasonic devices, so it is not possible to suppress the large size and high cost of the device. On the other hand, when only one-side cleaning is performed, particles attached to the surface that is not cleaned will emerge through the backlight or the like, which is the problem. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 538438 B7 ________ ^ V. Description of the invention (less) The present invention was proposed in view of the above situation, and aims to provide a substrate cleaning The method and the cleaning device are those which can realize the miniaturization and low cost of the device without impairing the cleaning effect. DISCLOSURE OF THE INVENTION The present invention relates to a method for cleaning a substrate, which is characterized in that at least a part of the substrate is brought into contact with the washing water, and the surface of the substrate on the opposite side of the contact portion is supplied with ultrasonic vibration imparted thereto. The substrate is washed with water. In this method, in a state where at least a part of the substrate is brought into contact with the washing water, the surface of the substrate opposite to the contact portion is supplied with washing water to which ultrasonic vibration is imparted. The ultrasonic vibration imparted to the washing water supplied to the substrate surface is transmitted through the substrate to the washing water in contact with the inside of the substrate, and the ultrasonic wave is given to the washing water in contact with the inside of the substrate. In this way, both the front and back surfaces of the substrate can be similarly washed with washing water that is subjected to ultrasonic vibration, and the front and back surfaces can be effectively cleaned. Therefore, as long as there is one device for imparting ultrasonic vibrations, the size and cost of the entire device can be suppressed. In addition, the substrate may be moved horizontally, so that the entire surface of the substrate is in contact with the washing water. In this way, by moving the substrate horizontally, the entire surface of the substrate will be in contact with the washing water, and the front and back surfaces of the substrate can be completely cleaned. Therefore, there is no need to make a large device in which the entire surface of the substrate is in contact with the washing water, and the miniaturization and cost reduction of the washing device can be expected. This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 public love) C Please read the notes on the back before filling out this page}-Order --------- Line 丨-538438 A7 __ -____ B7__ 5. Description of the invention ()) The invention of the above method can be effectively implemented through the invention of the following device. That is, the invention of this device relates to a substrate cleaning device, which is characterized in that it is provided with a water storage tank with an opening at the top to store the cleaning water inside; a support mechanism for supporting the substrate The substrate can be moved horizontally and its inside can be in contact with the washing water stored in the water storage tank. The washing water supply mechanism is arranged above the water storage tank, and can be used for the opposite side of the substrate that is in contact with the washing water. The surface is supplied with washing water that has been subjected to ultrasonic vibration; and a transfer mechanism is used to transfer the substrate between the water storage tank and the washing water supply mechanism. In addition, the washing water supply mechanism may be configured to have an elongated nozzle arranged in a direction orthogonal to the substrate transfer direction; the opening of the water storage tank may be in a direction orthogonal to the substrate transfer direction. The upper dimension is longer than the width dimension of the substrate in the orthogonal direction. In addition, the support mechanism may include a support roller, which is arranged in the water storage tank and has an upper end that is consistent with the washing water surface in the water storage tank. With such a structure, the substrate is supported so that the back surface of the substrate can be reliably contacted with the washing water in the water storage tank, and the substrate can be prevented from being caused by the pressure of the washing water supplied to the substrate by the self-cleaning water supply mechanism. It bends, so that the phenomenon of submersion occurs. Since this supporting roller is subjected to ultrasonic waves, it is preferable to use a material such as a metal that can prevent damage. It is also preferable that the peripheral portion in contact with the substrate is formed as a gentle curved surface. Among the side walls constituting the water storage tank, a pair of side walls that are orthogonal to the substrate transfer direction are provided so that they can move up and down, and the height of the upper end portion (please read the precautions on the back before filling this page) ; p ------- order -------! line 丨 _ 丨 丨 This paper size applies to China National Standard (CNS) A4 (21〇x 297 mm) A7 538438 _______B7____ V. Description of the invention The (&) position can be adjusted, and the height position of the washing water surface determined by the upper end portion of the side wall can be adjusted. According to the above structure, by making the side wall move up and down and the height of the upper end portion being adjustable, the height position of the washing water surface determined by the upper end portion of the side wall can also be adjusted. The contact with the washing water in a better state can make the cleaning effect inside the substrate good. Brief Description of the Drawings Fig. 1 is a schematic plan view showing a schematic structure of a preferred substrate cleaning device of the present invention; Fig. 2 is a side sectional view of Fig. 1. Best Mode for Carrying Out the Invention Hereinafter, the present invention will be described in more detail with reference to the drawings'. In addition, the substrate w is moved in the left-right direction in the first figure, and in the second figure is the direction orthogonal to the paper surface. As shown in FIG. 1, the substrate cleaning device of the present invention is provided with a washing water supply mechanism 1 for supplying washing water to which ultrasonic vibration is given, and a storage unit storing the washing water therein. The water tank 3 is constituted. The substrate W is transferred in the direction of arrow A via the transfer roller R and the auxiliary roller r of the transfer mechanism. The washing water supply mechanism 1 includes an ultrasonic nozzle 2 formed with a slit 2a (for forming the washing water supplied from the water supply source 20 into a film shape and ejecting it), and the washing through the slit 2a is performed. Ultrasonic vibration caused by water (Please read the precautions on the back before filling this page)
一^e n n I .n n n m I n I I— n n n n -1_1 n 1.1 I n I n ϋ i_i ϋ ϋ n n I 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 538438 A7 B7 五、發明說明（< ) 壓電元件（未圖示），該洗淨水供給機構i係裝設於處理槽 內的基板移送路徑的上方，藉由控制器10來控制其動作 。超音波2噴嘴之長邊方向，係與基板W的移送方向（箭 頭A方向）正交’長度爲可將基板W的寬方向（前述正交方 向）的全寬覆盍之長度。又，若以1個超音波噴嘴2無法 將基板W的全寬覆蓋之場合，亦可用至少2個的超音波噴 嘴2，依移送方向以前後作平行設置，以將移送的基板的 全寬用複數的超音波噴嘴2覆蓋之方式來構成。 儲水槽3 ’係沿著超音波噴嘴2的長邊方向形成爲細 長形狀’於上部敞開之相狀的外槽5中，設置有一對的板 4與給水噴嘴31。給水噴嘴31係裝設於外槽5的底板， 連接到給水源3〇。於外槽5的外側，沿移送方向（箭頭A 方向）之前後，設置有輔助輥r。一對的板4，係設置於與 外槽5的兩組側壁5〇、52之中的和前述移送方向（箭頭A 方向）正交之側壁5〇上。另一方的側壁52，由於基板W 係通過其間移送，故該等間隔較基板W的寬度方向（與前 述移送方向正交之方向）的寬度大。又，側壁52的高度， 較側壁5〇的高度高。側壁5〇的高度，較基板移送路徑的 高度（移送輥R及輔助輥r的上端之位置）低，於其上下方 向的大致中央處，形成有沿上下方向的長孔51。又，長孔 51，如第2圖所示般，係沿著長邊方向，隔著適當的間隔 設置著複數個。 板4，如第1圖所示般，係設置於側壁50的內側。 又，於側壁50的外側，以覆蓋長孔51之方式設置平板狀 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） (請先閱讀背面之注意事項再填寫本頁) 訂---------線丨 , 538438 A7 ___^B7_ 五、發明說明（心） 的密合板44，藉由貫通長孔51之螺絲42，將側壁5〇夾 持之狀態下，板4與密合板44係固定於側壁50 ’且係將 長孔51以液密方式密合。又，螺絲42，係可於長孔51 內沿著上下方向移動，故板4可變更上下方向的固定位置 〇 板4的長邊方向之兩端，如第2圖所示般，以液密方 式密合於另一側壁52的內面，以板4與側壁52實質形成 儲水槽3的4側面，高度較低的板4之上端係成爲儲存在 儲水槽3內的洗淨水之水面Η。 又，如第2圖所示般，於外槽5的外緣，設置有面向 著處理槽的壁依與移送方向正交的方向水平地延伸的凸緣 部53，.藉由此凸緣部53使外槽5固定於處理槽內。另一 方面，在此凸緣部53的上方，設置有與凸緣部53平行可 上下移動的托架43，托架43係藉由螺絲41可調整其上 下方向的位置，並固定之。於此托架43係連接著板4的 兩端，其結果，使板4可藉由螺絲41來調整上下方向的 位置。 如此般地，藉由介在凸緣部53與托架43之間的螺絲 41 ’可調整外槽5與板4的上下方向之相對位置關係。其 後，藉由沿著側壁50的長邊方向，將依適當的間隔插入 複數設置的長孔51之螺絲鎖緊，可將板4固定。 又’於儲水槽3內，設置有作爲基板支持機構之支持 輥6 °此支持輥6，係以將其上端設定位於如第1圖所示 般之在超音波噴嘴2的隙縫2a的正下方處之方式裝設於 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） (請先閱讀背面之注意事項再填寫本頁) --訂---------線丨· 538438 A7 _________ Β7_____ 五、發明說明（1 ) 轉軸7上。又，其最上端，係設定爲和前述儲水槽3內儲 存之洗淨水的水面Η之相同高度，換言之，前述板4的高 度位置，係以和支持輥6的最上端成爲相同高度之方式作 調整，且使支持輥6上所支持之基板W的裏面與洗淨水做 接觸。 又，支持輕6，如第2圖所不般，係依轉軸7的軸方 向隔著適當的間隔設置著複數個。轉軸7，係沿著儲水槽 3的長邊方向設置，其兩端，如第2圖所示般，以可自由 旋轉的方式支撐在外槽5的側壁5◦上。支持輥6係金屬 製者，與基板W相接的部分係作成爲圓的面。藉由此圓面 與基板的浮力，可使基板W的裏面不會受到刮傷。又，移 送輥R .及輔助輥r，以由樹脂等之柔軟性的材料來形成爲 佳。 使用具備上述構成之本例的基板洗淨裝置，首先，藉 由移送$昆R及輔助輕r將基板W依箭頭A方向移送，導入 儲水槽3與洗淨水供給機構1之間。基板W藉由支持輥6 支持，其裏面係與儲水槽3內的洗淨水接觸。另一方面， 在與此相反側的基板W的表面，經賦予超音波振動之洗淨 水係自洗淨水供給機構1所供給。對供給至基板W的表面 的洗淨水所賦予之超音波振動，係透過基板W傳遞到與其 裏面接觸之洗淨水，而賦予超音波振動至與該基板W的裏 面接觸之洗淨水。如此作法，基板W的表裏兩面可同樣地 藉由經賦予超音波振動的洗淨水而被洗淨，表裏兩面可有 效地洗淨。如此般，依據本例的基板洗淨裝置，用以賦予 - -------------------；-IQ --— 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) -# 訂* _ 538438 A7 ^-------BZ_____ 五、發明說明（$ ) 超音波振動之裝置，只要有一台即足夠，藉此，可抑制裝 置全體之大型化及高成本化。 然後，藉由移送輥R及輔助輥r繼續地沿箭頭a方向 移送的基板W，逐漸離開儲水槽3內的洗淨水和其裏面接 觸的位置及自洗淨水供給機構1供給到其表面之洗淨水的 位置，最後，基板W的表裏全面與洗淨水接觸，而將該表 裏兩面洗淨。因此之故，不須要有巨大的裝置來使基板w 的裏面全面與洗淨水接觸，可期洗淨裝置的小型化、低成 本化。 又，由於係作成以設置於儲水槽3內之支持$昆6來支 持基板W，可在使基板W的裏面確實地與儲水槽3內的洗 淨水接觸來支持基板，而且，可防止因自洗淨水供給機構 1供給至基板W的表面之洗淨水的壓力使得基板W彎曲， 從而沒入水面下的現象之發生。 又，由於係作成爲藉由調整板4的高度位置來調整在 儲水槽3內儲存之洗淨水的水面位置，故對於基板W的裏 面，可使其以更佳的狀態與洗淨水接觸，而可作成洗淨效 果良好者。 產業上之可利用性 如上述般，本發明之基板洗淨方法及洗淨裝置，可良 好地適用於液晶顯示器、光罩等之玻璃基板、印刷配線基 板及半導體晶圓等之各種基板的洗淨。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) - 訂---------線丨 β A7 538438 _ B7 五、發明說明（f ) 元件符號說明 1 洗淨水供給機構 2 超音波噴嘴 2a 隙縫 3 儲水槽 4 板 5 外槽 6 支持輥 7 轉軸 10 控制器 20,30 給水源 3 1 給水噴嘴 41,42 螺絲 43 托架 44 密合板 50,52 側壁 51 長孔 53 凸緣部 A 基板移送方向 Η 水面 R 移送輥 r 輔助輥 (請先閱讀背面之注意事項再填寫本頁) ------—訂---------線！ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）I ^ enn I .nnnm I n II— nnnn -1_1 n 1.1 I n I n ϋ i_i ϋ nn nn I This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 538438 A7 B7 V. Invention (≪) A piezoelectric element (not shown), the washing water supply mechanism i is installed above the substrate transfer path in the processing tank, and its operation is controlled by the controller 10. The length direction of the ultrasonic 2 nozzle is orthogonal to the substrate W transfer direction (arrow A direction). The length is a length that can cover the full width of the substrate W in the width direction (the orthogonal direction described above). If one ultrasonic nozzle 2 cannot cover the full width of the substrate W, at least two ultrasonic nozzles 2 can be used in parallel to the front and back according to the transfer direction to use the full width of the substrate to be transferred. The plural ultrasonic nozzles 2 are covered. The water storage tank 3 'is formed in an elongated shape along the longitudinal direction of the ultrasonic nozzle 2'. A pair of plates 4 and a water supply nozzle 31 are provided in a phase-shaped outer tank 5 whose upper portion is open. The water supply nozzle 31 is installed on the bottom plate of the outer tank 5 and is connected to the water supply source 30. An auxiliary roller r is provided on the outer side of the outer tank 5 in front of and behind the feed direction (direction of arrow A). A pair of plates 4 are provided on the side wall 50 orthogonal to the above-mentioned transfer direction (direction of arrow A) among the two sets of side walls 50 and 52 of the outer tank 5. On the other side wall 52, since the substrate W is transferred therethrough, the intervals are larger than the width direction of the substrate W (a direction orthogonal to the above-mentioned transfer direction). The height of the side wall 52 is higher than the height of the side wall 50. The height of the side wall 50 is lower than the height of the substrate transfer path (the positions of the upper ends of the transfer roller R and the auxiliary roller r), and a long hole 51 in the up-down direction is formed at approximately the center of the up-down direction. Further, as shown in Fig. 2, a plurality of long holes 51 are provided along the long side direction at appropriate intervals. The plate 4 is provided inside the side wall 50 as shown in FIG. 1. In addition, a flat plate is set on the outside of the side wall 50 so as to cover the long hole 51. The paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 public love) (Please read the precautions on the back before filling this page) Order --------- Line 丨, 538438 A7 ___ ^ B7_ 5. In the state of the invention, the tight plate 44 is held by the side wall 50 with the screw 42 penetrating the long hole 51. The plate 4 and the sealing plate 44 are fixed to the side wall 50 ′, and the long hole 51 is tightly adhered in a liquid-tight manner. The screw 42 is movable in the up and down direction in the long hole 51, so the plate 4 can be fixed in the up and down direction. Both ends of the plate 4 in the longitudinal direction are liquid-tight as shown in FIG. The method is in close contact with the inner surface of the other side wall 52. The plate 4 and the side wall 52 substantially form the 4 sides of the water storage tank 3. The upper end of the lower plate 4 is the water surface of the washing water stored in the water storage tank 3. . Further, as shown in FIG. 2, a flange portion 53 is provided on the outer edge of the outer tank 5 so as to extend horizontally in a direction orthogonal to the conveying direction of the wall facing the processing tank. 53 The outer tank 5 is fixed in the processing tank. On the other hand, a bracket 43 that can be moved up and down parallel to the flange portion 53 is provided above the flange portion 53. The bracket 43 can be adjusted in position in the up-down direction by a screw 41 and fixed. The bracket 43 is connected to both ends of the plate 4, and as a result, the plate 4 can be adjusted in the vertical position by the screw 41. In this manner, the vertical position of the outer groove 5 and the plate 4 can be adjusted by the screws 41 'interposed between the flange portion 53 and the bracket 43. Thereafter, the plate 4 can be fixed by tightening the screws inserted into the plurality of long holes 51 provided at appropriate intervals along the longitudinal direction of the side wall 50. In the water storage tank 3, a supporting roller 6 serving as a substrate supporting mechanism is provided. This supporting roller 6 is set so that its upper end is located directly below the slit 2a of the ultrasonic nozzle 2 as shown in Fig. 1 The method is installed on this paper standard applicable to China National Standard (CNS) A4 specifications (210 X 297 public love) (Please read the precautions on the back before filling this page) --Order --------- Line 丨 538438 A7 _________ Β7 _____ 5. Description of the invention (1) On the shaft 7. The uppermost end is set to the same height as the water surface of the washing water stored in the water storage tank 3, in other words, the height position of the plate 4 is set to the same height as the uppermost end of the support roller 6. Make adjustments so that the inside of the substrate W supported on the support roller 6 is in contact with the washing water. In addition, the light 6 is supported, as shown in FIG. 2, and a plurality of light 6 are provided at appropriate intervals in the axial direction of the rotation shaft 7. The rotating shaft 7 is provided along the longitudinal direction of the water storage tank 3, and both ends of the rotating shaft 7 are rotatably supported on the side wall 5 of the outer tank 5 as shown in Fig. 2. The support roller 6 is made of metal, and a portion in contact with the substrate W is formed as a round surface. By this buoyancy between the circular surface and the substrate, the inside of the substrate W can be prevented from being scratched. The transfer roller R. and the auxiliary roller r are preferably formed of a flexible material such as resin. Using the substrate cleaning device having the above-mentioned configuration, first, the substrate W is transferred in the direction of the arrow A by the transfer $ K and the auxiliary light r, and is introduced between the water storage tank 3 and the cleaning water supply mechanism 1. The substrate W is supported by the support roller 6, and the inside thereof is in contact with the washing water in the water storage tank 3. On the other hand, the surface of the substrate W on the opposite side is supplied with the washing water supplied from the washing water supply means 1 through the ultrasonic wave. The ultrasonic vibration imparted to the washing water supplied to the surface of the substrate W is transmitted through the substrate W to the washing water in contact with the inside thereof, and the ultrasonic vibration is imparted to the washing water in contact with the inside of the substrate W. In this way, both the front and back surfaces of the substrate W can be similarly washed with washing water that is subjected to ultrasonic vibration, and the front and back surfaces can be effectively cleaned. In this way, the substrate cleaning device according to this example is used to give --------------------; -IQ --- This paper size applies to Chinese national standards (CNS ) A4 specification (210 X 297 mm) (Please read the notes on the back before filling out this page)-# Order * _ 538438 A7 ^ ------- BZ_____ 5. Description of the invention ($) Ultrasonic vibration As long as one device is sufficient, the size and cost of the entire device can be suppressed. Then, the substrate W, which is continuously transferred in the direction of the arrow a by the transfer roller R and the auxiliary roller r, gradually moves away from the position where the washing water in the water storage tank 3 comes into contact with, and the self-washing water supply mechanism 1 supplies the surface. At the position of the washing water, finally, the front and back surfaces of the substrate W are in full contact with the washing water, and both sides of the front and back surfaces are washed. Therefore, it is not necessary to have a huge device to fully contact the inside of the substrate w with the washing water, and the miniaturization and low cost of the washing device can be expected. In addition, since the substrate W is supported by the support $ Kun 6 provided in the water storage tank 3, the substrate W can be reliably contacted with the washing water in the water storage tank 3 to support the substrate. The pressure of the washing water supplied from the self-washing water supply mechanism 1 to the surface of the substrate W causes the substrate W to bend, thereby immersing itself under the water surface. In addition, since the water surface position of the washing water stored in the water storage tank 3 is adjusted by the height position of the adjustment plate 4, the inside of the substrate W can be brought into contact with the washing water in a better state. , And can be made into a good cleaning effect. The industrial applicability is as described above. The substrate cleaning method and cleaning device of the present invention can be suitably used for cleaning various substrates such as glass substrates of liquid crystal displays, photomasks, printed wiring substrates, and semiconductor wafers. net. This paper size applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page)-Order --------- line 丨 β A7 538438 _ B7 V. Description of the invention (f) Description of component symbols 1 Wash water supply mechanism 2 Ultrasonic nozzle 2a Slot 3 Water storage tank 4 Plate 5 Outer tank 6 Support roller 7 Rotary shaft 10 Controller 20, 30 Water supply source 3 1 Water supply nozzles 41, 42 Screw 43 Bracket 44 Plywood 50, 52 Side wall 51 Long hole 53 Flange A Substrate transfer direction Η Water surface R Transfer roller r Auxiliary roller (Please read the precautions on the back before filling this page) -------- Order --------- line! This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)