KR20020059439A - 고순도 저저항 정전 척 - Google Patents
고순도 저저항 정전 척 Download PDFInfo
- Publication number
- KR20020059439A KR20020059439A KR1020027007244A KR20027007244A KR20020059439A KR 20020059439 A KR20020059439 A KR 20020059439A KR 1020027007244 A KR1020027007244 A KR 1020027007244A KR 20027007244 A KR20027007244 A KR 20027007244A KR 20020059439 A KR20020059439 A KR 20020059439A
- Authority
- KR
- South Korea
- Prior art keywords
- temperature
- atmosphere
- polycrystalline
- aluminum nitride
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/581—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Products (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/458,278 US6723274B1 (en) | 1999-12-09 | 1999-12-09 | High-purity low-resistivity electrostatic chucks |
| US09/458,278 | 1999-12-09 | ||
| PCT/US2000/042555 WO2001042163A2 (en) | 1999-12-09 | 2000-12-05 | High-purity low-resistivity electrostatic chucks |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20020059439A true KR20020059439A (ko) | 2002-07-12 |
Family
ID=23820126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027007244A Ceased KR20020059439A (ko) | 1999-12-09 | 2000-12-05 | 고순도 저저항 정전 척 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6723274B1 (https=) |
| JP (2) | JP2004521052A (https=) |
| KR (1) | KR20020059439A (https=) |
| CN (1) | CN1313420C (https=) |
| AU (1) | AU4516201A (https=) |
| DE (1) | DE10085278B4 (https=) |
| GB (1) | GB2373497A (https=) |
| WO (1) | WO2001042163A2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220144859A (ko) * | 2020-03-27 | 2022-10-27 | 레이서 어드밴스드 머티리얼즈 테크놀로지 컴퍼니 리미티드 | 다층 복합 세라믹 플레이트 및 그 제조 방법 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6603650B1 (en) * | 1999-12-09 | 2003-08-05 | Saint-Gobain Ceramics And Plastics, Inc. | Electrostatic chuck susceptor and method for fabrication |
| KR20020059438A (ko) * | 1999-12-09 | 2002-07-12 | 보스트 스티븐 엘. | 편평한 막 전극을 갖는 정전 척 |
| TWI243158B (en) * | 2000-12-21 | 2005-11-11 | Ngk Insulators Ltd | Aluminum nitride sintered bodies |
| US7369393B2 (en) * | 2004-04-15 | 2008-05-06 | Saint-Gobain Ceramics & Plastics, Inc. | Electrostatic chucks having barrier layer |
| US8187525B2 (en) * | 2007-08-31 | 2012-05-29 | Corning Incorporated | Method of firing green bodies into porous ceramic articles |
| TWI475594B (zh) | 2008-05-19 | 2015-03-01 | 恩特格林斯公司 | 靜電夾頭 |
| JP5180034B2 (ja) * | 2008-11-21 | 2013-04-10 | 日本碍子株式会社 | 窒化アルミニウム焼結体、その製法及びそれを用いた静電チャック |
| SG10201402319QA (en) | 2009-05-15 | 2014-07-30 | Entegris Inc | Electrostatic chuck with polymer protrusions |
| US8861170B2 (en) | 2009-05-15 | 2014-10-14 | Entegris, Inc. | Electrostatic chuck with photo-patternable soft protrusion contact surface |
| US8580593B2 (en) * | 2009-09-10 | 2013-11-12 | Micron Technology, Inc. | Epitaxial formation structures and associated methods of manufacturing solid state lighting devices |
| CN105196094B (zh) | 2010-05-28 | 2018-01-26 | 恩特格林斯公司 | 高表面电阻率静电吸盘 |
| JP5931862B2 (ja) | 2010-07-20 | 2016-06-08 | ヘクサテック,インコーポレイテッド | 多結晶窒化アルミニウム材料およびその製造方法 |
| JP6159982B2 (ja) * | 2012-06-28 | 2017-07-12 | 日本特殊陶業株式会社 | 静電チャックの製造方法 |
| JP6039497B2 (ja) * | 2013-04-27 | 2016-12-07 | 京セラ株式会社 | 半導電性セラミックスおよび半導電性セラミックスの製造方法 |
| KR102339550B1 (ko) | 2017-06-30 | 2021-12-17 | 주식회사 미코세라믹스 | 질화 알루미늄 소결체 및 이를 포함하는 반도체 제조 장치용 부재 |
| JP7338674B2 (ja) * | 2021-12-24 | 2023-09-05 | 住友大阪セメント株式会社 | 静電チャック部材、静電チャック装置、および静電チャック部材の製造方法 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944797A (ja) | 1982-09-07 | 1984-03-13 | 増田 閃一 | 物体の静電的処理装置 |
| JPS60151280A (ja) * | 1984-01-19 | 1985-08-09 | 日本電気株式会社 | 窒化アルミニウム焼結体の製造方法 |
| DE3608326A1 (de) | 1986-03-13 | 1987-09-17 | Kempten Elektroschmelz Gmbh | Praktisch porenfreie formkoerper aus polykristallinem aluminiumnitrid und verfahren zu ihrer herstellung ohne mitverwendung von sinterhilfsmitteln |
| US4778778A (en) * | 1987-06-03 | 1988-10-18 | Keramont Advanced Ceramic Products Corporation | Process for the production of sintered aluminum nitrides |
| JP2665242B2 (ja) | 1988-09-19 | 1997-10-22 | 東陶機器株式会社 | 静電チャック |
| JPH0617214B2 (ja) | 1989-12-29 | 1994-03-09 | ナショナル サイエンス カウンシル | 超微粒子な窒化アルミニウム粉末の製造方法 |
| DE69130205T2 (de) | 1990-12-25 | 1999-03-25 | Ngk Insulators, Ltd., Nagoya, Aichi | Heizungsapparat für eine Halbleiterscheibe und Verfahren zum Herstellen desselben |
| EP1120817B8 (en) | 1991-03-26 | 2007-10-10 | Ngk Insulators, Ltd. | Use of a corrosion-resistant member |
| EP0506537A1 (en) | 1991-03-28 | 1992-09-30 | Shin-Etsu Chemical Co., Ltd. | Electrostatic chuck |
| JPH06737A (ja) | 1991-03-29 | 1994-01-11 | Shin Etsu Chem Co Ltd | 静電チャック基板 |
| JPH0659008A (ja) | 1992-08-06 | 1994-03-04 | Sumitomo Electric Ind Ltd | 物性測定装置およびその測定方法 |
| US5800618A (en) | 1992-11-12 | 1998-09-01 | Ngk Insulators, Ltd. | Plasma-generating electrode device, an electrode-embedded article, and a method of manufacturing thereof |
| US5413360A (en) | 1992-12-01 | 1995-05-09 | Kyocera Corporation | Electrostatic chuck |
| US5320990A (en) * | 1993-03-30 | 1994-06-14 | The Dow Chemical Company | Process for sintering aluminum nitride to a high thermal conductivity and resultant sintered bodies |
| JPH06326175A (ja) | 1993-04-22 | 1994-11-25 | Applied Materials Inc | 集積回路処理装置において使用されるウエハサポートの誘電材への保護被覆とその形成方法 |
| US5457075A (en) * | 1993-05-11 | 1995-10-10 | Hitachi Metals, Ltd. | Sintered ceramic composite and molten metal contact member produced therefrom |
| EP0635870A1 (en) | 1993-07-20 | 1995-01-25 | Applied Materials, Inc. | An electrostatic chuck having a grooved surface |
| EP0680075B1 (en) | 1993-11-18 | 2001-11-28 | Ngk Insulators, Ltd. | Electrode for generating plasma and method for manufacturing the electrode |
| US5541145A (en) | 1993-12-22 | 1996-07-30 | The Carborundum Company/Ibm Corporation | Low temperature sintering route for aluminum nitride ceramics |
| KR100430643B1 (ko) | 1994-01-31 | 2004-05-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 두께가 균일한 절연체 막을 갖는 정전기 척 |
| US5671116A (en) | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
| US5677253A (en) | 1995-03-30 | 1997-10-14 | Kyocera Corporation | Wafer holding member |
| US5886863A (en) | 1995-05-09 | 1999-03-23 | Kyocera Corporation | Wafer support member |
| US5817406A (en) | 1995-07-14 | 1998-10-06 | Applied Materials, Inc. | Ceramic susceptor with embedded metal electrode and brazing material connection |
| US5633073A (en) | 1995-07-14 | 1997-05-27 | Applied Materials, Inc. | Ceramic susceptor with embedded metal electrode and eutectic connection |
| EP0992470B1 (en) | 1995-08-03 | 2006-03-08 | Ngk Insulators, Ltd. | Aluminium nitride sintered bodies and their use as substrate in an apparatus for producing semiconductors |
| JP3457477B2 (ja) | 1995-09-06 | 2003-10-20 | 日本碍子株式会社 | 静電チャック |
| JP3670416B2 (ja) | 1995-11-01 | 2005-07-13 | 日本碍子株式会社 | 金属包含材および静電チャック |
| US6017485A (en) | 1996-03-28 | 2000-01-25 | Carborundum Corporation | Process for making a low electrical resistivity, high purity aluminum nitride electrostatic chuck |
| US5764471A (en) | 1996-05-08 | 1998-06-09 | Applied Materials, Inc. | Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck |
| US5708557A (en) | 1996-08-22 | 1998-01-13 | Packard Hughes Interconnect Company | Puncture-resistant electrostatic chuck with flat surface and method of making the same |
| US5958813A (en) | 1996-11-26 | 1999-09-28 | Kyocera Corporation | Semi-insulating aluminum nitride sintered body |
| US5705450A (en) | 1996-12-17 | 1998-01-06 | The Dow Chemical Company | A1N sintered body containing a rare earth aluminum oxynitride and method to produce said body |
| JP3790000B2 (ja) | 1997-01-27 | 2006-06-28 | 日本碍子株式会社 | セラミックス部材と電力供給用コネクターとの接合構造 |
| JP3954177B2 (ja) | 1997-01-29 | 2007-08-08 | 日本碍子株式会社 | 金属部材とセラミックス部材との接合構造およびその製造方法 |
| US6303879B1 (en) | 1997-04-01 | 2001-10-16 | Applied Materials, Inc. | Laminated ceramic with multilayer electrodes and method of fabrication |
| JP3670444B2 (ja) | 1997-06-06 | 2005-07-13 | 日本碍子株式会社 | 窒化アルミニウム基複合体、電子機能材料、静電チャックおよび窒化アルミニウム基複合体の製造方法 |
| JP3746594B2 (ja) | 1997-06-20 | 2006-02-15 | 日本碍子株式会社 | セラミックスの接合構造およびその製造方法 |
| US5909355A (en) | 1997-12-02 | 1999-06-01 | Applied Materials, Inc. | Ceramic electrostatic chuck and method of fabricating same |
-
1999
- 1999-12-09 US US09/458,278 patent/US6723274B1/en not_active Expired - Lifetime
-
2000
- 2000-12-05 GB GB0215873A patent/GB2373497A/en not_active Withdrawn
- 2000-12-05 JP JP2001543466A patent/JP2004521052A/ja not_active Withdrawn
- 2000-12-05 WO PCT/US2000/042555 patent/WO2001042163A2/en not_active Ceased
- 2000-12-05 AU AU45162/01A patent/AU4516201A/en not_active Abandoned
- 2000-12-05 CN CNB008168083A patent/CN1313420C/zh not_active Expired - Lifetime
- 2000-12-05 DE DE10085278T patent/DE10085278B4/de not_active Expired - Lifetime
- 2000-12-05 KR KR1020027007244A patent/KR20020059439A/ko not_active Ceased
-
2009
- 2009-02-12 JP JP2009030499A patent/JP2009173537A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220144859A (ko) * | 2020-03-27 | 2022-10-27 | 레이서 어드밴스드 머티리얼즈 테크놀로지 컴퍼니 리미티드 | 다층 복합 세라믹 플레이트 및 그 제조 방법 |
| US12195402B2 (en) | 2020-03-27 | 2025-01-14 | Raycer Advanced Materials Technology Co., Ltd | Multi-layer composite ceramic plate and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10085278T1 (de) | 2002-12-12 |
| JP2009173537A (ja) | 2009-08-06 |
| CN1313420C (zh) | 2007-05-02 |
| CN1407956A (zh) | 2003-04-02 |
| WO2001042163A3 (en) | 2002-03-07 |
| WO2001042163A2 (en) | 2001-06-14 |
| DE10085278B4 (de) | 2008-10-16 |
| JP2004521052A (ja) | 2004-07-15 |
| GB2373497A (en) | 2002-09-25 |
| US6723274B1 (en) | 2004-04-20 |
| GB0215873D0 (en) | 2002-08-14 |
| AU4516201A (en) | 2001-06-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| R17-X000 | Change to representative recorded |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| R18-X000 | Changes to party contact information recorded |
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| P22-X000 | Classification modified |
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