KR20020051832A - 포토마스크 - Google Patents
포토마스크 Download PDFInfo
- Publication number
- KR20020051832A KR20020051832A KR1020010080465A KR20010080465A KR20020051832A KR 20020051832 A KR20020051832 A KR 20020051832A KR 1020010080465 A KR1020010080465 A KR 1020010080465A KR 20010080465 A KR20010080465 A KR 20010080465A KR 20020051832 A KR20020051832 A KR 20020051832A
- Authority
- KR
- South Korea
- Prior art keywords
- photomask
- pattern
- tantalum
- thin film
- light
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Thin Film Transistor (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (3)
- 투명기판상에 차광성 금속박막으로 이루어지는 차광성 패턴을 구비하는 포토마스크로서, 상기 포토마스크는 규화탄탈, 산화탄탈, 질화탄탈 또는 그 혼합물에서 선택되는 재료로 이루어지는 탄탈을 주성분으로 하는 반투명 패턴을 더욱 구비하는 것을 특징으로 하는 포토마스크.
- 제 1 항에 있어서, 반투명 패턴층과 차광성 패턴층의 사이에 중간층을 개재시킨 것을 특징으로 하는 포토마스크.
- 제 2 항에 있어서, 상기 중간층이 실리콘산화물인 것을 특징으로 하는 포토마스크.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000390382A JP2002196473A (ja) | 2000-12-22 | 2000-12-22 | フォトマスク |
JPJP-P-2000-00390382 | 2000-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020051832A true KR20020051832A (ko) | 2002-06-29 |
KR100876033B1 KR100876033B1 (ko) | 2008-12-26 |
Family
ID=18856762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020010080465A KR100876033B1 (ko) | 2000-12-22 | 2001-12-18 | 포토마스크 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6740455B2 (ko) |
JP (1) | JP2002196473A (ko) |
KR (1) | KR100876033B1 (ko) |
TW (1) | TW552465B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101053752B1 (ko) * | 2007-03-30 | 2011-08-02 | 호야 일렉트로닉스 말레이지아 센드리안 베르하드 | 포토마스크 블랭크, 포토마스크 및 포토마스크의 제조방법 |
KR101430763B1 (ko) * | 2007-03-30 | 2014-08-18 | 호야 가부시키가이샤 | 마스크 블랭크 및 포토마스크 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20080107242A (ko) * | 2006-03-06 | 2008-12-10 | 파나소닉 주식회사 | 포토마스크, 그 작성방법, 그 포토마스크를 이용한패턴형성방법 및 마스크데이터 작성방법 |
US8524421B2 (en) | 2010-03-30 | 2013-09-03 | Hoya Corporation | Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device |
US8435704B2 (en) * | 2010-03-30 | 2013-05-07 | Hoya Corporation | Mask blank, transfer mask, and methods of manufacturing the same |
JP5123349B2 (ja) * | 2010-04-19 | 2013-01-23 | Hoya株式会社 | 多階調マスクの製造方法 |
JP5950430B2 (ja) * | 2011-09-15 | 2016-07-13 | Hoya株式会社 | マスクブランク、多階調マスクおよびそれらの製造方法 |
JP6084391B2 (ja) * | 2011-09-28 | 2017-02-22 | Hoya株式会社 | マスクブランク、転写用マスク、転写用マスクの製造方法および半導体デバイスの製造方法 |
CN105717737B (zh) * | 2016-04-26 | 2019-08-02 | 深圳市华星光电技术有限公司 | 一种掩膜版及彩色滤光片基板的制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4440841A (en) * | 1981-02-28 | 1984-04-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask and photomask blank |
JPS6318351A (ja) * | 1986-07-11 | 1988-01-26 | Hitachi Micro Comput Eng Ltd | パタ−ン形成用マスク |
JPH02207252A (ja) * | 1989-02-07 | 1990-08-16 | Rohm Co Ltd | パターン形成用フォトマスク |
JPH03250415A (ja) * | 1990-02-28 | 1991-11-08 | Sanyo Electric Co Ltd | 薄膜磁気ヘッド |
JPH04301846A (ja) * | 1991-03-29 | 1992-10-26 | Toshiba Corp | 露光用マスク基板の製造方法 |
JPH06123961A (ja) * | 1992-10-12 | 1994-05-06 | Hoya Corp | 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクの製造方法 |
JP3272790B2 (ja) * | 1992-12-03 | 2002-04-08 | ホーヤ株式会社 | 位相シフトマスクの製造方法及び位相シフトマスクブランク |
JP3411613B2 (ja) * | 1993-03-26 | 2003-06-03 | Hoya株式会社 | ハーフトーン型位相シフトマスク |
JP3412207B2 (ja) * | 1993-10-07 | 2003-06-03 | 凸版印刷株式会社 | 位相シフトマスク及びその製造方法 |
JP3173314B2 (ja) * | 1995-03-30 | 2001-06-04 | 凸版印刷株式会社 | 位相シフトマスクの製造方法 |
JP3244107B2 (ja) * | 1995-06-02 | 2002-01-07 | 凸版印刷株式会社 | ハーフトーン型位相シフトマスク及びその製造方法 |
JP2877193B2 (ja) * | 1996-02-29 | 1999-03-31 | 日本電気株式会社 | フォトマスク |
US5914202A (en) * | 1996-06-10 | 1999-06-22 | Sharp Microeletronics Technology, Inc. | Method for forming a multi-level reticle |
JPH1115128A (ja) * | 1997-06-20 | 1999-01-22 | Hitachi Ltd | ホトマスク及びそれを用いたパタン形成方法 |
JP3250973B2 (ja) * | 1997-06-27 | 2002-01-28 | ホーヤ株式会社 | ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク |
JP2983020B1 (ja) * | 1998-12-18 | 1999-11-29 | ホーヤ株式会社 | ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク |
-
2000
- 2000-12-22 JP JP2000390382A patent/JP2002196473A/ja active Pending
-
2001
- 2001-12-18 KR KR1020010080465A patent/KR100876033B1/ko active IP Right Grant
- 2001-12-21 US US10/023,841 patent/US6740455B2/en not_active Expired - Lifetime
- 2001-12-21 TW TW090131810A patent/TW552465B/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101053752B1 (ko) * | 2007-03-30 | 2011-08-02 | 호야 일렉트로닉스 말레이지아 센드리안 베르하드 | 포토마스크 블랭크, 포토마스크 및 포토마스크의 제조방법 |
KR101430763B1 (ko) * | 2007-03-30 | 2014-08-18 | 호야 가부시키가이샤 | 마스크 블랭크 및 포토마스크 |
Also Published As
Publication number | Publication date |
---|---|
US6740455B2 (en) | 2004-05-25 |
US20020119379A1 (en) | 2002-08-29 |
TW552465B (en) | 2003-09-11 |
KR100876033B1 (ko) | 2008-12-26 |
JP2002196473A (ja) | 2002-07-12 |
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