KR20010040185A - 마스크와 워크의 간격설정수단을 구비한 콘택트 노광장치 - Google Patents
마스크와 워크의 간격설정수단을 구비한 콘택트 노광장치 Download PDFInfo
- Publication number
- KR20010040185A KR20010040185A KR1020000063251A KR20000063251A KR20010040185A KR 20010040185 A KR20010040185 A KR 20010040185A KR 1020000063251 A KR1020000063251 A KR 1020000063251A KR 20000063251 A KR20000063251 A KR 20000063251A KR 20010040185 A KR20010040185 A KR 20010040185A
- Authority
- KR
- South Korea
- Prior art keywords
- work
- mask
- stage
- workpiece
- contact
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/08—Treatments involving gases
- H05K2203/085—Using vacuum or low pressure
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (1)
- 워크 스테이지상에 놓인 표면에 감광막이 피착된 워크와, 마스크 패턴이 형성된 마스크를 밀착시켜, 노광광을 포함하는 광을 마스크를 통해 워크상에 조사하여, 워크상에 마스크 패턴을 노광하는 콘택트 노광장치에서,상기 콘택트 노광장치는, 마스크와 워크 사이의 공간을 원하는 콘택트력을 얻을 수 있는 압력으로 감압했을 때, 마스크와 워크를 접촉하지 않는 미리 설정된 간격이 되도록 양자를 격리 대면시키는 간격설정수단을 구비하고,상기 간격설정수단은 워크 스테이지 또는 마스크 스테이지에 부착된 제1 부재와, 제1 부재에 대해 높이 방향으로 이동가능한 제2 부재로 구성된 것을 특징으로 하는 마스크와 워크 간격설정수단을 구비한 것을 특징으로 하는 콘택트 노광장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30360099A JP3678079B2 (ja) | 1999-10-26 | 1999-10-26 | マスクとワークの間隔設定手段を備えたコンタクト露光装置 |
JP99-303600 | 1999-10-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010040185A true KR20010040185A (ko) | 2001-05-15 |
KR100554698B1 KR100554698B1 (ko) | 2006-02-22 |
Family
ID=17922961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000063251A KR100554698B1 (ko) | 1999-10-26 | 2000-10-26 | 마스크와 워크의 간격설정수단을 구비한 콘택트 노광장치 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6459474B1 (ko) |
EP (1) | EP1096320B1 (ko) |
JP (1) | JP3678079B2 (ko) |
KR (1) | KR100554698B1 (ko) |
DE (1) | DE60027665T2 (ko) |
TW (1) | TW477005B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100793260B1 (ko) * | 2006-04-12 | 2008-01-10 | 오에프티 주식회사 | 노광 장치 및 이를 이용하여 마스크와 기판 사이의 간극을설정하는 방법 |
KR101117896B1 (ko) * | 2009-07-03 | 2012-02-24 | 가부시키가이샤 히다치 하이테크놀로지즈 | 노광 장치 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003029414A (ja) * | 2001-07-19 | 2003-01-29 | Adtec Engineeng Co Ltd | 露光装置 |
DE20208285U1 (de) | 2002-05-27 | 2002-08-29 | Geburek, Frank, Dipl.-Ing. (TH), 31162 Bad Salzdetfurth | Belichtungsvorrichtung |
JP2004029063A (ja) * | 2002-06-21 | 2004-01-29 | Adtec Engineeng Co Ltd | 密着型露光装置 |
JP4158514B2 (ja) | 2002-12-24 | 2008-10-01 | ウシオ電機株式会社 | 両面投影露光装置 |
US20040145751A1 (en) * | 2003-01-28 | 2004-07-29 | Binnard Michael B. | Square wafer chuck with mirror |
JP2006200562A (ja) * | 2005-01-18 | 2006-08-03 | Nikon Corp | シール部材及びシール方法、テーブル及びステージ装置、並びに露光装置 |
US7239376B2 (en) * | 2005-07-27 | 2007-07-03 | International Business Machines Corporation | Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices |
US20070035717A1 (en) * | 2005-08-12 | 2007-02-15 | Wei Wu | Contact lithography apparatus, system and method |
CN1955842B (zh) * | 2005-10-27 | 2010-06-16 | 中华映管股份有限公司 | 光刻设备 |
US7830498B2 (en) * | 2006-10-10 | 2010-11-09 | Hewlett-Packard Development Company, L.P. | Hydraulic-facilitated contact lithography apparatus, system and method |
US7768628B2 (en) * | 2006-10-12 | 2010-08-03 | Hewlett-Packard Development Company, L.P. | Contact lithography apparatus and method |
US20100103402A1 (en) | 2007-02-26 | 2010-04-29 | Dai Nippon Printing Co., Ltd | Work stage of exposing apparatus, exposing method and method of manufacturing a structure |
CN101464620B (zh) * | 2008-12-17 | 2012-01-18 | 顾金昌 | 立体投影成像光栅压紧装置 |
DE102009025309B4 (de) * | 2009-06-15 | 2016-12-22 | Toptica Photonics Ag | Kinematischer Halter |
US8913230B2 (en) * | 2009-07-02 | 2014-12-16 | Canon Nanotechnologies, Inc. | Chucking system with recessed support feature |
TW201133703A (en) * | 2010-03-19 | 2011-10-01 | Els System Technology Co Ltd | Carrying apparatus and exposure machine having the same |
US9864279B2 (en) * | 2010-08-05 | 2018-01-09 | Asml Netherlands B.V. | Imprint lithography |
DE102010053332A1 (de) * | 2010-12-03 | 2012-06-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Handhaben von Werkstücken |
JP6142450B2 (ja) * | 2011-09-09 | 2017-06-07 | 株式会社ブイ・テクノロジー | 密着露光装置及び密着露光方法 |
DE102017105379A1 (de) | 2017-03-14 | 2018-09-20 | Aixtron Se | Substrathalteranordnung mit Maskenträger |
DE102017105374A1 (de) * | 2017-03-14 | 2018-09-20 | Aixtron Se | Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3192844A (en) * | 1963-03-05 | 1965-07-06 | Kulicke And Soffa Mfg Company | Mask alignment fixture |
GB1406406A (en) | 1973-01-17 | 1975-09-17 | Elektromat Veb | Apparatus for adjusting the distance between two planes |
US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
JPS58173727A (ja) * | 1982-04-05 | 1983-10-12 | Canon Inc | 密着焼付けにおける密着方法 |
JP2601834B2 (ja) * | 1987-08-26 | 1997-04-16 | 株式会社東芝 | テーブル装置 |
JP2705312B2 (ja) | 1990-12-06 | 1998-01-28 | ソニー株式会社 | 投影露光方法 |
KR100208739B1 (ko) | 1993-07-08 | 1999-07-15 | 다나카 아키히로 | 작업편과 마스크의 간극설정방법 및 간극설정기구 |
DE69500707T2 (de) * | 1994-02-07 | 1998-02-12 | Ushiodenki K.K., Tokio/Tokyo | Haltevorrichtung |
JPH11312635A (ja) | 1998-04-28 | 1999-11-09 | Ushio Inc | コンタクト露光方法 |
-
1999
- 1999-10-26 JP JP30360099A patent/JP3678079B2/ja not_active Expired - Lifetime
-
2000
- 2000-09-05 TW TW089118171A patent/TW477005B/zh not_active IP Right Cessation
- 2000-10-23 EP EP00123013A patent/EP1096320B1/en not_active Expired - Lifetime
- 2000-10-23 US US09/694,030 patent/US6459474B1/en not_active Expired - Lifetime
- 2000-10-23 DE DE60027665T patent/DE60027665T2/de not_active Expired - Lifetime
- 2000-10-26 KR KR1020000063251A patent/KR100554698B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100793260B1 (ko) * | 2006-04-12 | 2008-01-10 | 오에프티 주식회사 | 노광 장치 및 이를 이용하여 마스크와 기판 사이의 간극을설정하는 방법 |
KR101117896B1 (ko) * | 2009-07-03 | 2012-02-24 | 가부시키가이샤 히다치 하이테크놀로지즈 | 노광 장치 |
Also Published As
Publication number | Publication date |
---|---|
US6459474B1 (en) | 2002-10-01 |
JP3678079B2 (ja) | 2005-08-03 |
TW477005B (en) | 2002-02-21 |
KR100554698B1 (ko) | 2006-02-22 |
DE60027665D1 (de) | 2006-06-08 |
EP1096320A2 (en) | 2001-05-02 |
EP1096320B1 (en) | 2006-05-03 |
DE60027665T2 (de) | 2007-04-05 |
JP2001125275A (ja) | 2001-05-11 |
EP1096320A3 (en) | 2002-06-12 |
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