TW201133703A - Carrying apparatus and exposure machine having the same - Google Patents

Carrying apparatus and exposure machine having the same Download PDF

Info

Publication number
TW201133703A
TW201133703A TW99108158A TW99108158A TW201133703A TW 201133703 A TW201133703 A TW 201133703A TW 99108158 A TW99108158 A TW 99108158A TW 99108158 A TW99108158 A TW 99108158A TW 201133703 A TW201133703 A TW 201133703A
Authority
TW
Taiwan
Prior art keywords
carrier
exposed
workpiece
hole
bearing surface
Prior art date
Application number
TW99108158A
Other languages
Chinese (zh)
Other versions
TWI405296B (en
Inventor
zhi-ming Deng
Rong-Ting Wei
Original Assignee
Els System Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Els System Technology Co Ltd filed Critical Els System Technology Co Ltd
Priority to TW99108158A priority Critical patent/TW201133703A/en
Publication of TW201133703A publication Critical patent/TW201133703A/en
Application granted granted Critical
Publication of TWI405296B publication Critical patent/TWI405296B/zh

Links

Abstract

Disclosed is a carrying apparatus suitable for holding a work-piece to be exposed. The carrying apparatus comprises a base and a replaceable carrying tray. The base includes a top and a plurality of first positioning components disposed on the top. The replaceable carrying tray includes: a carrying surface which is capable of carrying the work-piece to be exposed and has same size as the work-piece; a bottom which can lean against the top; and a plurality of second positioning components which are disposed on the bottom and can connect with the first positioning components in a detachable way. Accordingly, if the size of another work-piece to be exposed is different, another replaceable carrying tray with the carrying surface corresponding to the size of the work-piece to be exposed can substitute.

Description

201133703 六、發明說明: 【發明所屬之技術領域】 本發明是有關於一種承載裝置及具有該承載裝置的曝 光機’特別是指一種承載盤可更換地組裝在基座上或由基 座上拆卸的承載裝置及具有該承載裝置的曝光機。 【先前技術】 如圖1及圖2所示,一般曝光機1包含一機台11,一 设置於機台Π上的承載裝置12、一鎖固於機台^上且位 於承載裝置12上方的承載座13,及一設置於機台u上且 位於承載座13上方的曝光頭14,承載座13用以承載一光 罩15。承載裝置12包括一馬達121、一連接於馬達121頂 端的螺接件122、一螺接於螺接件122上的螺桿123,及一 接合於螺桿123頂端用以承載一待曝光工件16的承載盤 124 ° 一進仃曝光作業時,待曝光工件16會透過移載裝置(圖201133703 VI. Description of the Invention: [Technical Field] The present invention relates to a carrying device and an exposure machine having the same, in particular to a carrier plate that is replaceably assembled on or detached from the base Carrying device and an exposure machine having the same. [Previous Art] As shown in FIG. 1 and FIG. 2, the general exposure machine 1 includes a machine table 11, a carrier device 12 disposed on the machine bed, and a device fixed on the machine table and located above the carrier device 12. The carrier 13 and an exposure head 14 disposed on the table u and located above the carrier 13 are used to carry a mask 15 . The carrying device 12 includes a motor 121, a screw member 122 connected to the top end of the motor 121, a screw 123 screwed to the screw member 122, and a bearing coupled to the top end of the screw 123 for carrying a workpiece 16 to be exposed. When the disk is 124 ° into the 仃 exposure operation, the workpiece 16 to be exposed will pass through the transfer device (Fig.

未示)的輸送而被置放在承載盤124上,承載裝置12會將承 載盤124在上推移’使得承載盤124上的待曝光工件16與 承載座U上的光罩15貼平’接著,藉由曝光頭14所產生 的光線通過光罩15對待曝光卫件16曝光,使得光罩15上 的預设圖案能轉印到採膜止τ …株以 件16上。為了穩固地承載待 =件16,承載盤m的尺寸大都會設計與待曝光工件 16尺寸相當,若㈣行其他不同尺寸㈣曝光4 光作業時’必須將原士 曝 將原本的承载裝置12 個具有與該待曝光工件 ㉛㈣上另- 1干丨6尺寸相當的承载盤124之承载裴 201133703 置12,才可進行不同尺寸的待曝光工件16的曝光。然而, 安裝後的承载裝置12與光罩15及曝光頭14之間會產生誤 差,需重新進行對位校正的動作,故在曝光作業時較為不 便,且會耗費大量的工時,因此,如何構思出一種便於拆 裝且可更換不同尺寸大小的承載盤124設計,遂成為本發 明要進一步改進的主題。 【發明内容】 本發明之主要目的,在於提供一種承載裝置,其承載 盤能方便且迅速地組裝在基座上或由基座上拆卸,藉此, 當待曝光工件尺寸改變時,便能替換具有對應待曝光工件 尺寸的承載盤。 本發明之另-目的,在於提供一種具有承載裝置的曝 光機,承載裝置的承載盤能方便且迅速地組裝在基座上或 由基座上拆卸’藉此,當待曝光工件尺寸改變時,便能替 換具有對應待曝光工件尺寸的承載盤。 本發明的目的及解決先前技術問題是採用以下技術手 段來實現的’依據本發明所揭露的承載裝置適於承載一 待曝光工件,承載裝置包含一基座及一可更換的承載盤。 基座包括-頂面,及複數個設置於頂面的第一定位件 ;可更換的承載盤包括-可承載待曝光工件並與其尺寸相 當的承載面、一可抵接於頂面的底面,及複數個設置於底 面且可拆卸地與所述第一定位件相接合的第二定位件,藉 此,當待曝光工件尺寸改變時,便能替換具有對應待曝光 工件尺寸之承載面的可更換的承載盤。 201133703 本發明的目的及解決先前技術問題 術手段進一步實現。 疋』以祕用以下技 各第-定位件為定位柱或定位孔其中之一 位件為定位柱或定位孔其甲另一。 第一疋 基座還包括-由頂面向下凹陷的凹槽一 槽相連通的第—iS $ ^ ~ 凹 另…Γ 裝置還包含-安裝於第-通孔 使承載盤被吸附於基座的頂面。 另一鈿的第一氣嘴,第一潇 孔驚帛孔嘴可對第-通孔及凹槽抽氣,The carrier (not shown) is placed on the carrier tray 124, and the carrier device 12 will push the carrier tray 124 up so that the workpiece 16 to be exposed on the carrier tray 124 is flattened with the mask 15 on the carrier U. The light generated by the exposure head 14 is exposed to the exposure member 16 through the reticle 15, so that the predetermined pattern on the reticle 15 can be transferred to the film slab. In order to stably carry the member 16, the size of the carrier m is designed to be equivalent to the size of the workpiece 16 to be exposed. If (4) other different sizes (4) exposure 4 light operation, the original carrier must be exposed to 12 original devices. The carrier 裴201133703 having the size of the carrier disk 124 corresponding to the size of the other 丨6 on the workpiece 31 to be exposed (4) can be exposed to different sizes of the workpiece 16 to be exposed. However, there is an error between the mounted carrier device 12 and the mask 15 and the exposure head 14, and the alignment correction operation needs to be performed again, which is inconvenient in the exposure operation and consumes a lot of man-hours. Therefore, how It is conceivable that a design of the carrier tray 124 that is easy to assemble and disassemble and can be replaced with different sizes is the subject of further improvement of the present invention. SUMMARY OF THE INVENTION A primary object of the present invention is to provide a carrying device in which a carrier tray can be easily and quickly assembled on or detached from a susceptor, thereby being replaceable when the size of the workpiece to be exposed is changed. A carrier disk having a size corresponding to the workpiece to be exposed. Another object of the present invention is to provide an exposure machine having a carrying device that can be easily and quickly assembled on or detached from the base. Thereby, when the size of the workpiece to be exposed changes, The carrier tray having the size corresponding to the workpiece to be exposed can be replaced. SUMMARY OF THE INVENTION The object of the present invention and the prior art problem is achieved by the following technical means. The carrier device according to the present invention is adapted to carry a workpiece to be exposed. The carrier device comprises a base and a replaceable carrier disk. The base comprises a top surface, and a plurality of first positioning members disposed on the top surface; the replaceable carrier tray comprises: a bearing surface capable of carrying the workpiece to be exposed and corresponding in size, and a bottom surface capable of abutting the top surface, And a plurality of second positioning members disposed on the bottom surface and detachably engaged with the first positioning member, whereby when the size of the workpiece to be exposed is changed, the bearing surface having the size corresponding to the workpiece to be exposed can be replaced Replacement of the carrier tray. 201133703 The object of the present invention and the solution to the prior art are further achieved.疋 以 秘 秘 秘 秘 秘 秘 秘 秘 秘 秘 秘 - - - - - - - - - - - - - - - - - - - - The first cymbal base further includes a first-iS $^~ recessed groove that is recessed by the top-down recessed groove. The device further includes a mounting-to-through hole for the carrier disk to be adsorbed to the pedestal. Top surface. The other first nozzle, the first aperture convulsion nozzle can pump the first through hole and the groove,

基座還包括_一端形成於頂面的第二通孔,承裁盤還 匕括一貫穿承載面盥底面 _ 名“ 面且與第—通孔連通的氣體流道, 一載裝置還包含一安裝於第二通孔另一端的第二氣嘴第 氣嘴可對第_通孔及氣體流道抽氣,使待曝光工件被吸 附於承載盤的承載面。 承載盤還包括一形成於承載面上的第一溝槽,及複數 個形成於承載面上且與第一溝槽相連通的第二溝槽,第一 溝槽呈十字形且中心處與氣體流道_通,所述第二溝槽 呈同心圓狀地排列且分別具有不同的直徑。 ,基座還包括一位於該頂面下方的容置空間,及複數個 形成於該頂面並與該容置空間連通的第一穿孔該承載盤 還i括複數個貫穿該承載面與該底面且與所述第一穿孔連 通的第一穿孔,忒承載裝置還包含一穿伸於該容置空間内 的頂推件,該頂推件包括複數根分別穿設於所述第一、第 穿孔用以頂抵待曝光工件的頂針,頂推件可在一各頂針 穿出承載面的第一高度位置,及一各頂針位於承載面下方 201133703 的第一同度位置之間往復運動。承載裝置還包含一設置於 基座上並可驅動頂推件在第一高度位置與第二高度位置之 間往復運動的汽缸。 依據本發明所揭露的具有承載裝置的曝光機,包括一 機台、一承載件、一曝光頭及一承載裝置。 承載件设置於機台上用以承載一光罩;曝光頭設置於 機台上且位於承載件上方;承載裝置適於承載一待曝光工 件’承載裝置包含一基座、一驅動機構,及一可更換的承 載盤。基座设置於承載件下方並包括一頂面,及複數個設 置於頂面的第一定位件;驅動機構安裝於基座底端並可驅 使基座上下往復運動;可更換的承載盤包括一可承載待曝 光工件並與其尺寸相當的承載面、一可抵接於頂面的底面 ,及複數個設置於底面且可拆卸地與所述第一定位件相接 合的第一定位件,藉此,當待曝光工件尺寸改變時,便能 替換具有對應該待曝光工件尺寸之承載面的可更換的承載 盤。 藉由上述技術手段,本發明承載裝置的優點及功效在 於,藉由可更換的承載盤設計,使得操作人員能方便且迅 速地將承載盤組裝在基座上或由基座上拆卸,藉此,便能 替換具有對應待曝光工件尺寸之承載面的可更換的承載盤 【實施方式】 有關本發明之前述及其他技術内容、特點與功效,在 以下配合參考圖式之一個較佳實施例的詳細說明中,將可 201133703 清楚的呈現。透過具體實施方式的說明’當可對本發明為 達成預定目的所採取的技術手段及功效得以更加深入且具 體的了解,然而所附圖式只是提供參考與說明之用,並非 用來對本發明加以限制。 在本發明被詳細描述之前,要注意的是,在以下的說 明内容中,類似的元件是以相同的編號來表示。The base further includes a second through hole formed at one end of the top surface, and the receiving tray further includes a gas flow passage extending through the bottom surface of the bearing surface and communicating with the first through hole, and the loading device further comprises a The second nozzle nozzle installed at the other end of the second through hole can pump the first through hole and the gas flow path, so that the workpiece to be exposed is adsorbed on the bearing surface of the carrier. The carrier tray further includes a carrier formed on the carrier. a first groove on the surface, and a plurality of second grooves formed on the bearing surface and communicating with the first groove, the first groove is in a cross shape and the center is connected to the gas flow channel, the first The two grooves are arranged concentrically and have different diameters respectively. The base further includes an accommodating space below the top surface, and a plurality of first holes formed on the top surface and communicating with the accommodating space. The perforating tray further includes a plurality of first perforations extending through the bearing surface and the bottom surface and communicating with the first perforation, the crucible carrying device further comprising a pushing member extending through the receiving space, the top The pushing member includes a plurality of roots respectively disposed on the first and second perforations for abutting The ejector pin of the light workpiece, the pushing member is reciprocable between a first height position at which the ejector pins pass the bearing surface, and a thimble is located between the first degree of the same position below the bearing surface 201133703. The carrying device further comprises a setting a cylinder on the base and capable of driving the pushing member to reciprocate between the first height position and the second height position. The exposure machine with the carrying device disclosed in the present invention comprises a machine table, a carrier, an exposure a carrier is disposed on the machine platform for carrying a light cover; an exposure head is disposed on the machine table and located above the carrier; the carrier device is adapted to carry a workpiece to be exposed, and the carrier device comprises a base, a driving mechanism, and a replaceable carrier tray. The base is disposed under the carrier and includes a top surface, and a plurality of first positioning members disposed on the top surface; the driving mechanism is mounted on the bottom end of the base and can drive the base The seat is reciprocated up and down; the replaceable carrier includes a bearing surface capable of carrying the workpiece to be exposed and corresponding in size, a bottom surface abuttable to the top surface, and a plurality of bottom surfaces disposed on the bottom surface And a first positioning member detachably engaged with the first positioning member, whereby when the size of the workpiece to be exposed is changed, the replaceable carrier having the bearing surface corresponding to the size of the workpiece to be exposed can be replaced. The above-mentioned technical means, the advantage and the effect of the carrying device of the present invention is that the replaceable carrier plate design enables the operator to conveniently and quickly assemble or remove the carrier plate from the base. The replaceable carrier disk having the bearing surface corresponding to the size of the workpiece to be exposed can be replaced. [Embodiment] The foregoing and other technical contents, features and effects of the present invention are described below with reference to a preferred embodiment of the reference drawings. In the detailed description, it can be clearly presented in 201133703. Through the description of the specific embodiments, the technical means and effects of the present invention for achieving the intended purpose can be more deeply and specifically understood, however, the drawings are only for reference. The description is not intended to limit the invention. Before the present invention is described in detail, it is noted that in the following description, similar elements are denoted by the same reference numerals.

如圖3所示,是本發明具有承載裝置的曝光機的一較 佳實施例,該曝光機2包含一機台21、一設置於機台21上 的承載件22、一設置於機台21上且位於承載件22上方的 曝光頭23 ’及一設置於機台21上且位於承載件22下方的 承載裝置400。承載件22用以承載一光罩31,而承載裝置 4〇〇頂端用以承載一待曝光工件32,承載裝置4〇〇可將待 曝光工件32往上推移並貼平於光罩31底面,藉此,曝光 頭23所產生的光線能通過光罩Η對待曝光工件32曝光, 使得光罩31上的預設圖案能轉印到待曝光工件32上,其 中,待曝光工件32可為一基板或一晶圓,在本實施例中是 以晶圓為例作說明。 如圖3及圖4所示,承載裝置4〇〇包含一基座 更換地設置於基座4上的承載盤5,及—驅動機構6。驅〗 機構6安裝於機台21上’其包括一驅動馬達61,及一可, 驅動馬達61帶動而上下往復運動的活動架62。基座4包; 一第-座體4卜及-設置於第—座體41上並供承載盤5 裝的第二㈣42’基座4的第—座體41可透過螺鎖方式 固於活動架62頂端’藉此,使得基座4及承載盤$可受 201133703 動架62的帶動而上下往復運動。 如圖4、圖5及圖6所示’第二座體42呈圓柱形,其 底面凸設有-弧形接合部42G ’第二座體42的弧形接合部 420可轉動地容置於第一座體41頂端的弧形凹槽41〇内, 藉此,承載盤5可透過第二座體42相對於第一座體41轉 動,以進行角度微調的動作。第二座體42包括一頂面421 及由頂面421向下凹陷的凹槽422,第二座體界定 凹槽422 #槽壁423上凸設有複數個第—^位件424。承 載盤5呈圓盤狀’並包括一可承載待曝光工件32並與其尺 寸相當的承載面51、一位於承載面51相反側且可抵接於頂 面421的底面52,及複數個設置於底面52的第二定位件 53’第二定位件53的數量與第__定位件424數量相同且位 置相對應’各第二定位件53可拆卸地與各第—定位件424 相接合,藉此’使得承_ 5可更換地組裝定位在基座4 的=二座體42上。在本實施例中,各第定一定位件424為 定位柱而各第一定位件53為一可供該定位柱穿設的定 位孔。當然,在設計上,如圖7所示,各第一定位件似 也可為-定位孔,而各第二定位件53也可為一穿設於該定 位孔内的定位柱。 基座4的第二座體42還包括一第一通孔425,第一通 孔425的-端形成在槽壁423上並與凹槽422相連通,而 第一通孔425另一端用以供承載裝置的-第-氣嘴71 安裝,第一氣嘴71可與一氣壓裝置(圖未示)相連接,透過 氣壓裝置的作動,使得第—氣嘴71可對第—通孔425及凹 201133703As shown in FIG. 3, it is a preferred embodiment of the exposure machine with a carrying device of the present invention. The exposure machine 2 includes a machine table 21, a carrier 22 disposed on the machine table 21, and a device 21 disposed on the machine table 21. An exposure head 23 ′ above the carrier 22 and a carrier 400 disposed on the machine 21 and below the carrier 22 . The carrier 22 is used to carry a reticle 31, and the top end of the carrying device 4 is used to carry a workpiece 32 to be exposed. The carrying device 4 推移 can push the workpiece 32 to be exposed upward and flatten the bottom surface of the reticle 31. Thereby, the light generated by the exposure head 23 can be exposed through the reticle Η the exposed workpiece 32, so that the predetermined pattern on the reticle 31 can be transferred onto the workpiece 32 to be exposed, wherein the workpiece 32 to be exposed can be a substrate. Or a wafer, in this embodiment, a wafer is taken as an example for illustration. As shown in Figs. 3 and 4, the carrying unit 4 includes a carrier 5 on which the base is removably disposed on the base 4, and a drive mechanism 6. The mechanism 6 is mounted on the machine table. 'It includes a drive motor 61, and a movable frame 62 that drives the motor 61 to reciprocate up and down. The base 4 is wrapped; a first seat body 4 and a first seat body 41 disposed on the first seat body 41 and provided for the second (four) 42' base 4 of the carrier plate 5 are fixed to the movable body by a screw lock The top end of the frame 62 is such that the base 4 and the carrier tray $ can be reciprocated up and down by the driving of the 201133703 motion frame 62. As shown in FIG. 4, FIG. 5 and FIG. 6, the second seat body 42 has a cylindrical shape, and the bottom surface thereof is convexly provided with an arc-shaped engaging portion 42G. The arc-shaped engaging portion 420 of the second seat body 42 is rotatably accommodated. The arcuate recess 41 is formed at the top end of the first body 41. Thereby, the carrier 5 can be rotated relative to the first base 41 through the second base 42 to perform an angle fine adjustment. The second body 42 includes a top surface 421 and a recess 422 recessed downwardly from the top surface 421. The second base defines a recess 422. The slot wall 423 is convexly provided with a plurality of first and second members 424. The carrier disk 5 has a disk shape and includes a bearing surface 51 capable of carrying the workpiece 32 to be exposed and corresponding in size, a bottom surface 52 on the opposite side of the bearing surface 51 and abutting against the top surface 421, and a plurality of The second positioning member 53' of the bottom surface 52 has the same number of second positioning members 53 as the first positioning member 424 and the position corresponds to each of the second positioning members 53 being detachably engaged with the respective first positioning members 424. This allows the carrier 5 to be replaceably assembled on the base 2 of the base 4 . In this embodiment, each of the first positioning members 424 is a positioning post and each of the first positioning members 53 is a positioning hole through which the positioning rod can be inserted. Of course, in the design, as shown in FIG. 7 , each of the first positioning members may also be a positioning hole, and each of the second positioning members 53 may also be a positioning post that is disposed in the positioning hole. The second base 42 of the base 4 further includes a first through hole 425. The first end of the first through hole 425 is formed on the groove wall 423 and communicates with the groove 422, and the other end of the first through hole 425 is used. The first air nozzle 71 is connected to a pneumatic device (not shown), and the air pressure device is actuated to enable the first air nozzle 71 to be opposite to the first through hole 425 and Concave 201133703

槽422抽氣。當承載盤5定位在第二座體42的頂面421時 透過第一氣嘴71對第一通孔425及凹槽422抽氣,使得 承載盤5被向下的吸力吸附於第二座體42的頂面421,藉 此,承載盤5能穩固地定位在第二座體42的頂面421,且 不會因誤觸被往上抬而造成第二定位件53與第一定位件 424分離。較佳地,在本實施例中,凹槽422具有一呈弧形 的第一槽部426,及一位於第一槽部426内周圍並與其相連 通呈十字形的第二槽部427,透過凹槽422的第一、第二槽 部426、427設計,承載盤5的底面52靠近周緣處及中間 部位均能被穩固地吸附,使得承載盤5的底面52能均勻且 平整地抵接在第二座體42的頂面421,能避免因吸力不均 而造成承載盤5產生歪斜的現象。 如圖4、圖6及圖8所示,承載盤5還包括一貫穿承載 面51與底面52的氣體流道54,基座4的第二座體42還包 括一第二通孔428,第二通孔428的一端形成於頂面421並 與氣體流道54相連通,而第二通孔428的另—端用以供承 載裝置400的一第二氣嘴72安裝,第二氣嘴72同樣與該 氣壓裝置相連接’透過氣壓裝置的作動,使得第二氣嘴Μ 可對第二通孔428及氣體流道54抽氣。當待曝光工件 置放在承載盤5的承載面51時,透過第二氣嘴72對第二 通孔428及氣體流道54抽氣,使得待曝光工件32被向下 的吸力吸附於承載盤5的承載面51,藉此,待曝光工件μ 能定位在承載盤5的承载面51。較佳地’承載盤5還包括 一形成於承載面51上的第一溝槽55,及複數個形成於承載 201133703 T 51上的第二溝槽56,第-溝槽55呈十字形且中心處與 1 «道54相連通,而所述第二溝槽%呈同心圓狀地排 列且分別具有不同的直徑,所述第二溝槽%分別與第一溝 ,相連通’藉此,第二氣嘴72能透過第二通孔428及 孔體机道54對第-、第二溝槽55、%抽氣,使得待曝光 工件32能被穩固地吸附,同時能均勻且平整地抵接在承載 面51上。 如圓4、圖8及圖9所示’基座4的第二座體42還包 4於頂面421下方的容置空間429,及複數個形成於頂 面似並與容置空間相連通的第一穿孔43〇,而承載盤 5還包括複數個貫穿承載面51與底面52的第二穿孔π, ’第二穿孔57的數量與第—穿孔·的數量相同且位置相 對應,各第二穿孔57與各第—穿孔·相連通。承載裝置 400還包含_頂推件8,及一設置於第一座體μ上並;驅 動頂推件8作動的汽缸9’頂推件8經由一側向開口 431穿 伸於谷置空間429 Ν,頂推件8包括複數根用以頂抵待曝 光工件32的頂針8卜各頂針81穿設於各第一穿孔伽及 各第:穿孔57並可頂推待曝光工件32,藉由汽缸9的驅動 ’使得頂推件8可在—頂針81穿出第二穿孔57及承載面 51的第-鬲度位置(如圖9所示)’及一頂針81位於承载面 51下方的第二高度位置(如圖1〇所示)之間往復運動。 如圖6及圖8所示,欲組裝承載盤5於基座4的第二 座體42上時,先將承載盤5置放於第二座體42的頂面421 ,並使各第-定位件424穿設於各第二定位件53内,使得 10 201133703 I:盤接5/位透在::座體42上且不會相對於第二座體42 似抽氣,η —氣嘴71對第-通孔425及凹槽 '于载盤5能被吸附並使底面52均勻且平整 地抵接在第二座體42的 且十整 的組裝。 的頂面似,此時’即完成承載盤5 如圖4 圓 及圖10所不,曝光機2在進行曝 先作業時’頂推件8是位扃笛一 一 ώ Β 在第一冋度位置,移載裝置(圖未 不)會將待曝光工件32The slot 422 is pumped. When the carrier 5 is positioned on the top surface 421 of the second body 42 , the first through hole 425 and the groove 422 are evacuated through the first air nozzle 71 , so that the carrier 5 is attracted to the second body by the downward suction. The top surface 421 of the second positioning member 53 and the first positioning member 424 can be stably positioned on the top surface 421 of the second base body 42 without being lifted up by mistake. Separation. Preferably, in the embodiment, the groove 422 has a first groove portion 426 which is curved, and a second groove portion 427 which is located around the first groove portion 426 and communicates with the cross portion. The first and second groove portions 426 and 427 of the groove 422 are designed, and the bottom surface 52 of the carrier plate 5 can be stably adsorbed near the periphery and the intermediate portion, so that the bottom surface 52 of the carrier plate 5 can be evenly and evenly abutted. The top surface 421 of the second base body 42 can avoid the phenomenon that the carrier disk 5 is skewed due to uneven suction. As shown in FIG. 4, FIG. 6 and FIG. 8, the carrier tray 5 further includes a gas flow passage 54 extending through the bearing surface 51 and the bottom surface 52. The second base 42 of the base 4 further includes a second through hole 428. One end of the second through hole 428 is formed on the top surface 421 and communicates with the gas flow passage 54 , and the other end of the second through hole 428 is used for mounting a second air nozzle 72 of the carrying device 400 , the second air nozzle 72 Also connected to the pneumatic device 'actuation through the pneumatic device, so that the second nozzle 抽 can pump the second through hole 428 and the gas flow passage 54. When the workpiece to be exposed is placed on the carrying surface 51 of the carrier 5, the second through hole 428 and the gas flow path 54 are evacuated through the second air nozzle 72, so that the workpiece 32 to be exposed is attracted to the carrier by the downward suction. The bearing surface 51 of 5, whereby the workpiece μ to be exposed can be positioned on the bearing surface 51 of the carrier disk 5. Preferably, the carrier tray 5 further includes a first groove 55 formed on the bearing surface 51, and a plurality of second grooves 56 formed on the bearing 201133703 T 51. The first groove 55 has a cross shape and a center. Corresponding to 1 "channel 54", wherein the second grooves % are arranged concentrically and have different diameters, respectively, and the second grooves % are respectively connected to the first groove, thereby The two nozzles 72 can pump the first and second grooves 55 and % through the second through holes 428 and the hole body passages 54, so that the workpiece 32 to be exposed can be stably adsorbed, and can be evenly and evenly abutted. On the bearing surface 51. As shown in the circle 4, FIG. 8 and FIG. 9 , the second base 42 of the base 4 further includes an accommodation space 429 below the top surface 421, and a plurality of forms formed on the top surface and connected to the accommodation space. The first through hole 43〇, and the carrier plate 5 further includes a plurality of second through holes π extending through the bearing surface 51 and the bottom surface 52. The number of the second through holes 57 is the same as the number of the first perforations, and the positions correspond to each other. The second through hole 57 is in communication with each of the first through holes. The carrying device 400 further includes a pushing member 8 and a cylinder 9' pushing the pushing member 8 which is disposed on the first seat body 51 and drives the pushing member 8 to extend through the side opening 431 to the valley space 429. The ejector member 8 includes a plurality of ejector pins 8 for abutting against the workpiece 32 to be exposed. Each of the ejector pins 81 is disposed through each of the first perforations and each of the perforations 57 and can push the workpiece 32 to be exposed by the cylinder. The drive of 9 enables the pusher 8 to pass through the second through hole 57 and the first twist position of the bearing surface 51 (shown in FIG. 9) and the second needle 81 is located below the load bearing surface 51. The height position (as shown in Figure 1) reciprocates. As shown in FIG. 6 and FIG. 8 , when the carrier 5 is to be assembled on the second base 42 of the base 4, the carrier 5 is placed on the top surface 421 of the second base 42 and the first The positioning member 424 is disposed in each of the second positioning members 53, so that 10 201133703 I: the disk is 5/bit through: the seat body 42 and does not draw air relative to the second seat body 42, the η-air nozzle 71 pairs of through-holes 425 and grooves ' can be adsorbed on the carrier 5 and the bottom surface 52 is evenly and smoothly abutted against the second assembly 42 and assembled. The top surface is similar, at this time 'that is, the carrier tray 5 is completed as shown in FIG. 4 and FIG. 10, and the exposure machine 2 is in the exposure operation. 'The pushing member 8 is in the position of the flute one by one. Position, the transfer device (not shown) will be the workpiece to be exposed 32

輸送至頂針81的正上方,接著,務 Γ8Γ=Γ曝光工件32下降,當待曝光工件32被頂 針81頂抵時,待曝光 4 曝九件32即不再繼續下移。之後,透 過汽紅9驅動頂推件8由第一古许 ^ 间度位置沿箭頭I方向下移, 當頂推件8下移到如圖1〇 > 所不的第—尚度位置時,待曝光 工件32因承載面51的阻擋而置放在承載面5i i,透過操 控氣壓裝置使第二氣嘴72對第二通孔似、氣體流道Μ及 第一、第二溝槽55、56抽氣,使得待曝光工件32能被穩 固地吸附在承載面51上》It is conveyed directly above the ejector pin 81, and then, the Γ 8 Γ = Γ exposure workpiece 32 is lowered, and when the workpiece 32 to be exposed is erected by the ejector pin 81, the exposure to be exposed 4 does not continue to move downward. Thereafter, the driving pusher 8 is moved downward in the direction of the arrow I by the first steaming position by the steam red 9 when the pushing member 8 is moved down to the first-degree position as shown in FIG. The workpiece 32 to be exposed is placed on the bearing surface 5i i due to the blocking of the bearing surface 51, and the second air nozzle 72 is aligned with the second through hole, the gas flow path, and the first and second grooves 55 by operating the air pressure device. , 56 pumping, so that the workpiece 32 to be exposed can be firmly adsorbed on the bearing surface 51"

如圖11及圖12所示,接著,透過操控驅動機構6的驅 動馬達61作動,驅動馬達61的活動架62會帶動基座4、 承載盤5及待曝光:件32由—初始位置(如圖^所㈡沿箭 頭π方向向上移動。待承載面51上的待曝光工件32抵壓 在光罩31底面時,透過第二座體42的弧形接合部42〇可 轉動地容置於第一座體41的弧形凹槽41〇設計,使得承载 盤5能透過第二座體42進行角度微調的動作,藉此,使得 待曝光工件32能平整地貼覆在光罩31底面。另外,透過 11 201133703 -感測元件(圖未示)感測待曝光工件32抵壓在光罩η上的 壓力到達-預設值時,感測元件會驅使驅動馬達61停止作 動,使得待曝光王件32 *會被繼續向上推移,此時,即可 藉由曝光頭23(如圖3)及光罩31對待曝光工件32曝光。待 曝光作業完成後,驅動馬達61會驅動活動架62帶動基座* 、承載盤5及待曝光卫件32沿箭頭1方向向下移動至圖^ 所示的初始位置,使待曝光工件32與光罩31分離。 透過第二氣嘴72停止對第二通孔428、氣體流道54及 第-、第二溝槽55、56抽氣,可解除待曝光工件32被吸 附在承載面51上的狀態。之後,藉由汽缸9驅動頂推件8 由圖10所示的第二高度位置沿箭頭„方向上移到圖9所示 的第一高度位置,頂推件8的頂針81能將待曝光工件Η 頂離承載面51,使得移載機構能將曝光好的待曝光工件 移離頂針8卜以便頂針81能繼續承接下__個待曝光工件。 如圖3、圖4、®6及圖13所示,承載裝置彻透過 可更換的承載盤5設計,使得操作人員欲進行不同尺寸的 待曝光工件32’(如圖13)的曝光時,藉由操控第一氣嘴71 使其停止對第一通孔425及凹槽422抽氣,接著,將承載 盤5往上抬使第二定位件53與第一定位件424分離後,即 可方便且迅速地將承載盤5拆離基座4的第二座體42,此 時,便能替換具有對應待曝光工件32,尺寸之承載面51,的 可更換的承載盤5,。由於承載裝置400藉由基座4及驅動 機構6組裝於機台21時,已與光罩31及曝光頭23之間完 成對位校正的動作,因此,透過前述的組裝步驟將承載盤 12 201133703 5迅速地組裝在基座4的第二座體42後,即可進行曝光作 業,不需再進行對位及校正的動作,能有效減少操作的工 時。 歸納上述,本實施例的曝光機2,藉由可更換的承載盤 5設計,使得操作人員能方便且迅速地將承載盤5組裝在基 座4的第二座體42上或由第二座體42上拆卸,藉此,便 月b替換具有對應待曝光工件32’尺寸之承載面51’的可更換 的承載盤5,,確實能達成本發明所訴求之目的。 9 准以上所述者,僅為本發明之較佳實施例而已,當不 育b以此限疋本發明實施之範圍,即大凡依本發明申請專利 範圍及發明說明内容所作之簡單的等效變化與修飾,皆仍 屬本發明專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一般曝光機的示意圖; 圖2是類似圖丨的示意圖,說明伸縮裝置將待曝光工 件往上推移使其平貼光罩; ® 圖3是本發明具有承載裝置的曝光機的一較佳實施例 的立體圖; 圖4是本發明具有承載裝置的曝光機的一較佳實施例 的承載裝置的立體分解圖; 圖5是本發明具有承載裝置的曝光機的一較佳實施例 的承載盤的仰視圖; 圖6是本發明具有承載裝置的曝光機的一較佳實施例 的局部放大圖’說明承載盤組裝於基座的第二座體上,且 13 201133703 第一定位件為定位柱,第二定位件為定位孔; 疋本發明具有承載裝置的曝光機的—較佳實施例 的另-實施態樣的局部放大圖,說明第一定位件為定位孔 ’第二定位件為定位柱; 圖8是本發明具有承载裝置的曝光機的—較佳實施例 的剖視圖; 疋本發月具有承載裝置的曝光機的一較佳實施例 的剖視圖,說明頂推件位在第一高度位置; 圖10是本發明具有承載裝置的曝光機的一 的剖視圖,說明頂推件位在第二高度位置;佳貫施例 、圖11是本發明具有承載裝置的曝光機的一較佳實施例 的作動示意圖,說明基座、承載盤及待曝光工 位置; 圖12是本發明具有承載裝置的曝光機的一較佳實施例 作動不意圖’說明待曝光工件抵壓在光罩底面;及 疋本發明具有承載裝置的曝光機的一較佳實施例 、操作不意圖’說明承载裝置能替換具有對應待曝光工件 尺寸之承載面的承載盤。 14 201133703As shown in FIG. 11 and FIG. 12, then, by actuating the drive motor 61 of the drive mechanism 6, the movable frame 62 of the drive motor 61 drives the base 4, the carrier plate 5, and the member to be exposed: the initial position (eg, (2) moving upward in the direction of the arrow π. When the workpiece 32 to be exposed on the bearing surface 51 is pressed against the bottom surface of the reticle 31, the arc-shaped engaging portion 42 of the second base 42 is rotatably accommodated. The arcuate groove 41 of the body 41 is designed such that the carrier plate 5 can be angularly adjusted through the second body 42 so that the workpiece 32 to be exposed can be flatly attached to the bottom surface of the reticle 31. Through the sensing element (not shown) of 11 201133703 - sensing that the pressure of the workpiece 32 to be exposed against the reticle η reaches a preset value, the sensing element drives the driving motor 61 to stop, so that the king to be exposed The piece 32* will continue to move upwards. At this time, the workpiece 32 to be exposed can be exposed by the exposure head 23 (Fig. 3) and the reticle 31. After the operation to be exposed is completed, the drive motor 61 drives the movable frame 62 to drive the base. The seat*, the carrier plate 5 and the guard to be exposed 32 are moved downward in the direction of the arrow 1 to The initial position shown in Fig. 2 separates the workpiece 32 to be exposed from the reticle 31. The second through hole 428, the gas flow path 54, and the first and second grooves 55, 56 are stopped by the second gas nozzle 72. The state in which the workpiece 32 to be exposed is adsorbed on the bearing surface 51 can be released. Thereafter, the pushing member 8 is driven by the cylinder 9 to move from the second height position shown in FIG. 10 to the arrow „ direction to the position shown in FIG. In the first height position, the ejector pin 81 of the pushing member 8 can lift the workpiece to be exposed from the bearing surface 51, so that the transfer mechanism can move the exposed workpiece to be exposed away from the ejector pin 8 so that the thimble 81 can continue to receive the __ As shown in Fig. 3, Fig. 4, Fig. 6 and Fig. 13, the carrying device is designed through the replaceable carrying tray 5, so that the operator wants to perform different sizes of the workpiece 32' to be exposed (Fig. 13). During the exposure, the first nozzle 425 and the groove 422 are stopped by the first nozzle 71, and then the carrier 5 is lifted up to separate the second positioning member 53 from the first positioning member 424. After that, the carrier tray 5 can be easily and quickly detached from the second base 42 of the base 4, and at this time, the replacement can be replaced. The replaceable carrier 5 corresponding to the workpiece 32 to be exposed, the size of the bearing surface 51. Since the carrier 400 is assembled to the machine table 21 by the base 4 and the drive mechanism 6, the photomask 31 and the exposure head 23 have been The alignment correction operation is completed. Therefore, after the carrier disk 12 201133703 5 is quickly assembled in the second body 42 of the susceptor 4 through the aforementioned assembly step, the exposure operation can be performed without alignment. The correcting action can effectively reduce the man-hour of operation. In summary, the exposure machine 2 of the present embodiment is designed by the replaceable carrier 5 so that the operator can easily and quickly assemble the carrier 5 to the base 4. The second seat body 42 is detached from the second seat body 42, whereby the replaceable carrier plate 5 having the bearing surface 51' corresponding to the size of the workpiece 32' to be exposed is replaced by the month b, and the book can be achieved. The purpose of the invention. 9 The above is only the preferred embodiment of the present invention, and when the infertility b is limited to the scope of the present invention, that is, the simple equivalent of the patent scope and the description of the invention according to the present invention. Variations and modifications are still within the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a general exposure machine; FIG. 2 is a schematic view similar to the drawing, illustrating that the telescopic device pushes up the workpiece to be exposed to flatten the reticle; FIG. 3 is a carrying device of the present invention. 4 is a perspective view of a preferred embodiment of the exposure machine with a carrying device of the present invention; FIG. 5 is an exploded view of the exposure machine of the present invention having a carrying device; FIG. 6 is a partial enlarged view of a preferred embodiment of an exposure machine having a carrying device according to the present invention, illustrating a carrier plate assembled to a second base of the base, and 13 201133703 The first positioning member is a positioning post, and the second positioning member is a positioning hole; 局部 a partial enlarged view of another embodiment of the exposure machine of the present invention having a carrying device, illustrating that the first positioning member is a positioning hole 'The second positioning member is a positioning post; FIG. 8 is a cross-sectional view of a preferred embodiment of the exposure machine with a carrying device of the present invention; FIG. 8 is a cross-sectional view of a preferred embodiment of the exposure machine having a carrying device FIG. 10 is a cross-sectional view of the exposure machine with the carrying device of the present invention, illustrating the pushing member at the second height position; FIG. 11 is a view of the present invention FIG. 12 is a schematic view of a preferred embodiment of an exposure machine having a carrying device, illustrating a susceptor, a carrier, and a position to be exposed; FIG. 12 is a schematic view of a preferred embodiment of the exposure machine having a carrying device of the present invention. The workpiece to be exposed is pressed against the bottom surface of the reticle; and a preferred embodiment of the exposure machine having a carrying device of the present invention, the operation is not intended to describe that the carrying device can replace the carrying plate having a bearing surface corresponding to the size of the workpiece to be exposed. 14 201133703

【主要元件符號說明】 2 ......... •曝光機 429…… •容置空間 21........ •機台 430…… •第一穿孔 22........ •承載件 431…… •侧向開口 23........ •曝光頭 5、5,… •承載盤 31........ •光罩 51 ' 5Γ •承載面 32 > 325 •待曝光工件 52........ •底面 400…… •承載裝置 53........ •第—定位件 A ......... •肖 ηϊτ c A........ Η 巷座 狀》"IL退 41........ •第一座體 55........ •第一溝槽 410…… 56........ •第二溝槽 42........ •第二座體 57........ •第二穿孔 420…… •弧形接合部 6 ......... •驅動機構 421…… •頂面 61........ •驅動馬達 422…… •凹槽 62........ •活動架 423…… •槽壁 71........ •第一氣嘴 424…… •第一定位件 72........ •第二氣嘴 425…… •第一通孔 8 ......... •頂推件 426…… •第一槽部 81........ •頂針 427…… •第二槽部 9 ......... •汽缸 428…… •第二通孔 I、II … •箭頭 15[Explanation of main component symbols] 2 ......... • Exposure machine 429... • Accommodation space 21........ • Machine table 430... • First perforation 22.... .... • Carrier 431... • Lateral opening 23........ • Exposure head 5, 5,... • Carrier tray 31........ • Photomask 51 ' 5Γ • Bearing surface 32 > 325 • workpiece to be exposed 52 ..... • bottom surface 400... • carrying device 53........ • first - positioning member A ........ • 肖ηϊτ c A........ Η Lane shape” "IL retreat 41........ • First seat 55........ • First ditch Slot 410... 56........ • Second groove 42........ • Second seat 57........ • Second perforation 420... • Arc Shape joint 6 ......... • Drive mechanism 421... • Top surface 61........ • Drive motor 422... • Groove 62........ • Moving frame 423... • Groove wall 71........ • First air nozzle 424... • First positioning member 72........ • Second air nozzle 425... • First Through hole 8 ......... • Pusher 426... • First groove portion 81........ • Thimble 427... • Second groove portion 9... ... Cylinder 428 ...... • second through-hole I, II ... • 15 arrow

Claims (1)

201133703 七、申請專利範圍: 1. 一種承載裝置,適於承載一待曝光工件,該承載裝置包 含: 一基座,包括一頂面,及複數個設置於該頂面的第 一定位件;及 一可更換的承載盤,包括一可承載該待曝光工件並 與其尺寸相當的承載面、一可抵接於該頂面的底面’及 複數個設置於該底面且可拆卸地與所述第一定位件相接 合的第二定位件,藉此,當該待曝光工件尺寸改變時, 便能替㈣有對應該待曝光工件尺寸之承載面的該可更 換的承載盤。 2·根據中請專利範圍第}項所述之承載裝置,其中,各該 第-定位件為定位柱或定位孔其中之…各該第二定位 件為定位柱或定位孔其中另一。 •根據中π專利範圍第i項所述之承載裝置,其中,該基 座還包括一由該頂面向下凹陷的凹槽,及--端與該凹 :、連通的第-通孔,該承载裝置還包含—安裝於該第 另《的第-氣嘴’該第—氣嘴可對該第一通孔 及該凹槽抽氣’使該承載盤被吸附於該基座的頂面。 •請專利範圍第1項所述之承载裝置,其中,該基 括--端形成於該頂面的第二通孔,該承載盤還 π貫穿該承載面與该底面且與該第二通孔連通的氣 =道^承載裝置還包含—安裝於該第二通孔另一端 氣嘴’ δ亥第一氣嘴可對該第二通孔及該氣體流道 16 201133703 抽氣,使該待曝光工件被吸附於該承載盤的承載面。 5_根據申請專利範圍帛4項所述之承裁裝置,其中,該承 載盤還包括一形成於該承載面上的第一溝槽,及複數個 形成於該承載面上且與該第一溝槽相連通的第二溝槽, 該第-溝槽呈十字形且中心處與該氣體流道相連通,所 述第二溝槽呈同心圓狀地排列且分別具有不同的直徑。 6. 根據中請專利範圍第3項所述之承载裝置,其中,該基 座還包括—一端形成於該頂面的第二通孔,該承載盤: 包括-貫穿該承載面與該底面且與該第二通孔連通的氣 體流道’該承載裝置還包含一安裝於該第二通孔另一端 的第二氣嘴,該第二氣嘴可對該第二通孔及該氣體流道 抽氣,使該待曝光工件被吸附於該承載盤的承載面。 7. 根據中請專利範圍第6項所述之承載裝置其中,該承 載盤還包括-形成於該承載面上的第—溝槽,及複數個 形成於該承載面上且與該第一溝槽相連通的第二溝槽, /第屢槽呈十子形且中心處與該氣體流道相連通,所 述第二溝槽呈同心圓狀地排列且分別具有不同的直徑。 8. 根據申請專利範圍第6項所述之承載裝置,其中,該基 座還包括-位於該頂面下方的容置空間,及複數個形成 於該頂面並與該容置空間連通的第一穿孔,該承載盤還 包括複數個貫穿該承載面與該底面且與所述第一穿孔連 通的第二穿孔,該承載裝置還包含一穿伸於該容置空間 内的頂推件’該頂推件包括複數根分财設於所述第一 、第二mx頂抵該待曝光卫件的頂針,該頂推件可 17 201133703 在一各該頂針穿出該承載面的第一高度位置及一各該 9頂針位於該承載面下方的第二高度位置之間往復運動。 根據申請專利範圍第8項所述之承載裝置.,還包含一設 置於該基座上並可驅動該頂推件在該第一高度位置與該 第二高度位置之間往復運動的汽缸。 ·〜種具有承載裝置的曝光機,包括: 一機台; 一承载件’設置於該機台上用以承載一光罩; 一曝光頭,設置於該機台上且位於該承載件上方; 一承載裝置,適於承載一待曝光工件,該承載裝置 包含: 一基座,設置於該承載件下方並包括一頂面, 及複數個設置於該頂面的第一定位件; 一驅動機構,安裝於該基座底端並可驅使該基 座上下往復運動;及 -可更換的承載盤,包括一可承載該待曝光工 件並與其尺寸相當的承載面、一可抵接於該頂面的 底面,及複數個設置於該底面且可拆卸地與所述第 -定位件相接合的第二定位件,藉此,當該待曝光 工件尺寸改變時,便能替換具有對應該待曝光工件 尺寸之承載面的該可更換的承載盤。 18201133703 VII. Patent application scope: 1. A carrying device adapted to carry a workpiece to be exposed, the carrying device comprising: a base comprising a top surface, and a plurality of first positioning members disposed on the top surface; A replaceable carrier disk includes a bearing surface capable of carrying the workpiece to be exposed and corresponding in size, a bottom surface abuttable to the top surface, and a plurality of the bottom surface disposed on the bottom surface and detachably coupled to the first The second positioning member is engaged with the positioning member, whereby when the size of the workpiece to be exposed is changed, the replaceable carrier tray having the bearing surface corresponding to the size of the workpiece to be exposed can be replaced. The carrier device according to the above-mentioned claim, wherein each of the first positioning members is a positioning post or a positioning hole, wherein each of the second positioning members is one of a positioning post or a positioning hole. The carrier device according to the item π, wherein the base further includes a recess recessed downwardly from the top surface, and a first through hole communicating with the recess: The carrying device further includes - mounted to the first "air nozzle", the first air nozzle can pump the first through hole and the recess to make the carrier disk adsorbed to the top surface of the base. The carrier device of claim 1, wherein the base-shaped end is formed in the second through hole of the top surface, the carrier plate further π penetrates the bearing surface and the bottom surface and the second through The gas communicating device of the hole further comprises: a gas nozzle installed at the other end of the second through hole. The first gas nozzle of the second through hole can pump the second through hole and the gas flow channel 16 201133703 to make the waiting The exposed workpiece is adsorbed to the bearing surface of the carrier. 5) The receiving device according to claim 4, wherein the carrier further comprises a first groove formed on the bearing surface, and a plurality of the first groove formed on the bearing surface and the first a second trench in which the trenches are in communication, the first trench is in a cross shape and communicates with the gas flow channel at a center, and the second trenches are arranged concentrically and have different diameters respectively. 6. The carrier device of claim 3, wherein the base further comprises a second through hole formed at one end of the top surface, the carrier disk comprising: a through-bearing surface and the bottom surface The gas flow passage communicating with the second through hole includes a second nozzle mounted to the other end of the second through hole, the second nozzle being the second through hole and the gas flow passage The air is sucked so that the workpiece to be exposed is adsorbed to the bearing surface of the carrier. 7. The carrier device of claim 6, wherein the carrier tray further comprises a first groove formed on the bearing surface, and a plurality of the plurality of grooves formed on the bearing surface and the first groove The second groove communicating with the groove has a ten-shaped shape and communicates with the gas flow path at the center, and the second grooves are arranged concentrically and have different diameters respectively. 8. The carrier device of claim 6, wherein the base further comprises an accommodating space located below the top surface, and a plurality of locating spaces formed on the top surface and communicating with the accommodating space a plurality of perforations, the carrier tray further includes a plurality of second through holes extending through the bearing surface and the bottom surface and communicating with the first through hole, the carrying device further comprising a pushing member extending through the receiving space The pushing member includes a plurality of thimbles disposed on the first and second mx against the guard to be exposed, and the pushing member 17 201133703 is at a first height position of each of the thimbles passing through the bearing surface And each of the 9 thimbles reciprocates between a second height position below the bearing surface. The carrying device of claim 8 further comprising a cylinder disposed on the base and drivable to reciprocate between the first height position and the second height position. An exposure machine having a carrying device, comprising: a machine table; a carrier member disposed on the machine table for carrying a light cover; an exposure head disposed on the machine table and located above the carrier member; a carrying device is adapted to carry a workpiece to be exposed, the carrying device comprises: a base disposed under the carrying member and including a top surface, and a plurality of first positioning members disposed on the top surface; a driving mechanism Mounting on the bottom end of the base and driving the base to reciprocate up and down; and - the replaceable carrier tray includes a bearing surface capable of carrying the workpiece to be exposed and corresponding in size, and abutable to the top surface a bottom surface, and a plurality of second positioning members disposed on the bottom surface and detachably engaging the first positioning member, thereby replacing the workpiece corresponding to the workpiece to be exposed when the size of the workpiece to be exposed is changed The replaceable carrier tray of the sized bearing surface. 18
TW99108158A 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same TW201133703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Publications (2)

Publication Number Publication Date
TW201133703A true TW201133703A (en) 2011-10-01
TWI405296B TWI405296B (en) 2013-08-11

Family

ID=46751287

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99108158A TW201133703A (en) 2010-03-19 2010-03-19 Carrying apparatus and exposure machine having the same

Country Status (1)

Country Link
TW (1) TW201133703A (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4775877A (en) * 1985-10-29 1988-10-04 Canon Kabushiki Kaisha Method and apparatus for processing a plate-like workpiece
JP3678079B2 (en) * 1999-10-26 2005-08-03 ウシオ電機株式会社 Contact exposure apparatus having a mask / workpiece interval setting means
SG103303A1 (en) * 2000-07-07 2004-04-29 Nikon Corp Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
US20040130695A1 (en) * 2003-01-08 2004-07-08 Vyacheslav Ananyev Kit for converting a photolithography machine for treating semiconductor wafers of certain diameter to a machine for treating semiconductor wafers of larger diameter
US7352440B2 (en) * 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography

Also Published As

Publication number Publication date
TWI405296B (en) 2013-08-11

Similar Documents

Publication Publication Date Title
TWI590372B (en) Single ultra-planar wafer table structure for both wafers and film frames
US7650691B2 (en) Component supply head device and component mounting head device
TWI443781B (en) Chip bonding apparatus
JP2016500199A (en) Apparatus for orienting a wafer onto a wafer carrier
JP2018014361A (en) Support body separation device and support body separation method
JP5678277B2 (en) Electronic component mounting equipment
JP5303135B2 (en) Wafer processing equipment
JPWO2013108394A1 (en) Mounting head holding device for component mounter
JP2009147171A5 (en)
JP6051411B2 (en) Paste supply apparatus, screen printer and paste supply method
TW201133703A (en) Carrying apparatus and exposure machine having the same
JP2011183501A (en) Dressing method of cutting blade
JPH02155244A (en) Feeder for chip
JP6019406B2 (en) Electronic component mounting apparatus and electronic component mounting method
TWI527656B (en) Assembling method of lens module
JP5768213B2 (en) Screen printing machine and screen printing method
WO2019030864A1 (en) Component mounting machine
JP2022098875A (en) Chuck table mechanism
US20140366797A1 (en) Paste supply apparatus and screen printing machine
JPH05326672A (en) Chip plunge-up device
WO2019230204A1 (en) Scribe device and tool change mechanism provided to scribe device
JPH0625964Y2 (en) Die ejector device
KR101815048B1 (en) Laser marking apparatus and laser marking method using the same
JP2001358450A (en) Solder ball mounting device
JP5123766B2 (en) Exposure equipment