KR20010021856A - 칩-기판-어셈블리를 제조하기 위한 방법 및 장치 - Google Patents

칩-기판-어셈블리를 제조하기 위한 방법 및 장치 Download PDF

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KR20010021856A
KR20010021856A KR1020007000420A KR20007000420A KR20010021856A KR 20010021856 A KR20010021856 A KR 20010021856A KR 1020007000420 A KR1020007000420 A KR 1020007000420A KR 20007000420 A KR20007000420 A KR 20007000420A KR 20010021856 A KR20010021856 A KR 20010021856A
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component
solder
chip
substrate
eutectic
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KR1020007000420A
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English (en)
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KR100454490B1 (ko
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한스외르크 라이허트
마가레테 데커스
라이너 찬너
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칼 하인쯔 호르닝어
지멘스 악티엔게젤샤프트
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Publication of KR20010021856A publication Critical patent/KR20010021856A/ko
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    • H01L23/00—Details of semiconductor or other solid state devices
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    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550 degrees C
    • B23K35/3013—Au as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/32—Selection of soldering or welding materials proper with the principal constituent melting at more than 1550 degrees C
    • B23K35/322—Selection of soldering or welding materials proper with the principal constituent melting at more than 1550 degrees C a Pt-group metal as principal constituent
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Abstract

본 발명은, 제 1 성분 X가 특히 금 등의 귀금속을 포함하며, 제 2 성분 Y가 납땜 과정시 결합될 재료 또는 층에서 반응 또는 용융에 의해 소비되는, 적어도 2개의 금속 함유 성분 X 및 Y를 함유하는 2성분 또는 다성분의 땜납을 사용하여 합금시키거나 경질 납땜함으로써 칩-기판-어셈블리를 제조하기 위한 방법 및 장치에 관한 것이다. 상기 땜납은 제 2 성분 Y의 과공융 농도를 갖는다. 또한, 본 발명은 칩-기판-어셈블리를 제조하기 위한 땜납, 그리고 합금 또는 경질 납땜에 의해 기판상에 고정된 반도체칩(1)을 갖는 반도체 소자에 관한 것이다.

Description

칩-기판-어셈블리를 제조하기 위한 방법 및 장치 {METHOD AND DEVICE FOR PRODUCING A CHIP-SUBSTRATE ASSEMBLY}
통상적으로 칩-본딩 또는 다이-본딩으로 일컫어지는, 기판상의 반도체칩 후면의 결합시, 충분한 기계적 고정 및 우수한 열전도성 및 전기 전도성의 측면에 대한 요구 사항이 사용 용도에 따라 개별적으로 또는 공통으로 충족되어야 한다. 칩과 기판의 일치는 열부하시 팽창 특성에 대한 2개의 결합 파트너의 매칭에 중요한 역할을 한다. 최근에는 3가지의 상이한 칩고정 방법이 일반적이다: 합금(경질 납땜), 납땜(연질 납땜) 및 접착. 본 발명에 따른 바람직한 사용 영역은 합금 또는 경질 납땜이다; AuSi-시스템에서 공지된 본딩 방법에 있어서, 결합되는 결합 파트너의 가장 낮은 온도에서 반도체칩과 기판의 공융(eutectic) 결합이 이루어진다. 단일 성분 Au 및 Si의 용융 온도보다 매우 낮은 온도로 합금이 형성된다. 이 온도는 그렇게 높지 않아서, 반도체 구조 및 이에 따른 전기적 기능이 손상되지 않는다. 합금 과정시 칩 및 기판은 상기 온도로 가열되고, 약한 압력이 가해지며, 칩이 콘택의 향상을 위해 원형으로 움직인다. 상(phase) 다이어그램의 액체-고체-곡선에 상응하는 용융점에 도달할 때, 땜납이 용융되고 본딩 작업이 이루어진다. 가열 공정은 일반적으로 비용적 이유로 인해 매우 신속히 이루어지며 열역학적 균형 상태에서는 진행되지 않는다. 이와 반대로 냉각 과정은 천천히 진행된다. 경화점에서 다시 공융 혼합 특성이 얻어질 때 까지, 잉여 성분의 결정화가 이루어진다. 공융 용융물의 경화 동안 2개의 성분이 분리되어 결정화되어, 경화된 공융 혼합물의 구조가 동일하게 배분된 Si-결정 및 Au-결정을 나타낸다.
칩-기판이 가능한 균일하게 평평하게 결합됨으로써 그리고 자체 변형이 적어 칩 파손 가능성이 최소화된다. 결합의 품질은 납땜 용액 특성 및 납땜 경화와 사용 온도의 온도차에 의한 변형에 의해 제어된다.
본 발명은 2개의 금속 함유 성분 X 및 Y를 함유하는 땜납을 사용하여 합금시키거나 경질 납땜(hard solder)함으로써 칩-기판-어셈블리를 제조하기 위한 방법 및 장치에 관한 것이며, 여기서 제 1 성분 X는 특히 금 등의 귀금속을 포함한다. 본 발명은 또한 칩-기판-어셈블리를 제조하기 위한 땜납 및 기판상에 합금 또는 경질 납땜에 의해 고정된 반도체칩을 갖는 반도체 소자에 관한 것이다.
도 1은 AuSn의 상 다이어그램이고,
도 2a는 본 발명에 따른 과공융 AuSn-납을 사용하여 리드 프레임상에 합금된 반도체칩의 개략도이며,
도 2b는 도 2a의 X 부분의 확대 단면도이다.
본 발명의 목적은, 특히 합금시키거나 경질 납땜함으로써 칩-기판-어셈블리를 형성하기 위한 장치 및 방법 그리고 이에 대해 칩파손의 위험이 가능한 적은 적합한 땜납을 제공하는 것이다.
상기 목적은 방법적으로는 청구항 제 1항에 의해 장치적으로는 제 8항에 의해 달성된다. 본 발명에 따른 땜납은 제 11항에 그리고 본 발명에 따른 땜납을 사용하여 고정된 반도체 소자는 제 13항에 제시된다.
본 발명에 따라, 땜납이 제 2 성분 Y의 과공융 농도를 갖는다. 이때, 성분 Y는, 납땜 과정시 결합될 층에서의 반응 또는 용융에 의해 소비되는 2가지 또는 그 이상의 성분을 갖는 땜납의 성분을 의미한다. 이것은 일관되게 다성분 시스템에서도 적용된다.
여기서, 낮은 온도에서 용융되는 매우 바람직한 땜납은 과공융 농도의 주석을 갖는 AuSn-납을 의미한다. AuSn-땜납은 바람직하게 20% 이상의 Sn-중량 비율을 갖는다.
본 발명은 하기의 장점을 제공한다:
- 과공융 Sn-농도를 갖는 AuSn-납의 사용은 웨이퍼 후면에서 증착되는 공지된 공융 AuSi-납 또는 공융 AuGe-납에 비해 100℃ 까지 감소된 칩 합금 온도를 제공하며, 이것에 의해 열변형이 적어지고 이에 따라 칩파손 위험이 감소된다. 또한, 본 발명은 납층의 동질성(homogeneity) 및 이용성을 향상시킨다.
- 본 발명은 공융 AuSn-납에 비해 무엇보다 낮은 합금 온도의 장점을 제공한다. 공융 AuSn에서는 코팅 및 조립 과정 동안 Sn이 감소된다. 왜냐 하면, AuSn과 Si 사이에 필요한 배리어 및 (예를 들어 Ag로 이루어진) 리드 프레임(Leadframe)-표면이 조립시 Sn을 수용하기 때문이다. 따라서, AuSn-납의 용융 온도가 상승한다. 무엇보다 스퍼터링된 공융 AuSn에서 결합에 필요한 합금 온도는 거의 AuSi-합금에서와 같이 높다.
- 본 발명은 에폭시-접착제에 비해 어셈블리의 향상된 열전도성, 어셈블리의 향상된 동질성을 제공하고 무엇보다 조립시 접착제 및 접착 과정이 생략되는 장점이 있다.
- 본 발명에 따른 방법에서는 예비 형태를 갖는 땜납에 비해 무엇보다 조립시 비용이 절약된다.
땜납은 바람직하게 칩의 후면에서 특히 스퍼터링에 의해 데포짓된다. 이것은 물론 반도체칩의 웨이퍼 결합시 이루어져서, 칩 컨셉이 웨이퍼 결합시 존재하는 칩을 포함한다.
데포지션시 사용된 타겟은 성분 X 대 Y의 중량 조성비가 70 대 30, 즉 바람직하게 AuSn = 70/30의 조성비를 갖는 장점이 있다. 납층은 약 1 ㎛ 내지 약 2 ㎛의 두께로, 바람직하게 1.5 ㎛의 두께로 웨이퍼 후면에 스퍼터링된다.
첨부한 도면을 참고로 본 발명의 실시예를 자세히 살펴보면 하기와 같다.
도 1에 도시된 바와 같이, AuSn 시스템에 있어서 공융 온도는 278℃이며 이에 상응하는 조성은 20%의 Sn과 80%의 Au(중량 퍼센트)이다. 따라서, 단일 성분의 용융 온도 이하의 온도에서 합금이 형성된다. 본 발명의 중요한 사상에 따라 주석의 과공융 농도를 갖는 AuSn-납이 사용되어, AuSn-땜납이 20% 이상의 Sn-중량비를 갖는다. 따라서, SOT-하우징에서의 조립을 위해 380℃ 이하의 온도에서 땜납의 충분한 얇은 흐름이 얻어진다. 왜냐 하면, 인접한 금속층으로의 Sn 확산에 의해 AuSn의 조성이 주석이 풍부한 상으로부터 공융점쪽으로 이동하고, 따라서 공융 혼합물 위에 위치하는 금-부화 땜납상(gold-rich solder phase)이 억제된다. AuSn-혼합물의 용융 온도는 Au-과잉시 매우 급하게 상승하고, Sn-부화시 용융 온도 상승은 매우 적다. 본 발명에 따른 Sn-부화 땜납의 Sn-손실에 의해 납땜 과정시 연속적인 용융점 하강이 이루어진다. 납땜 과정이 개선된다. 특히, Sn-감소가 이루어지는 콘택점, 납-리드 프레임(예를 들어 Ag)에서 국부적으로 용융 온도가 하강하고, 이것은 납의 흐름 특성을 향상시킨다. 이러한 이유에서 Sn을 과하게 제공함으로써 낮은 온도에서 반복될 수 있는 조립 조건이 얻어진다. 특히, 웨이퍼 후면 코팅시에 일반적인 얇은 땜납-층에서 이러한 효과가 강하게 나타난다.
도 2a 및 도 2b에는 합금시키거나 경질 납땜함으로써 반도체칩(1)의 어셈블리가 금속 시스템 캐리어(3)의 중앙 "섬"(2)상에 조립된 것을 도시한다. 리드 프레임으로 표시된, 예비 고정된 금속 시스템 지지부는 특히 플라스틱 하우징에 사용하기 위한 매우 넓게 뻗는 기판 형태이다. 도 2b에 따른 확대도에서는 층열이 자세히 도시된다. 반도체칩(1)의 후면에는 바람직하게 Ti/Pt를 포함하는 접착 배리어 또는 확산 배리어(4)가 제공된다. 도면 부호 5는 통상적으로 1.5 ㎛의 두께로 웨이퍼 후면에 스퍼터링된 땜납층을 표시한다. 이에 따라 칩-기판-어셈블리의 저항이 충분히 낮기 때문에, 예를 들어 AuAs로 이루어진 도핑층 또는 콘택 주입층(6)이 미리 첨가되는 것이 필요할 수 있다.

Claims (13)

  1. 제 1 성분 X가 특히 금 등의 귀금속을 포함하며, 제 2 성분 Y가 납땜 과정시 결합될 재료 또는 층에서의 반응 또는 용융에 의해 소비되는, 적어도 2개의 금속 함유 성분 X 및 Y를 함유하는 2성분 또는 다성분의 땜납을 사용하여 합금시키거나 경질 납땜함으로써 칩-기판-어셈블리를 제조하기 위한 방법에 있어서,
    땜납(5)이 제 2 성분 Y의 과공융 농도를 갖는 것을 특징으로 하는 방법.
  2. 제 1항에 있어서,
    땜납의 제 2 성분 Y가 과공융 농도를 갖는 주석을 포함하는 것을 특징으로 하는 방법.
  3. 제 1항 또는 제 2항에 있어서,
    과공융 Sn-농도를 갖는 땜납으로서 금-주석-화합물(AuSn)을 사용하는 것을 특징으로 하는 방법.
  4. 제 3항에 있어서, 사용된 AuSn-땜납이 20% 이상의 Sn-중량비를 갖는 것을 특징으로 하는 방법.
  5. 제 1항 내지 제 4항 중 어는 한 항에 있어서,
    땜납을 스퍼터링에 의해 칩(1)의 후면상에 데포짓하는 것을 특징으로 하는 방법.
  6. 제 5항에 있어서, 데포짓시 사용된 타겟의 성분 X 대 Y의 중량비적 조성이 70 대 30인 것을 특징으로 하는 방법.
  7. 제 5항 또는 제 6항에 있어서,
    땜납을 약 1 ㎛ 내지 약 2 ㎛의 두께로, 특히 약 1.5 ㎛의 두께로 칩(1)의 후면에 코팅, 특히 스퍼터링하는 것을 특징으로 하는 방법.
  8. 제 1 성분 X가 특히 금 등의 귀금속을 포함하며, 제 2 성분 Y가 납땜 과정에서 결합될 재료 또는 층에서의 반응 또는 용융에 의해 소비되는, 적어도 2개의 금속 함유 성분 X 및 Y를 함유하는 2성분 또는 다성분의 땜납을 칩(1)의 후면에 얇은 층으로 데포짓하기 위한 장치에 있어서,
    타겟에 과공융 농도를 갖는 제 2 성분 Y가 제공되는 것을 특징으로 하는 장치.
  9. 제 8항에 있어서,
    땜납-타겟의 제 2 성분 Y가 과공융 농도를 갖는 주석을 포함하는 것을 특징으로 하는 장치.
  10. 제 9항에 있어서,
    타겟 성분 X 대 Y의 중량비적 조성이 70 대 30인 것을 특징으로 하는 장치.
  11. 제 1 성분 X가 특히 금 등의 귀금속을 포함하고, 제 2 성분 Y가 납땜 과정에서 결합될 재료 또는 층에서의 반응 또는 용융에 의해 소비되는, 적어도 2개의 금속 함유 성분 X 및 Y를 함유하는 2성분 또는 다성분의, 칩-기판-어셈블리를 제조하기 위한 땜납에 있어서,
    제 2 성분 Y의 과공융 농도를 갖는 것을 특징으로 하는 땜납.
  12. 제 10항에 있어서,
    땜납의 제 2 성분 Y가 과공융 농도를 갖는 주석을 포함하는 것을 특징으로 하는 땜납.
  13. 합금시키거나 경질 납땜함으로써 기판상에 고정된 반도체칩(1)을 갖는 반도체 소자에 있어서,
    칩-기판-어셈블리를 위한 땜납이 청구항 제 11항 또는 제 12항에 따라 형성되고, 과공융 Sn-농도를 갖는 금-주석-화합물(AuSn)을 포함하는 것을 특징으로 하는 반도체 소자.
KR10-2000-7000420A 1997-07-14 1998-06-24 칩-기판 접촉부를 제조하기 위한 방법 및 장치 KR100454490B1 (ko)

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