KR20010012970A - 진공하에 다이아몬드형 탄소 코팅막의 형성방법 - Google Patents
진공하에 다이아몬드형 탄소 코팅막의 형성방법 Download PDFInfo
- Publication number
- KR20010012970A KR20010012970A KR1019997010940A KR19997010940A KR20010012970A KR 20010012970 A KR20010012970 A KR 20010012970A KR 1019997010940 A KR1019997010940 A KR 1019997010940A KR 19997010940 A KR19997010940 A KR 19997010940A KR 20010012970 A KR20010012970 A KR 20010012970A
- Authority
- KR
- South Korea
- Prior art keywords
- cathode
- component
- carbon
- plasma
- diamond
- Prior art date
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 83
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 54
- 238000000576 coating method Methods 0.000 title claims abstract description 50
- 239000011248 coating agent Substances 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 33
- 150000002500 ions Chemical class 0.000 claims abstract description 38
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 29
- 239000010439 graphite Substances 0.000 claims abstract description 29
- 238000010891 electric arc Methods 0.000 claims abstract description 15
- 238000004544 sputter deposition Methods 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims abstract description 5
- 230000000153 supplemental effect Effects 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 229910021645 metal ion Inorganic materials 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 239000011651 chromium Substances 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000012300 argon atmosphere Substances 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 239000011574 phosphorus Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 238000012958 reprocessing Methods 0.000 claims 1
- 239000003990 capacitor Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910052743 krypton Inorganic materials 0.000 description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 3
- -1 titanium ions Chemical class 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 210000003709 heart valve Anatomy 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 229910001095 light aluminium alloy Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
- C23C14/0611—Diamond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU97108626 | 1997-05-30 | ||
| RU97108626A RU2114210C1 (ru) | 1997-05-30 | 1997-05-30 | Способ формирования углеродного алмазоподобного покрытия в вакууме |
| PCT/NO1998/000158 WO1998054376A1 (en) | 1997-05-30 | 1998-05-28 | Method of forming diamond-like carbon coating in vacuum |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20010012970A true KR20010012970A (ko) | 2001-02-26 |
Family
ID=20193334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019997010940A KR20010012970A (ko) | 1997-05-30 | 1998-05-28 | 진공하에 다이아몬드형 탄소 코팅막의 형성방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6261424B1 (de) |
| EP (1) | EP0985057A1 (de) |
| JP (1) | JP2002501575A (de) |
| KR (1) | KR20010012970A (de) |
| CN (1) | CN1258322A (de) |
| AU (1) | AU7678598A (de) |
| RU (1) | RU2114210C1 (de) |
| WO (1) | WO1998054376A1 (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040022639A (ko) * | 2002-09-09 | 2004-03-16 | 주식회사 네오바이오텍 | 탄소계 물질 박막 형성방법 |
| KR100465738B1 (ko) * | 2002-07-04 | 2005-01-13 | 한국과학기술연구원 | 다층 경질 탄소박막과 그 제조방법 |
Families Citing this family (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
| US6475573B1 (en) | 1999-05-03 | 2002-11-05 | Guardian Industries Corp. | Method of depositing DLC inclusive coating on substrate |
| US6280834B1 (en) | 1999-05-03 | 2001-08-28 | Guardian Industries Corporation | Hydrophobic coating including DLC and/or FAS on substrate |
| US6368664B1 (en) | 1999-05-03 | 2002-04-09 | Guardian Industries Corp. | Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon |
| US6277480B1 (en) | 1999-05-03 | 2001-08-21 | Guardian Industries Corporation | Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method |
| DE19933707A1 (de) * | 1999-07-19 | 2001-01-25 | Johannes Moeller Hamburg Engin | Beschickungsvorrichtung für feinteiliges oder pulverförmiges Material |
| JP4560964B2 (ja) | 2000-02-25 | 2010-10-13 | 住友電気工業株式会社 | 非晶質炭素被覆部材 |
| US6359388B1 (en) | 2000-08-28 | 2002-03-19 | Guardian Industries Corp. | Cold cathode ion beam deposition apparatus with segregated gas flow |
| EP1184119A1 (de) * | 2000-08-31 | 2002-03-06 | N.V. Bekaert S.A. | Werkzeug zum Schneiden von organischem Material mit einem scharfpunktigen Querschnitt aufweisenden und verdrillten Schneiddraht |
| US6566983B2 (en) * | 2000-09-02 | 2003-05-20 | Lg Electronics Inc. | Saw filter using a carbon nanotube and method for manufacturing the same |
| US6602371B2 (en) | 2001-02-27 | 2003-08-05 | Guardian Industries Corp. | Method of making a curved vehicle windshield |
| US6613198B2 (en) | 2001-04-18 | 2003-09-02 | James F. Garvey | Pulsed arc molecular beam process |
| US20050034668A1 (en) * | 2001-03-22 | 2005-02-17 | Garvey James F. | Multi-component substances and apparatus for preparation thereof |
| US6797336B2 (en) * | 2001-03-22 | 2004-09-28 | Ambp Tech Corporation | Multi-component substances and processes for preparation thereof |
| US6815690B2 (en) * | 2002-07-23 | 2004-11-09 | Guardian Industries Corp. | Ion beam source with coated electrode(s) |
| US6988463B2 (en) * | 2002-10-18 | 2006-01-24 | Guardian Industries Corp. | Ion beam source with gas introduced directly into deposition/vacuum chamber |
| US6812648B2 (en) | 2002-10-21 | 2004-11-02 | Guardian Industries Corp. | Method of cleaning ion source, and corresponding apparatus/system |
| US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
| FR2849867B1 (fr) * | 2003-01-10 | 2005-03-25 | Centre Nat Rech Scient | Croissance diamant a grande vitesse par plasma micro-onde en regime pulse. |
| CN101580928B (zh) * | 2003-02-26 | 2012-07-18 | 住友电气工业株式会社 | 无定形碳膜及其制备方法以及无定形碳膜涂敷的材料 |
| US20040172832A1 (en) * | 2003-03-04 | 2004-09-09 | Colin Clipstone | Razor blade |
| RU2240376C1 (ru) * | 2003-05-22 | 2004-11-20 | Ооо "Альбатэк" | Способ формирования сверхтвердого аморфного углеродного покрытия в вакууме |
| JP2005008851A (ja) * | 2003-05-29 | 2005-01-13 | Nissan Motor Co Ltd | 硬質炭素薄膜付き機械加工工具用切削油及び硬質炭素薄膜付き機械加工工具 |
| US7033670B2 (en) * | 2003-07-11 | 2006-04-25 | Siemens Power Generation, Inc. | LCT-epoxy polymers with HTC-oligomers and method for making the same |
| US7781063B2 (en) | 2003-07-11 | 2010-08-24 | Siemens Energy, Inc. | High thermal conductivity materials with grafted surface functional groups |
| JP4863152B2 (ja) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
| EP1666573B1 (de) | 2003-08-06 | 2019-05-15 | Nissan Motor Company Limited | Reibungsarmer gleitmechanismus und reibungsverringerungsverfahren |
| JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
| US7771821B2 (en) | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
| EP1508611B1 (de) | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Getriebe enthaltend eine getriebeölzusammensetzung |
| US7553781B2 (en) * | 2004-06-15 | 2009-06-30 | Siemens Energy, Inc. | Fabrics with high thermal conductivity coatings |
| US8216672B2 (en) * | 2004-06-15 | 2012-07-10 | Siemens Energy, Inc. | Structured resin systems with high thermal conductivity fillers |
| US7309526B2 (en) * | 2004-06-15 | 2007-12-18 | Siemens Power Generation, Inc. | Diamond like carbon coating on nanofillers |
| US20050277721A1 (en) | 2004-06-15 | 2005-12-15 | Siemens Westinghouse Power Corporation | High thermal conductivity materials aligned within resins |
| US7553438B2 (en) * | 2004-06-15 | 2009-06-30 | Siemens Energy, Inc. | Compression of resin impregnated insulating tapes |
| US7592045B2 (en) * | 2004-06-15 | 2009-09-22 | Siemens Energy, Inc. | Seeding of HTC fillers to form dendritic structures |
| US20080050580A1 (en) * | 2004-06-15 | 2008-02-28 | Stevens Gary C | High Thermal Conductivity Mica Paper Tape |
| US7776392B2 (en) * | 2005-04-15 | 2010-08-17 | Siemens Energy, Inc. | Composite insulation tape with loaded HTC materials |
| US20050274774A1 (en) * | 2004-06-15 | 2005-12-15 | Smith James D | Insulation paper with high thermal conductivity materials |
| DE102004033321B4 (de) * | 2004-07-09 | 2006-03-30 | Brueninghaus Hydromatik Gmbh | Axialkolbenmaschine mit Verschleißschutzschicht |
| US7651963B2 (en) * | 2005-04-15 | 2010-01-26 | Siemens Energy, Inc. | Patterning on surface with high thermal conductivity materials |
| US7846853B2 (en) * | 2005-04-15 | 2010-12-07 | Siemens Energy, Inc. | Multi-layered platelet structure |
| US20060280946A1 (en) * | 2005-05-20 | 2006-12-14 | United Technologies Corporation | Metal-containing diamond-like-carbon coating compositions |
| US7655295B2 (en) | 2005-06-14 | 2010-02-02 | Siemens Energy, Inc. | Mix of grafted and non-grafted particles in a resin |
| US7781057B2 (en) * | 2005-06-14 | 2010-08-24 | Siemens Energy, Inc. | Seeding resins for enhancing the crystallinity of polymeric substructures |
| US7955661B2 (en) * | 2005-06-14 | 2011-06-07 | Siemens Energy, Inc. | Treatment of micropores in mica materials |
| US7851059B2 (en) * | 2005-06-14 | 2010-12-14 | Siemens Energy, Inc. | Nano and meso shell-core control of physical properties and performance of electrically insulating composites |
| US20070026221A1 (en) * | 2005-06-14 | 2007-02-01 | Siemens Power Generation, Inc. | Morphological forms of fillers for electrical insulation |
| US8357433B2 (en) * | 2005-06-14 | 2013-01-22 | Siemens Energy, Inc. | Polymer brushes |
| JP2009519379A (ja) * | 2005-12-13 | 2009-05-14 | ユナイテッド テクノロジーズ コーポレイション | アモルファス炭素を堆積させる方法 |
| ATE529881T1 (de) * | 2006-08-03 | 2011-11-15 | Creepservice S A R L | Verfahren zur beschichtung von substraten mit diamantähnlichen kohlenstoffschichten |
| US7547847B2 (en) * | 2006-09-19 | 2009-06-16 | Siemens Energy, Inc. | High thermal conductivity dielectric tape |
| US7879203B2 (en) * | 2006-12-11 | 2011-02-01 | General Electric Company | Method and apparatus for cathodic arc ion plasma deposition |
| CN101200802B (zh) * | 2006-12-13 | 2010-05-12 | 上海坤孚企业(集团)有限公司 | 发动机内壁陶瓷化处理方法 |
| US8076617B2 (en) * | 2007-04-06 | 2011-12-13 | Norwood Robert A | Nanoamorphous carbon-based photonic crystal infrared emitters |
| WO2010020274A1 (en) * | 2008-08-18 | 2010-02-25 | Metso Paper, Inc. | Coating for lowering friction effect and improving wear resistance of a component in a fibre web machine and process of producing the same |
| DE102009003232A1 (de) * | 2009-05-19 | 2010-12-02 | Federal-Mogul Burscheid Gmbh | Gleitelement eines Verbrennungsmotors, insbesondere Kolbenring |
| CN102498232B (zh) * | 2009-08-07 | 2014-04-16 | 欧瑞康贸易股份公司(特吕巴赫) | 包括含类金刚石层的基底及其制备方法 |
| CN101806928B (zh) * | 2010-03-31 | 2011-11-16 | 西安交通大学 | 一种树脂镜片、有机玻璃镜片表面超硬涂层镀膜方法 |
| JP5360603B2 (ja) * | 2010-05-27 | 2013-12-04 | 住友電気工業株式会社 | 非晶質炭素被覆部材の製造方法 |
| JP5640942B2 (ja) * | 2011-10-06 | 2014-12-17 | トヨタ自動車株式会社 | 摺動部材およびその製造方法 |
| US8575565B2 (en) | 2011-10-10 | 2013-11-05 | Guardian Industries Corp. | Ion source apparatus and methods of using the same |
| JP2016101658A (ja) * | 2013-03-06 | 2016-06-02 | 株式会社ニコン | 金属光沢を有する装飾膜を備えた複合部材 |
| RU2542912C2 (ru) * | 2013-07-18 | 2015-02-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина)" | Способ получения интерметаллического антиэмиссионного покрытия на сеточных электродах генераторных ламп |
| JP5997417B1 (ja) * | 2015-06-24 | 2016-09-28 | キヤノンアネルバ株式会社 | 真空アーク成膜装置および成膜方法 |
| WO2016208094A1 (ja) * | 2015-06-24 | 2016-12-29 | キヤノンアネルバ株式会社 | 真空アーク成膜装置および成膜方法 |
| CZ201660A3 (cs) | 2016-02-05 | 2017-03-22 | Platit A.S. | Způsob nanášení otěruvzdorné DLC vrstvy |
| RU2651837C1 (ru) * | 2017-03-21 | 2018-04-24 | Олег Андреевич Стрелецкий | Способ нанесения антиадгезивного, биосовместимого и бактериостатичного покрытия на основе углерода на металлические, полимерные и текстильные изделия медицинского назначения |
| RU2651836C1 (ru) * | 2017-04-13 | 2018-04-24 | Олег Андреевич Стрелецкий | Способ нанесения антиадгезивного, биосовместимого и бактериостатичного покрытия на основе углерода на изделия медицинского назначения из материала с термомеханической памятью формы |
| RU2656312C1 (ru) * | 2017-08-14 | 2018-06-04 | Федеральное государственное бюджетное учреждение науки Институт физики металлов имени М.Н. Михеева Уральского отделения Российской академии наук (ИФМ УрО РАН) | Способ нанесения твердых износостойких наноструктурных покрытий из аморфного алмазоподобного углерода |
| CN110205589B (zh) * | 2019-07-12 | 2023-12-08 | 江苏徐工工程机械研究院有限公司 | 一种脉冲碳离子激发源装置 |
| RU2757303C1 (ru) * | 2020-08-18 | 2021-10-13 | Общество с ограниченной ответственностью "ТехноТерм-Саратов" | Способ получения аморфного наноструктурированного алмазоподобного покрытия |
| RU2760018C1 (ru) * | 2020-11-03 | 2021-11-22 | ООО "ТехноТерм-Саратов" | Способ получения аморфного наноструктурированного алмазоподобного покрытия |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5527596A (en) | 1990-09-27 | 1996-06-18 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
| GB9224697D0 (en) | 1992-11-25 | 1993-01-13 | Amaratunga Gehan A J | Doping of highly tetrahedral diamond-like amorphous carbon |
| US5401543A (en) * | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| TW353758B (en) * | 1996-09-30 | 1999-03-01 | Motorola Inc | Electron emissive film and method |
-
1997
- 1997-05-30 RU RU97108626A patent/RU2114210C1/ru active
-
1998
- 1998-05-28 WO PCT/NO1998/000158 patent/WO1998054376A1/en not_active Application Discontinuation
- 1998-05-28 KR KR1019997010940A patent/KR20010012970A/ko not_active Application Discontinuation
- 1998-05-28 AU AU76785/98A patent/AU7678598A/en not_active Abandoned
- 1998-05-28 US US09/424,763 patent/US6261424B1/en not_active Expired - Fee Related
- 1998-05-28 CN CN98805586.4A patent/CN1258322A/zh active Pending
- 1998-05-28 JP JP50054099A patent/JP2002501575A/ja active Pending
- 1998-05-28 EP EP98924681A patent/EP0985057A1/de not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100465738B1 (ko) * | 2002-07-04 | 2005-01-13 | 한국과학기술연구원 | 다층 경질 탄소박막과 그 제조방법 |
| KR20040022639A (ko) * | 2002-09-09 | 2004-03-16 | 주식회사 네오바이오텍 | 탄소계 물질 박막 형성방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002501575A (ja) | 2002-01-15 |
| US6261424B1 (en) | 2001-07-17 |
| AU7678598A (en) | 1998-12-30 |
| RU2114210C1 (ru) | 1998-06-27 |
| CN1258322A (zh) | 2000-06-28 |
| EP0985057A1 (de) | 2000-03-15 |
| WO1998054376A1 (en) | 1998-12-03 |
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