KR102889182B1 - 공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법 - Google Patents

공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법

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Publication number
KR102889182B1
KR102889182B1 KR1020227044795A KR20227044795A KR102889182B1 KR 102889182 B1 KR102889182 B1 KR 102889182B1 KR 1020227044795 A KR1020227044795 A KR 1020227044795A KR 20227044795 A KR20227044795 A KR 20227044795A KR 102889182 B1 KR102889182 B1 KR 102889182B1
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copolymer
parts
acid
meth
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KR20230015406A (ko
Inventor
히로키 마츠우라
노부히로 마에다
다쿠마 데라다
류이치 히라오카
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가부시키가이샤 닛폰 쇼쿠바이
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/52—Phosphorus bound to oxygen only
    • C08K5/521—Esters of phosphoric acids, e.g. of H3PO4
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
KR1020227044795A 2020-08-03 2021-08-02 공중합체, 공중합체 용액, 감광성 수지 조성물, 경화물, 공중합체의 제조 방법, 및, 공중합체 용액의 제조 방법 Active KR102889182B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020132001 2020-08-03
JPJP-P-2020-132001 2020-08-03
JP2021033804 2021-03-03
JPJP-P-2021-033804 2021-03-03
PCT/JP2021/028611 WO2022030445A1 (ja) 2020-08-03 2021-08-02 共重合体、共重合体溶液、感光性樹脂組成物、硬化物、共重合体の製造方法、及び、共重合体溶液の製造方法

Publications (2)

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KR20230015406A KR20230015406A (ko) 2023-01-31
KR102889182B1 true KR102889182B1 (ko) 2025-11-20

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JP (2) JP7415014B2 (https=)
KR (1) KR102889182B1 (https=)
CN (1) CN116057088A (https=)
TW (1) TWI881154B (https=)
WO (1) WO2022030445A1 (https=)

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CN119604818A (zh) * 2022-07-25 2025-03-11 株式会社力森诺科 感光性树脂组合物、树脂固化膜及图像显示元件
CN117069918B (zh) * 2023-08-21 2024-04-26 广东嘉元新材料有限公司 一种改性丙烯酸树脂及其制备方法
CN120349448B (zh) * 2025-06-25 2025-10-03 湖北雨田科技有限公司 墨粉用苯乙烯-丙烯酸酯-环氧接枝共聚物及其制备方法

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JP2004051953A (ja) * 1993-09-10 2004-02-19 Kansai Paint Co Ltd 自己架橋性樹脂
JP2004264623A (ja) * 2003-03-03 2004-09-24 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP2014010200A (ja) * 2012-06-28 2014-01-20 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP2017057305A (ja) * 2015-09-17 2017-03-23 株式会社日本触媒 二重結合含有樹脂の製造方法

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JPH0726042B2 (ja) * 1984-11-05 1995-03-22 三井東圧化学株式会社 粉体塗料組成物
JPS62256806A (ja) * 1986-04-30 1987-11-09 Japan Synthetic Rubber Co Ltd アクリル系ランダム共重合体および該共重合体を用いた熱硬化性樹脂組成物
JPH0425846A (ja) 1990-05-21 1992-01-29 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性エレメント
JP3363211B2 (ja) * 1993-08-06 2003-01-08 東京応化工業株式会社 感光性樹脂組成物およびその製造方法
JP4347923B2 (ja) * 1998-04-27 2009-10-21 共栄社化学株式会社 新規カルボキシル基含有エポキシ（メタ）アクリレートオリゴマー
JP4492393B2 (ja) 2005-03-08 2010-06-30 チッソ株式会社 感光性組成物およびそれを用いた表示素子
KR101032275B1 (ko) 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스
JP2011138116A (ja) 2009-12-04 2011-07-14 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜並びにそれらの形成方法
JP5495991B2 (ja) 2010-07-12 2014-05-21 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置
JP5930786B2 (ja) * 2012-03-22 2016-06-08 株式会社日本触媒 硬化性樹脂組成物および感光性樹脂組成物
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JP5994564B2 (ja) 2012-10-22 2016-09-21 Jnc株式会社 光配向性を有する熱硬化性組成物
JP6157193B2 (ja) 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP6644406B2 (ja) * 2015-09-29 2020-02-12 株式会社日本触媒 アルカリ可溶性樹脂及び感光性樹脂組成物
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JP7216480B2 (ja) * 2018-03-29 2023-02-01 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物及びドライフィルム及び硬化物ならびにプリント配線板
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JP2004051953A (ja) * 1993-09-10 2004-02-19 Kansai Paint Co Ltd 自己架橋性樹脂
JP2004264623A (ja) * 2003-03-03 2004-09-24 Jsr Corp 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP2014010200A (ja) * 2012-06-28 2014-01-20 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
JP2017057305A (ja) * 2015-09-17 2017-03-23 株式会社日本触媒 二重結合含有樹脂の製造方法

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WO2022030445A1 (ja) 2022-02-10
JP7415014B2 (ja) 2024-01-16
TWI881154B (zh) 2025-04-21
CN116057088A (zh) 2023-05-02
TW202216812A (zh) 2022-05-01
KR20230015406A (ko) 2023-01-31
JPWO2022030445A1 (https=) 2022-02-10
JP2024038213A (ja) 2024-03-19
JP7716466B2 (ja) 2025-07-31

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