KR102604150B1 - 슬릿 노즐, 슬릿 노즐의 조정 방법 및 기판 처리 장치 - Google Patents
슬릿 노즐, 슬릿 노즐의 조정 방법 및 기판 처리 장치 Download PDFInfo
- Publication number
- KR102604150B1 KR102604150B1 KR1020220072673A KR20220072673A KR102604150B1 KR 102604150 B1 KR102604150 B1 KR 102604150B1 KR 1020220072673 A KR1020220072673 A KR 1020220072673A KR 20220072673 A KR20220072673 A KR 20220072673A KR 102604150 B1 KR102604150 B1 KR 102604150B1
- Authority
- KR
- South Korea
- Prior art keywords
- main body
- body portion
- adjustment
- discharge port
- gap
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 106
- 238000012545 processing Methods 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims description 18
- 239000007788 liquid Substances 0.000 claims abstract description 36
- 230000007246 mechanism Effects 0.000 claims description 114
- 238000009434 installation Methods 0.000 claims description 30
- 238000005452 bending Methods 0.000 claims description 7
- 230000008569 process Effects 0.000 claims description 7
- 230000000149 penetrating effect Effects 0.000 claims description 4
- 210000000216 zygoma Anatomy 0.000 claims 6
- 230000007774 longterm Effects 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 description 35
- 238000000576 coating method Methods 0.000 description 35
- 238000007667 floating Methods 0.000 description 31
- 238000010586 diagram Methods 0.000 description 15
- 238000012546 transfer Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 238000005188 flotation Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
- B05C5/0262—Coating heads with slot-shaped outlet adjustable in width, i.e. having lips movable relative to each other in order to modify the slot width, e.g. to close it
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
- B05C5/0258—Coating heads with slot-shaped outlet flow controlled, e.g. by a valve
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2021-104551 | 2021-06-24 | ||
JP2021104551A JP7330233B2 (ja) | 2021-06-24 | 2021-06-24 | スリットノズル、スリットノズルの調整方法および基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20230000430A KR20230000430A (ko) | 2023-01-02 |
KR102604150B1 true KR102604150B1 (ko) | 2023-11-20 |
Family
ID=84695710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020220072673A KR102604150B1 (ko) | 2021-06-24 | 2022-06-15 | 슬릿 노즐, 슬릿 노즐의 조정 방법 및 기판 처리 장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7330233B2 (ja) |
KR (1) | KR102604150B1 (ja) |
CN (1) | CN115518828A (ja) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003024855A (ja) | 2001-07-13 | 2003-01-28 | Sumitomo Heavy Ind Ltd | ダイコータ装置 |
JP2012030164A (ja) | 2010-07-29 | 2012-02-16 | Fujifilm Corp | 塗布装置、及び光学フィルムの製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1015461A (ja) * | 1996-07-02 | 1998-01-20 | Sony Corp | 塗布装置 |
JPH11188301A (ja) * | 1997-12-26 | 1999-07-13 | Hirata Corp | 流体塗布装置 |
EP1600218B1 (en) * | 2003-03-03 | 2009-09-23 | Toray Industries, Inc. | Slit die, and method and device for producing base material with coating film |
KR100739477B1 (ko) * | 2005-06-21 | 2007-07-13 | 세메스 주식회사 | 평판 디스플레이 제조에 사용되는 슬릿 노즐 |
KR100756563B1 (ko) * | 2006-08-09 | 2007-09-07 | 주식회사 디엠에스 | 슬릿형 코팅장치 |
KR100987184B1 (ko) * | 2008-08-22 | 2010-10-11 | 주식회사 디엠에스 | 슬릿 노즐 |
KR101252957B1 (ko) | 2010-12-13 | 2013-04-15 | 삼성에스디아이 주식회사 | 코팅장치 및 이를 이용한 코팅 방법 |
JP2014008465A (ja) | 2012-06-29 | 2014-01-20 | Dainippon Printing Co Ltd | ダイヘッド、丁合装置およびダイヘッドのスリットの隙間の大きさの調整方法 |
CN103736631B (zh) * | 2013-12-10 | 2016-08-24 | 京东方科技集团股份有限公司 | 一种狭缝式涂布机 |
KR101583747B1 (ko) * | 2014-01-29 | 2016-01-08 | 세메스 주식회사 | 액 공급 유닛 |
TWI828873B (zh) | 2019-03-28 | 2024-01-11 | 日商尼康股份有限公司 | 塗布裝置、以及噴頭單元 |
-
2021
- 2021-06-24 JP JP2021104551A patent/JP7330233B2/ja active Active
-
2022
- 2022-05-12 CN CN202210513193.5A patent/CN115518828A/zh active Pending
- 2022-06-15 KR KR1020220072673A patent/KR102604150B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003024855A (ja) | 2001-07-13 | 2003-01-28 | Sumitomo Heavy Ind Ltd | ダイコータ装置 |
JP2012030164A (ja) | 2010-07-29 | 2012-02-16 | Fujifilm Corp | 塗布装置、及び光学フィルムの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202301534A (zh) | 2023-01-01 |
JP2023003459A (ja) | 2023-01-17 |
JP7330233B2 (ja) | 2023-08-21 |
KR20230000430A (ko) | 2023-01-02 |
CN115518828A (zh) | 2022-12-27 |
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