KR102507693B1 - 리소그래피 시스템용 연결 장치 - Google Patents

리소그래피 시스템용 연결 장치 Download PDF

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Publication number
KR102507693B1
KR102507693B1 KR1020177015304A KR20177015304A KR102507693B1 KR 102507693 B1 KR102507693 B1 KR 102507693B1 KR 1020177015304 A KR1020177015304 A KR 1020177015304A KR 20177015304 A KR20177015304 A KR 20177015304A KR 102507693 B1 KR102507693 B1 KR 102507693B1
Authority
KR
South Korea
Prior art keywords
interface element
contact surface
component
interface
lithography system
Prior art date
Application number
KR1020177015304A
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English (en)
Korean (ko)
Other versions
KR20170093139A (ko
Inventor
디르크 섀퍼
옌스 프로히나우
안드레아스 부름브란드
Original Assignee
칼 짜이스 에스엠테 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 칼 짜이스 에스엠테 게엠베하 filed Critical 칼 짜이스 에스엠테 게엠베하
Publication of KR20170093139A publication Critical patent/KR20170093139A/ko
Application granted granted Critical
Publication of KR102507693B1 publication Critical patent/KR102507693B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020177015304A 2014-12-09 2015-11-27 리소그래피 시스템용 연결 장치 KR102507693B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014225199.0 2014-12-09
DE102014225199.0A DE102014225199A1 (de) 2014-12-09 2014-12-09 Verbindungsanordnung für eine Lithographieanlage
PCT/EP2015/077904 WO2016091616A1 (en) 2014-12-09 2015-11-27 Connecting arrangement for a lithography system

Publications (2)

Publication Number Publication Date
KR20170093139A KR20170093139A (ko) 2017-08-14
KR102507693B1 true KR102507693B1 (ko) 2023-03-09

Family

ID=54705624

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177015304A KR102507693B1 (ko) 2014-12-09 2015-11-27 리소그래피 시스템용 연결 장치

Country Status (5)

Country Link
KR (1) KR102507693B1 (zh)
CN (1) CN107003623B (zh)
DE (1) DE102014225199A1 (zh)
TW (1) TWI669549B (zh)
WO (1) WO2016091616A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018218110A1 (de) * 2018-10-23 2020-04-23 Carl Zeiss Smt Gmbh Abstandshalter, optisches system und lithographieanlage

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284208A (ja) * 2000-03-30 2001-10-12 Mitsubishi Electric Corp Ｘ線マスクの製造方法、およびｘ線マスクを用いた露光方法
JP2004327987A (ja) * 2003-04-21 2004-11-18 Hewlett-Packard Development Co Lp 可変ウェッジ・サーマル・インターフェース装置および方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
KR100449613B1 (ko) * 2000-08-31 2004-09-22 미쓰비시덴키 가부시키가이샤 반사경 유닛
DE10359576A1 (de) * 2003-12-18 2005-07-28 Carl Zeiss Smt Ag Verfahren zur Herstellung einer optischen Einheit
WO2005106557A1 (en) 2004-05-03 2005-11-10 Carl Zeiss Smt Ag Optical assembly structure comprising a connecting body with thermal expansion compensation means
DE102005060622A1 (de) * 2005-12-19 2007-04-19 Carl Zeiss Smt Ag Montagevorrichtung für eine optische Einrichtung
KR20090039664A (ko) * 2006-07-06 2009-04-22 가부시키가이샤 니콘 마이크로 액츄에이터, 광학 유닛 및 노광 장치, 및 디바이스 제조 방법
CN101241314B (zh) * 2008-03-11 2010-06-23 上海微电子装备有限公司 可补偿z向位置的六自由度精密定位台
DE102009035192A1 (de) * 2009-07-29 2010-08-05 Carl Zeiss Smt Ag Selbsthemmende Justagevorrichtung bei einer Vorrichtung zur Positionierung eines Elements
CN102012638B (zh) * 2009-09-04 2012-11-14 上海微电子装备有限公司 具有可平衡力矩的驱动装置的光刻机工件台
JP5917526B2 (ja) * 2010-09-29 2016-05-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子を位置合わせするシステム及びその方法
NL2008695A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv Lithographic apparatus comprising substrate table.
JP6114516B2 (ja) * 2012-08-21 2017-04-12 キヤノン株式会社 光学装置、露光装置、および物品製造方法
DE102013100535B4 (de) * 2013-01-18 2015-07-16 Von Ardenne Gmbh Vorrichtung und Verfahren zum Ausrichten eines Substrates und einer Maske

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284208A (ja) * 2000-03-30 2001-10-12 Mitsubishi Electric Corp Ｘ線マスクの製造方法、およびｘ線マスクを用いた露光方法
JP2004327987A (ja) * 2003-04-21 2004-11-18 Hewlett-Packard Development Co Lp 可変ウェッジ・サーマル・インターフェース装置および方法

Also Published As

Publication number Publication date
TWI669549B (zh) 2019-08-21
CN107003623A (zh) 2017-08-01
KR20170093139A (ko) 2017-08-14
WO2016091616A1 (en) 2016-06-16
TW201632930A (zh) 2016-09-16
CN107003623B (zh) 2021-11-02
DE102014225199A1 (de) 2016-06-09

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