WO2016091616A1 - Connecting arrangement for a lithography system - Google Patents

Connecting arrangement for a lithography system Download PDF

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Publication number
WO2016091616A1
WO2016091616A1 PCT/EP2015/077904 EP2015077904W WO2016091616A1 WO 2016091616 A1 WO2016091616 A1 WO 2016091616A1 EP 2015077904 W EP2015077904 W EP 2015077904W WO 2016091616 A1 WO2016091616 A1 WO 2016091616A1
Authority
WO
WIPO (PCT)
Prior art keywords
interface element
contact surface
component
interface
tiltable
Prior art date
Application number
PCT/EP2015/077904
Other languages
French (fr)
Inventor
Dirk Schaffer
Jens PROCHNAU
Andreas Wurmbrand
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Priority to KR1020177015304A priority Critical patent/KR102507693B1/en
Priority to CN201580067252.9A priority patent/CN107003623B/en
Publication of WO2016091616A1 publication Critical patent/WO2016091616A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Definitions

  • the present invention relates to a connecting arrangement, to a lithography system having a connecting arrangement, and to a method for producing a connecting arrangement.
  • lenses consist of various components, in particular carrying structures and optical devices. Consequently, the carrying structures are connected to the optical devices via junctions. Depending on the way in which the junctions are produced, they give rise to stresses and
  • a connecting arrangement for a lithography system which has a first component, a second component, a first interface element, which is releasably connected to the first component at a first junction, and a second interface element, which is releasably connected to the second component at a second junction.
  • the first interface element has a first contact surface
  • the second interface element has a second contact surface. At least one of the two contact surfaces is configured in order to be aligned and/or selected in order to compensate for an offset between the first component and the second component before the two contact surfaces are connected at a third junction.
  • the first contact surface of the first interface element and the second contact surface of the second interface element are connected by means of a material-fit connection at the third junction.
  • the first component may be a carrying structure.
  • the second component may be an optical device.
  • the optical device may have an optical element and a frame for the optical element.
  • One of the components may, however, also be a measuring interface, a reference structure or a structural component of the lithography system.
  • the first interface element is releasably connected to the first component.
  • the second interface element is releasably connected to the second component.
  • the releasable connections may be force-fit and/or form-fit connections.
  • a force-fit connection presupposes a normal force on the surfaces to be connected to one another.
  • Force-fit connections may be achieved by friction locking or by magnetic force fit. Mutual displacement of the surfaces is prevented so long as the counterforce caused by the static friction or the magnetic force fit is not exceeded.
  • the first contact surface of the first interface element and the second contact surface of the second interface element are connected by means of a material-fit connection.
  • the connecting partners are held together by atomic or molecular forces.
  • Material-fit connections are nonreleasable connections, which can only be separated by destroying the connecting means.
  • Material-fit connection may for example be carried out by adhesive bonding, soldering, welding or vulcanizing.
  • At least one of the two contact surfaces is configured in order to be aligned and/or selected in order to compensate for an offset between the first component and the second component before the two contact surfaces are connected at a third junction
  • the connection may take place in a state of relative freedom from stresses of the components. If the components are mounted contact-free in the installation position during adhesive bonding, then the adhesive bonding can compensate for the tolerances in the bonding gap and only stresses due to the adhesive are generated.
  • both the first component and the second component can be replaced nondestructively. Because at least one of the two contact surfaces of the interface elements is adjustable in order to compensate for an offset between the first component and the second component, the connecting arrangement can be aligned in the way in which it is intended to be installed in the lithography system.
  • the material-fit connection at the third junction i.e. between the first and second interface elements, then ultimately ensures a stress- and deformation-free connection. Because the two contact surfaces of the interface elements are aligned with one another, a very thin material-fit connection can be produced at the third junction. This leads to a highly stiff connecting arrangement.
  • the two contact surfaces of the interface elements are aligned with one another, a parallel material-fit connection can furthermore be produced at the third junction. This leads to a minimization of torques which may otherwise occur, for example during the curing of adhesives.
  • the at least one of the two contact surfaces of the first and second interface elements can be aligned in relation to the shortest connecting path or in relation to the directions
  • the two contact surfaces may thus be aligned with a constant short distance. This allows a thin third junction and therefore a highly stiff connecting arrangement, or at least a parallel junction with advantages in relation to the joining stress effect.
  • the at least one of the two contact surfaces can be aligned in relation to the connecting path, i.e. the distance between the two contact surfaces can be adjusted.
  • the at least one of the two contact surfaces can be aligned in relation to the directions perpendicular to the connecting path, i.e.
  • the at least one contact surface can be moved in such a way that, from a viewing direction perpendicular to the at least one contact surface, it lies exactly over the other contact surface.
  • the at least one of the two contact surfaces can be aligned in relation to the angle of the two contact surfaces with respect to one another, i.e. the contact surfaces can be aligned parallel with one another.
  • the contact surfaces are parallel to one another. That is to say, the contact surfaces have a constant distance from one another. In this way, a material-fit connection can be implemented well and stresses during the creation of the material-fit connection cannot generate any torques.
  • At least one of the interface elements has an asymmetric shape in order to compensate for the offset between the components.
  • the contact surfaces can therefore be positioned parallel and with a short distance from one another.
  • the at least one of the two interface elements may be selected from a plurality of interface elements. Because at least one of the interface elements is configured as a replaceable element (shim), the suitably shaped interface element can be used according to requirements.
  • asymmetric shape is a wedge shape.
  • a wedge-shaped interface element can compensate for oblique positioning of the contact surfaces with respect to one another.
  • the first interface element has a base and a tiltable fixable element in order to tilt the first contact surface relative to the base.
  • the base may be connected with a force and/or form fit to the first component.
  • the tiltable fixable element can be tilted relative to the base. After the tiltable fixable element is aligned, it can be fixed by means of the base.
  • the first contact surface may be formed by a side of the tiltable fixable element of the first interface element.
  • the second interface element may have a base and a tiltable fixable element in order to tilt the second contact surface relative to the base.
  • the base may be connected with a force and/or form fit to the second component.
  • the tiltable fixable element can be tilted relative to the base. After the tiltable fixable element is aligned, it can be fixed by means of the base.
  • the second contact surface may be formed by a side of the titltable fixable element of the second interface element.
  • the first contact surface of the first interface element is planar, and/or the second contact surface of the second interface element is planar. Because the contact surfaces of the interface elements are planar, the contact surfaces can be connected to one another well with a material fit.
  • the tiltable fixable element of the first interface element and/or of the second interface element is configured as a spherical cap, and the component on which the tiltable fixable element is fixed has a corresponding recess.
  • the planar side of the spherical cap has one of the two contact surfaces and the curved side of the spherical cap can be clamped against the corresponding component.
  • the base has a fixing element, which clamps the tiltable fixable element against the component for fixing. After the contact surface has been aligned, the fixing element can fix the tiltable fixable element.
  • the fixing element may have a curvature.
  • the tiltable fixable element may have a curvature corresponding to the curvature of the fixing element.
  • the first component has a carrying structure and the second component has an optical device.
  • the connecting arrangement may be produced with a carrying structure and an optical device.
  • the optical device has a frame and a mirror or a lens element.
  • the optical device may have a frame for an optical element.
  • the optical element may be a mirror or a lens element.
  • a lithography system in particular an EUV lithography system, having one or more connecting arrangements as described is also provided.
  • a method for producing a connecting arrangement for a lithography system has the following steps.
  • a step a) a first interface element is releasably connected to a first component and a second interface element is releasably connected to a second component, so that a tiltable fixable element of the first interface element and/or a tiltable fixable element of the second interface element is/are tiltable relative to the first component and/or the second component.
  • a first contact surface of the first interface element and/or a second contact surface of the second interface element is aligned in order to compensate for an offset between the first and second components.
  • the tiltable fixable element of the first interface element is fixed relative to the first component and/or the tiltable fixable element of the second interface element is fixed relative to the second component.
  • the first contact surface of the first interface element is connected with a material fit to the second contact surface of the second interface element.
  • the method produces a connecting arrangement with two releasable junctions. In this way, both the first component and the second component can be replaced.
  • the use of one or more tiltable fixable elements allows alignment of a first contact surface of the first interface element and/or of a second contact surface of the second interface element. Subsequently, the tiltable fixable element is fixed, or the tiltable fixable elements are fixed. A very thin material-fit connection can then be produced between the interface elements by adhesive bonding. This leads to a highly stiff connecting arrangement. Furthermore, the material-fit
  • connection at the third junction is carried out as a final step. In this way, a connecting arrangement free of stresses and deformations can be produced. No sequence is specified by the designation of the individual method steps.
  • step b) comprises ⁇ tilting of the first contact surface of the first interface element by bringing the first contact surface of the first interface element and the second contact surface of the second interface element in contact, the tiltable fixable element of the first interface element being tilted so that the first contact surface of the first interface element and the second contact surface of the second interface element have a constant distance from one another, and/or tilting of the second contact surface of the second interface element by bringing the second contact surface of the second interface element and the first contact surface of the first interface element in contact, the tiltable fixable element of the second interface element being tilted so that the second contact surface of the second interface element and the first contact surface of the first interface element have a constant distance from one another.
  • a contact surface may be aligned by means of a tiltable fixable element.
  • a method for producing a connecting arrangement for a lithography system is furthermore described. The method has the following steps. In a step a) a first interface element and a second interface element are selected and/or produced. In a step b), the first interface element is releasably connected to a first component. In a step c), the second interface element is releasably connected to a second component. In a step d), the first contact surface of the first interface element is connected with a material fit to the second contact surface of the second interface element.
  • the method produces a connecting arrangement with two releasable junctions. In this way, both the first component and the second component can be replaced.
  • the suitable interface elements can be provided in order to compensate for an offset between the components. In this way, the contact surfaces of the interface elements can be aligned parallel with one another.
  • a very thin material-fit connection can then be produced between the interface elements by adhesive bonding. This leads to a highly stiff connecting arrangement.
  • the material-fit connection at the third junction is carried out as a final step. In this way, a connecting arrangement free of stresses and deformations can be produced. No sequence is specified by the designation of the individual method steps.
  • a measurement is first made of the space which is available between the first component and the second component, in order to be able to select the interface elements with the suitable shape.
  • the contact surfaces of the interface elements are aligned parallel with one another after the selection and connection to the components.
  • step a) comprises: selection of the first interface element and/or of the second interface element from a set of interface elements, the set of interface elements having a plurality of interface elements with different geometry.
  • the suitable interface elements can be selected from a set of interface elements.
  • step a) comprises: production of the first interface element and/or of the second interface element by means of grinding, milling or cutting.
  • the interface elements can be produced straightforwardly from a basic shape.
  • step d) comprises the following steps: In step dl), the first contact surface and the second contact surface are moved away from one another so that adhesive can be applied at least onto one of the two contact surfaces. In step d2), adhesive is applied onto at least one of the two contact surfaces. In step d3) the contact surfaces are brought together and adhesively bonded.
  • a connecting arrangement free of stresses and deformations can be produced by means of the material-fit connection.
  • FIG. 1 shows a schematic view of an EUV lithography system
  • Fig. 2A shows a schematic view of a carrying structure and of an optical device!
  • Fig. 2B shows a schematic view of a first embodiment of a connecting
  • Fig. 3 shows a schematic view of a second embodiment of a connecting
  • FIG. 4 shows a detailed sectional view of the connecting arrangement of Fig. 3;
  • Fig. 5 shows a schematic view of an apparatus for producing the connecting arrangement of Fig. 3 and Fig. 4; and Fig. 6 shows a schematic flowchart of a method for producing the connecting arrangement of Fig. 3 and Fig. 4, with the apparatus of Fig. 5.
  • FIG. 1 shows a schematic view of an EUV lithography system 100, which comprises a beam shaping system 102, and illumination system 104 and a projection system 106.
  • the beam shaping system 102, the illumination system 104 and the projection system 106 are respectively provided in a vacuum housing, which is evacuated with the aid of an evacuation apparatus (not represented in detail).
  • the vacuum housings are enclosed by a machine space (not represented in detail) in which the drive apparatuses for the mechanical movement or adjustment of the optical elements are provided. Electrical controls and the like may furthermore be provided in the machine space.
  • the beam shaping system 102 has an EUV light source 108, a collimator 110 and a monochromator 112.
  • a plasma source or a synchrotron which emits radiation in the EUV range (extreme ultraviolet range), i.e. in the wavelength range of from 5 nm to 20 nm, may be provided as the EUV light source 108.
  • the radiation emitted by the EUV light source 108 is first collimated by the collimator 110, whereupon the desired operating wavelength is filtered out by the monochromator 112.
  • the beam shaping system 102 therefore adapts the wavelength and the spatial distribution of the light emitted by the EUV light source 108.
  • the EUV radiation 114 generated by the EUV light source 108 has a relatively low transmissivity through air, for which reason the beam guiding spaces in the beam shaping system 102, in the illumination system 104 and in the projection system, or projection lens 106 are evacuated.
  • the illumination system 104 has a first mirror 116 and a second mirror 118.
  • These mirrors 116, 118 may, for example, be configured as facet mirrors for pupil shaping, and they guide the EUV radiation 114 onto a photomask 120.
  • the photomask 120 is likewise configured as a reflective optical element and may be arranged outside the systems 102, 104, 106.
  • the photomask 120 has a structure which is imaged on a reduced scale by means of the projection system 106 onto a wafer 122 or the like.
  • the projection system 106 has, in the beam guiding space, for example a third mirror 124 and a fourth mirror 202.
  • the number of mirrors of the EUV lithography system 100 is not restricted to the number represented, and more or fewer mirrors may be provided.
  • the mirrors are generally curved on their front side for beam shaping.
  • Fig. 2A shows by way of example the fourth mirror 202.
  • the fourth mirror 202 is applied on a frame 204 (mirror support frame).
  • the fourth mirror 202 and the frame 204 may together form an optical device 206.
  • the frame 204 has a wedge- shaped projection 208-1 and a projection 208-2.
  • This wedge-shaped projection 208-1 in this case represents an arbitrarily shaped contact element of the frame 204.
  • the first interface elements 210-1, 210-2 are respectively fastened with a releasable connection 216, for example a force- and/or form-fit connection, in particular screwing, on a carrying structure 212.
  • a releasable connection 216 for example a force- and/or form-fit connection, in particular screwing, on a carrying structure 212.
  • a gap 214 can respectively be seen.
  • the gap 214 represents the space requirement for a second interface element 218 and the assembly gap.
  • Fig. 2B shows a first embodiment of a connecting arrangement 200A with the carrying structure 212 and the optical device 206 of Fig. 2A.
  • the gaps 214 are closed with a wedge-shaped second interface element 218-1 and with a second interface element 218-2.
  • the carrying structure 212 and the first interface element 210-1 opposite the wedge-shaped projection 208-1 are connected at a first junction 220 with a releasable connection.
  • the wedge-shaped projection 208-1 of the frame 204 is releasably connected to the wedge-shaped second interface element 218-1 at a second junction 222.
  • the first interface element 210-1 opposite the wedge-shaped projection 208-1 has a first contact surface 226, which faces in the direction of the second interface element 218-1.
  • the wedge-shaped second interface element 218-1 has a second contact surface 228, which faces in the direction of the first interface element 210-1.
  • the first interface element 210- 1 and the wedge-shaped second interface element 218-1 are connected to one another with a material fit at a third junction 224, which lies between the first contact surface 226 and the second contact surface 228.
  • the direct connecting path, or the gap dimension, between the first contact surface 226 and the second contact surface 288, i.e. the distance between the two contact surfaces 226, 228, can be influenced by the selection of differently thick interface elements 210-1, 218-1.
  • adjustment of the two contact surfaces 226, 228 relative to one another is carried out, and/or selection of equally large contact surfaces 226, 228 is carried out by the selection of suitable interface elements 210-1, 218- 1.
  • the angle of the two contact surfaces 226, 228 with respect to one another can be influenced by the selection of the angle of the wedge-shaped interface element 218-1.
  • the interface element 218-1 may be selected from a
  • a wedge- shaped interface element 218-1 can be implemented.
  • the projection 208-2, the second interface element 218-2, the first interface element 210-2 opposite the projection 208-2 and the carrying structure 212 can be connected to one another.
  • the connecting arrangement 200A is shown with two projections 208- 1, 208-2.
  • the second interface element 218 is directly connected releasably to the frame 204.
  • the carrying structure 212 and the first interface element 210 as well as the frame 204 with the projection 208 and the second interface element 218 are releasably connected to one another, the carrying structure 212 and the optical device 206 can be replaced. Because the gap 214 can be closed with an accurate fit with a second interface element 218, the first contact surface 226 and the second contact surface 228 can be aligned parallel with one another. This allows a very thin third junction 224, which in turn leads to a highly stiff connecting arrangement 200A.
  • the second interface element 218-1 shown in Fig. 2B is wedge-shaped.
  • the wedge-shaped second interface element 218-1 or the first interface element 210-1 could be replaced with an interface element having any desired asymmetric or symmetrical shape, if this first contact surface 226 can thereby be aligned parallel with the second contact surface 228.
  • Fig. 3 shows a second embodiment of a connecting arrangement 200B with a carrying structure 212 and an optical device 206.
  • the optical device 206 has the fourth mirror 202 of Fig. 1 and a frame 204.
  • the carrying structure 212 is releasably connected to a first interface element 210 at a first junction 220.
  • the optical device 206 is releasably connected by means of the frame 204 to the second interface element 218 at a second junction 222.
  • the first interface element 210 has a first contact surface 226, which faces in the direction of the second interface element 218.
  • the second interface element 218 has a second contact surface 228, which faces in the direction of the first interface element 210.
  • the first interface element 210 and the second interface element 218 are connected to one another with a material fit at a third junction 224, which lies between the first contact surface 226 and the second contact surface 228.
  • the second interface element 218 can be rotated relative to the optical device 206. In this way, the second contact surface 228 can be aligned parallel with the first contact surface 226. The second interface element 218 may then be fixed on the optical device 206 so that rotation is no longer possible.
  • the parallel alignment of the contact surfaces 226, 228 allows a very thin third junction 224, which in turn leads to a highly stiff connecting arrangement 200B. Because the carrying structure 212 and the first interface element 210 as well as the frame 204 of the optical device 206 and the second interface element 218 are releasably connected to one another, the carrying structure 212 and the optical device 206 can be replaced.
  • the second interface element 218 may have a base (not shown in Fig. 3) and a tiltable fixable element 300.
  • the base may be releasably connected to the frame 204 of the optical device 206.
  • the tiltable fixable element 300 of the second interface element 218 may comprise the second contact surface 228.
  • the second contact surface 228 may then be tilted relative to the base and relative to the frame 204. After the second contact surface 228 is aligned, the tiltable fixable element 300 can be fixed by the base on the frame 204.
  • the carrying structure 212 preferably consists of ceramic.
  • the frame 204 may also consist of ceramic or metal.
  • the interface elements 210, 218 preferably comprise ceramic or metal. In the case of metals, Invar is preferably used, i.e. an iron-nickel alloy with a very low thermal expansion behaviour.
  • the adhesive bonding at the third junction 224 may be carried out with multicomponent adhesives.
  • Fig. 2A, Fig. 2B and Fig. 3 respectively show the fourth mirror 202 of the EUV lithography system of Fig. 1.
  • the connecting arrangements 200A, 200B may, however, be used for any other mirror of the EUV lithography system 100 or for another optical device 206 of the EUV lithography system 100.
  • Fig. 4 shows a detailed sectional view of the connecting arrangement 200B represented only schematically in Fig. 3.
  • the first interface element 210 is releasably fastened with a screw 316 to the carrying structure 212.
  • An axial spacer 314 may be inserted between the first interface element 210 and the carrying structure 212.
  • the second interface element 218 has a tiltable fixable element 300 and a base 302.
  • the tiltable fixable element 300 is, as can be seen in Fig. 4, configured as a spherical cap.
  • the axial spacer 314 compensates for the shortest connecting path, while the tiltable fixable element 300 ensures the tilting compensation.
  • an interface element 210, 218 may also be configured in a plurality of parts, in order to be able to fulfil a plurality of different functions.
  • the optical device 206 has a contact element 304 for contacting the tiltable fixable element 300.
  • the base 302 may be releasably fastened by means of a nut 308 to the optical device 206, or its frame 204.
  • the contact element 304 has, on its side lying toward the tiltable fixable element 300, a recess corresponding thereto. When the nut 308 is loosened, the tiltable fixable element 300 can be tilted while being guided by the recess.
  • a fixing element 312 of the base 302 presses against the tiltable fixable element 300 so that the latter is clamped with a force fit against the contact element 304 at the second junction 222.
  • the tiltable fixable element 300 is then fixed in its position.
  • the first contact surface 226 and the second contact surface 228 can be aligned parallel with one another.
  • the material-fit connection between the first contact surface 226 and the second contact surface 228 may then be carried out at the third junction 224.
  • the optical device may have a radial or thermal decoupler 306 for thermal compensation.
  • the radial or thermal decoupler 306 may comprise metal, in particular Invar.
  • the thermal decoupler 306 shown in Fig. 4 comprises the contact element 304, a web 318 and a volume element 320.
  • the volume element 320 is adhesively bonded into the optical device 206, or into its frame 204, by means of an adhesive 330.
  • the base 302 represented in Fig. 4 has the shape of a flanged hollow cylinder.
  • the base 302 extends through an opening 322 of the tiltable fixable element 300.
  • the fixing element 312 is formed by the flange of the hollow cylinder.
  • the fixing element 312, i.e. the flange of the hollow cylinder, is sunk in a recess 324 of the tiltable fixable element 300.
  • a lower side 326 of the fixing element is pressed against an upper side 328 of the recess 324 of the tiltable fixable element 300.
  • the tiltable fixable element 300 is thereby pressed against the element 304 and therefore fixed.
  • the first interface element 210 may have a base 302 and a tiltable fixable element 300. The first contact surface 226 is then tiltable relative to the carrying structure 212.
  • the corresponding contact element 304 may have a pan- shaped spherical geometry.
  • the first and second contact surfaces 226, 228 are planar.
  • a thin third junction can then be implemented well.
  • an interface element 210, 218 may have a tiltable fixable element in which the tilting mechanism lies inside the interface element and is not, as in Figs. 3 and 4, implemented by means of the adjoining component 206, 212.
  • the tilting mechanism may then be carried out with a ball joint or with a rotary joint.
  • Fig. 5 shows an apparatus 416 for producing the connecting arrangement 200B of Fig. 3 and Fig. 4.
  • the apparatus 416 for producing the connecting arrangement 200B has a first positioning device 400 and a second positioning device 410.
  • the first positioning device 400 holds the carrying structure 212.
  • the carrying structure 212 can be moved by means of the positioning device 400 in the x, y and z directions.
  • the positioning device 400 has a first rotary or ball joint 402. Rotation 404 of the carrying structure 212 is therefore possible.
  • the second positioning device 410 holds the frame 204 of the optical device 206.
  • the frame 204 can be moved by means of the positioning device in the x, y and z directions.
  • the positioning device 410 has a second rotary or ball joint 412.
  • Rotation 414 of the frame 204 is therefore possible.
  • the carrying structure 212 and the frame 204 can be aligned by the positioning devices 400, 410 in the installation position, i.e. in the alignment required by subsequent use.
  • the connecting arrangement 200B is assembled free from stresses and deformations.
  • Fig. 6 shows a method by which a connecting arrangement 200B according to Figs. 3 and 4 can be produced with an apparatus 416 of Fig. 5.
  • a first step Si the first interface element 210 is releasably connected to the carrying structure 212 and the second interface element 218 is releasably connected to the frame 204 of the optical device 206.
  • the tiltable fixable element 300 of the second interface element 218 is tiltable relative to the frame 204 of the optical device 206.
  • the second contact surface 228 of the second interface element 218 is aligned in order to compensate for an offset between the carrying structure 212 and the frame 204 of the optical device 206.
  • the first contact surface 226 and the second contact surface 228 are brought into contact.
  • the second contact surface 228 of the second interface element 218 is thereby tilted.
  • the tiltable fixable element 300 of the second interface element 218 is thereby likewise tilted.
  • the contact surfaces 226, 228 After being brought into contact, the contact surfaces 226, 228 have a constant distance from one another, i.e. they are aligned parallel.
  • a third step S3 the tiltable fixable element 300 of the second interface element 218 is fixed relative to the frame 204 of the optical device 206. After the alignment, the tiltable fixable element 300 of the second interface element 218 is clamped by means of the fixing element 312 of the base 302 against the contact element 304 of the optical device 206, or its frame 204. The tiltable fixable element 300 is therefore fixed.
  • a fourth step S4 the already parallel-aligned first and second contact surfaces 226, 228 are now connected with a material fit at the third junction 224. To this end, the first and second contact surfaces 226, 228 are moved away from one another until adhesive can be applied onto the contact surfaces 226, 228.
  • the contact surfaces 226, 228 are brought back together and are adhesively bonded to one another.
  • the tiltable fixable element 300 could also be arranged in the first interface element 210.
  • both interface elements 210, 218 could have a tiltable fixable element 300.
  • a measurement may be made of the space available between the carrying structure 212 and the optical device 206.
  • the interface elements 210, 218 with the suitable asymmetric or symmetrical shape and the correct density may be selected, as described for example in connection with Fig. 2B.
  • the lithography system 100 need not be an EUV lithography system. Rather, light of a different wavelength may also be used (for example 193 nm by means of an ArF excimer laser). Furthermore, instead of the aforementioned mirrors, lens elements may also be used, particularly in the aforementioned projection system 106.

Abstract

A connecting arrangement (200A, 200B) for a lithography system (100) is disclosed, which has a first component (212), a second component (206), a first interface element (210), which is releasably connected to the first component (212) at a first junction (220), and a second interface element (218), which is releasably connected to the second component (206) at a second junction (222). The first interface element (210) has a first contact surface (226), the second interface element (218) has a second contact surface (228), and at least one of the two contact surfaces (226, 228) is configured in order to be aligned and/or selected in order to compensate for an offset between the first component (212) and the second component (206) before the two contact surfaces (226, 228) are connected at a third junction (224). The first contact surface (226) of the first interface element (210) and the second contact surface (228) of the second interface element (218) are connected by means of a material-fit connection at the third junction (224).

Description

CONNECTING ARRANGEMENT FOR A LITHOGRAPHY SYSTEM
This application claims priority to German patent application No. 10 2014 225 199.0, filed December 9, 2014. This application in its entirety is incorporated herein by reference.
The present invention relates to a connecting arrangement, to a lithography system having a connecting arrangement, and to a method for producing a connecting arrangement.
For reasons of material and manufacturing, lenses consist of various components, in particular carrying structures and optical devices. Consequently, the carrying structures are connected to the optical devices via junctions. Depending on the way in which the junctions are produced, they give rise to stresses and
deformations that have a detrimental effect on the optical devices. In particular because of the requirement for a minimum mechanical strength, assembly without stresses and deformations has to date scarcely been possible.
Besides the occurrence of stresses and deformations due to the method, during assembly it is also important to compensate for shape and positional tolerances of the components, without additional stresses and deformations thereby being generated. WO2005/106557 takes this effect into account by deformations generated by a force-fit connection being absorbed by decoupling elements. Since the decoupling effect is directly related to the mechanical stiffness, this procedure is only limitedly suitable for systems which require a high mechanical stiffness.
Against this background, it is an object of the present invention to improve a connecting arrangement for a lithography system, in particular on the one hand with the connecting arrangement being releasable and, on the other hand, the components being connected virtually without stress and deformation in the installed position. In particular, it is an object of the present invention to provide a lithography system having a connecting arrangement, and a method for producing a connecting arrangement.
The object is achieved by a connecting arrangement for a lithography system, which has a first component, a second component, a first interface element, which is releasably connected to the first component at a first junction, and a second interface element, which is releasably connected to the second component at a second junction. The first interface element has a first contact surface, and the second interface element has a second contact surface. At least one of the two contact surfaces is configured in order to be aligned and/or selected in order to compensate for an offset between the first component and the second component before the two contact surfaces are connected at a third junction. The first contact surface of the first interface element and the second contact surface of the second interface element are connected by means of a material-fit connection at the third junction.
The first component may be a carrying structure. The second component may be an optical device. The optical device may have an optical element and a frame for the optical element. One of the components may, however, also be a measuring interface, a reference structure or a structural component of the lithography system.
The first interface element is releasably connected to the first component. The second interface element is releasably connected to the second component. The releasable connections may be force-fit and/or form-fit connections. A force-fit connection presupposes a normal force on the surfaces to be connected to one another. Force-fit connections may be achieved by friction locking or by magnetic force fit. Mutual displacement of the surfaces is prevented so long as the counterforce caused by the static friction or the magnetic force fit is not exceeded.
The first contact surface of the first interface element and the second contact surface of the second interface element are connected by means of a material-fit connection. In the case of material-fit connections, the connecting partners are held together by atomic or molecular forces. Material-fit connections are nonreleasable connections, which can only be separated by destroying the connecting means. Material-fit connection may for example be carried out by adhesive bonding, soldering, welding or vulcanizing.
The expression "at least one of the two contact surfaces is configured in order to be aligned and/or selected in order to compensate for an offset between the first component and the second component before the two contact surfaces are connected at a third junction" is to be interpreted as meaning that at least one of the two contact surfaces can be suitably tilted and/or the interface elements can be correspondingly selected, so that at least one of the two contact surfaces is suitably aligned after the selection. In the case of material-fit connections, the connection may take place in a state of relative freedom from stresses of the components. If the components are mounted contact-free in the installation position during adhesive bonding, then the adhesive bonding can compensate for the tolerances in the bonding gap and only stresses due to the adhesive are generated.
Because the connecting arrangement has two releasable junctions, both the first component and the second component can be replaced nondestructively. Because at least one of the two contact surfaces of the interface elements is adjustable in order to compensate for an offset between the first component and the second component, the connecting arrangement can be aligned in the way in which it is intended to be installed in the lithography system. The material-fit connection at the third junction, i.e. between the first and second interface elements, then ultimately ensures a stress- and deformation-free connection. Because the two contact surfaces of the interface elements are aligned with one another, a very thin material-fit connection can be produced at the third junction. This leads to a highly stiff connecting arrangement. Because the two contact surfaces of the interface elements are aligned with one another, a parallel material-fit connection can furthermore be produced at the third junction. This leads to a minimization of torques which may otherwise occur, for example during the curing of adhesives. In one embodiment of the connecting arrangement, the at least one of the two contact surfaces of the first and second interface elements can be aligned in relation to the shortest connecting path or in relation to the directions
perpendicular to the shortest connecting path and/or in relation to the angle of the two contact surfaces with respect to one another. The alignability may in this case encompass all directions and angles. Advantageously, the two contact surfaces may thus be aligned with a constant short distance. This allows a thin third junction and therefore a highly stiff connecting arrangement, or at least a parallel junction with advantages in relation to the joining stress effect. The at least one of the two contact surfaces can be aligned in relation to the connecting path, i.e. the distance between the two contact surfaces can be adjusted. The at least one of the two contact surfaces can be aligned in relation to the directions perpendicular to the connecting path, i.e. the at least one contact surface can be moved in such a way that, from a viewing direction perpendicular to the at least one contact surface, it lies exactly over the other contact surface. The at least one of the two contact surfaces can be aligned in relation to the angle of the two contact surfaces with respect to one another, i.e. the contact surfaces can be aligned parallel with one another. According to another preferred embodiment of the connecting arrangement, the contact surfaces are parallel to one another. That is to say, the contact surfaces have a constant distance from one another. In this way, a material-fit connection can be implemented well and stresses during the creation of the material-fit connection cannot generate any torques.
According to another embodiment of the connecting arrangement, at least one of the interface elements has an asymmetric shape in order to compensate for the offset between the components. Advantageously, the contact surfaces can therefore be positioned parallel and with a short distance from one another.
The at least one of the two interface elements may be selected from a plurality of interface elements. Because at least one of the interface elements is configured as a replaceable element (shim), the suitably shaped interface element can be used according to requirements.
According to another embodiment of the connecting arrangement, the
asymmetric shape is a wedge shape. Advantageously, a wedge-shaped interface element can compensate for oblique positioning of the contact surfaces with respect to one another.
According to another embodiment of the connecting arrangement, the first interface element has a base and a tiltable fixable element in order to tilt the first contact surface relative to the base. In this case, the base may be connected with a force and/or form fit to the first component. The tiltable fixable element can be tilted relative to the base. After the tiltable fixable element is aligned, it can be fixed by means of the base. The first contact surface may be formed by a side of the tiltable fixable element of the first interface element.
As an alternative or in addition, the second interface element may have a base and a tiltable fixable element in order to tilt the second contact surface relative to the base. In this case, the base may be connected with a force and/or form fit to the second component. The tiltable fixable element can be tilted relative to the base. After the tiltable fixable element is aligned, it can be fixed by means of the base. The second contact surface may be formed by a side of the titltable fixable element of the second interface element. According to another embodiment of the connecting arrangement, the first contact surface of the first interface element is planar, and/or the second contact surface of the second interface element is planar. Because the contact surfaces of the interface elements are planar, the contact surfaces can be connected to one another well with a material fit.
According to another embodiment of the connecting arrangement, the tiltable fixable element of the first interface element and/or of the second interface element is configured as a spherical cap, and the component on which the tiltable fixable element is fixed has a corresponding recess. In this case, the planar side of the spherical cap has one of the two contact surfaces and the curved side of the spherical cap can be clamped against the corresponding component.
According to another embodiment of the connecting arrangement, the base has a fixing element, which clamps the tiltable fixable element against the component for fixing. After the contact surface has been aligned, the fixing element can fix the tiltable fixable element. The fixing element may have a curvature. The tiltable fixable element may have a curvature corresponding to the curvature of the fixing element.
According to another embodiment of the connecting arrangement, the first component has a carrying structure and the second component has an optical device. Preferably, the connecting arrangement may be produced with a carrying structure and an optical device.
According to another embodiment of the connecting arrangement, the optical device has a frame and a mirror or a lens element. The optical device may have a frame for an optical element. The optical element may be a mirror or a lens element.
A lithography system, in particular an EUV lithography system, having one or more connecting arrangements as described is also provided.
A method for producing a connecting arrangement for a lithography system is also described. The method has the following steps. In a step a), a first interface element is releasably connected to a first component and a second interface element is releasably connected to a second component, so that a tiltable fixable element of the first interface element and/or a tiltable fixable element of the second interface element is/are tiltable relative to the first component and/or the second component. In a step b), a first contact surface of the first interface element and/or a second contact surface of the second interface element is aligned in order to compensate for an offset between the first and second components. In a step c), the tiltable fixable element of the first interface element is fixed relative to the first component and/or the tiltable fixable element of the second interface element is fixed relative to the second component. In a step d), the first contact surface of the first interface element is connected with a material fit to the second contact surface of the second interface element.
The method produces a connecting arrangement with two releasable junctions. In this way, both the first component and the second component can be replaced. The use of one or more tiltable fixable elements allows alignment of a first contact surface of the first interface element and/or of a second contact surface of the second interface element. Subsequently, the tiltable fixable element is fixed, or the tiltable fixable elements are fixed. A very thin material-fit connection can then be produced between the interface elements by adhesive bonding. This leads to a highly stiff connecting arrangement. Furthermore, the material-fit
connection at the third junction is carried out as a final step. In this way, a connecting arrangement free of stresses and deformations can be produced. No sequence is specified by the designation of the individual method steps.
According to another embodiment of the method, step b) comprises^ tilting of the first contact surface of the first interface element by bringing the first contact surface of the first interface element and the second contact surface of the second interface element in contact, the tiltable fixable element of the first interface element being tilted so that the first contact surface of the first interface element and the second contact surface of the second interface element have a constant distance from one another, and/or tilting of the second contact surface of the second interface element by bringing the second contact surface of the second interface element and the first contact surface of the first interface element in contact, the tiltable fixable element of the second interface element being tilted so that the second contact surface of the second interface element and the first contact surface of the first interface element have a constant distance from one another. Advantageously, a contact surface may be aligned by means of a tiltable fixable element. A method for producing a connecting arrangement for a lithography system is furthermore described. The method has the following steps. In a step a) a first interface element and a second interface element are selected and/or produced. In a step b), the first interface element is releasably connected to a first component. In a step c), the second interface element is releasably connected to a second component. In a step d), the first contact surface of the first interface element is connected with a material fit to the second contact surface of the second interface element.
The method produces a connecting arrangement with two releasable junctions. In this way, both the first component and the second component can be replaced. By the selection and/or production of the interface elements, the suitable interface elements can be provided in order to compensate for an offset between the components. In this way, the contact surfaces of the interface elements can be aligned parallel with one another. A very thin material-fit connection can then be produced between the interface elements by adhesive bonding. This leads to a highly stiff connecting arrangement. Furthermore, the material-fit connection at the third junction is carried out as a final step. In this way, a connecting arrangement free of stresses and deformations can be produced. No sequence is specified by the designation of the individual method steps. According to another embodiment of the method, a measurement is first made of the space which is available between the first component and the second component, in order to be able to select the interface elements with the suitable shape. Advantageously, the contact surfaces of the interface elements are aligned parallel with one another after the selection and connection to the components.
According to another embodiment of the method, step a) comprises: selection of the first interface element and/or of the second interface element from a set of interface elements, the set of interface elements having a plurality of interface elements with different geometry. Advantageously, the suitable interface elements can be selected from a set of interface elements.
According to another embodiment of the method, step a) comprises: production of the first interface element and/or of the second interface element by means of grinding, milling or cutting. Advantageously, the interface elements can be produced straightforwardly from a basic shape.
According to another embodiment of the method, step d) comprises the following steps: In step dl), the first contact surface and the second contact surface are moved away from one another so that adhesive can be applied at least onto one of the two contact surfaces. In step d2), adhesive is applied onto at least one of the two contact surfaces. In step d3) the contact surfaces are brought together and adhesively bonded. Advantageously, a connecting arrangement free of stresses and deformations can be produced by means of the material-fit connection.
The embodiments and features described for the proposed apparatus apply accordingly for the proposed method.
Other possible implementations of the invention also comprise combinations, not explicitly mentioned, of features or embodiments described above or below in relation to the exemplary embodiments. In this case, the person skilled in the art will also add individual aspects as improvements or enhancements of the respective basic form of the invention.
Other advantageous configurations and aspects of the invention are the subject- matter of the dependent claims and of the exemplary embodiments of the invention as described below. Furthermore, the invention will be explained in more detail with the aid of preferred embodiments with reference to the appended figures. Fig. 1 shows a schematic view of an EUV lithography system!
Fig. 2A shows a schematic view of a carrying structure and of an optical device!
Fig. 2B shows a schematic view of a first embodiment of a connecting
arrangement with the carrier structure and the optical device of Fig. 2A!
Fig. 3 shows a schematic view of a second embodiment of a connecting
arrangement; Fig. 4 shows a detailed sectional view of the connecting arrangement of Fig. 3;
Fig. 5 shows a schematic view of an apparatus for producing the connecting arrangement of Fig. 3 and Fig. 4; and Fig. 6 shows a schematic flowchart of a method for producing the connecting arrangement of Fig. 3 and Fig. 4, with the apparatus of Fig. 5.
Unless otherwise indicated, references which are the same in the figures denote elements which are the same or functionally equivalent. Furthermore, it should be noted that the representations in the figures are not necessarily true to scale. Fig. 1 shows a schematic view of an EUV lithography system 100, which comprises a beam shaping system 102, and illumination system 104 and a projection system 106. The beam shaping system 102, the illumination system 104 and the projection system 106 are respectively provided in a vacuum housing, which is evacuated with the aid of an evacuation apparatus (not represented in detail). The vacuum housings are enclosed by a machine space (not represented in detail) in which the drive apparatuses for the mechanical movement or adjustment of the optical elements are provided. Electrical controls and the like may furthermore be provided in the machine space.
The beam shaping system 102 has an EUV light source 108, a collimator 110 and a monochromator 112. For example, a plasma source or a synchrotron, which emits radiation in the EUV range (extreme ultraviolet range), i.e. in the wavelength range of from 5 nm to 20 nm, may be provided as the EUV light source 108. The radiation emitted by the EUV light source 108 is first collimated by the collimator 110, whereupon the desired operating wavelength is filtered out by the monochromator 112. The beam shaping system 102 therefore adapts the wavelength and the spatial distribution of the light emitted by the EUV light source 108. The EUV radiation 114 generated by the EUV light source 108 has a relatively low transmissivity through air, for which reason the beam guiding spaces in the beam shaping system 102, in the illumination system 104 and in the projection system, or projection lens 106 are evacuated.
In the example represented, the illumination system 104 has a first mirror 116 and a second mirror 118. These mirrors 116, 118 may, for example, be configured as facet mirrors for pupil shaping, and they guide the EUV radiation 114 onto a photomask 120.
The photomask 120 is likewise configured as a reflective optical element and may be arranged outside the systems 102, 104, 106. The photomask 120 has a structure which is imaged on a reduced scale by means of the projection system 106 onto a wafer 122 or the like. To this end, the projection system 106 has, in the beam guiding space, for example a third mirror 124 and a fourth mirror 202. It should be noted that the number of mirrors of the EUV lithography system 100 is not restricted to the number represented, and more or fewer mirrors may be provided. Furthermore, the mirrors are generally curved on their front side for beam shaping.
Fig. 2A shows by way of example the fourth mirror 202. The fourth mirror 202 is applied on a frame 204 (mirror support frame). The fourth mirror 202 and the frame 204 may together form an optical device 206. The frame 204 has a wedge- shaped projection 208-1 and a projection 208-2. This wedge-shaped projection 208-1 in this case represents an arbitrarily shaped contact element of the frame 204. There is a first interface element 210-1 opposite the wedge-shaped projection 208-1, and likewise a first interface element 210-2 opposite the projection 208-2. The first interface elements 210-1, 210-2 are respectively fastened with a releasable connection 216, for example a force- and/or form-fit connection, in particular screwing, on a carrying structure 212. Between the wedge-shaped projection 208-1 and the first interface element 210-1 lying opposite, and between the projection 208-2 and the first interface element 210-2 lying opposite, a gap 214 can respectively be seen. The gap 214 represents the space requirement for a second interface element 218 and the assembly gap.
Fig. 2B shows a first embodiment of a connecting arrangement 200A with the carrying structure 212 and the optical device 206 of Fig. 2A. The gaps 214 are closed with a wedge-shaped second interface element 218-1 and with a second interface element 218-2. The carrying structure 212 and the first interface element 210-1 opposite the wedge-shaped projection 208-1 are connected at a first junction 220 with a releasable connection. The wedge-shaped projection 208-1 of the frame 204 is releasably connected to the wedge-shaped second interface element 218-1 at a second junction 222. The first interface element 210-1 opposite the wedge-shaped projection 208-1 has a first contact surface 226, which faces in the direction of the second interface element 218-1. The wedge-shaped second interface element 218-1 has a second contact surface 228, which faces in the direction of the first interface element 210-1. The first interface element 210- 1 and the wedge-shaped second interface element 218-1 are connected to one another with a material fit at a third junction 224, which lies between the first contact surface 226 and the second contact surface 228.
The direct connecting path, or the gap dimension, between the first contact surface 226 and the second contact surface 288, i.e. the distance between the two contact surfaces 226, 228, can be influenced by the selection of differently thick interface elements 210-1, 218-1. In relation to the directions perpendicular to the direct connecting path, adjustment of the two contact surfaces 226, 228 relative to one another is carried out, and/or selection of equally large contact surfaces 226, 228 is carried out by the selection of suitable interface elements 210-1, 218- 1. The angle of the two contact surfaces 226, 228 with respect to one another can be influenced by the selection of the angle of the wedge-shaped interface element 218-1. To this end, the interface element 218-1 may be selected from a
multiplicity of wedge-shaped interface elements with a different wedge angle. By machine processing of an interface element, for example grinding, a wedge- shaped interface element 218-1 can be implemented. Similarly, the projection 208-2, the second interface element 218-2, the first interface element 210-2 opposite the projection 208-2 and the carrying structure 212 can be connected to one another.
In Fig. 2B, the connecting arrangement 200A is shown with two projections 208- 1, 208-2. As an alternative, there may also be a plurality of projections 208 or only one projection 208. In this case, three projections distributed over the connecting region are preferred. In a further alternative, there is no projection 208. In this case, the second interface element 218 is directly connected releasably to the frame 204.
Because the carrying structure 212 and the first interface element 210 as well as the frame 204 with the projection 208 and the second interface element 218 are releasably connected to one another, the carrying structure 212 and the optical device 206 can be replaced. Because the gap 214 can be closed with an accurate fit with a second interface element 218, the first contact surface 226 and the second contact surface 228 can be aligned parallel with one another. This allows a very thin third junction 224, which in turn leads to a highly stiff connecting arrangement 200A.
The second interface element 218-1 shown in Fig. 2B is wedge-shaped. As an alternative, if need be, the wedge-shaped second interface element 218-1 or the first interface element 210-1 could be replaced with an interface element having any desired asymmetric or symmetrical shape, if this first contact surface 226 can thereby be aligned parallel with the second contact surface 228.
Fig. 3 shows a second embodiment of a connecting arrangement 200B with a carrying structure 212 and an optical device 206. The optical device 206 has the fourth mirror 202 of Fig. 1 and a frame 204. The carrying structure 212 is releasably connected to a first interface element 210 at a first junction 220. The optical device 206 is releasably connected by means of the frame 204 to the second interface element 218 at a second junction 222. The first interface element 210 has a first contact surface 226, which faces in the direction of the second interface element 218. The second interface element 218 has a second contact surface 228, which faces in the direction of the first interface element 210. The first interface element 210 and the second interface element 218 are connected to one another with a material fit at a third junction 224, which lies between the first contact surface 226 and the second contact surface 228.
The second interface element 218 can be rotated relative to the optical device 206. In this way, the second contact surface 228 can be aligned parallel with the first contact surface 226. The second interface element 218 may then be fixed on the optical device 206 so that rotation is no longer possible. The parallel alignment of the contact surfaces 226, 228 allows a very thin third junction 224, which in turn leads to a highly stiff connecting arrangement 200B. Because the carrying structure 212 and the first interface element 210 as well as the frame 204 of the optical device 206 and the second interface element 218 are releasably connected to one another, the carrying structure 212 and the optical device 206 can be replaced.
The second interface element 218 may have a base (not shown in Fig. 3) and a tiltable fixable element 300. The base may be releasably connected to the frame 204 of the optical device 206. The tiltable fixable element 300 of the second interface element 218 may comprise the second contact surface 228. The second contact surface 228 may then be tilted relative to the base and relative to the frame 204. After the second contact surface 228 is aligned, the tiltable fixable element 300 can be fixed by the base on the frame 204.
The carrying structure 212 preferably consists of ceramic. The frame 204 may also consist of ceramic or metal. The interface elements 210, 218 preferably comprise ceramic or metal. In the case of metals, Invar is preferably used, i.e. an iron-nickel alloy with a very low thermal expansion behaviour. The adhesive bonding at the third junction 224 may be carried out with multicomponent adhesives.
Fig. 2A, Fig. 2B and Fig. 3 respectively show the fourth mirror 202 of the EUV lithography system of Fig. 1. The connecting arrangements 200A, 200B may, however, be used for any other mirror of the EUV lithography system 100 or for another optical device 206 of the EUV lithography system 100.
Fig. 4 shows a detailed sectional view of the connecting arrangement 200B represented only schematically in Fig. 3. The first interface element 210 is releasably fastened with a screw 316 to the carrying structure 212. An axial spacer 314 may be inserted between the first interface element 210 and the carrying structure 212. The second interface element 218 has a tiltable fixable element 300 and a base 302. The tiltable fixable element 300 is, as can be seen in Fig. 4, configured as a spherical cap. The axial spacer 314 compensates for the shortest connecting path, while the tiltable fixable element 300 ensures the tilting compensation. As an alternative, an interface element 210, 218 may also be configured in a plurality of parts, in order to be able to fulfil a plurality of different functions.
The optical device 206 has a contact element 304 for contacting the tiltable fixable element 300. The base 302 may be releasably fastened by means of a nut 308 to the optical device 206, or its frame 204. There may be a washer 310 between the nut 308 and the contact element 304. The contact element 304 has, on its side lying toward the tiltable fixable element 300, a recess corresponding thereto. When the nut 308 is loosened, the tiltable fixable element 300 can be tilted while being guided by the recess. When the nut is tightened, a fixing element 312 of the base 302 presses against the tiltable fixable element 300 so that the latter is clamped with a force fit against the contact element 304 at the second junction 222. The tiltable fixable element 300 is then fixed in its position. By tilting of the tiltable fixable element 300, the first contact surface 226 and the second contact surface 228 can be aligned parallel with one another. The material-fit connection between the first contact surface 226 and the second contact surface 228 may then be carried out at the third junction 224.
The optical device may have a radial or thermal decoupler 306 for thermal compensation. The radial or thermal decoupler 306 may comprise metal, in particular Invar. The thermal decoupler 306 shown in Fig. 4 comprises the contact element 304, a web 318 and a volume element 320. The volume element 320 is adhesively bonded into the optical device 206, or into its frame 204, by means of an adhesive 330.
The base 302 represented in Fig. 4 has the shape of a flanged hollow cylinder. The base 302 extends through an opening 322 of the tiltable fixable element 300. The fixing element 312 is formed by the flange of the hollow cylinder. The fixing element 312, i.e. the flange of the hollow cylinder, is sunk in a recess 324 of the tiltable fixable element 300. When the nut 308 is tightened, a lower side 326 of the fixing element is pressed against an upper side 328 of the recess 324 of the tiltable fixable element 300. The tiltable fixable element 300 is thereby pressed against the element 304 and therefore fixed. As an alternative or in addition, the first interface element 210 may have a base 302 and a tiltable fixable element 300. The first contact surface 226 is then tiltable relative to the carrying structure 212.
In the case of a spherical geometry of the interface element 210, 218, the corresponding contact element 304 may have a pan- shaped spherical geometry.
Preferably, the first and second contact surfaces 226, 228 are planar. A thin third junction can then be implemented well. As an alternative, an interface element 210, 218 may have a tiltable fixable element in which the tilting mechanism lies inside the interface element and is not, as in Figs. 3 and 4, implemented by means of the adjoining component 206, 212. The tilting mechanism may then be carried out with a ball joint or with a rotary joint.
Fig. 5 shows an apparatus 416 for producing the connecting arrangement 200B of Fig. 3 and Fig. 4. The apparatus 416 for producing the connecting arrangement 200B has a first positioning device 400 and a second positioning device 410. The first positioning device 400 holds the carrying structure 212. The carrying structure 212 can be moved by means of the positioning device 400 in the x, y and z directions. Furthermore, the positioning device 400 has a first rotary or ball joint 402. Rotation 404 of the carrying structure 212 is therefore possible. The second positioning device 410 holds the frame 204 of the optical device 206. The frame 204 can be moved by means of the positioning device in the x, y and z directions. Furthermore, the positioning device 410 has a second rotary or ball joint 412. Rotation 414 of the frame 204 is therefore possible. The carrying structure 212 and the frame 204 can be aligned by the positioning devices 400, 410 in the installation position, i.e. in the alignment required by subsequent use. In this installation position, the connecting arrangement 200B is assembled free from stresses and deformations.
Fig. 6 shows a method by which a connecting arrangement 200B according to Figs. 3 and 4 can be produced with an apparatus 416 of Fig. 5. In a first step Si, the first interface element 210 is releasably connected to the carrying structure 212 and the second interface element 218 is releasably connected to the frame 204 of the optical device 206. In this case, the tiltable fixable element 300 of the second interface element 218 is tiltable relative to the frame 204 of the optical device 206.
In a second step S2, the second contact surface 228 of the second interface element 218 is aligned in order to compensate for an offset between the carrying structure 212 and the frame 204 of the optical device 206. The first contact surface 226 and the second contact surface 228 are brought into contact. The second contact surface 228 of the second interface element 218 is thereby tilted. The tiltable fixable element 300 of the second interface element 218 is thereby likewise tilted. After being brought into contact, the contact surfaces 226, 228 have a constant distance from one another, i.e. they are aligned parallel.
In a third step S3, the tiltable fixable element 300 of the second interface element 218 is fixed relative to the frame 204 of the optical device 206. After the alignment, the tiltable fixable element 300 of the second interface element 218 is clamped by means of the fixing element 312 of the base 302 against the contact element 304 of the optical device 206, or its frame 204. The tiltable fixable element 300 is therefore fixed. In a fourth step S4, the already parallel-aligned first and second contact surfaces 226, 228 are now connected with a material fit at the third junction 224. To this end, the first and second contact surfaces 226, 228 are moved away from one another until adhesive can be applied onto the contact surfaces 226, 228. After the adhesive has been applied, the contact surfaces 226, 228 are brought back together and are adhesively bonded to one another. As an alternative, the tiltable fixable element 300 could also be arranged in the first interface element 210. Furthermore, both interface elements 210, 218 could have a tiltable fixable element 300.
As an alternative or in addition, before the first two steps a measurement may be made of the space available between the carrying structure 212 and the optical device 206. With the aid of the result of this measurement, the interface elements 210, 218 with the suitable asymmetric or symmetrical shape and the correct density may be selected, as described for example in connection with Fig. 2B. The lithography system 100 need not be an EUV lithography system. Rather, light of a different wavelength may also be used (for example 193 nm by means of an ArF excimer laser). Furthermore, instead of the aforementioned mirrors, lens elements may also be used, particularly in the aforementioned projection system 106.
Although the present invention has been described with the aid of exemplary embodiments, it may be modified in a wide variety of ways.
LIST OF REFERENCES
100 EUV lithography system
102 beam shaping system
104 illumination system
106 projection system
108 EUV light source
110 collimator
112 monochromator
114 EUV radiation
116 first mirror
118 second mirror
120 photomask
122 wafer
124 third mirror
200 connecting arrangement
200A connecting arrangement according to the first embodiment
200B connecting arrangement according to the second embodiment
202 fourth mirror
204 frame
206 optical device
208 projection on the frame
208-1 wedge-shaped projection on the frame
208-2 projection on the frame
210 first interface element
210-1 first interface element opposite the wedge-shaped projection
210-2 first interface element opposite the projection
212 carrying structure
214 gap
216 releasable connection
218 second interface element
218-1 wedge-shaped second interface element 218-2 second interface element
220 first junction
222 second junction
224 third junction
226 first contact surface
228 second contact surface
300 tiltable fixable element
302 base
304 contact element
306 radial or thermal decoupler
308 nut
310 washer
312 fixing element
314 axial spacer
316 screw
318 web
320 volume element
322 opening of the tiltable fixable element
324 recess of the tiltable fixable element
326 lower side of the fixing element
328 upper side of the recess of the tiltable fixable element
330 adhesive
400 first positioning device
402 first rotary or ball joint
404 rotation of the carrying structure
410 second positioning device
412 second rotary or ball joint
414 rotation of the frame
416 apparatus for producing a connecting arrangement
418 shortest connecting path
420 directions perpendicular to the shortest connecting path

Claims

PATENT CLAIMS
Connecting arrangement (200A, 200B) for a lithography system (100), comprising:
a first component (212),
a second component (206),
a first interface element (210), which is releasably connected to the first component (212) at a first junction (220), and
a second interface element (218), which is releasably connected to the second component (206) at a second junction (222),
wherein the first interface element (210) has a first contact surface (226), the second interface element (218) has a second contact surface (228), and at least one of the two contact surfaces (226, 228) is configured in order to be aligned and/or selected in order to compensate for an offset between the first component (212) and the second component (206) before the two contact surfaces (226, 228) are connected at a third junction (224),
wherein the first contact surface (226) of the first interface element (210) and the second contact surface (228) of the second interface element (218) are connected by means of a material-fit connection at the third junction (224).
Connecting arrangement according to Claim 1, wherein the at least one of the two contact surfaces (226, 228) of the first and second interface elements (210, 218) can be aligned in relation to the shortest connecting path (418) or in relation to the directions (420) perpendicular to the shortest connecting path and/or in relation to the angle of the two contact surfaces (226, 228) with respect to one another.
Connecting arrangement according to Claim 1 or 2, wherein the contact surfaces (226, 228) are parallel to one another.
4. Connecting arrangement according to one of Claims 1 to 3, wherein at least one of the interface elements (210, 218) has an asymmetric shape (218-1) in order to compensate for the offset between the components (206, 212).
5. Connecting arrangement according to Claim 4, wherein the asymmetric
shape (218-1) a is wedge shape.
6. Connecting arrangement according to one of Claims 1 to 5, wherein the first interface element (210) has a base (302) and a tiltable fixable element (300) in order to tilt the first contact surface (226) relative to the base (302), and/or wherein the second interface element (218) has a base (302) and a tiltable fixable element (300) in order to tilt the second contact surface (228) relative to the base (302).
7. Connecting arrangement according to one of Claims 1 to 6, wherein the first contact surface (226) of the first interface element (210) is planar, and/or the second contact surface (228) of the second interface element (218) is planar.
8. Connecting arrangement according to Claim 6 or 7, wherein the tiltable
fixable element (300) of the first interface element (210) and/or of the second interface element (218) is configured as a spherical cap, and the component (206, 212) on which the tiltable fixable element (300) is fixed has a
corresponding recess.
9. Connecting arrangement according to one of Claims 6 to 8, wherein the base
(302) has a fixing element (312), which clamps the tiltable fixable element (300) against the component (206, 212) for fixing.
10. Connecting arrangement according to one of Claims 1 to 9, wherein the first component has a carrying structure (212) and the second component has an optical device (206).
11. Connecting arrangement as claimed Claim 10, wherein the optical device (206) has a frame (204) and a mirror (202) or a lens element.
12. Lithography system, in particular EUV lithography system (100), having one or more connecting arrangements (200A, 200B) according to one of Claims 1 to 11.
13. Method for producing a connecting arrangement (200A, 200B) for a
lithography system (100), having the steps:
a) releasable connection of a first interface element (210) to a first component
(212) and of a second interface element (218) to a second component (206), so that a tiltable fixable element (300) of the first interface element (210) and/or a tiltable fixable element (300) of the second interface element (218) is tiltable relative to the first component (212) and/or the second component (206),
b) alignment of a first contact surface (226) of the first interface element (210) and/or a second contact surface (228) of the second interface element (218) in order to compensate for an offset between the first and second components (206, 212),
c) fixing of the tiltable fixable element (300) of the first interface element
(210) relative to the first component (212) and/or fixing of the tiltable fixable element (300) of the second interface element (218) relative to the second component (206), and
d) material-fit connection of the first contact surface (226) of the first interface element (210) to the second contact surface (228) of the second interface element (218).
14. Method according to Claim 13, wherein step b) comprises^
tilting of the first contact surface (226) of the first interface element (210) by bringing the first contact surface (226) of the first interface element (210) and the second contact surface (228) of the second interface element (218) in contact, the tiltable fixable element (300) of the first interface element (210) being tilted so that the first contact surface (226) of the first interface element (210) and the second contact surface (228) of the second interface element (218) have a constant distance from one another,
and/or
tilting of the second contact surface (228) of the second interface element
(218) by bringing the second contact surface (228) of the second interface element (218) and the first contact surface (226) of the first interface element (210) in contact, the tiltable fixable element (300) of the second interface element (218) being tilted so that the second contact surface (228) of the second interface element (218) and the first contact surface (226) of the first interface element (210) have a constant distance from one another.
15. Method for producing a connecting arrangement (200A, 200B) for a
lithography system (100), having the steps:
a) selecting and/or producing a first interface element (210) and a second interface element (218)
b) releasable connection of the first interface element (210) to a first component (212),
c) releasable connection of the second interface element (218) to a second component (206),
d) material-fit connection of the first contact surface (226) of the first interface element (210) to the second contact surface (228) of the second interface element (218). 16. Method according to one of Claims 13 to 15, wherein before step a) a
measurement is made of the space which is available between the first component (212) and the second component (206), in order to be able to select the interface elements (210, 218) with the suitable shape (218-1). 17. Method according to Claim 15 or 16, wherein step a) comprises^
selection of the first interface element (210) and/or of the second interface element (218) from a set of interface elements (210, 218), the set of interface elements (210, 218) having a plurality of interface elements with different geometry.
18. Method according to one of Claims 15 to 17, wherein step a) comprises^
production of the first interface element (210) and/or of the second interface element (218) by means of grinding, milling or cutting.
19. Method according to one of Claims 13 to 18, wherein step d) comprises^
dl) moving the first contact surface (226) and the second contact surface (228) away from one another so that adhesive can be applied at least onto one of the two contact surfaces (226, 228),
d2) application of adhesive onto at least one of the two contact surfaces (226, 228), and
d3) bringing together and adhesively bonding the contact surfaces (226, 228).
PCT/EP2015/077904 2014-12-09 2015-11-27 Connecting arrangement for a lithography system WO2016091616A1 (en)

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TWI669549B (en) 2019-08-21
KR20170093139A (en) 2017-08-14
TW201632930A (en) 2016-09-16
CN107003623B (en) 2021-11-02
DE102014225199A1 (en) 2016-06-09
CN107003623A (en) 2017-08-01

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