DE102014225199A1 - Verbindungsanordnung für eine Lithographieanlage - Google Patents

Verbindungsanordnung für eine Lithographieanlage Download PDF

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Publication number
DE102014225199A1
DE102014225199A1 DE102014225199.0A DE102014225199A DE102014225199A1 DE 102014225199 A1 DE102014225199 A1 DE 102014225199A1 DE 102014225199 A DE102014225199 A DE 102014225199A DE 102014225199 A1 DE102014225199 A1 DE 102014225199A1
Authority
DE
Germany
Prior art keywords
interface element
contact surface
component
interface
tiltable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102014225199.0A
Other languages
German (de)
English (en)
Inventor
Dirk Schaffer
Jens Prochnau
Andreas Wurmbrand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102014225199.0A priority Critical patent/DE102014225199A1/de
Priority to CN201580067252.9A priority patent/CN107003623B/zh
Priority to PCT/EP2015/077904 priority patent/WO2016091616A1/en
Priority to KR1020177015304A priority patent/KR102507693B1/ko
Priority to TW104140108A priority patent/TWI669549B/zh
Publication of DE102014225199A1 publication Critical patent/DE102014225199A1/de
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
DE102014225199.0A 2014-12-09 2014-12-09 Verbindungsanordnung für eine Lithographieanlage Withdrawn DE102014225199A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102014225199.0A DE102014225199A1 (de) 2014-12-09 2014-12-09 Verbindungsanordnung für eine Lithographieanlage
CN201580067252.9A CN107003623B (zh) 2014-12-09 2015-11-27 光刻系统的连接配置
PCT/EP2015/077904 WO2016091616A1 (en) 2014-12-09 2015-11-27 Connecting arrangement for a lithography system
KR1020177015304A KR102507693B1 (ko) 2014-12-09 2015-11-27 리소그래피 시스템용 연결 장치
TW104140108A TWI669549B (zh) 2014-12-09 2015-12-01 微影系統的連接配置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014225199.0A DE102014225199A1 (de) 2014-12-09 2014-12-09 Verbindungsanordnung für eine Lithographieanlage

Publications (1)

Publication Number Publication Date
DE102014225199A1 true DE102014225199A1 (de) 2016-06-09

Family

ID=54705624

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014225199.0A Withdrawn DE102014225199A1 (de) 2014-12-09 2014-12-09 Verbindungsanordnung für eine Lithographieanlage

Country Status (5)

Country Link
KR (1) KR102507693B1 (zh)
CN (1) CN107003623B (zh)
DE (1) DE102014225199A1 (zh)
TW (1) TWI669549B (zh)
WO (1) WO2016091616A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018218110A1 (de) * 2018-10-23 2020-04-23 Carl Zeiss Smt Gmbh Abstandshalter, optisches system und lithographieanlage

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
US6663247B1 (en) * 2000-08-31 2003-12-16 Mitsubishi Denki Kabushiki Kaisha Reflecting mirror unit
WO2005106557A1 (en) 2004-05-03 2005-11-10 Carl Zeiss Smt Ag Optical assembly structure comprising a connecting body with thermal expansion compensation means
DE102005060622A1 (de) * 2005-12-19 2007-04-19 Carl Zeiss Smt Ag Montagevorrichtung für eine optische Einrichtung
DE102009035192A1 (de) * 2009-07-29 2010-08-05 Carl Zeiss Smt Ag Selbsthemmende Justagevorrichtung bei einer Vorrichtung zur Positionierung eines Elements
DE102011114123A1 (de) * 2010-09-29 2012-04-05 Carl Zeiss Smt Gmbh System zur Ausrichtung eines optischen Elements und Verfahren hierfür

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284208A (ja) * 2000-03-30 2001-10-12 Mitsubishi Electric Corp Ｘ線マスクの製造方法、およびｘ線マスクを用いた露光方法
US6985359B2 (en) * 2003-04-21 2006-01-10 Hewlett-Packard Development Company, L.P. Variable-wedge thermal-interface device
DE10359576A1 (de) * 2003-12-18 2005-07-28 Carl Zeiss Smt Ag Verfahren zur Herstellung einer optischen Einheit
EP2045645A1 (en) * 2006-07-06 2009-04-08 Nikon Corporation Micro actuator, optical unit, exposure device, and device manufacturing method
CN101241314B (zh) * 2008-03-11 2010-06-23 上海微电子装备有限公司 可补偿z向位置的六自由度精密定位台
CN102012638B (zh) * 2009-09-04 2012-11-14 上海微电子装备有限公司 具有可平衡力矩的驱动装置的光刻机工件台
NL2008695A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv Lithographic apparatus comprising substrate table.
JP6114516B2 (ja) * 2012-08-21 2017-04-12 キヤノン株式会社 光学装置、露光装置、および物品製造方法
DE102013100535B4 (de) * 2013-01-18 2015-07-16 Von Ardenne Gmbh Vorrichtung und Verfahren zum Ausrichten eines Substrates und einer Maske

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
US6663247B1 (en) * 2000-08-31 2003-12-16 Mitsubishi Denki Kabushiki Kaisha Reflecting mirror unit
WO2005106557A1 (en) 2004-05-03 2005-11-10 Carl Zeiss Smt Ag Optical assembly structure comprising a connecting body with thermal expansion compensation means
DE102005060622A1 (de) * 2005-12-19 2007-04-19 Carl Zeiss Smt Ag Montagevorrichtung für eine optische Einrichtung
DE102009035192A1 (de) * 2009-07-29 2010-08-05 Carl Zeiss Smt Ag Selbsthemmende Justagevorrichtung bei einer Vorrichtung zur Positionierung eines Elements
DE102011114123A1 (de) * 2010-09-29 2012-04-05 Carl Zeiss Smt Gmbh System zur Ausrichtung eines optischen Elements und Verfahren hierfür

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018218110A1 (de) * 2018-10-23 2020-04-23 Carl Zeiss Smt Gmbh Abstandshalter, optisches system und lithographieanlage
US11460780B2 (en) 2018-10-23 2022-10-04 Carl Zeiss Smt Gmbh Method for adusting a first element of a lithography apparatus towards a second element of a lithography apparatus by a tunable spacer

Also Published As

Publication number Publication date
TW201632930A (zh) 2016-09-16
TWI669549B (zh) 2019-08-21
KR20170093139A (ko) 2017-08-14
CN107003623B (zh) 2021-11-02
KR102507693B1 (ko) 2023-03-09
CN107003623A (zh) 2017-08-01
WO2016091616A1 (en) 2016-06-16

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Date Code Title Description
R012 Request for examination validly filed
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: G03F0007200000

Ipc: G02B0007000000

R120 Application withdrawn or ip right abandoned