KR102502436B1 - 경합금 상에 얇은 기능성 코팅을 생성하는 방법 - Google Patents

경합금 상에 얇은 기능성 코팅을 생성하는 방법 Download PDF

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KR102502436B1
KR102502436B1 KR1020197007350A KR20197007350A KR102502436B1 KR 102502436 B1 KR102502436 B1 KR 102502436B1 KR 1020197007350 A KR1020197007350 A KR 1020197007350A KR 20197007350 A KR20197007350 A KR 20197007350A KR 102502436 B1 KR102502436 B1 KR 102502436B1
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plating
bath
plating current
substrate
current
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KR20190066004A (ko
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보 후
쥔저 동
펭옌 후
크리스토퍼 윌리엄 구드
위신 왕
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씨러스 매터리얼즈 사이언스 리미티드
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/16—Pretreatment, e.g. desmutting
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/24—Chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/30—Anodisation of magnesium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/20—Pretreatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
    • C25D5/44—Aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1020197007350A 2016-08-17 2017-08-16 경합금 상에 얇은 기능성 코팅을 생성하는 방법 Active KR102502436B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662376029P 2016-08-17 2016-08-17
US62/376,029 2016-08-17
PCT/IB2017/054972 WO2018033862A1 (en) 2016-08-17 2017-08-16 Method to create thin functional coatings on light alloys

Publications (2)

Publication Number Publication Date
KR20190066004A KR20190066004A (ko) 2019-06-12
KR102502436B1 true KR102502436B1 (ko) 2023-02-22

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Country Status (9)

Country Link
US (1) US10519562B2 (https=)
EP (1) EP3500695A4 (https=)
JP (2) JP2019525011A (https=)
KR (1) KR102502436B1 (https=)
CN (1) CN110114517B (https=)
AU (1) AU2017314185B2 (https=)
CA (1) CA3073008C (https=)
TW (1) TWI762503B (https=)
WO (1) WO2018033862A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019183206A (ja) * 2018-04-05 2019-10-24 本田技研工業株式会社 内燃機関用部材
TW202142744A (zh) * 2020-04-24 2021-11-16 紐西蘭商西洛斯材料科學有限公司 在鎂上形成官能化塗層的方法
TW202212640A (zh) 2020-04-24 2022-04-01 紐西蘭商西洛斯材料科學有限公司 在合金上施加著色塗層的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011099A (ja) * 2001-06-27 2003-01-15 Sharp Corp 多孔質層及びデバイス、並びにその製造方法
JP2011202194A (ja) * 2010-03-24 2011-10-13 Fujifilm Corp 金属充填微細構造体の製造方法

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3098804A (en) * 1960-03-28 1963-07-23 Kaiser Aluminium Chem Corp Metal treatment
IT991079B (it) * 1973-07-09 1975-07-30 Colale R Procedimento per riportare elettroliticamente rame su allu minio e sue leghe e prodotti ottenuti con tale procedimento
US3915811A (en) * 1974-10-16 1975-10-28 Oxy Metal Industries Corp Method and composition for electroplating aluminum alloys
JPS51138543A (en) * 1975-05-27 1976-11-30 Fuji Satsushi Kogyo Kk Coloring process for aluminum or aluminum alloy
US4067782A (en) * 1977-05-09 1978-01-10 Xerox Corporation Method of forming an electroforming mandrel
JPS5812356B2 (ja) * 1980-03-21 1983-03-08 株式会社フジクラ アルミニウムまたはアルミニウム合金の陽極酸化皮膜の表面処理方法
JP2706925B2 (ja) * 1988-09-19 1998-01-28 リョービ株式会社 耐摩耗性及び潤滑性を有するａｌ合金ダイカスト及びａｌ合金ダイカストの表面処理方法
EP0368470A1 (en) * 1988-10-14 1990-05-16 Alcan International Limited Methods for depositing finish coatings on substrates of anodisable metals and the products thereof
CA1341327C (en) * 1989-09-05 2001-12-18 Dan Fern Methods for depositing finish coatings on substrates of anodisable metals and the products thereof
US5470636A (en) * 1991-03-15 1995-11-28 Yamaha Corporation Magnetic recording medium and method of producing it
JPH05234070A (ja) * 1991-03-15 1993-09-10 Yamaha Corp 磁気記録媒体及びその製造方法
DE4243164A1 (de) * 1992-12-19 1994-06-23 Deutsche Aerospace Airbus Verfahren zur anodischen Oxidation
US5470363A (en) * 1995-01-13 1995-11-28 Envirco Corporation Air blower and filter assemblies
US5775892A (en) * 1995-03-24 1998-07-07 Honda Giken Kogyo Kabushiki Kaisha Process for anodizing aluminum materials and application members thereof
JPH1111036A (ja) * 1997-06-27 1999-01-19 Konica Corp 感光性平版印刷版
US6407047B1 (en) * 2000-02-16 2002-06-18 Atotech Deutschland Gmbh Composition for desmutting aluminum
US20020096434A1 (en) * 2001-01-19 2002-07-25 Marczak Gregory S. Continuous anodizing and coloring process
JP2005008909A (ja) * 2003-06-16 2005-01-13 Canon Inc 構造体の製造方法
JP4631047B2 (ja) * 2004-01-05 2011-02-16 国立大学法人広島大学 陽極酸化アルミナ膜を具備する構造体およびその製造方法並びにその利用
JP4654083B2 (ja) * 2005-07-20 2011-03-16 富士フイルム株式会社 金属粒子型反応触媒およびその製造方法、並びに該触媒を用いた有機合成反応装置
JP5143045B2 (ja) * 2008-07-09 2013-02-13 富士フイルム株式会社 微細構造体およびその製造方法
CN101660188B (zh) * 2008-10-11 2011-11-23 大连海事大学 在铝及其合金阳极氧化膜孔内和表面镶嵌纳米金属的方法
JP2010097840A (ja) * 2008-10-17 2010-04-30 Toyota Motor Corp 燃料電池用セパレータ及び燃料電池用セパレータの製造方法
US20130153427A1 (en) * 2011-12-20 2013-06-20 Apple Inc. Metal Surface and Process for Treating a Metal Surface
CN103173834A (zh) * 2011-12-23 2013-06-26 深圳富泰宏精密工业有限公司 铝或铝合金表面处理方法及制品
JP6237999B2 (ja) * 2013-11-07 2017-11-29 株式会社サーテック永田 接合品の製造方法
CN103668389B (zh) * 2013-11-21 2016-05-11 中国科学院合肥物质科学研究院 孔径和厚度可调的超薄双通二氧化钛纳米孔阵列薄膜的制备方法
CN104805473B (zh) * 2015-03-16 2017-12-01 河北民族师范学院 一种Co纳米线/多孔氧化铝复合薄膜、制备方法及其用途

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011099A (ja) * 2001-06-27 2003-01-15 Sharp Corp 多孔質層及びデバイス、並びにその製造方法
JP2011202194A (ja) * 2010-03-24 2011-10-13 Fujifilm Corp 金属充填微細構造体の製造方法

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TW201819692A (zh) 2018-06-01
JP2019525011A (ja) 2019-09-05
CN110114517A (zh) 2019-08-09
US10519562B2 (en) 2019-12-31
NZ749862A (en) 2025-08-29
JP7389847B2 (ja) 2023-11-30
EP3500695A1 (en) 2019-06-26
KR20190066004A (ko) 2019-06-12
WO2018033862A1 (en) 2018-02-22
US20180051388A1 (en) 2018-02-22
AU2017314185A1 (en) 2019-02-21
EP3500695A4 (en) 2020-03-25
AU2017314185B2 (en) 2022-07-14
TWI762503B (zh) 2022-05-01
CA3073008A1 (en) 2018-02-22
JP2022105544A (ja) 2022-07-14
CA3073008C (en) 2024-10-15
CN110114517B (zh) 2022-12-13

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