JP2022105544A - 軽合金上に薄い機能性コーティングを生成する方法 - Google Patents
軽合金上に薄い機能性コーティングを生成する方法 Download PDFInfo
- Publication number
- JP2022105544A JP2022105544A JP2022074943A JP2022074943A JP2022105544A JP 2022105544 A JP2022105544 A JP 2022105544A JP 2022074943 A JP2022074943 A JP 2022074943A JP 2022074943 A JP2022074943 A JP 2022074943A JP 2022105544 A JP2022105544 A JP 2022105544A
- Authority
- JP
- Japan
- Prior art keywords
- anodized
- plating current
- thin
- bath
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 68
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 55
- 229910001234 light alloy Inorganic materials 0.000 title 1
- 238000007747 plating Methods 0.000 claims abstract description 96
- 238000004070 electrodeposition Methods 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 239000010409 thin film Substances 0.000 claims abstract description 22
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 18
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000009501 film coating Methods 0.000 claims abstract description 16
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 239000011148 porous material Substances 0.000 claims description 28
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 18
- 229910052782 aluminium Inorganic materials 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 238000005238 degreasing Methods 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000011777 magnesium Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 81
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 63
- 238000007743 anodising Methods 0.000 description 29
- 229910052759 nickel Inorganic materials 0.000 description 26
- 238000012360 testing method Methods 0.000 description 24
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 15
- 230000007797 corrosion Effects 0.000 description 15
- 238000005260 corrosion Methods 0.000 description 15
- 239000012528 membrane Substances 0.000 description 13
- 230000004913 activation Effects 0.000 description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910007567 Zn-Ni Inorganic materials 0.000 description 6
- 229910007614 Zn—Ni Inorganic materials 0.000 description 6
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000012792 core layer Substances 0.000 description 5
- 239000002346 layers by function Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 238000005275 alloying Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910001094 6061 aluminium alloy Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 241000907681 Morpho Species 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- BQJCRHHNABKAKU-KBQPJGBKSA-N morphine Chemical compound O([C@H]1[C@H](C=C[C@H]23)O)C4=C5[C@@]12CCN(C)[C@@H]3CC5=CC=C4O BQJCRHHNABKAKU-KBQPJGBKSA-N 0.000 description 2
- 239000002070 nanowire Substances 0.000 description 2
- 229940078494 nickel acetate Drugs 0.000 description 2
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 241000291280 Micropterus floridanus Species 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 241000143980 Satyrinae Species 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- KALRYADCNDLICZ-UHFFFAOYSA-N [Zn].[Ni].[Ni] Chemical compound [Zn].[Ni].[Ni] KALRYADCNDLICZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 208000014451 palmoplantar keratoderma and congenital alopecia 2 Diseases 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/20—Electrolytic after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/30—Anodisation of magnesium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/20—Pretreatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/08—Rinsing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/10—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing organic acids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
本発明は、以下の実施態様を含む。
[1]薄膜コーティングの製造方法であって:
基板を前処理し;
前記基板を少なくともリン酸および硫酸を含むバスに位置させて薄い陽極酸化された層を生成し;
前記薄い陽極酸化された層を溶液中で洗浄し;
前記薄い陽極酸化された層の表面を電着バスでメッキ電流プロファイルにしたがって所定の期間にメッキし;
メッキ電流を推奨バスメッキ電流まで増加させて所望の初期コーティング厚さを有する薄膜コーティングを生成すること;を含む、薄膜コーティングの製造方法。
[2]前記基板は、アルミニウムを含む、[1]に記載の方法。
[3]前記基板は、チタニウムおよびマグネシウムのいずれかを含む、[1]に記載の方法。
[4]前記薄い陽極酸化された層は、約2ミクロン~10ミクロンの厚みを有する、[1]に記載の方法。
[5]前記前処理は:
前記基板をアルカリ性バスで脱脂し;
前記基板を溶液中で粗面化し;
前記基板を硝酸溶液でエッチングすること;を含む、[1]に記載の方法。
[6]前記洗浄のための前記溶液は、希釈フッ化水素酸を含む、[1]に記載の方法。
[7]前記薄い陽極酸化された層を洗浄することは、薄膜コーティングに対する干渉を最小化して均一な膜を生成する、[1]に記載の方法。
[8]前記薄い陽極酸化された層は、室温および定電圧で生成される、[1]に記載の方法。
[9]前記定電圧は、30ボルト(V)~60Vである、[8]に記載の方法。
[10]前記電流プロファイルは、公称メッキ電流の1つの百分率として選択される、[1]に記載の方法。
[11]前記百分率は、メッキされる表面の陽極酸化された細孔を充填するのに十分な時間である、[10]に記載の方法。
[12]前記百分率は、リン酸および硫酸バスに対する公称メッキ電流の5%~50%である、[10]に記載の方法。
[13]前記メッキ電流プロファイルは:
前記メッキ電流を第1の期間にわたってゼロから公称メッキ電流の1つの百分率まで単調な勾配で増加し;
前記メッキ電流をメッキされる表面の陽極酸化処理細孔を充填するのに十分な時間の第2の期間に、第1の値で一定に保持させ;
前記メッキ電流を陽極酸化処理層の上に均一なコーティングを提供するのに十分な時間の第3の期間に、第1の値よりも高い第2の値までに増加させること;を含む工程を通して得られる、[1]に記載の方法。
[14]初期に使用されるメッキ電流を推奨メッキ電流まで増加させて所望の初期コーティング厚さを有する薄膜コーティングを生成することをさらに含む、[1]に記載の方法。
Claims (14)
- 薄膜コーティングの製造方法であって:
基板を前処理し;
前記基板を少なくともリン酸および硫酸を含むバスに位置させて薄い陽極酸化された層を生成し;
前記薄い陽極酸化された層を溶液中で洗浄し;
前記薄い陽極酸化された層の表面を電着バスでメッキ電流プロファイルにしたがって所定の期間にメッキし;
メッキ電流を推奨バスメッキ電流まで増加させて所望の初期コーティング厚さを有する薄膜コーティングを生成すること;を含む、薄膜コーティングの製造方法。 - 前記基板は、アルミニウムを含む、請求項1に記載の方法。
- 前記基板は、チタニウムおよびマグネシウムのいずれかを含む、請求項1に記載の方法。
- 前記薄い陽極酸化された層は、約2ミクロン~10ミクロンの厚みを有する、請求項1に記載の方法。
- 前記前処理は:
前記基板をアルカリ性バスで脱脂し;
前記基板を溶液中で粗面化し;
前記基板を硝酸溶液でエッチングすること;を含む、請求項1に記載の方法。 - 前記洗浄のための前記溶液は、希釈フッ化水素酸を含む、請求項1に記載の方法。
- 前記薄い陽極酸化された層を洗浄することは、薄膜コーティングに対する干渉を最小化して均一な膜を生成する、請求項1に記載の方法。
- 前記薄い陽極酸化された層は、室温および定電圧で生成される、請求項1に記載の方法。
- 前記定電圧は、30ボルト(V)~60Vである、請求項8に記載の方法。
- 前記電流プロファイルは、公称メッキ電流の1つの百分率として選択される、請求項1に記載の方法。
- 前記百分率は、メッキされる表面の陽極酸化された細孔を充填するのに十分な時間である、請求項10に記載の方法。
- 前記百分率は、リン酸および硫酸バスに対する公称メッキ電流の5%~50%である、請求項10に記載の方法。
- 前記メッキ電流プロファイルは:
前記メッキ電流を第1の期間にわたってゼロから公称メッキ電流の1つの百分率まで単調な勾配で増加し;
前記メッキ電流をメッキされる表面の陽極酸化処理細孔を充填するのに十分な時間の第2の期間に、第1の値で一定に保持させ;
前記メッキ電流を陽極酸化処理層の上に均一なコーティングを提供するのに十分な時間の第3の期間に、第1の値よりも高い第2の値までに増加させること;を含む工程を通して得られる、請求項1に記載の方法。 - 初期に使用されるメッキ電流を推奨メッキ電流まで増加させて所望の初期コーティング厚さを有する薄膜コーティングを生成することをさらに含む、請求項1に記載の方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662376029P | 2016-08-17 | 2016-08-17 | |
US62/376,029 | 2016-08-17 | ||
PCT/IB2017/054972 WO2018033862A1 (en) | 2016-08-17 | 2017-08-16 | Method to create thin functional coatings on light alloys |
JP2019530243A JP2019525011A (ja) | 2016-08-17 | 2017-08-16 | 軽合金上に薄い機能性コーティングを生成する方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019530243A Division JP2019525011A (ja) | 2016-08-17 | 2017-08-16 | 軽合金上に薄い機能性コーティングを生成する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022105544A true JP2022105544A (ja) | 2022-07-14 |
JP7389847B2 JP7389847B2 (ja) | 2023-11-30 |
Family
ID=61191295
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019530243A Withdrawn JP2019525011A (ja) | 2016-08-17 | 2017-08-16 | 軽合金上に薄い機能性コーティングを生成する方法 |
JP2022074943A Active JP7389847B2 (ja) | 2016-08-17 | 2022-04-28 | 軽合金上に薄い機能性コーティングを生成する方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019530243A Withdrawn JP2019525011A (ja) | 2016-08-17 | 2017-08-16 | 軽合金上に薄い機能性コーティングを生成する方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US10519562B2 (ja) |
EP (1) | EP3500695A4 (ja) |
JP (2) | JP2019525011A (ja) |
KR (1) | KR102502436B1 (ja) |
CN (1) | CN110114517B (ja) |
AU (1) | AU2017314185B2 (ja) |
CA (1) | CA3073008A1 (ja) |
TW (1) | TWI762503B (ja) |
WO (1) | WO2018033862A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019183206A (ja) * | 2018-04-05 | 2019-10-24 | 本田技研工業株式会社 | 内燃機関用部材 |
TW202142744A (zh) * | 2020-04-24 | 2021-11-16 | 紐西蘭商西洛斯材料科學有限公司 | 在鎂上形成官能化塗層的方法 |
TW202212640A (zh) * | 2020-04-24 | 2022-04-01 | 紐西蘭商西洛斯材料科學有限公司 | 在合金上施加著色塗層的方法 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5147549A (ja) * | 1974-10-16 | 1976-04-23 | Oxy Metal Industries Corp | |
JPS56133489A (en) * | 1980-03-21 | 1981-10-19 | Fujikura Ltd | Surface treatment for anodized film of aluminum or aluminum alloy |
JPH02138495A (ja) * | 1988-09-19 | 1990-05-28 | Ryobi Ltd | 耐摩耗性及び潤滑性を有するal合金ダイカスト及びal合金ダイカストの表面処理方法 |
JPH05234070A (ja) * | 1991-03-15 | 1993-09-10 | Yamaha Corp | 磁気記録媒体及びその製造方法 |
JPH06299393A (ja) * | 1992-12-19 | 1994-10-25 | Deutsche Aerospace Airbus Gmbh | 陽極酸化法 |
JPH1111036A (ja) * | 1997-06-27 | 1999-01-19 | Konica Corp | 感光性平版印刷版 |
JP2003011099A (ja) * | 2001-06-27 | 2003-01-15 | Sharp Corp | 多孔質層及びデバイス、並びにその製造方法 |
JP2005220436A (ja) * | 2004-01-05 | 2005-08-18 | Hiroshima Univ | 陽極酸化アルミナ膜を具備する構造体およびその製造方法並びにその利用 |
JP2010097840A (ja) * | 2008-10-17 | 2010-04-30 | Toyota Motor Corp | 燃料電池用セパレータ及び燃料電池用セパレータの製造方法 |
US20110117357A1 (en) * | 2008-07-09 | 2011-05-19 | Fujifilm Corporation | Microstructure, and method for production thereof |
JP2015089964A (ja) * | 2013-11-07 | 2015-05-11 | 株式会社サーテック永田 | 接合品の製造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3098804A (en) | 1960-03-28 | 1963-07-23 | Kaiser Aluminium Chem Corp | Metal treatment |
IT991079B (it) * | 1973-07-09 | 1975-07-30 | Colale R | Procedimento per riportare elettroliticamente rame su allu minio e sue leghe e prodotti ottenuti con tale procedimento |
JPS51138543A (en) * | 1975-05-27 | 1976-11-30 | Fuji Satsushi Kogyo Kk | Coloring process for aluminum or aluminum alloy |
US4067782A (en) * | 1977-05-09 | 1978-01-10 | Xerox Corporation | Method of forming an electroforming mandrel |
EP0368470A1 (en) * | 1988-10-14 | 1990-05-16 | Alcan International Limited | Methods for depositing finish coatings on substrates of anodisable metals and the products thereof |
CA1341327C (en) * | 1989-09-05 | 2001-12-18 | Dan Fern | Methods for depositing finish coatings on substrates of anodisable metals and the products thereof |
US5470636A (en) * | 1991-03-15 | 1995-11-28 | Yamaha Corporation | Magnetic recording medium and method of producing it |
US5470363A (en) * | 1995-01-13 | 1995-11-28 | Envirco Corporation | Air blower and filter assemblies |
US5775892A (en) * | 1995-03-24 | 1998-07-07 | Honda Giken Kogyo Kabushiki Kaisha | Process for anodizing aluminum materials and application members thereof |
US6407047B1 (en) * | 2000-02-16 | 2002-06-18 | Atotech Deutschland Gmbh | Composition for desmutting aluminum |
US20020096434A1 (en) * | 2001-01-19 | 2002-07-25 | Marczak Gregory S. | Continuous anodizing and coloring process |
JP2005008909A (ja) * | 2003-06-16 | 2005-01-13 | Canon Inc | 構造体の製造方法 |
JP4654083B2 (ja) * | 2005-07-20 | 2011-03-16 | 富士フイルム株式会社 | 金属粒子型反応触媒およびその製造方法、並びに該触媒を用いた有機合成反応装置 |
CN101660188B (zh) * | 2008-10-11 | 2011-11-23 | 大连海事大学 | 在铝及其合金阳极氧化膜孔内和表面镶嵌纳米金属的方法 |
JP5435484B2 (ja) * | 2010-03-24 | 2014-03-05 | 富士フイルム株式会社 | 金属充填微細構造体の製造方法 |
US20130153427A1 (en) * | 2011-12-20 | 2013-06-20 | Apple Inc. | Metal Surface and Process for Treating a Metal Surface |
CN103173834A (zh) * | 2011-12-23 | 2013-06-26 | 深圳富泰宏精密工业有限公司 | 铝或铝合金表面处理方法及制品 |
CN103668389B (zh) * | 2013-11-21 | 2016-05-11 | 中国科学院合肥物质科学研究院 | 孔径和厚度可调的超薄双通二氧化钛纳米孔阵列薄膜的制备方法 |
CN104805473B (zh) * | 2015-03-16 | 2017-12-01 | 河北民族师范学院 | 一种Co纳米线/多孔氧化铝复合薄膜、制备方法及其用途 |
-
2017
- 2017-08-16 KR KR1020197007350A patent/KR102502436B1/ko active IP Right Grant
- 2017-08-16 TW TW106127791A patent/TWI762503B/zh active
- 2017-08-16 JP JP2019530243A patent/JP2019525011A/ja not_active Withdrawn
- 2017-08-16 US US15/678,256 patent/US10519562B2/en active Active
- 2017-08-16 EP EP17841176.5A patent/EP3500695A4/en active Pending
- 2017-08-16 CA CA3073008A patent/CA3073008A1/en active Pending
- 2017-08-16 AU AU2017314185A patent/AU2017314185B2/en active Active
- 2017-08-16 CN CN201780049650.7A patent/CN110114517B/zh active Active
- 2017-08-16 WO PCT/IB2017/054972 patent/WO2018033862A1/en unknown
-
2022
- 2022-04-28 JP JP2022074943A patent/JP7389847B2/ja active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5147549A (ja) * | 1974-10-16 | 1976-04-23 | Oxy Metal Industries Corp | |
JPS56133489A (en) * | 1980-03-21 | 1981-10-19 | Fujikura Ltd | Surface treatment for anodized film of aluminum or aluminum alloy |
JPH02138495A (ja) * | 1988-09-19 | 1990-05-28 | Ryobi Ltd | 耐摩耗性及び潤滑性を有するal合金ダイカスト及びal合金ダイカストの表面処理方法 |
JPH05234070A (ja) * | 1991-03-15 | 1993-09-10 | Yamaha Corp | 磁気記録媒体及びその製造方法 |
JPH06299393A (ja) * | 1992-12-19 | 1994-10-25 | Deutsche Aerospace Airbus Gmbh | 陽極酸化法 |
JPH1111036A (ja) * | 1997-06-27 | 1999-01-19 | Konica Corp | 感光性平版印刷版 |
JP2003011099A (ja) * | 2001-06-27 | 2003-01-15 | Sharp Corp | 多孔質層及びデバイス、並びにその製造方法 |
JP2005220436A (ja) * | 2004-01-05 | 2005-08-18 | Hiroshima Univ | 陽極酸化アルミナ膜を具備する構造体およびその製造方法並びにその利用 |
US20110117357A1 (en) * | 2008-07-09 | 2011-05-19 | Fujifilm Corporation | Microstructure, and method for production thereof |
JP2010097840A (ja) * | 2008-10-17 | 2010-04-30 | Toyota Motor Corp | 燃料電池用セパレータ及び燃料電池用セパレータの製造方法 |
JP2015089964A (ja) * | 2013-11-07 | 2015-05-11 | 株式会社サーテック永田 | 接合品の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2018033862A1 (en) | 2018-02-22 |
CN110114517B (zh) | 2022-12-13 |
CN110114517A (zh) | 2019-08-09 |
JP7389847B2 (ja) | 2023-11-30 |
EP3500695A1 (en) | 2019-06-26 |
AU2017314185A1 (en) | 2019-02-21 |
TW201819692A (zh) | 2018-06-01 |
US10519562B2 (en) | 2019-12-31 |
CA3073008A1 (en) | 2018-02-22 |
JP2019525011A (ja) | 2019-09-05 |
KR20190066004A (ko) | 2019-06-12 |
AU2017314185B2 (en) | 2022-07-14 |
KR102502436B1 (ko) | 2023-02-22 |
US20180051388A1 (en) | 2018-02-22 |
EP3500695A4 (en) | 2020-03-25 |
TWI762503B (zh) | 2022-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7389847B2 (ja) | 軽合金上に薄い機能性コーティングを生成する方法 | |
JP4857340B2 (ja) | マグネシウム基板の電気めっき前処理 | |
US8152985B2 (en) | Method of chrome plating magnesium and magnesium alloys | |
RU2618017C2 (ru) | Никелированный и/или хромированный элемент и способ его производства | |
CN105308220A (zh) | 改善铝薄膜粘附的方法 | |
JPH0257690A (ja) | 陽極酸化処理用多層アルミニウムめっき基体 | |
KR20060073941A (ko) | 마그네슘 또는 마그네슘 합금으로 이루어진 제품 및 이의제조방법 | |
WO1991003583A1 (en) | Methods for depositing finish coatings on substrates of anodisable metals and the products thereof | |
WO2019215287A1 (en) | Nickel comprising layer array and a method for its manufacturing | |
JPH11217693A (ja) | グレー発色アルミニウム材とその着色体の製造方法 | |
JP6029202B2 (ja) | アルミニウムまたはアルミニウム合金材への純鉄の電気めっき方法 | |
JPH11181597A (ja) | アルミニウムの表面処理方法 | |
JP6274556B2 (ja) | 電解めっき方法 | |
US20220389604A1 (en) | Method to create functional coatings on magnesium | |
JP3344973B2 (ja) | アルミニウム材料の着色方法 | |
KR100779691B1 (ko) | 석재 표면의 금속도금방법 | |
Runge et al. | Plating on Aluminum | |
JP2010196100A (ja) | 黒色めっき皮膜及びその皮膜形成方法 | |
JP2908105B2 (ja) | アルミニウム又はアルミニウム合金の電解着色法 | |
JP2005163144A (ja) | 屋外部品および屋外部品の製造方法 | |
JP3139838B2 (ja) | クリア塗装用表面処理アルミニウム及びアルミニウム合金材料とその製法 | |
JPH0931690A (ja) | アルミニウムの陽極酸化皮膜の処理法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220526 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220526 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230228 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20230531 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230823 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231031 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231117 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7389847 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |