KR102475056B1 - 결함 마킹 방법 및 결함 마킹 장치, 원반의 제조 방법 및 원반, 그리고 시트의 제조 방법 및 시트 - Google Patents

결함 마킹 방법 및 결함 마킹 장치, 원반의 제조 방법 및 원반, 그리고 시트의 제조 방법 및 시트 Download PDF

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KR102475056B1
KR102475056B1 KR1020180023836A KR20180023836A KR102475056B1 KR 102475056 B1 KR102475056 B1 KR 102475056B1 KR 1020180023836 A KR1020180023836 A KR 1020180023836A KR 20180023836 A KR20180023836 A KR 20180023836A KR 102475056 B1 KR102475056 B1 KR 102475056B1
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defect
printing
pattern
film
marking
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KR20180101210A (ko
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게이타 이무라
데츠시 고시노
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스미또모 가가꾸 가부시키가이샤
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8874—Taking dimensions of defect into account
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/888—Marking defects

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Making Paper Articles (AREA)
KR1020180023836A 2017-03-03 2018-02-27 결함 마킹 방법 및 결함 마킹 장치, 원반의 제조 방법 및 원반, 그리고 시트의 제조 방법 및 시트 Active KR102475056B1 (ko)

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JPJP-P-2017-040931 2017-03-03
JP2017040931 2017-03-03

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KR20180101210A KR20180101210A (ko) 2018-09-12
KR102475056B1 true KR102475056B1 (ko) 2022-12-06

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JP (1) JP6978963B2 (enExample)
KR (1) KR102475056B1 (enExample)
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TW (1) TWI766952B (enExample)

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WO2021117273A1 (ja) * 2019-12-10 2021-06-17 日東電工株式会社 長尺光学積層体の検査方法及び検査システム
KR20230104169A (ko) * 2020-11-18 2023-07-07 닛토덴코 가부시키가이샤 시트상 제품의 제조 방법, 시트상 제품, 원반 및 중간체
JP7330253B2 (ja) * 2020-12-08 2023-08-21 住友化学株式会社 マーク付き光学積層体、及び、マーク付き光学積層体の製造方法
JP7594917B2 (ja) * 2021-01-08 2024-12-05 日東電工株式会社 光学積層フィルムの検査方法及びフィルム製品の製造方法
CN114604678A (zh) * 2022-03-11 2022-06-10 凌云光技术股份有限公司 一种消除缺陷定位误差的方法

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JP2007192660A (ja) * 2006-01-19 2007-08-02 Fujifilm Corp フイルムの表面欠陥検出方法及び検出機
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JP2016176836A (ja) * 2015-03-20 2016-10-06 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法

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JP3660763B2 (ja) * 1996-06-26 2005-06-15 株式会社日立製作所 被検査パターンの検査方法及び製造プロセス診断方法並びに半導体基板の製造方法
JP3878340B2 (ja) * 1998-09-18 2007-02-07 株式会社ルネサステクノロジ パターンの欠陥検査方法およびその装置
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JP3890430B2 (ja) * 1999-08-24 2007-03-07 富士フイルム株式会社 表面検査方法及び装置
JP2001305070A (ja) 2000-04-19 2001-10-31 Sumitomo Chem Co Ltd シート状製品の欠陥マーキング方法および装置
JP4343456B2 (ja) 2001-04-03 2009-10-14 大日本印刷株式会社 シート状製品の欠陥マーキング方法および装置
JP4049723B2 (ja) * 2003-09-04 2008-02-20 沖電気工業株式会社 窒化物半導体素子の製造方法及び窒化物半導体素子の製造装置
JP2006071560A (ja) * 2004-09-03 2006-03-16 Fuji Photo Film Co Ltd 光ファイバの欠陥検出装置
JP2008020321A (ja) * 2006-07-13 2008-01-31 Purex:Kk 欠陥マーキング装置付き欠陥布片検出装置
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JP2014048206A (ja) * 2012-08-31 2014-03-17 Sharp Corp 欠陥分類装置、欠陥分類方法、制御プログラム、および記録媒体
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JP2007192660A (ja) * 2006-01-19 2007-08-02 Fujifilm Corp フイルムの表面欠陥検出方法及び検出機
JP2014224763A (ja) * 2013-05-16 2014-12-04 住友化学株式会社 欠陥検査システム
JP2016176836A (ja) * 2015-03-20 2016-10-06 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法

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JP6978963B2 (ja) 2021-12-08
TW201837456A (zh) 2018-10-16
TWI766952B (zh) 2022-06-11
CN108535259A (zh) 2018-09-14
KR20180101210A (ko) 2018-09-12
JP2018146580A (ja) 2018-09-20

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