CN108535259B - 缺陷标注方法及装置、卷料和片的制造方法及卷料和片 - Google Patents

缺陷标注方法及装置、卷料和片的制造方法及卷料和片 Download PDF

Info

Publication number
CN108535259B
CN108535259B CN201810169825.4A CN201810169825A CN108535259B CN 108535259 B CN108535259 B CN 108535259B CN 201810169825 A CN201810169825 A CN 201810169825A CN 108535259 B CN108535259 B CN 108535259B
Authority
CN
China
Prior art keywords
defect
pattern
printed
film
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201810169825.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN108535259A (zh
Inventor
井村圭太
越野哲史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CN108535259A publication Critical patent/CN108535259A/zh
Application granted granted Critical
Publication of CN108535259B publication Critical patent/CN108535259B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8914—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the material examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8874—Taking dimensions of defect into account
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/888—Marking defects

Landscapes

  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Making Paper Articles (AREA)
CN201810169825.4A 2017-03-03 2018-02-28 缺陷标注方法及装置、卷料和片的制造方法及卷料和片 Active CN108535259B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-040931 2017-03-03
JP2017040931 2017-03-03

Publications (2)

Publication Number Publication Date
CN108535259A CN108535259A (zh) 2018-09-14
CN108535259B true CN108535259B (zh) 2022-05-06

Family

ID=63486407

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810169825.4A Active CN108535259B (zh) 2017-03-03 2018-02-28 缺陷标注方法及装置、卷料和片的制造方法及卷料和片

Country Status (4)

Country Link
JP (1) JP6978963B2 (enExample)
KR (1) KR102475056B1 (enExample)
CN (1) CN108535259B (enExample)
TW (1) TWI766952B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021117273A1 (ja) * 2019-12-10 2021-06-17 日東電工株式会社 長尺光学積層体の検査方法及び検査システム
KR20230104169A (ko) * 2020-11-18 2023-07-07 닛토덴코 가부시키가이샤 시트상 제품의 제조 방법, 시트상 제품, 원반 및 중간체
JP7330253B2 (ja) * 2020-12-08 2023-08-21 住友化学株式会社 マーク付き光学積層体、及び、マーク付き光学積層体の製造方法
JP7594917B2 (ja) * 2021-01-08 2024-12-05 日東電工株式会社 光学積層フィルムの検査方法及びフィルム製品の製造方法
CN114604678A (zh) * 2022-03-11 2022-06-10 凌云光技术股份有限公司 一种消除缺陷定位误差的方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074812A (ja) * 1996-06-26 1998-03-17 Hitachi Ltd 被検査パターンの検査方法及び製造プロセス診断方法並びに半導体基板の製造方法
JP2000097869A (ja) * 1998-09-18 2000-04-07 Hitachi Ltd パターンの欠陥検査方法およびその装置
CN101210889A (zh) * 2006-12-30 2008-07-02 大元科技股份有限公司 全像式自动光学检测系统及方法
JP2011012986A (ja) * 2009-06-30 2011-01-20 Toppan Printing Co Ltd 印刷物検査装置
CN102099672A (zh) * 2008-07-18 2011-06-15 旭硝子株式会社 用于缺陷检查的图像数据的处理装置及方法、使用它们的缺陷检查装置及方法、使用它们的板状体的制造方法、以及存储介质
JP2015230298A (ja) * 2014-06-06 2015-12-21 株式会社ニューフレアテクノロジー 検査方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0830683B2 (ja) * 1987-01-22 1996-03-27 大和製罐株式会社 製缶用金属コイル薄板の欠陥部の表示方法
JP2000051941A (ja) * 1998-08-06 2000-02-22 Nkk Corp 薄鋼板への欠陥マーキング方法
DE60036939T2 (de) * 1999-03-18 2008-08-07 Jfe Steel Corp. Verfahren und vorrichtung zur markierung von fehlern
JP3890430B2 (ja) * 1999-08-24 2007-03-07 富士フイルム株式会社 表面検査方法及び装置
JP2001305070A (ja) 2000-04-19 2001-10-31 Sumitomo Chem Co Ltd シート状製品の欠陥マーキング方法および装置
JP4343456B2 (ja) 2001-04-03 2009-10-14 大日本印刷株式会社 シート状製品の欠陥マーキング方法および装置
JP4049723B2 (ja) * 2003-09-04 2008-02-20 沖電気工業株式会社 窒化物半導体素子の製造方法及び窒化物半導体素子の製造装置
JP2006071560A (ja) * 2004-09-03 2006-03-16 Fuji Photo Film Co Ltd 光ファイバの欠陥検出装置
JP2007192660A (ja) * 2006-01-19 2007-08-02 Fujifilm Corp フイルムの表面欠陥検出方法及び検出機
JP2008020321A (ja) * 2006-07-13 2008-01-31 Purex:Kk 欠陥マーキング装置付き欠陥布片検出装置
JP2009244064A (ja) * 2008-03-31 2009-10-22 Sumitomo Chemical Co Ltd 偏光フィルムの検査方法
JP5446232B2 (ja) * 2008-04-10 2014-03-19 凸版印刷株式会社 カラーフィルタ基板の欠陥検査装置および欠陥検査方法
JP2011065184A (ja) 2009-04-10 2011-03-31 Nitto Denko Corp 光学フィルムロール原反、およびそれを用いた画像表示装置の製造方法
KR101774074B1 (ko) * 2010-03-10 2017-09-01 쓰리엠 이노베이티브 프로퍼티즈 컴파니 웨브 제조 공정에서의 응용-특정된 반복 결함 검출 시스템
JP5223998B2 (ja) * 2010-11-29 2013-06-26 大日本印刷株式会社 評価用基板
JP5274622B2 (ja) * 2011-06-27 2013-08-28 富士フイルム株式会社 欠陥検査装置及び方法
JP6004797B2 (ja) 2012-07-09 2016-10-12 大倉工業株式会社 欠陥マーキング方法、光学フィルムの製造方法および欠陥マーキング装置
JP2014048206A (ja) * 2012-08-31 2014-03-17 Sharp Corp 欠陥分類装置、欠陥分類方法、制御プログラム、および記録媒体
JP6204697B2 (ja) * 2013-05-16 2017-09-27 住友化学株式会社 欠陥検査システム
JP6182806B2 (ja) * 2013-06-04 2017-08-23 住友化学株式会社 欠陥検査システム及びフィルムの製造装置
JP6177017B2 (ja) * 2013-06-12 2017-08-09 住友化学株式会社 欠陥検査システム
JP6641093B2 (ja) * 2015-03-20 2020-02-05 住友化学株式会社 光学フィルム及び積層光学フィルムの欠陥検査方法
KR101898835B1 (ko) * 2015-04-09 2018-09-13 스미또모 가가꾸 가부시키가이샤 적층 광학 필름의 결함 검사 방법, 광학 필름의 결함 검사 방법 및 적층 광학 필름의 제조 방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074812A (ja) * 1996-06-26 1998-03-17 Hitachi Ltd 被検査パターンの検査方法及び製造プロセス診断方法並びに半導体基板の製造方法
JP2000097869A (ja) * 1998-09-18 2000-04-07 Hitachi Ltd パターンの欠陥検査方法およびその装置
CN101210889A (zh) * 2006-12-30 2008-07-02 大元科技股份有限公司 全像式自动光学检测系统及方法
CN102099672A (zh) * 2008-07-18 2011-06-15 旭硝子株式会社 用于缺陷检查的图像数据的处理装置及方法、使用它们的缺陷检查装置及方法、使用它们的板状体的制造方法、以及存储介质
JP2011012986A (ja) * 2009-06-30 2011-01-20 Toppan Printing Co Ltd 印刷物検査装置
JP2015230298A (ja) * 2014-06-06 2015-12-21 株式会社ニューフレアテクノロジー 検査方法

Also Published As

Publication number Publication date
JP6978963B2 (ja) 2021-12-08
TW201837456A (zh) 2018-10-16
TWI766952B (zh) 2022-06-11
CN108535259A (zh) 2018-09-14
KR20180101210A (ko) 2018-09-12
KR102475056B1 (ko) 2022-12-06
JP2018146580A (ja) 2018-09-20

Similar Documents

Publication Publication Date Title
CN108535259B (zh) 缺陷标注方法及装置、卷料和片的制造方法及卷料和片
JP6177017B2 (ja) 欠陥検査システム
US7976657B2 (en) Method and system for continuously manufacturing liquid-crystal display element
EP2264515B1 (en) Optical film laminate with a continuous web of cutting lines and manufacturing method and manufacturing apparatus thereof
US8016965B2 (en) Information storing, readout and calculation system for use in a system for continuously manufacturing liquid-crystal display elements, and method for producing the same
CN108535273B (zh) 缺陷检查系统、膜制造装置及方法、印刷装置及方法
WO2009123002A1 (ja) 偏光フィルムの検査方法
JP2009244064A5 (enExample)
KR102241700B1 (ko) 결함 검사 시스템 및 필름 제조 장치
JP7195042B2 (ja) 欠陥情報読取方法、欠陥情報読取システム及びフィルム製造装置
JP7117864B2 (ja) 欠陥検査システム、フィルム製造装置、フィルム製造方法、印字装置及び印字方法
JP6550168B2 (ja) 欠陥検査システム及びフィルム製造装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant