KR102474454B1 - 증착 마스크의 제조 방법 및 증착 마스크 - Google Patents

증착 마스크의 제조 방법 및 증착 마스크 Download PDF

Info

Publication number
KR102474454B1
KR102474454B1 KR1020177021747A KR20177021747A KR102474454B1 KR 102474454 B1 KR102474454 B1 KR 102474454B1 KR 1020177021747 A KR1020177021747 A KR 1020177021747A KR 20177021747 A KR20177021747 A KR 20177021747A KR 102474454 B1 KR102474454 B1 KR 102474454B1
Authority
KR
South Korea
Prior art keywords
metal layer
deposition mask
substrate
pattern
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020177021747A
Other languages
English (en)
Korean (ko)
Other versions
KR20170110623A (ko
Inventor
치카오 이케나가
Original Assignee
다이니폰 인사츠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이니폰 인사츠 가부시키가이샤 filed Critical 다이니폰 인사츠 가부시키가이샤
Publication of KR20170110623A publication Critical patent/KR20170110623A/ko
Application granted granted Critical
Publication of KR102474454B1 publication Critical patent/KR102474454B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/08—Perforated or foraminous objects, e.g. sieves
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • H01L51/0011—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020177021747A 2015-02-10 2016-02-05 증착 마스크의 제조 방법 및 증착 마스크 Active KR102474454B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015024626 2015-02-10
JPJP-P-2015-024626 2015-02-10
PCT/JP2016/053581 WO2016129534A1 (ja) 2015-02-10 2016-02-05 蒸着マスクの製造方法および蒸着マスク

Publications (2)

Publication Number Publication Date
KR20170110623A KR20170110623A (ko) 2017-10-11
KR102474454B1 true KR102474454B1 (ko) 2022-12-06

Family

ID=56615612

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177021747A Active KR102474454B1 (ko) 2015-02-10 2016-02-05 증착 마스크의 제조 방법 및 증착 마스크

Country Status (5)

Country Link
JP (1) JP6688478B2 (enrdf_load_stackoverflow)
KR (1) KR102474454B1 (enrdf_load_stackoverflow)
CN (2) CN107208251B (enrdf_load_stackoverflow)
TW (2) TWI682237B (enrdf_load_stackoverflow)
WO (1) WO2016129534A1 (enrdf_load_stackoverflow)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6425135B2 (ja) * 2015-04-07 2018-11-21 大日本印刷株式会社 蒸着マスクの製造方法
KR102477941B1 (ko) 2015-09-30 2022-12-16 다이니폰 인사츠 가부시키가이샤 증착 마스크, 증착 마스크의 제조 방법 및 금속판
US10541387B2 (en) 2015-09-30 2020-01-21 Dai Nippon Printing Co., Ltd. Deposition mask, method of manufacturing deposition mask and metal plate
WO2018092531A1 (ja) 2016-11-18 2018-05-24 大日本印刷株式会社 蒸着マスク
EP4148161B1 (en) 2016-12-14 2025-05-14 Dai Nippon Printing Co., Ltd. Method of manufacturing vapor deposition mask device
JP7121918B2 (ja) * 2016-12-14 2022-08-19 大日本印刷株式会社 蒸着マスク装置及び蒸着マスク装置の製造方法
US20180183014A1 (en) * 2016-12-27 2018-06-28 Int Tech Co., Ltd. Light emitting device
WO2018135255A1 (ja) * 2017-01-17 2018-07-26 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
KR102330373B1 (ko) 2017-03-14 2021-11-23 엘지이노텍 주식회사 금속판, 증착용 마스크 및 이의 제조방법
KR102418174B1 (ko) 2017-07-05 2022-07-08 다이니폰 인사츠 가부시키가이샤 증착 마스크, 증착 마스크 장치, 증착 마스크의 제조 방법 및 증착 마스크 장치의 제조 방법
JP6652227B2 (ja) * 2017-10-27 2020-02-19 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
TWI765121B (zh) 2017-11-14 2022-05-21 日商大日本印刷股份有限公司 用以製造蒸鍍罩之金屬板、金屬板之檢查方法、金屬板之製造方法、蒸鍍罩、蒸鍍罩裝置及蒸鍍罩之製造方法
JP6364599B1 (ja) * 2017-11-20 2018-08-01 株式会社プロセス・ラボ・ミクロン 微細パターンニッケル薄膜とその製造方法
JP7049593B2 (ja) * 2017-11-30 2022-04-07 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
WO2019180893A1 (ja) * 2018-03-22 2019-09-26 シャープ株式会社 蒸着マスク、及び蒸着装置
WO2020009088A1 (ja) * 2018-07-03 2020-01-09 大日本印刷株式会社 マスク及びその製造方法
KR102773284B1 (ko) * 2018-07-09 2025-02-27 다이니폰 인사츠 가부시키가이샤 증착 마스크의 제조 방법 및 증착 마스크 장치의 제조 방법
DE202019006014U1 (de) 2018-11-13 2024-01-25 Dai Nippon Printing Co., Ltd. Metallplatte zur Herstellung von Dampfphasenabscheidungsmasken
CN211814624U (zh) * 2018-12-25 2020-10-30 大日本印刷株式会社 蒸镀掩模
JP6838693B2 (ja) * 2019-01-31 2021-03-03 大日本印刷株式会社 蒸着マスク群、電子デバイスの製造方法及び電子デバイス
CN109913804B (zh) * 2019-03-27 2021-01-26 京东方科技集团股份有限公司 掩膜版及其制造方法
CN114574908B (zh) * 2019-05-13 2022-11-25 创造未来有限公司 精细金属掩模制造方法
JP2022067159A (ja) * 2020-10-20 2022-05-06 株式会社ジャパンディスプレイ 蒸着マスクユニットとその製造方法
CN115627443A (zh) * 2020-11-18 2023-01-20 匠博先进材料科技(广州)有限公司 蒸镀掩模、组件、装置、显示装置及其制造方法和装置
KR20220091647A (ko) * 2020-12-23 2022-07-01 삼성디스플레이 주식회사 마스크 어셈블리의 제작 방법
TWI828015B (zh) * 2021-12-01 2024-01-01 達運精密工業股份有限公司 精密金屬遮罩的製造方法
JP2023106977A (ja) * 2022-01-21 2023-08-02 株式会社ジャパンディスプレイ 蒸着マスクおよびその製造方法
KR102696337B1 (ko) * 2022-08-09 2024-08-20 대진대학교 산학협력단 고정밀 미세 메탈 마스크 제조방법
CN115948710B (zh) * 2022-10-20 2024-10-18 京东方科技集团股份有限公司 一种蒸镀掩膜版及其制作方法、蒸镀设备
CN115896693A (zh) * 2022-12-23 2023-04-04 京东方科技集团股份有限公司 掩膜板、显示背板、显示装置以及掩膜板的制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045657A (ja) * 2001-05-24 2003-02-14 Kyushu Hitachi Maxell Ltd 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法
JP2003107723A (ja) * 2001-09-25 2003-04-09 Eastman Kodak Co メタルマスクの製造方法およびメタルマスク
JP2009054512A (ja) * 2007-08-29 2009-03-12 Seiko Epson Corp マスク

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001234385A (ja) 2000-02-24 2001-08-31 Tohoku Pioneer Corp メタルマスク及びその製造方法
JP2003213401A (ja) * 2002-01-16 2003-07-30 Sony Corp 蒸着マスクおよび成膜装置
JP2003253434A (ja) * 2002-03-01 2003-09-10 Sanyo Electric Co Ltd 蒸着方法及び表示装置の製造方法
EP1686655A4 (en) * 2003-11-17 2008-02-13 Jsr Corp ANISOTROPIC CONDUCTIVE SHEET, MANUFACTURING METHOD AND PRODUCT THEREFOR
JP2005154879A (ja) * 2003-11-28 2005-06-16 Canon Components Inc 蒸着用メタルマスク及びそれを用いた蒸着パターンの製造方法
TWI427682B (zh) * 2006-07-04 2014-02-21 Semiconductor Energy Lab 顯示裝置的製造方法
TWI412079B (zh) * 2006-07-28 2013-10-11 Semiconductor Energy Lab 製造顯示裝置的方法
KR101266828B1 (ko) * 2010-03-31 2013-05-27 도레이 카부시키가이샤 전사용 도너 기판, 디바이스의 제조 방법 및 유기 ｅｌ 소자
KR20130057794A (ko) * 2011-11-24 2013-06-03 삼성디스플레이 주식회사 증착용 마스크 및 증착용 마스크의 제조 방법
CN103205696A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀掩膜板
CN202576542U (zh) * 2012-01-16 2012-12-05 昆山允升吉光电科技有限公司 蒸镀用掩模板
CN103205695B (zh) * 2012-01-16 2015-11-25 昆山允升吉光电科技有限公司 一种蒸镀用掩模板及其制作工艺
CN103205697B (zh) * 2012-01-16 2016-03-02 昆山允升吉光电科技有限公司 蒸镀掩模板及其制造方法
TWI587261B (zh) * 2012-06-01 2017-06-11 半導體能源研究所股份有限公司 半導體裝置及半導體裝置的驅動方法
JP6078746B2 (ja) * 2012-12-21 2017-02-15 株式会社ブイ・テクノロジー 蒸着マスクの製造方法
JP5382259B1 (ja) 2013-01-10 2014-01-08 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
CN104213072B (zh) * 2013-05-31 2016-09-14 旭晖应用材料股份有限公司 复合式遮罩及其制造方法
CN103938154B (zh) * 2013-06-21 2017-04-19 厦门天马微电子有限公司 一种掩膜板及其制造方法
TWI727366B (zh) * 2013-08-09 2021-05-11 日商半導體能源研究所股份有限公司 發光元件、顯示模組、照明模組、發光裝置、顯示裝置、電子裝置、及照明裝置
CN103589994A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种蒸镀用掩模板的制备方法
CN103572206B (zh) * 2013-11-08 2019-01-15 昆山允升吉光电科技有限公司 一种复合掩模板组件的制作方法
CN203999787U (zh) * 2014-08-12 2014-12-10 北京维信诺科技有限公司 一种蒸镀掩膜版

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003045657A (ja) * 2001-05-24 2003-02-14 Kyushu Hitachi Maxell Ltd 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法
JP2003107723A (ja) * 2001-09-25 2003-04-09 Eastman Kodak Co メタルマスクの製造方法およびメタルマスク
JP2009054512A (ja) * 2007-08-29 2009-03-12 Seiko Epson Corp マスク

Also Published As

Publication number Publication date
CN107208251B (zh) 2019-10-25
KR20170110623A (ko) 2017-10-11
TW201921099A (zh) 2019-06-01
JP6688478B2 (ja) 2020-04-28
WO2016129534A1 (ja) 2016-08-18
CN110551973B (zh) 2022-06-14
TWI682237B (zh) 2020-01-11
CN110551973A (zh) 2019-12-10
TWI651588B (zh) 2019-02-21
JP2016148112A (ja) 2016-08-18
TW201640220A (zh) 2016-11-16
CN107208251A (zh) 2017-09-26

Similar Documents

Publication Publication Date Title
KR102474454B1 (ko) 증착 마스크의 제조 방법 및 증착 마스크
KR102477941B1 (ko) 증착 마스크, 증착 마스크의 제조 방법 및 금속판
KR102471409B1 (ko) 증착 마스크 장치 및 증착 마스크 장치의 제조 방법
JP6670469B2 (ja) 蒸着マスクおよび蒸着マスク中間体
JP6728733B2 (ja) 蒸着マスクの製造方法および蒸着マスク
JP2013245392A (ja) 蒸着マスク及び蒸着マスクの製造方法
JP6624504B2 (ja) 蒸着マスク及び蒸着マスクの製造方法
JP6709534B2 (ja) 蒸着マスク及び蒸着マスクの製造方法
JP6701543B2 (ja) 蒸着マスクおよび蒸着マスクの製造方法
WO2019082739A1 (ja) 蒸着マスク及び蒸着マスクの製造方法
JP2020037748A (ja) 蒸着マスク
JP2016121376A (ja) 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
JP6519395B2 (ja) 蒸着マスク製造方法
JP6716878B2 (ja) 蒸着マスク及び蒸着マスクの製造方法
JP6770708B2 (ja) 蒸着マスク、蒸着マスクの製造方法及び有機半導体素子の製造方法
JP6819925B2 (ja) 蒸着マスク、蒸着マスク製造方法および有機半導体素子製造方法
KR101832988B1 (ko) 모판, 모판의 제조 방법, 및 마스크의 제조 방법
JP6819931B2 (ja) 蒸着マスク及び蒸着マスク製造方法
JP6425135B2 (ja) 蒸着マスクの製造方法
JP7232430B2 (ja) 蒸着マスクの製造方法
JP7134589B2 (ja) 蒸着マスク

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20170803

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20210105

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20220409

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20221007

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20221201

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20221202

End annual number: 3

Start annual number: 1

PG1601 Publication of registration