KR102456207B1 - 분산제 - Google Patents

분산제 Download PDF

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Publication number
KR102456207B1
KR102456207B1 KR1020177017483A KR20177017483A KR102456207B1 KR 102456207 B1 KR102456207 B1 KR 102456207B1 KR 1020177017483 A KR1020177017483 A KR 1020177017483A KR 20177017483 A KR20177017483 A KR 20177017483A KR 102456207 B1 KR102456207 B1 KR 102456207B1
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KR
South Korea
Prior art keywords
less
group
formula
carbon atoms
dispersing agent
Prior art date
Application number
KR1020177017483A
Other languages
English (en)
Korean (ko)
Other versions
KR20170100531A (ko
Inventor
후미히로 다카자와
아키토 이토이
Original Assignee
카오카부시키가이샤
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Application filed by 카오카부시키가이샤 filed Critical 카오카부시키가이샤
Publication of KR20170100531A publication Critical patent/KR20170100531A/ko
Application granted granted Critical
Publication of KR102456207B1 publication Critical patent/KR102456207B1/ko

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Optical Filters (AREA)
KR1020177017483A 2014-12-26 2015-12-25 분산제 KR102456207B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-266660 2014-12-26
JP2014266660 2014-12-26
PCT/JP2015/086440 WO2016104803A1 (ja) 2014-12-26 2015-12-25 分散剤

Publications (2)

Publication Number Publication Date
KR20170100531A KR20170100531A (ko) 2017-09-04
KR102456207B1 true KR102456207B1 (ko) 2022-10-18

Family

ID=56150813

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020177017483A KR102456207B1 (ko) 2014-12-26 2015-12-25 분산제

Country Status (5)

Country Link
JP (1) JP6645000B2 (ja)
KR (1) KR102456207B1 (ja)
CN (1) CN107109076B (ja)
TW (1) TWI680011B (ja)
WO (1) WO2016104803A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4098692A4 (en) 2020-01-30 2024-02-21 Kao Corp CELLULOSE FIBER COMPOSITE
TW202231641A (zh) 2020-12-16 2022-08-16 日商富士軟片股份有限公司 組成物、膜、濾光器、固體攝像元件、圖像顯示裝置及紅外線感測器
JPWO2022130773A1 (ja) 2020-12-17 2022-06-23
WO2022172607A1 (ja) * 2021-02-12 2022-08-18 昭和電工株式会社 高分子分散剤、顔料分散組成物、及び感光性着色組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014104289A1 (ja) * 2012-12-28 2014-07-03 花王株式会社 カラーフィルター用顔料分散体

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FR2085632A1 (en) * 1970-04-10 1971-12-31 Centre Etd Ind Pharma Glycylglycollic acid derivs - hepatoprojectors normolipemiants and hypocholesterol emiants
JPH02182795A (ja) * 1989-01-10 1990-07-17 Kao Corp 漂白剤及び漂白洗浄剤組成物
JPH04215830A (ja) * 1990-03-23 1992-08-06 Dainippon Ink & Chem Inc カチオン性界面活性剤、顔料分散剤および顔料分散液
JP2801066B2 (ja) * 1990-04-05 1998-09-21 花王株式会社 漂白剤及び漂白洗浄剤組成物
JPH0680927A (ja) * 1992-08-31 1994-03-22 Dainippon Ink & Chem Inc 水性顔料分散液、水性塗料および水性印刷インキ
JP3235930B2 (ja) * 1994-01-10 2001-12-04 ダイセル化学工業株式会社 顔料分散剤の製造方法
JPH0810601A (ja) * 1994-06-27 1996-01-16 Daicel Chem Ind Ltd 顔料分散剤およびラクトン変性アミン化合物の製造方法
JP3313897B2 (ja) * 1994-08-01 2002-08-12 ダイセル化学工業株式会社 顔料分散剤
JP3534859B2 (ja) * 1994-11-22 2004-06-07 ダイセル化学工業株式会社 顔料分散剤、塗料組成物および印刷インキ組成物
JP4368123B2 (ja) 2003-03-24 2009-11-18 大日本印刷株式会社 着色レジスト用顔料分散液、感光性着色組成物、及び、カラーフィルター
JP5663878B2 (ja) 2009-02-18 2015-02-04 Jsr株式会社 着色感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
CN102030898B (zh) * 2009-09-25 2012-05-02 天津大学 Abc型两亲性生物降解聚酯三嵌段共聚物及制备方法和应用
CN102126972B (zh) * 2011-01-26 2014-02-12 齐齐哈尔大学 烷基酚聚氧乙烯醚酯二聚阳离子表面活性剂及其制备方法
CN104285167B (zh) * 2012-07-12 2017-03-01 花王株式会社 滤色器用颜料分散体及其制造方法和用途、滤色器用着色组合物及其用途、滤色器

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014104289A1 (ja) * 2012-12-28 2014-07-03 花王株式会社 カラーフィルター用顔料分散体

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Pieter Van Royen et al., Static secondary ion mass spectrometry for the surface characterisation of individual nanofibres of polycaprolactone. Anal Bioanal Chem. (2011) 399: 1163~1172*

Also Published As

Publication number Publication date
WO2016104803A1 (ja) 2016-06-30
TW201628703A (zh) 2016-08-16
JPWO2016104803A1 (ja) 2017-10-12
KR20170100531A (ko) 2017-09-04
JP6645000B2 (ja) 2020-02-12
CN107109076A (zh) 2017-08-29
CN107109076B (zh) 2019-12-31
TWI680011B (zh) 2019-12-21

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