KR102442301B1 - 구조체, 격벽 형성용 조성물, 고체 촬상 소자 및 화상 표시 장치 - Google Patents

구조체, 격벽 형성용 조성물, 고체 촬상 소자 및 화상 표시 장치 Download PDF

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KR102442301B1
KR102442301B1 KR1020207005724A KR20207005724A KR102442301B1 KR 102442301 B1 KR102442301 B1 KR 102442301B1 KR 1020207005724 A KR1020207005724 A KR 1020207005724A KR 20207005724 A KR20207005724 A KR 20207005724A KR 102442301 B1 KR102442301 B1 KR 102442301B1
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KR20200028028A (ko
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타카히로 오카와라
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Electromagnetism (AREA)
  • Organic Chemistry (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Paints Or Removers (AREA)
  • Light Receiving Elements (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
KR1020207005724A 2017-09-26 2018-08-21 구조체, 격벽 형성용 조성물, 고체 촬상 소자 및 화상 표시 장치 KR102442301B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2017-184293 2017-09-26
JP2017184293 2017-09-26
PCT/JP2018/030730 WO2019064993A1 (ja) 2017-09-26 2018-08-21 構造体、隔壁形成用組成物、固体撮像素子および画像表示装置

Publications (2)

Publication Number Publication Date
KR20200028028A KR20200028028A (ko) 2020-03-13
KR102442301B1 true KR102442301B1 (ko) 2022-09-13

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KR1020207005724A KR102442301B1 (ko) 2017-09-26 2018-08-21 구조체, 격벽 형성용 조성물, 고체 촬상 소자 및 화상 표시 장치

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JP (1) JP6842560B2 (ja)
KR (1) KR102442301B1 (ja)
TW (1) TW201915051A (ja)
WO (1) WO2019064993A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023032746A1 (ja) * 2021-08-31 2023-03-09
JP7417819B1 (ja) 2022-11-17 2024-01-19 東洋インキＳｃホールディングス株式会社 固体撮像素子、固体撮像素子の製造方法及び電子機器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009075233A1 (ja) * 2007-12-10 2009-06-18 Kaneka Corporation アルカリ現像性を有する硬化性組成物およびそれを用いた絶縁性薄膜および薄膜トランジスタ
WO2013146183A1 (ja) * 2012-03-26 2013-10-03 東レ株式会社 感光性黒色樹脂組成物及び樹脂ブラックマトリックス基板
JP2017090513A (ja) * 2015-11-02 2017-05-25 株式会社カネカ ネガ型感光性樹脂組成物、硬化物および積層体

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5054925B2 (ja) 2006-03-20 2012-10-24 富士フイルム株式会社 組成物、絶縁膜、およびその製造方法
JP2008070543A (ja) * 2006-09-13 2008-03-27 Chisso Corp 感光性組成物およびそれを用いた表示素子
JP4996946B2 (ja) 2007-03-02 2012-08-08 富士フイルム株式会社 反射防止膜形成用組成物、反射防止膜および光学デバイス
JP2009111225A (ja) 2007-10-31 2009-05-21 Fujifilm Corp 固体撮像素子及びその製造方法
JP2009206197A (ja) * 2008-02-26 2009-09-10 Fujifilm Corp ナノインプリント用硬化性組成物、硬化物およびその製造方法
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
KR102300782B1 (ko) * 2014-01-24 2021-09-13 도레이 카부시키가이샤 네거티브형 감광성 수지 조성물, 그것을 경화시켜서 이루어지는 경화막과 그 제조 방법 및 그것을 구비하는 광학 디바이스, 그리고 이면 조사형 cmos 이미지 센서
WO2018061988A1 (ja) * 2016-09-29 2018-04-05 株式会社カネカ 感光性組成物、ならびに着色パターンおよびその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009075233A1 (ja) * 2007-12-10 2009-06-18 Kaneka Corporation アルカリ現像性を有する硬化性組成物およびそれを用いた絶縁性薄膜および薄膜トランジスタ
WO2013146183A1 (ja) * 2012-03-26 2013-10-03 東レ株式会社 感光性黒色樹脂組成物及び樹脂ブラックマトリックス基板
JP2017090513A (ja) * 2015-11-02 2017-05-25 株式会社カネカ ネガ型感光性樹脂組成物、硬化物および積層体

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Publication number Publication date
JP6842560B2 (ja) 2021-03-17
KR20200028028A (ko) 2020-03-13
TW201915051A (zh) 2019-04-16
JPWO2019064993A1 (ja) 2020-11-19
WO2019064993A1 (ja) 2019-04-04

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