KR102369833B1 - 기판 처리 장치 및 기판 처리 방법 - Google Patents

기판 처리 장치 및 기판 처리 방법 Download PDF

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KR102369833B1
KR102369833B1 KR1020150058832A KR20150058832A KR102369833B1 KR 102369833 B1 KR102369833 B1 KR 102369833B1 KR 1020150058832 A KR1020150058832 A KR 1020150058832A KR 20150058832 A KR20150058832 A KR 20150058832A KR 102369833 B1 KR102369833 B1 KR 102369833B1
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substrate
unit
center
correction information
processing
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Korean (ko)
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KR20150125593A (ko
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조지 구와하라
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가부시키가이샤 스크린 홀딩스
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    • H01L21/68—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H01L21/67745—
    • H01L21/683—
    • H01L21/68714—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/0015—Orientation; Alignment; Positioning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3306—Horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020150058832A 2014-04-30 2015-04-27 기판 처리 장치 및 기판 처리 방법 Active KR102369833B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-094151 2014-04-30
JP2014094151A JP6285275B2 (ja) 2014-04-30 2014-04-30 基板処理装置および基板処理方法

Publications (2)

Publication Number Publication Date
KR20150125593A KR20150125593A (ko) 2015-11-09
KR102369833B1 true KR102369833B1 (ko) 2022-03-03

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KR1020150058832A Active KR102369833B1 (ko) 2014-04-30 2015-04-27 기판 처리 장치 및 기판 처리 방법

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US (2) US20150318198A1 (https=)
JP (1) JP6285275B2 (https=)
KR (1) KR102369833B1 (https=)
TW (1) TWI613746B (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015220746A1 (de) * 2015-10-23 2017-04-27 Ersa Gmbh Verfahren und Vorrichtung zur Platzierung elektronischer Bauteile
JP6554392B2 (ja) * 2015-11-12 2019-07-31 株式会社ディスコ スピンナー装置
JP6703785B2 (ja) * 2016-05-09 2020-06-03 キヤノン株式会社 基板処理装置、および物品製造方法
JP6744155B2 (ja) * 2016-06-30 2020-08-19 日本電産サンキョー株式会社 搬送システム
JP6727048B2 (ja) * 2016-07-12 2020-07-22 東京エレクトロン株式会社 基板搬送装置および接合システム
JP6754247B2 (ja) * 2016-08-25 2020-09-09 株式会社Ｓｃｒｅｅｎホールディングス 周縁部処理装置および周縁部処理方法
JP6842934B2 (ja) * 2017-01-27 2021-03-17 株式会社Ｓｃｒｅｅｎホールディングス 基板搬送装置、検出位置較正方法および基板処理装置
KR102783141B1 (ko) 2017-02-24 2025-03-20 삼성디스플레이 주식회사 표시 장치
JP6966913B2 (ja) * 2017-09-29 2021-11-17 川崎重工業株式会社 基板搬送装置及び基板載置部の回転軸の探索方法
EP3694302B1 (en) * 2017-10-06 2023-09-20 Fuji Corporation Substrate work system
JP6653722B2 (ja) * 2018-03-14 2020-02-26 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置
JP7181068B2 (ja) * 2018-11-30 2022-11-30 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP2024031324A (ja) 2022-08-26 2024-03-07 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP2024054636A (ja) * 2022-10-05 2024-04-17 川崎重工業株式会社 ロボットシステム、アライナおよび半導体基板のアライメント方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003152055A (ja) * 2001-11-14 2003-05-23 Rorze Corp ウエハの位置決め方法、位置決め装置並びに処理システム
JP2009212130A (ja) 2008-02-29 2009-09-17 Tokyo Electron Ltd 搬送手段のティーチング方法、記憶媒体及び基板処理装置
JP2012119370A (ja) 2010-11-29 2012-06-21 Tokyo Electron Ltd 基板処理システム、基板処理方法、プログラム及びコンピュータ記憶媒体
JP2014022589A (ja) * 2012-07-19 2014-02-03 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3833373B2 (ja) 1997-11-28 2006-10-11 大日本スクリーン製造株式会社 搬送装置及びその搬送装置を適用した基板処理装置並びにこれらに使用する治具
JPH11349280A (ja) * 1998-06-05 1999-12-21 Shinko Electric Co Ltd 懸垂式搬送装置
JP4219579B2 (ja) * 2001-07-24 2009-02-04 東京エレクトロン株式会社 ウエハ移載システム及びウエハ移載方法、並びに無人搬送車システム
WO2003043077A1 (fr) * 2001-11-14 2003-05-22 Rorze Corporation Procede et appareil de positionnement de plaquette, systeme de traitement et procede de positionnement de l'axe du siege de plaquette d'un appareil de positionnement de plaquette
JP4260423B2 (ja) * 2002-05-30 2009-04-30 ローツェ株式会社 円盤状物の基準位置教示方法、位置決め方法および搬送方法並びに、それらの方法を使用する円盤状物の基準位置教示装置、位置決め装置、搬送装置および半導体製造設備

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003152055A (ja) * 2001-11-14 2003-05-23 Rorze Corp ウエハの位置決め方法、位置決め装置並びに処理システム
JP2009212130A (ja) 2008-02-29 2009-09-17 Tokyo Electron Ltd 搬送手段のティーチング方法、記憶媒体及び基板処理装置
JP2012119370A (ja) 2010-11-29 2012-06-21 Tokyo Electron Ltd 基板処理システム、基板処理方法、プログラム及びコンピュータ記憶媒体
JP2014022589A (ja) * 2012-07-19 2014-02-03 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Also Published As

Publication number Publication date
TW201541544A (zh) 2015-11-01
US20150318198A1 (en) 2015-11-05
KR20150125593A (ko) 2015-11-09
US10468284B2 (en) 2019-11-05
TWI613746B (zh) 2018-02-01
JP2015211206A (ja) 2015-11-24
US20180047603A1 (en) 2018-02-15
JP6285275B2 (ja) 2018-02-28

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