KR102311129B1 - 검사 시스템 및 검사 시스템에 있어서의 온도 측정 방법 - Google Patents

검사 시스템 및 검사 시스템에 있어서의 온도 측정 방법 Download PDF

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KR102311129B1
KR102311129B1 KR1020197037215A KR20197037215A KR102311129B1 KR 102311129 B1 KR102311129 B1 KR 102311129B1 KR 1020197037215 A KR1020197037215 A KR 1020197037215A KR 20197037215 A KR20197037215 A KR 20197037215A KR 102311129 B1 KR102311129 B1 KR 102311129B1
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temperature
substrate
temperature measuring
inspection system
stage
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KR20200007952A (ko
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쥰 모치즈키
요시히토 야마사키
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도쿄엘렉트론가부시키가이샤
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2855—Environmental, reliability or burn-in testing
    • G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
    • G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06794—Devices for sensing when probes are in contact, or in position to contact, with measured object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2601—Apparatus or methods therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/70—Determining position or orientation of objects or cameras
    • G06T7/73—Determining position or orientation of objects or cameras using feature-based methods
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Quality & Reliability (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Evolutionary Computation (AREA)
  • Databases & Information Systems (AREA)
  • General Health & Medical Sciences (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Multimedia (AREA)
  • Computing Systems (AREA)
  • Artificial Intelligence (AREA)
KR1020197037215A 2017-05-18 2018-03-01 검사 시스템 및 검사 시스템에 있어서의 온도 측정 방법 Active KR102311129B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2017-098913 2017-05-18
JP2017098913A JP6785186B2 (ja) 2017-05-18 2017-05-18 検査システムおよび検査システムにおける温度測定方法
PCT/JP2018/007834 WO2018211775A1 (ja) 2017-05-18 2018-03-01 検査システムおよび検査システムにおける温度測定方法

Publications (2)

Publication Number Publication Date
KR20200007952A KR20200007952A (ko) 2020-01-22
KR102311129B1 true KR102311129B1 (ko) 2021-10-08

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KR1020197037215A Active KR102311129B1 (ko) 2017-05-18 2018-03-01 검사 시스템 및 검사 시스템에 있어서의 온도 측정 방법

Country Status (6)

Country Link
US (1) US11378610B2 (enExample)
JP (1) JP6785186B2 (enExample)
KR (1) KR102311129B1 (enExample)
CN (1) CN110709972B (enExample)
TW (1) TWI749227B (enExample)
WO (1) WO2018211775A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10811290B2 (en) * 2018-05-23 2020-10-20 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for inspection stations
JP7153556B2 (ja) * 2018-12-28 2022-10-14 東京エレクトロン株式会社 温度測定部材、検査装置及び温度測定方法
CN110731008B (zh) * 2019-09-12 2021-06-08 长江存储科技有限责任公司 包括具有热指示器的衬底的电子部件
KR102720570B1 (ko) * 2019-12-24 2024-10-21 에스케이하이닉스 주식회사 반도체 테스트 시스템 및 방법
US11262401B2 (en) * 2020-04-22 2022-03-01 Mpi Corporation Wafer probe station
CN114814543A (zh) * 2022-04-22 2022-07-29 上海晶岳电子有限公司 一种电源管理芯片抗温度冲击测试系统及其测试方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162048A (ja) 1998-11-25 2000-06-16 Tokyo Electron Ltd 温度測定方法および温度測定装置
JP2001024204A (ja) 1999-07-06 2001-01-26 Canon Inc 太陽電池モジュールの検査装置ならびに検査方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3995800B2 (ja) * 1998-06-03 2007-10-24 セイコーインスツル株式会社 半導体装置の検査方法
JP4548817B2 (ja) 2002-10-18 2010-09-22 東京エレクトロン株式会社 プローブ装置
JP4343151B2 (ja) * 2004-08-11 2009-10-14 東京エレクトロン株式会社 加熱プレートの温度測定方法、基板処理装置及び加熱プレートの温度測定用のコンピュータプログラム
JP2010027729A (ja) * 2008-07-16 2010-02-04 Elpida Memory Inc プローブ装置及びそれを用いた半導体ウェハの検査方法
KR101209503B1 (ko) * 2008-11-10 2012-12-07 고쿠리츠다이가쿠호진 도호쿠다이가쿠 반도체 웨이퍼의 온도 제어 장치 및 온도 제어 방법
JP2011192867A (ja) * 2010-03-16 2011-09-29 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置のステージ温度制御方法、及び表示用パネル基板の製造方法
JP5528998B2 (ja) * 2010-12-15 2014-06-25 株式会社アドバンテスト 試験装置
JP5952645B2 (ja) * 2012-06-06 2016-07-13 東京エレクトロン株式会社 ウエハ検査用インターフェース及びウエハ検査装置
JP6333112B2 (ja) * 2014-08-20 2018-05-30 東京エレクトロン株式会社 ウエハ検査装置
JP6406221B2 (ja) * 2015-11-17 2018-10-17 三菱電機株式会社 半導体装置の評価装置及び評価方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162048A (ja) 1998-11-25 2000-06-16 Tokyo Electron Ltd 温度測定方法および温度測定装置
JP2001024204A (ja) 1999-07-06 2001-01-26 Canon Inc 太陽電池モジュールの検査装置ならびに検査方法

Also Published As

Publication number Publication date
CN110709972B (zh) 2022-12-06
TW201909297A (zh) 2019-03-01
US20200174060A1 (en) 2020-06-04
KR20200007952A (ko) 2020-01-22
CN110709972A (zh) 2020-01-17
TWI749227B (zh) 2021-12-11
JP6785186B2 (ja) 2020-11-18
JP2018195725A (ja) 2018-12-06
WO2018211775A1 (ja) 2018-11-22
US11378610B2 (en) 2022-07-05

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