KR102309246B1 - 반도체 장치 - Google Patents
반도체 장치 Download PDFInfo
- Publication number
- KR102309246B1 KR102309246B1 KR1020217011689A KR20217011689A KR102309246B1 KR 102309246 B1 KR102309246 B1 KR 102309246B1 KR 1020217011689 A KR1020217011689 A KR 1020217011689A KR 20217011689 A KR20217011689 A KR 20217011689A KR 102309246 B1 KR102309246 B1 KR 102309246B1
- Authority
- KR
- South Korea
- Prior art keywords
- conductive layer
- transistor
- layer
- oxide semiconductor
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- H01L29/41733—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
-
- H01L29/45—
-
- H01L29/7869—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
Landscapes
- Thin Film Transistor (AREA)
- Semiconductor Memories (AREA)
- Electrodes Of Semiconductors (AREA)
- Non-Volatile Memory (AREA)
- Bipolar Transistors (AREA)
- Noodles (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020217031293A KR102364878B1 (ko) | 2010-01-22 | 2010-12-24 | 트랜지스터 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2010-012540 | 2010-01-22 | ||
| JP2010012540 | 2010-01-22 | ||
| PCT/JP2010/073886 WO2011089846A1 (en) | 2010-01-22 | 2010-12-24 | Semiconductor device |
| KR1020207031465A KR102244389B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207031465A Division KR102244389B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217031293A Division KR102364878B1 (ko) | 2010-01-22 | 2010-12-24 | 트랜지스터 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210046849A KR20210046849A (ko) | 2021-04-28 |
| KR102309246B1 true KR102309246B1 (ko) | 2021-10-06 |
Family
ID=44306654
Family Applications (9)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207006694A Active KR102174859B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020187006866A Active KR101952555B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020207031465A Active KR102244389B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020217011689A Active KR102309246B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020127019408A Expired - Fee Related KR101844085B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020197017627A Active KR102088281B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020217031293A Active KR102364878B1 (ko) | 2010-01-22 | 2010-12-24 | 트랜지스터 |
| KR1020147002872A Active KR101637789B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020197004850A Active KR101993584B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
Family Applications Before (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207006694A Active KR102174859B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020187006866A Active KR101952555B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020207031465A Active KR102244389B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
Family Applications After (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127019408A Expired - Fee Related KR101844085B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020197017627A Active KR102088281B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020217031293A Active KR102364878B1 (ko) | 2010-01-22 | 2010-12-24 | 트랜지스터 |
| KR1020147002872A Active KR101637789B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
| KR1020197004850A Active KR101993584B1 (ko) | 2010-01-22 | 2010-12-24 | 반도체 장치 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8492840B2 (enExample) |
| JP (9) | JP5714340B2 (enExample) |
| KR (9) | KR102174859B1 (enExample) |
| CN (2) | CN103779426B (enExample) |
| TW (11) | TWI628799B (enExample) |
| WO (1) | WO2011089846A1 (enExample) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8436403B2 (en) | 2010-02-05 | 2013-05-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device including transistor provided with sidewall and electronic appliance |
| WO2011105198A1 (en) | 2010-02-26 | 2011-09-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| KR101812467B1 (ko) * | 2010-03-08 | 2017-12-27 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| KR20120106568A (ko) * | 2011-03-18 | 2012-09-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 발광 장치의 제작 방법 |
| US8946812B2 (en) | 2011-07-21 | 2015-02-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| KR20140101817A (ko) | 2011-12-02 | 2014-08-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 제작 방법 |
| WO2013094547A1 (en) | 2011-12-23 | 2013-06-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| JP6053490B2 (ja) | 2011-12-23 | 2016-12-27 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US9219164B2 (en) | 2012-04-20 | 2015-12-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device with oxide semiconductor channel |
| US9048323B2 (en) | 2012-04-30 | 2015-06-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US9059219B2 (en) | 2012-06-27 | 2015-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing semiconductor device |
| US8754459B2 (en) * | 2012-08-31 | 2014-06-17 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
| TWI761605B (zh) | 2012-09-14 | 2022-04-21 | 日商半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
| JP6059501B2 (ja) | 2012-10-17 | 2017-01-11 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP6021586B2 (ja) | 2012-10-17 | 2016-11-09 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP6018873B2 (ja) * | 2012-10-17 | 2016-11-02 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP2014082388A (ja) | 2012-10-17 | 2014-05-08 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
| JP6283191B2 (ja) * | 2012-10-17 | 2018-02-21 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP5951442B2 (ja) * | 2012-10-17 | 2016-07-13 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP6204145B2 (ja) | 2012-10-23 | 2017-09-27 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| WO2014065343A1 (en) | 2012-10-24 | 2014-05-01 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP6220641B2 (ja) * | 2012-11-15 | 2017-10-25 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| KR102526635B1 (ko) * | 2012-11-30 | 2023-04-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| JP6329762B2 (ja) | 2012-12-28 | 2018-05-23 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US10347769B2 (en) | 2013-03-25 | 2019-07-09 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor with multi-layer source/drain electrodes |
| JP6376788B2 (ja) | 2013-03-26 | 2018-08-22 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
| KR20220163502A (ko) * | 2013-12-26 | 2022-12-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| DE112014006046T5 (de) | 2013-12-27 | 2016-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Licht emittierende Vorrichtung |
| JP6281383B2 (ja) * | 2014-04-02 | 2018-02-21 | 株式会社デンソー | 半導体素子 |
| US9954112B2 (en) * | 2015-01-26 | 2018-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| FR3041808B1 (fr) * | 2015-09-30 | 2018-02-09 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procede de realisation d'une cellule memoire resistive |
| KR20250135902A (ko) | 2015-11-20 | 2025-09-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 이 반도체 장치의 제작 방법, 또는 이 반도체 장치를 가지는 표시 장치 |
| WO2017187301A1 (en) | 2016-04-28 | 2017-11-02 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, semiconductor device, and electronic device |
| US10096718B2 (en) * | 2016-06-17 | 2018-10-09 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, electronic device, manufacturing method of transistor |
| US10615187B2 (en) | 2016-07-27 | 2020-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, semiconductor device, and electronic device |
| KR20200023573A (ko) * | 2018-08-23 | 2020-03-05 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
| JP7374114B2 (ja) * | 2018-10-03 | 2023-11-06 | 浜松ホトニクス株式会社 | ファブリペロー干渉フィルタ |
| KR102669149B1 (ko) * | 2019-01-10 | 2024-05-24 | 삼성전자주식회사 | 반도체 장치 |
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| DE102021101243A1 (de) | 2020-05-29 | 2021-12-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Speicherblock-kanalregionen |
| DE102020127831A1 (de) | 2020-05-29 | 2021-12-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Speicherarray-gatestrukturen |
| US11695073B2 (en) | 2020-05-29 | 2023-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Memory array gate structures |
| US11710790B2 (en) | 2020-05-29 | 2023-07-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory array channel regions |
| US11640974B2 (en) | 2020-06-30 | 2023-05-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Memory array isolation structures |
| US11729987B2 (en) | 2020-06-30 | 2023-08-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Memory array source/drain electrode structures |
| US11647634B2 (en) | 2020-07-16 | 2023-05-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Three-dimensional memory device and method |
| US11355516B2 (en) | 2020-07-16 | 2022-06-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Three-dimensional memory device and method |
| JP2022049604A (ja) * | 2020-09-16 | 2022-03-29 | キオクシア株式会社 | 半導体装置及び半導体記憶装置 |
| JP7706250B2 (ja) * | 2021-03-23 | 2025-07-11 | 株式会社三共 | 遊技機 |
| JP7774967B2 (ja) * | 2021-03-23 | 2025-11-25 | 株式会社三共 | 遊技機 |
| JP7774968B2 (ja) * | 2021-03-23 | 2025-11-25 | 株式会社三共 | 遊技機 |
| WO2023237961A1 (ja) * | 2022-06-10 | 2023-12-14 | 株式会社半導体エネルギー研究所 | 半導体装置、記憶装置、及び半導体装置の作製方法 |
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