KR102208828B1 - 감광성 수지 조성물, 드라이 필름, 및 프린트 배선판 - Google Patents

감광성 수지 조성물, 드라이 필름, 및 프린트 배선판 Download PDF

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KR102208828B1
KR102208828B1 KR1020197007360A KR20197007360A KR102208828B1 KR 102208828 B1 KR102208828 B1 KR 102208828B1 KR 1020197007360 A KR1020197007360 A KR 1020197007360A KR 20197007360 A KR20197007360 A KR 20197007360A KR 102208828 B1 KR102208828 B1 KR 102208828B1
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South Korea
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resin composition
photosensitive resin
group
carboxyl group
acid
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KR1020197007360A
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English (en)
Korean (ko)
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KR20200016822A (ko
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미치야 히구치
유스케 후지와라
소이치 하시모토
다카시 아라이
히로노부 가와사토
신지 이나바
Original Assignee
고오 가가쿠고교 가부시키가이샤
닛테츠 케미컬 앤드 머티리얼 가부시키가이샤
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Publication of KR20200016822A publication Critical patent/KR20200016822A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L21/00—Compositions of unspecified rubbers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
KR1020197007360A 2017-06-09 2018-05-08 감광성 수지 조성물, 드라이 필름, 및 프린트 배선판 KR102208828B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017114695 2017-06-09
JPJP-P-2017-114695 2017-06-09
PCT/JP2018/017810 WO2018225441A1 (ja) 2017-06-09 2018-05-08 感光性樹脂組成物、ドライフィルム、及びプリント配線板

Publications (2)

Publication Number Publication Date
KR20200016822A KR20200016822A (ko) 2020-02-17
KR102208828B1 true KR102208828B1 (ko) 2021-01-27

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KR1020197007360A KR102208828B1 (ko) 2017-06-09 2018-05-08 감광성 수지 조성물, 드라이 필름, 및 프린트 배선판

Country Status (5)

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JP (1) JP6733929B2 (zh)
KR (1) KR102208828B1 (zh)
CN (1) CN109791354B (zh)
TW (1) TWI727175B (zh)
WO (1) WO2018225441A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7251323B2 (ja) * 2019-05-31 2023-04-04 株式会社レゾナック 感光性樹脂組成物、感光性樹脂フィルム、多層プリント配線板、半導体パッケージ、及び多層プリント配線板の製造方法
CN112526823A (zh) * 2019-09-19 2021-03-19 株式会社田村制作所 感光性树脂组合物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002064276A (ja) 2000-08-22 2002-02-28 Nippon Steel Chem Co Ltd 光又は熱硬化性樹脂組成物及び多層プリント配線基板
JP2002357895A (ja) 2001-05-31 2002-12-13 Mitsubishi Gas Chem Co Inc レジスト樹脂組成物
JP2008225244A (ja) 2007-03-14 2008-09-25 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2012041452A (ja) 2010-08-19 2012-03-01 Hitachi Chem Co Ltd ポリヒドロキシウレタン化合物及びその製造方法、並びに、硬化性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2016188985A (ja) 2015-03-30 2016-11-04 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化物、半導体装置及びレジストパターンの形成方法

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JP3496674B2 (ja) * 1997-11-28 2004-02-16 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いた感光性エレメント
JP4683182B2 (ja) * 2004-09-28 2011-05-11 山栄化学株式会社 感光性熱硬化性樹脂組成物、並びにレジスト被覆プリント配線板及びその製造法
JP4508929B2 (ja) 2005-03-31 2010-07-21 新日鐵化学株式会社 絶縁膜用感光性樹脂組成物
JP5585065B2 (ja) * 2009-01-30 2014-09-10 Ｊｓｒ株式会社 感光性絶縁樹脂組成物及びその硬化物並びに絶縁膜の製造方法
JP5571990B2 (ja) * 2009-06-04 2014-08-13 旭化成イーマテリアルズ株式会社 ネガ型感光性樹脂組成物、硬化レリーフパターン形成・製造方法、並びに半導体装置
JP5661293B2 (ja) * 2010-02-08 2015-01-28 太陽ホールディングス株式会社 光硬化性樹脂組成物、ドライフィルム、硬化物及びプリント配線板
JP6123152B2 (ja) * 2010-12-08 2017-05-10 味の素株式会社 樹脂組成物
JP5723958B1 (ja) * 2013-12-02 2015-05-27 太陽インキ製造株式会社 感光性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
CN107250198B (zh) * 2015-01-28 2020-02-21 互应化学工业株式会社 含羧基树脂、感光性树脂组合物、干膜、印刷布线板以及含羧基树脂的制造方法
JP6704224B2 (ja) * 2015-04-15 2020-06-03 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
TWI620012B (zh) * 2015-11-02 2018-04-01 互應化學工業股份有限公司 感光性樹脂組成物、乾膜及印刷線路板
JP6140246B2 (ja) * 2015-11-02 2017-05-31 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、プリント配線板、及び感光性樹脂組成物の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002064276A (ja) 2000-08-22 2002-02-28 Nippon Steel Chem Co Ltd 光又は熱硬化性樹脂組成物及び多層プリント配線基板
JP2002357895A (ja) 2001-05-31 2002-12-13 Mitsubishi Gas Chem Co Inc レジスト樹脂組成物
JP2008225244A (ja) 2007-03-14 2008-09-25 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2012041452A (ja) 2010-08-19 2012-03-01 Hitachi Chem Co Ltd ポリヒドロキシウレタン化合物及びその製造方法、並びに、硬化性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP2016188985A (ja) 2015-03-30 2016-11-04 日立化成株式会社 感光性樹脂組成物、感光性エレメント、硬化物、半導体装置及びレジストパターンの形成方法

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JPWO2018225441A1 (ja) 2019-07-11
TW201902973A (zh) 2019-01-16
CN109791354B (zh) 2021-06-04
JP6733929B2 (ja) 2020-08-05
TWI727175B (zh) 2021-05-11
CN109791354A (zh) 2019-05-21
KR20200016822A (ko) 2020-02-17
WO2018225441A1 (ja) 2018-12-13

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