KR102203303B1 - 저온 경화 가능한 네거티브형 감광성 조성물 - Google Patents

저온 경화 가능한 네거티브형 감광성 조성물 Download PDF

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Publication number
KR102203303B1
KR102203303B1 KR1020140072442A KR20140072442A KR102203303B1 KR 102203303 B1 KR102203303 B1 KR 102203303B1 KR 1020140072442 A KR1020140072442 A KR 1020140072442A KR 20140072442 A KR20140072442 A KR 20140072442A KR 102203303 B1 KR102203303 B1 KR 102203303B1
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KR
South Korea
Prior art keywords
group
meth
photosensitive composition
weight
polysiloxane
Prior art date
Application number
KR1020140072442A
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English (en)
Korean (ko)
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KR20140146008A (ko
Inventor
다이시 요코야마
아쓰코 노야
유지 다시로
나오후미 요시다
도시아키 노나카
Original Assignee
에이제트 일렉트로닉 머티어리얼스 (룩셈부르크) 에스.에이.알.엘.
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Publication of KR20140146008A publication Critical patent/KR20140146008A/ko
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Publication of KR102203303B1 publication Critical patent/KR102203303B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
KR1020140072442A 2013-06-14 2014-06-13 저온 경화 가능한 네거티브형 감광성 조성물 KR102203303B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2013126031 2013-06-14
JPJP-P-2013-126031 2013-06-14
JPJP-P-2014-114176 2014-06-02
JP2014114176A JP6466087B2 (ja) 2013-06-14 2014-06-02 低温硬化可能なネガ型感光性組成物

Publications (2)

Publication Number Publication Date
KR20140146008A KR20140146008A (ko) 2014-12-24
KR102203303B1 true KR102203303B1 (ko) 2021-01-18

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Family Applications (1)

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KR1020140072442A KR102203303B1 (ko) 2013-06-14 2014-06-13 저온 경화 가능한 네거티브형 감광성 조성물

Country Status (3)

Country Link
JP (1) JP6466087B2 (ja)
KR (1) KR102203303B1 (ja)
TW (1) TWI611267B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102631400B1 (ko) 2015-10-22 2024-01-29 삼성전자주식회사 감광성 조성물, 이로부터 제조된 양자점-폴리머 복합체 패턴, 및 이를 포함하는 전자 소자
JP2017146554A (ja) 2016-02-19 2017-08-24 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 低温硬化可能なネガ型感光性組成物
JP2017181798A (ja) 2016-03-30 2017-10-05 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 低温硬化可能なネガ型感光性組成物
JP2018028630A (ja) * 2016-08-19 2018-02-22 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ ブラックマトリックス用組成物、およびそれを用いたブラックマトリックスの製造方法
JP2018189732A (ja) * 2017-04-28 2018-11-29 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポジ型感光性シロキサン組成物、およびそれを用いて形成した硬化膜
JP2019120750A (ja) * 2017-12-28 2019-07-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 感光性シロキサン組成物およびこれを用いたパターン形成方法
KR102381639B1 (ko) * 2018-11-16 2022-04-01 주식회사 엘지화학 감광성 수지 조성물, 감광재, 디스플레이 장치 및 감광성 수지 조성물의 저온 경화 방법
JP2022102272A (ja) * 2020-12-25 2022-07-07 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング ネガ型感光性組成物

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WO2013031985A1 (ja) * 2011-08-31 2013-03-07 旭化成イーマテリアルズ株式会社 感光性アルカリ可溶シリコーン樹脂組成物
WO2013080884A1 (ja) * 2011-11-29 2013-06-06 ＡｚエレクトロニックマテリアルズＩｐ株式会社 ネガ型感光性シロキサン組成物

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Publication number Priority date Publication date Assignee Title
JP2012211968A (ja) * 2011-03-31 2012-11-01 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用着色組成物、およびカラーフィルタ
WO2013031985A1 (ja) * 2011-08-31 2013-03-07 旭化成イーマテリアルズ株式会社 感光性アルカリ可溶シリコーン樹脂組成物
WO2013080884A1 (ja) * 2011-11-29 2013-06-06 ＡｚエレクトロニックマテリアルズＩｐ株式会社 ネガ型感光性シロキサン組成物

Also Published As

Publication number Publication date
JP2015018226A (ja) 2015-01-29
JP6466087B2 (ja) 2019-02-06
TW201510659A (zh) 2015-03-16
KR20140146008A (ko) 2014-12-24
TWI611267B (zh) 2018-01-11

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