KR102018592B1 - 반사방지막부 기재의 제조방법 및 광전기 셀 - Google Patents

반사방지막부 기재의 제조방법 및 광전기 셀 Download PDF

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KR102018592B1
KR102018592B1 KR1020130072048A KR20130072048A KR102018592B1 KR 102018592 B1 KR102018592 B1 KR 102018592B1 KR 1020130072048 A KR1020130072048 A KR 1020130072048A KR 20130072048 A KR20130072048 A KR 20130072048A KR 102018592 B1 KR102018592 B1 KR 102018592B1
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refractive index
index layer
substrate
electrode
dispersion
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English (en)
Korean (ko)
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KR20140004004A (ko
Inventor
유코 하코시마
마사유키 마츠다
료 무라구치
미치오 코마츠
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니끼 쇼꾸바이 카세이 가부시키가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/209—Light trapping arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2036—Light-sensitive devices comprising an oxide semiconductor electrode comprising mixed oxides, e.g. ZnO covered TiO2 particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Photovoltaic Devices (AREA)
  • Hybrid Cells (AREA)
KR1020130072048A 2012-06-26 2013-06-24 반사방지막부 기재의 제조방법 및 광전기 셀 Expired - Fee Related KR102018592B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-143396 2012-06-26
JP2012143396A JP6317874B2 (ja) 2012-06-26 2012-06-26 反射防止膜付基材の製造方法および光電気セル

Publications (2)

Publication Number Publication Date
KR20140004004A KR20140004004A (ko) 2014-01-10
KR102018592B1 true KR102018592B1 (ko) 2019-09-05

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JP (1) JP6317874B2 (enExample)
KR (1) KR102018592B1 (enExample)
CN (1) CN103515457B (enExample)
TW (1) TWI572045B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3224215T3 (pl) * 2014-11-25 2021-08-16 Ppg Industries Ohio, Inc. Antyodblaskowe ekrany dotykowe i inne wyroby powlekane oraz metody ich formowania
CN108698918A (zh) * 2016-02-29 2018-10-23 富士胶片株式会社 层叠体的制造方法、带有防反射膜的玻璃以及太阳能电池模块
JP6609202B2 (ja) * 2016-03-08 2019-11-20 株式会社フジクラ 光電変換装置
CN106449887B (zh) * 2016-11-23 2018-01-16 绍兴文理学院 一种用于光伏组件的反光薄膜材料
JP2019129185A (ja) * 2018-01-22 2019-08-01 三菱マテリアル株式会社 サーミスタ及びその製造方法並びにサーミスタセンサ
JP7358251B2 (ja) * 2020-01-17 2023-10-10 株式会社荏原製作所 めっき支援システム、めっき支援装置、めっき支援プログラムおよびめっき実施条件決定方法
DE112021006612T5 (de) * 2020-12-24 2023-10-05 Furuya Metal Co., Ltd. Iridium-enthaltendes oxid, verfahren zu dessen herstellung und katalysator, der ein iridium-enthaltendes oxid enthält
KR102265267B1 (ko) * 2021-01-13 2021-06-17 (주)에스케이솔라에너지 건축물에 적용 가능한 컬러태양광모듈
CN113788631B (zh) * 2021-10-11 2023-05-05 上海西源新能源技术有限公司 一种ZnO-SiO2双涂层的下转换减反射膜及其制备方法
KR102461977B1 (ko) * 2022-01-20 2022-11-03 주식회사 블루비컴퍼니 광고 출력 기반의 디스플레이 어셈블리
JP2023125378A (ja) * 2022-02-28 2023-09-07 株式会社リコー 液体組成物、インクジェット吐出用液体組成物、収容容器、無機酸化物含有層の製造装置、無機酸化物含有層の製造方法、及び電気化学素子
CN114879401B (zh) * 2022-04-28 2023-10-31 Tcl华星光电技术有限公司 显示模组

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

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CH674596A5 (enExample) 1988-02-12 1990-06-15 Sulzer Ag
DE69115688T2 (de) 1990-04-17 1996-08-14 Ecole Polytech Photovoltaische zellen
JP3424876B2 (ja) * 1995-07-04 2003-07-07 松下電器産業株式会社 画像表示装置及びその製造方法
JP4100863B2 (ja) 2000-10-23 2008-06-11 触媒化成工業株式会社 光電気セル
JP4080756B2 (ja) * 2002-02-01 2008-04-23 富士フイルム株式会社 反射防止膜とその製造方法ならびに画像表示装置
FR2898295B1 (fr) * 2006-03-10 2013-08-09 Saint Gobain Substrat transparent antireflet presentant une couleur neutre en reflexion
TWI371864B (en) * 2008-01-29 2012-09-01 Big Sun Energy Technology Inc Solar cell with anti-reflection layer
KR101771757B1 (ko) * 2009-12-11 2017-08-25 니혼 이타가라스 가부시키가이샤 광전 변환 장치용 커버 유리 및 그 제조 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072315A (ja) * 2004-05-20 2006-03-16 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、及びそれを用いた画像表示装置
JP2010127951A (ja) * 2008-11-25 2010-06-10 Toray Advanced Film Co Ltd 低屈折率層形成用塗布液及び反射防止層の製造方法
JP2012086477A (ja) * 2010-10-20 2012-05-10 Hitachi Chemical Co Ltd 薄膜転写材及びその製造方法並びに薄膜付き成形体及びその製造方法

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Publication number Publication date
JP2014006443A (ja) 2014-01-16
CN103515457A (zh) 2014-01-15
CN103515457B (zh) 2017-08-25
TWI572045B (zh) 2017-02-21
KR20140004004A (ko) 2014-01-10
JP6317874B2 (ja) 2018-04-25
TW201407794A (zh) 2014-02-16

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