KR101727752B1 - 트랜스미션 게이트 및 반도체 장치 - Google Patents

트랜스미션 게이트 및 반도체 장치 Download PDF

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Publication number
KR101727752B1
KR101727752B1 KR1020110010961A KR20110010961A KR101727752B1 KR 101727752 B1 KR101727752 B1 KR 101727752B1 KR 1020110010961 A KR1020110010961 A KR 1020110010961A KR 20110010961 A KR20110010961 A KR 20110010961A KR 101727752 B1 KR101727752 B1 KR 101727752B1
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KR
South Korea
Prior art keywords
voltage
gate
input
level shifter
pmos transistor
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Expired - Fee Related
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KR1020110010961A
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English (en)
Korean (ko)
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KR20110093661A (ko
Inventor
다카시 오노
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에스아이아이 세미컨덕터 가부시키가이샤
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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/16Modifications for eliminating interference voltages or currents
    • H03K17/161Modifications for eliminating interference voltages or currents in field-effect transistor switches
    • H03K17/162Modifications for eliminating interference voltages or currents in field-effect transistor switches without feedback from the output circuit to the control circuit
    • H03K17/163Soft switching
    • H03K17/164Soft switching using parallel switching arrangements
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/16Modifications for eliminating interference voltages or currents
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/687Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/687Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
    • H03K17/693Switching arrangements with several input- or output-terminals, e.g. multiplexers, distributors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/08Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
    • H03K19/094Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
    • H03K19/0952Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using Schottky type FET MESFET
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0123Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K2217/00Indexing scheme related to electronic switching or gating, i.e. not by contact-making or -breaking covered by H03K17/00
    • H03K2217/0054Gating switches, e.g. pass gates

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Logic Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
KR1020110010961A 2010-02-09 2011-02-08 트랜스미션 게이트 및 반도체 장치 Expired - Fee Related KR101727752B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-026931 2010-02-09
JP2010026931A JP5431992B2 (ja) 2010-02-09 2010-02-09 トランスミッションゲート及び半導体装置

Publications (2)

Publication Number Publication Date
KR20110093661A KR20110093661A (ko) 2011-08-18
KR101727752B1 true KR101727752B1 (ko) 2017-04-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110010961A Expired - Fee Related KR101727752B1 (ko) 2010-02-09 2011-02-08 트랜스미션 게이트 및 반도체 장치

Country Status (5)

Country Link
US (1) US8354873B2 (enExample)
JP (1) JP5431992B2 (enExample)
KR (1) KR101727752B1 (enExample)
CN (1) CN102195637B (enExample)
TW (1) TWI530096B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010080889A1 (en) * 2009-01-07 2010-07-15 Zentrum Mikroelektronik Dresden Ag Adaptive bootstrap circuit for controlling cmos switch(es)
JP5923919B2 (ja) * 2011-10-11 2016-05-25 株式会社ソシオネクスト 半導体装置及びアナログスイッチの制御方法
TWI473072B (zh) * 2013-06-24 2015-02-11 Orise Technology Co Ltd 減少閂鎖元件數量的源極驅動裝置
CN104426528B (zh) * 2013-09-11 2019-05-07 台湾积体电路制造股份有限公司 多电压输入缓冲器及其相关方法
JP2016139390A (ja) * 2015-01-23 2016-08-04 エスアイアイ・セミコンダクタ株式会社 検出回路
US9843322B2 (en) * 2016-03-11 2017-12-12 Texas Instruments Incorporated Integrated high-side driver for P-N bimodal power device
KR101675573B1 (ko) * 2016-03-21 2016-11-11 주식회사 이노액시스 레벨 시프터, 디지털 아날로그 변환기, 버퍼 증폭기 및 이를 포함하는 소스 드라이버와 전자 장치
TWI653732B (zh) 2017-09-19 2019-03-11 世界先進積體電路股份有限公司 控制電路及操作電路
CN109560536B (zh) * 2017-09-26 2021-01-05 世界先进积体电路股份有限公司 控制电路及操作电路
US10818653B2 (en) 2017-12-12 2020-10-27 Vanguard International Semiconductor Corporation Control circuit and operating circuit utilizing the same
CN108199701B (zh) * 2017-12-28 2021-05-07 清华大学 一种高速的cmos传输门开关电路
US10763846B1 (en) * 2019-08-23 2020-09-01 Nxp Usa, Inc. High voltage tolerant analog switch
EP3799309A1 (en) * 2019-09-26 2021-03-31 Ams Ag Electric circuitry for signal transmission
US20220311439A1 (en) * 2021-03-24 2022-09-29 Stmicroelectronics International N.V. Multiplexer circuit using a transmission gate circuit with a selectively boosted switch control signal
CN120825157B (zh) * 2025-09-18 2025-11-21 苏州锴威特半导体股份有限公司 一种低导通电阻平坦度的模拟开关结构

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874971A (en) 1986-11-25 1989-10-17 North American Philips Corporation, Signetics Division Edge-sensitive dynamic switch

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
JPH01175410A (ja) * 1987-12-29 1989-07-11 Sharp Corp 半導体アナログ・スイッチ
JPH0595262A (ja) * 1991-03-30 1993-04-16 Nec Corp アナログ入力回路
US5194768A (en) * 1992-03-27 1993-03-16 Advanced Micro Devices, Inc. Apparatus for filtering noise from a periodic signal
JPH06208423A (ja) * 1993-01-12 1994-07-26 Mitsubishi Electric Corp 電源回路
JPH07169292A (ja) 1993-12-13 1995-07-04 Matsushita Electron Corp Cmosサンプルホールド回路
JPH07221642A (ja) * 1994-02-02 1995-08-18 Hitachi Ltd 半導体集積回路
US6433613B1 (en) * 2000-12-15 2002-08-13 Fairchild Semiconductor Corporation Translating switch circuit with disabling option
US6693479B1 (en) * 2002-06-06 2004-02-17 Analog Devices, Inc. Boost structures for switched-capacitor systems
JP3949027B2 (ja) * 2002-08-06 2007-07-25 富士通株式会社 アナログスイッチ回路
FR2894373B1 (fr) * 2005-12-07 2008-01-04 Atmel Corp Cellule anti-fusible autonome
JP4828343B2 (ja) * 2006-07-28 2011-11-30 三菱電機株式会社 アナログスイッチ回路
JP5018245B2 (ja) * 2007-05-31 2012-09-05 株式会社日立製作所 アナログスイッチ
JP2009017276A (ja) * 2007-07-05 2009-01-22 Nec Electronics Corp 半導体装置
JP2009108911A (ja) * 2007-10-29 2009-05-21 Akira Koyama ネジ固定機構およびネジ固定方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874971A (en) 1986-11-25 1989-10-17 North American Philips Corporation, Signetics Division Edge-sensitive dynamic switch

Also Published As

Publication number Publication date
CN102195637B (zh) 2015-07-01
US8354873B2 (en) 2013-01-15
TW201212537A (en) 2012-03-16
JP2011166449A (ja) 2011-08-25
US20110193615A1 (en) 2011-08-11
JP5431992B2 (ja) 2014-03-05
TWI530096B (zh) 2016-04-11
CN102195637A (zh) 2011-09-21
KR20110093661A (ko) 2011-08-18

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