KR101697240B1 - 광학 검사 시스템 및 방법 - Google Patents

광학 검사 시스템 및 방법 Download PDF

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Publication number
KR101697240B1
KR101697240B1 KR1020107022152A KR20107022152A KR101697240B1 KR 101697240 B1 KR101697240 B1 KR 101697240B1 KR 1020107022152 A KR1020107022152 A KR 1020107022152A KR 20107022152 A KR20107022152 A KR 20107022152A KR 101697240 B1 KR101697240 B1 KR 101697240B1
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South Korea
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delete delete
image
beam path
wafer
lens
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Expired - Fee Related
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Korean (ko)
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KR20110000560A (ko
Inventor
라스 마르크보르트
라제시와르 치베르
클라우스 엑컬
노르베르트 하렌트
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난다 테크놀로지스 게엠베하
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020107022152A 2008-04-04 2009-04-03 광학 검사 시스템 및 방법 Expired - Fee Related KR101697240B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6494908P 2008-04-04 2008-04-04
US61/064,949 2008-04-04
PCT/EP2009/002482 WO2009121628A2 (en) 2008-04-04 2009-04-03 Optical inspection system and method

Publications (2)

Publication Number Publication Date
KR20110000560A KR20110000560A (ko) 2011-01-03
KR101697240B1 true KR101697240B1 (ko) 2017-01-17

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Country Link
US (4) US8072591B2 (enExample)
JP (1) JP5749641B2 (enExample)
KR (1) KR101697240B1 (enExample)
CN (1) CN102016554B (enExample)
DE (1) DE112009000832T5 (enExample)
TW (1) TWI479583B (enExample)
WO (1) WO2009121628A2 (enExample)

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US8501503B2 (en) 2011-04-28 2013-08-06 Nanda Technologies Gmbh Methods of inspecting and manufacturing semiconductor wafers
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US9279663B2 (en) * 2012-07-30 2016-03-08 Kla-Tencor Corporation Method and apparatus to fold optics in tools for measuring shape and/or thickness of a large and thin substrate
DE102012111835A1 (de) 2012-12-05 2014-06-05 Hseb Dresden Gmbh Inspektionsvorrichtung
WO2014150232A1 (en) 2013-03-15 2014-09-25 The Board Of Trustees Of The Leland Stanford Junior University Optical lens fabrication
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US9377596B2 (en) * 2014-07-22 2016-06-28 Unimicron Technology Corp. Optical-electro circuit board, optical component and manufacturing method thereof
WO2016015734A1 (en) * 2014-08-01 2016-02-04 Dfm A/S A scatterometer apparatus
KR101741659B1 (ko) 2014-11-03 2017-05-31 주식회사 엠티엠 카메라 모듈 이물 검사를 위한 광원장치
IL243167B (en) * 2014-12-18 2021-02-28 Gordon Noam Multiple light sources that can be separated by optical inspection
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EP3270144B1 (en) * 2016-04-12 2021-12-15 Nippon Steel Corporation Inspection object imaging apparatus, inspection object imaging method, surface inspection apparatus, and surface inspection method
KR102233196B1 (ko) * 2017-01-31 2021-03-26 제이에프이 스틸 가부시키가이샤 강재 형상 계측 장치 및 강재 형상 교정 장치
US10422984B2 (en) * 2017-05-12 2019-09-24 Applied Materials, Inc. Flexible mode scanning optical microscopy and inspection system
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JP7175214B2 (ja) * 2019-02-13 2022-11-18 リコーインダストリアルソリューションズ株式会社 検査装置
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JP2003028621A (ja) 2001-07-11 2003-01-29 Nikon Corp 表面欠陥検査装置
JP2006514308A (ja) 2003-02-26 2006-04-27 エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド 同軸狭角暗視野照明
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Also Published As

Publication number Publication date
US8072591B2 (en) 2011-12-06
US8368881B2 (en) 2013-02-05
US20110043798A1 (en) 2011-02-24
US20110043796A1 (en) 2011-02-24
US20120133760A1 (en) 2012-05-31
CN102016554B (zh) 2013-01-30
US8345232B2 (en) 2013-01-01
US20100231902A1 (en) 2010-09-16
US8102521B2 (en) 2012-01-24
TWI479583B (zh) 2015-04-01
TW200952102A (en) 2009-12-16
KR20110000560A (ko) 2011-01-03
CN102016554A (zh) 2011-04-13
JP5749641B2 (ja) 2015-07-15
JP2011516844A (ja) 2011-05-26
WO2009121628A2 (en) 2009-10-08
DE112009000832T5 (de) 2011-07-28
WO2009121628A9 (en) 2009-11-26

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