JP5749641B2 - 光学検査システム及び方法 - Google Patents

光学検査システム及び方法 Download PDF

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Publication number
JP5749641B2
JP5749641B2 JP2011502299A JP2011502299A JP5749641B2 JP 5749641 B2 JP5749641 B2 JP 5749641B2 JP 2011502299 A JP2011502299 A JP 2011502299A JP 2011502299 A JP2011502299 A JP 2011502299A JP 5749641 B2 JP5749641 B2 JP 5749641B2
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JP
Japan
Prior art keywords
beam path
light
dark field
inspection system
wafer
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Expired - Fee Related
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JP2011502299A
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English (en)
Japanese (ja)
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JP2011516844A5 (enExample
JP2011516844A (ja
Inventor
マルクヴォルト、ラーズ
チヒベール、ラジェシュワー
エッケール、クラウス
ハレント、ノルベルト
Original Assignee
ナンダ テヒノロギーズ ゲーエムベーハー
ナンダ テヒノロギーズ ゲーエムベーハー
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Publication of JP2011516844A publication Critical patent/JP2011516844A/ja
Publication of JP2011516844A5 publication Critical patent/JP2011516844A5/ja
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2011502299A 2008-04-04 2009-04-03 光学検査システム及び方法 Expired - Fee Related JP5749641B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6494908P 2008-04-04 2008-04-04
US61/064,949 2008-04-04
PCT/EP2009/002482 WO2009121628A2 (en) 2008-04-04 2009-04-03 Optical inspection system and method

Publications (3)

Publication Number Publication Date
JP2011516844A JP2011516844A (ja) 2011-05-26
JP2011516844A5 JP2011516844A5 (enExample) 2012-05-24
JP5749641B2 true JP5749641B2 (ja) 2015-07-15

Family

ID=41059655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011502299A Expired - Fee Related JP5749641B2 (ja) 2008-04-04 2009-04-03 光学検査システム及び方法

Country Status (7)

Country Link
US (4) US8072591B2 (enExample)
JP (1) JP5749641B2 (enExample)
KR (1) KR101697240B1 (enExample)
CN (1) CN102016554B (enExample)
DE (1) DE112009000832T5 (enExample)
TW (1) TWI479583B (enExample)
WO (1) WO2009121628A2 (enExample)

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Also Published As

Publication number Publication date
US8072591B2 (en) 2011-12-06
US8368881B2 (en) 2013-02-05
KR101697240B1 (ko) 2017-01-17
US20110043798A1 (en) 2011-02-24
US20110043796A1 (en) 2011-02-24
US20120133760A1 (en) 2012-05-31
CN102016554B (zh) 2013-01-30
US8345232B2 (en) 2013-01-01
US20100231902A1 (en) 2010-09-16
US8102521B2 (en) 2012-01-24
TWI479583B (zh) 2015-04-01
TW200952102A (en) 2009-12-16
KR20110000560A (ko) 2011-01-03
CN102016554A (zh) 2011-04-13
JP2011516844A (ja) 2011-05-26
WO2009121628A2 (en) 2009-10-08
DE112009000832T5 (de) 2011-07-28
WO2009121628A9 (en) 2009-11-26

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