KR101679314B1 - 다중 노광을 운용한 중복 노광 화상 믹싱의 검사 방법 - Google Patents

다중 노광을 운용한 중복 노광 화상 믹싱의 검사 방법 Download PDF

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Publication number
KR101679314B1
KR101679314B1 KR1020140109499A KR20140109499A KR101679314B1 KR 101679314 B1 KR101679314 B1 KR 101679314B1 KR 1020140109499 A KR1020140109499 A KR 1020140109499A KR 20140109499 A KR20140109499 A KR 20140109499A KR 101679314 B1 KR101679314 B1 KR 101679314B1
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South Korea
Prior art keywords
exposure time
light source
inspection
image
emitting device
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KR1020140109499A
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English (en)
Korean (ko)
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KR20160011556A (ko
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구앙-시아 왕
후이-유 첸
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마하비전 아이엔씨.
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020140109499A 2014-07-22 2014-08-22 다중 노광을 운용한 중복 노광 화상 믹싱의 검사 방법 KR101679314B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW103125041A TWI495867B (zh) 2014-07-22 2014-07-22 Application of repeated exposure to multiple exposure image blending detection method
TW103125041 2014-07-22

Publications (2)

Publication Number Publication Date
KR20160011556A KR20160011556A (ko) 2016-02-01
KR101679314B1 true KR101679314B1 (ko) 2016-11-24

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KR1020140109499A KR101679314B1 (ko) 2014-07-22 2014-08-22 다중 노광을 운용한 중복 노광 화상 믹싱의 검사 방법

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JP (1) JP6034343B2 (zh)
KR (1) KR101679314B1 (zh)
CN (1) CN105277574B (zh)
TW (1) TWI495867B (zh)

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* Cited by examiner, † Cited by third party
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WO2017141611A1 (ja) * 2016-02-19 2017-08-24 株式会社Ｓｃｒｅｅｎホールディングス 欠陥検出装置、欠陥検出方法およびプログラム
CN110146519A (zh) * 2018-02-12 2019-08-20 志圣工业股份有限公司 电路板检测方法及电路板曝光方法
CN108414530A (zh) * 2018-03-13 2018-08-17 昆山国显光电有限公司 自动光学检测设备
CN110006919A (zh) * 2018-12-10 2019-07-12 浙江大学台州研究院 一种抛光石英晶片浅划痕检测的装置与方法
CN110702031B (zh) * 2019-11-19 2021-08-27 四川长虹电器股份有限公司 适用于深色表面的三维扫描装置及扫描方法
CN111542218B (zh) * 2020-04-23 2021-07-20 国网浙江省电力有限公司营销服务中心 一种电能表可信生产贴片环节采集验证方法及系统

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JP2006220578A (ja) * 2005-02-14 2006-08-24 Nikon Corp 表面検査装置
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Publication number Publication date
TW201604536A (zh) 2016-02-01
CN105277574B (zh) 2018-04-03
TWI495867B (zh) 2015-08-11
KR20160011556A (ko) 2016-02-01
JP6034343B2 (ja) 2016-11-30
CN105277574A (zh) 2016-01-27
JP2016024185A (ja) 2016-02-08

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