KR101675446B1 - 표면 처리제 - Google Patents

표면 처리제 Download PDF

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Publication number
KR101675446B1
KR101675446B1 KR1020100072351A KR20100072351A KR101675446B1 KR 101675446 B1 KR101675446 B1 KR 101675446B1 KR 1020100072351 A KR1020100072351 A KR 1020100072351A KR 20100072351 A KR20100072351 A KR 20100072351A KR 101675446 B1 KR101675446 B1 KR 101675446B1
Authority
KR
South Korea
Prior art keywords
surface treatment
film
substrate
treatment agent
polymerizable monomer
Prior art date
Application number
KR1020100072351A
Other languages
English (en)
Korean (ko)
Other versions
KR20110016823A (ko
Inventor
히사노부 미나미사와
Original Assignee
제이엔씨 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이엔씨 주식회사 filed Critical 제이엔씨 주식회사
Publication of KR20110016823A publication Critical patent/KR20110016823A/ko
Application granted granted Critical
Publication of KR101675446B1 publication Critical patent/KR101675446B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
KR1020100072351A 2009-08-12 2010-07-27 표면 처리제 KR101675446B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009187389 2009-08-12
JPJP-P-2009-187389 2009-08-12

Publications (2)

Publication Number Publication Date
KR20110016823A KR20110016823A (ko) 2011-02-18
KR101675446B1 true KR101675446B1 (ko) 2016-11-11

Family

ID=43775100

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100072351A KR101675446B1 (ko) 2009-08-12 2010-07-27 표면 처리제

Country Status (3)

Country Link
JP (1) JP5510126B2 (ja)
KR (1) KR101675446B1 (ja)
TW (1) TWI486411B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6123194B2 (ja) * 2011-11-11 2017-05-10 Jnc株式会社 熱硬化性組成物
KR101929862B1 (ko) 2011-11-11 2018-12-17 제이엔씨 주식회사 열경화성 조성물
KR20230093895A (ko) * 2021-12-20 2023-06-27 주식회사 케이씨텍 유무기 하이브리드 조성물용 표면처리제
WO2024106158A1 (ja) * 2022-11-14 2024-05-23 Dic株式会社 ランダム共重合体、当該共重合体を含むコーティング組成物及びレジスト組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2638612B2 (ja) * 1988-06-20 1997-08-06 日信化学工業株式会社 シリコーン／アクリル共重合体組成物
JP2005169832A (ja) * 2003-12-11 2005-06-30 Daicel Chem Ind Ltd インク記録体用樹脂組成物及びインク記録体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11227325A (ja) * 1998-02-17 1999-08-24 Toagosei Co Ltd インクジェット記録用シート
JP2000239601A (ja) 1999-02-22 2000-09-05 Kansai Paint Co Ltd 滑水性表面を形成し得るポリマー組成物
JP2004006700A (ja) 2002-03-27 2004-01-08 Seiko Epson Corp 表面処理方法、表面処理基板、膜パターンの形成方法、電気光学装置の製造方法、電気光学装置、及び電子機器
JP2005251809A (ja) 2004-03-01 2005-09-15 Seiko Epson Corp 薄膜トランジスタの製造方法、薄膜トランジスタ、薄膜トランジスタ回路、電子デバイスおよび電子機器

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2638612B2 (ja) * 1988-06-20 1997-08-06 日信化学工業株式会社 シリコーン／アクリル共重合体組成物
JP2005169832A (ja) * 2003-12-11 2005-06-30 Daicel Chem Ind Ltd インク記録体用樹脂組成物及びインク記録体

Also Published As

Publication number Publication date
TWI486411B (zh) 2015-06-01
TW201105757A (en) 2011-02-16
KR20110016823A (ko) 2011-02-18
JP2011057963A (ja) 2011-03-24
JP5510126B2 (ja) 2014-06-04

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
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