KR101623277B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

Info

Publication number
KR101623277B1
KR101623277B1 KR1020140161412A KR20140161412A KR101623277B1 KR 101623277 B1 KR101623277 B1 KR 101623277B1 KR 1020140161412 A KR1020140161412 A KR 1020140161412A KR 20140161412 A KR20140161412 A KR 20140161412A KR 101623277 B1 KR101623277 B1 KR 101623277B1
Authority
KR
South Korea
Prior art keywords
antistatic film
substrate
cloth
liquid
stage
Prior art date
Application number
KR1020140161412A
Other languages
English (en)
Korean (ko)
Other versions
KR20150062122A (ko
Inventor
리에 데시마
아키노리 이소
다카히로 하마다
겐지 사카시타
유키노부 니시베
류헤이 다카하라
Original Assignee
시바우라 메카트로닉스 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2014129595A external-priority patent/JP5917610B2/ja
Application filed by 시바우라 메카트로닉스 가부시끼가이샤 filed Critical 시바우라 메카트로닉스 가부시끼가이샤
Publication of KR20150062122A publication Critical patent/KR20150062122A/ko
Application granted granted Critical
Publication of KR101623277B1 publication Critical patent/KR101623277B1/ko

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
    • B08B1/143—Wipes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020140161412A 2013-11-28 2014-11-19 기판 처리 장치 KR101623277B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2013-246413 2013-11-28
JP2013246413 2013-11-28
JPJP-P-2014-129595 2014-06-24
JP2014129595A JP5917610B2 (ja) 2013-11-28 2014-06-24 基板処理装置

Publications (2)

Publication Number Publication Date
KR20150062122A KR20150062122A (ko) 2015-06-05
KR101623277B1 true KR101623277B1 (ko) 2016-05-20

Family

ID=53304102

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140161412A KR101623277B1 (ko) 2013-11-28 2014-11-19 기판 처리 장치

Country Status (2)

Country Link
KR (1) KR101623277B1 (zh)
CN (1) CN104668217B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106315113B (zh) * 2016-08-23 2018-10-12 重庆墨希科技有限公司 连续自动去除绑定区域石墨烯的装置和方法
CN108993943A (zh) * 2018-08-24 2018-12-14 汉能移动能源控股集团有限公司 一种清洁设备
CN112122190B (zh) * 2020-09-23 2023-07-25 格力电器（武汉）有限公司 表面清洁装置、pcb主板

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011085642A (ja) * 2009-10-13 2011-04-28 Hitachi High-Technologies Corp Ｆｐｄパネル実装装置及び実装方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005199299A (ja) * 2004-01-15 2005-07-28 Vantage Kogyo Kk 付着物除去装置
US20080092806A1 (en) * 2006-10-19 2008-04-24 Applied Materials, Inc. Removing residues from substrate processing components
JP2009066359A (ja) * 2007-09-18 2009-04-02 Nippon Oil Corp ワイピングクロス及びワイピング方法
JP2012114409A (ja) * 2010-11-04 2012-06-14 Tokyo Electron Ltd 基板洗浄方法、基板洗浄装置及び基板洗浄用記憶媒体
CN103240252B (zh) * 2011-01-13 2015-12-09 深圳市宇顺电子股份有限公司 一种自动清洁玻璃表面的擦拭方法
KR101450965B1 (ko) * 2011-09-29 2014-10-15 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011085642A (ja) * 2009-10-13 2011-04-28 Hitachi High-Technologies Corp Ｆｐｄパネル実装装置及び実装方法

Also Published As

Publication number Publication date
CN104668217B (zh) 2017-07-28
CN104668217A (zh) 2015-06-03
KR20150062122A (ko) 2015-06-05

Similar Documents

Publication Publication Date Title
JP5258811B2 (ja) スリットノズル洗浄装置及び塗布装置
JP6133120B2 (ja) 基板洗浄装置
JP5377037B2 (ja) 薄膜太陽電池パネルの高圧液噴射洗浄装置
JP5841449B2 (ja) 拭き取りパッド及びこのパッドを用いたノズルメンテナンス装置並びに塗布処理装置
KR100841501B1 (ko) 기판 처리 방법 및 기판 처리 장치
JP6367763B2 (ja) ウェーハ乾燥装置およびウェーハ乾燥方法
KR101623277B1 (ko) 기판 처리 장치
JP2007268391A (ja) 予備吐出装置及び予備吐出方法
WO2005077553A1 (ja) 板材の洗浄設備
KR100991086B1 (ko) 기판 처리 장치 및 기판 처리 방법
JP5820593B2 (ja) 流体散布器およびガラス清浄化処理
JP5917610B2 (ja) 基板処理装置
TWI227035B (en) Substrate processing device of transporting type
KR20170120024A (ko) 세정 장치
JP3180143U (ja) 塗布ノズル洗浄装置
JP4387938B2 (ja) 基板処理装置
JP6060140B2 (ja) 乾式指紋洗浄装置
JP2017190895A (ja) 基材の液切り装置
JP2004174308A (ja) 板材の洗浄設備
JP4620573B2 (ja) 板材の洗浄設備およびその高圧液スプレー洗浄装置
JP2017154111A (ja) 基板処理装置及び基板処理方法
JP2009066524A (ja) ローラー洗浄装置
JP3182815U (ja) 塗布ノズル洗浄装置
KR101091080B1 (ko) 슬릿 노즐 세정 유닛 및 이를 갖는 포토레지스트 도포 장치
JP2007317802A (ja) 基板の乾燥処理装置及び乾燥処理方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20190213

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20200220

Year of fee payment: 5