KR101598657B1 - 웨이퍼의 모따기 장치 - Google Patents
웨이퍼의 모따기 장치 Download PDFInfo
- Publication number
- KR101598657B1 KR101598657B1 KR1020127029505A KR20127029505A KR101598657B1 KR 101598657 B1 KR101598657 B1 KR 101598657B1 KR 1020127029505 A KR1020127029505 A KR 1020127029505A KR 20127029505 A KR20127029505 A KR 20127029505A KR 101598657 B1 KR101598657 B1 KR 101598657B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- machining
- processing
- chamfering
- tables
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 235000012431 wafers Nutrition 0.000 claims abstract description 278
- 238000003754 machining Methods 0.000 claims abstract description 150
- 238000012545 processing Methods 0.000 claims abstract description 94
- 230000007246 mechanism Effects 0.000 claims description 100
- 238000004140 cleaning Methods 0.000 claims description 51
- 238000001035 drying Methods 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 34
- 238000012805 post-processing Methods 0.000 claims description 25
- 238000005259 measurement Methods 0.000 claims description 11
- 238000007781 pre-processing Methods 0.000 claims description 3
- 238000012423 maintenance Methods 0.000 abstract 1
- 238000012546 transfer Methods 0.000 description 17
- 239000004575 stone Substances 0.000 description 15
- 230000003028 elevating effect Effects 0.000 description 13
- 238000009499 grossing Methods 0.000 description 12
- 238000001179 sorption measurement Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000000498 cooling water Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000013459 approach Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000013404 process transfer Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
- B24B47/225—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation for bevelling optical work, e.g. lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02021—Edge treatment, chamfering
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2010-109645 | 2010-05-11 | ||
| JP2010109645A JP5491273B2 (ja) | 2010-05-11 | 2010-05-11 | ウェーハの面取り装置 |
| PCT/JP2011/054445 WO2011142159A1 (ja) | 2010-05-11 | 2011-02-28 | ウェーハの面取り装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130092401A KR20130092401A (ko) | 2013-08-20 |
| KR101598657B1 true KR101598657B1 (ko) | 2016-02-29 |
Family
ID=44914218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127029505A Active KR101598657B1 (ko) | 2010-05-11 | 2011-02-28 | 웨이퍼의 모따기 장치 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5491273B2 (enExample) |
| KR (1) | KR101598657B1 (enExample) |
| CN (1) | CN102869476B (enExample) |
| TW (1) | TWI499482B (enExample) |
| WO (1) | WO2011142159A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6099960B2 (ja) * | 2012-12-18 | 2017-03-22 | ダイトエレクトロン株式会社 | ウェーハの面取り加工方法およびウェーハの面取り装置 |
| JP6007889B2 (ja) * | 2013-12-03 | 2016-10-19 | 信越半導体株式会社 | 面取り加工装置及びノッチレスウェーハの製造方法 |
| JP6141814B2 (ja) * | 2014-10-30 | 2017-06-07 | 信越半導体株式会社 | 研磨装置 |
| KR101578713B1 (ko) * | 2015-06-22 | 2015-12-18 | 황정하 | 광학렌즈의 양면 모따기 장치 |
| JP6614978B2 (ja) * | 2016-01-14 | 2019-12-04 | 株式会社荏原製作所 | 研磨装置及び研磨方法 |
| JP6774263B2 (ja) * | 2016-08-19 | 2020-10-21 | 株式会社ディスコ | 切削装置 |
| CN106181681A (zh) * | 2016-08-31 | 2016-12-07 | 天通银厦新材料有限公司 | 一种蓝宝石加工用精确打磨装置 |
| EP3581331B1 (en) | 2018-06-13 | 2022-07-20 | W-M GLASS Sp. z o.o. | Set of discs for grinding the edges of glass plates |
| CN109333222B (zh) * | 2018-11-01 | 2023-06-27 | 浙江中晶新材料研究有限公司 | 一种全自动硅片倒角加工设备及其加工工艺 |
| JP7153578B2 (ja) * | 2019-01-29 | 2022-10-14 | 信越半導体株式会社 | シリコンウェーハの製造方法 |
| JP7016032B2 (ja) | 2019-09-24 | 2022-02-04 | 日亜化学工業株式会社 | 半導体素子の製造方法 |
| CN114888983B (zh) * | 2022-05-31 | 2025-03-04 | 杭州中为光电技术有限公司 | 硅片自动倒角清洗一体化设备 |
| CN116673817B (zh) * | 2023-06-08 | 2025-09-02 | 芜湖众源复合新材料有限公司 | 一种机械零件边角的打磨设备 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2186135Y (zh) * | 1994-03-04 | 1994-12-28 | 廖胜钦 | 多轴式圆形玻璃磨斜边机 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2554432B2 (ja) * | 1992-11-20 | 1996-11-13 | 住友シチックス株式会社 | 半導体ウエーハの外周面加工装置 |
| JP2882458B2 (ja) | 1994-11-28 | 1999-04-12 | 株式会社東京精密 | ウェーハ面取り機 |
| JPH1177501A (ja) * | 1997-09-05 | 1999-03-23 | Asahi Glass Co Ltd | ガラス板端部の加工方法 |
| ITMI991382A1 (it) * | 1999-06-21 | 2000-12-21 | Bavelloni Z Spa | Macchina automatica bilaterale per la lavorazione dei bordi di lastredi vetro materiali lapidei e simili |
| JP4323058B2 (ja) | 2000-04-24 | 2009-09-02 | エムテック株式会社 | ウェーハのノッチの研摩装置 |
| JP4013778B2 (ja) * | 2003-02-04 | 2007-11-28 | 坂東機工株式会社 | ガラス板の加工装置 |
| JP2006110642A (ja) * | 2004-10-12 | 2006-04-27 | Shiraitekku:Kk | 研磨装置 |
| JP5112703B2 (ja) | 2007-01-18 | 2013-01-09 | ダイトエレクトロン株式会社 | ウェーハ面取り加工方法およびその装置 |
| KR100905094B1 (ko) * | 2007-08-01 | 2009-06-30 | 주식회사 에스에프에이 | 웨이퍼 연마장치 |
| JP5304020B2 (ja) * | 2008-05-14 | 2013-10-02 | 新東工業株式会社 | 板状部材の端面の加工方法 |
| JP4758457B2 (ja) * | 2008-05-22 | 2011-08-31 | 株式会社東京精密 | ウェーハ面取り装置 |
| JP5434014B2 (ja) * | 2008-08-22 | 2014-03-05 | 坂東機工株式会社 | ガラス板の加工方法及びガラス板加工装置 |
-
2010
- 2010-05-11 JP JP2010109645A patent/JP5491273B2/ja active Active
-
2011
- 2011-02-28 WO PCT/JP2011/054445 patent/WO2011142159A1/ja not_active Ceased
- 2011-02-28 KR KR1020127029505A patent/KR101598657B1/ko active Active
- 2011-02-28 CN CN201180022063.1A patent/CN102869476B/zh active Active
- 2011-05-04 TW TW100115556A patent/TWI499482B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2186135Y (zh) * | 1994-03-04 | 1994-12-28 | 廖胜钦 | 多轴式圆形玻璃磨斜边机 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011142159A1 (ja) | 2011-11-17 |
| JP5491273B2 (ja) | 2014-05-14 |
| TW201206636A (en) | 2012-02-16 |
| CN102869476B (zh) | 2015-08-19 |
| CN102869476A (zh) | 2013-01-09 |
| JP2011235406A (ja) | 2011-11-24 |
| KR20130092401A (ko) | 2013-08-20 |
| TWI499482B (zh) | 2015-09-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20121109 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20140221 Comment text: Request for Examination of Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20150629 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20160127 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20160223 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
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