KR101598657B1 - 웨이퍼의 모따기 장치 - Google Patents

웨이퍼의 모따기 장치 Download PDF

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Publication number
KR101598657B1
KR101598657B1 KR1020127029505A KR20127029505A KR101598657B1 KR 101598657 B1 KR101598657 B1 KR 101598657B1 KR 1020127029505 A KR1020127029505 A KR 1020127029505A KR 20127029505 A KR20127029505 A KR 20127029505A KR 101598657 B1 KR101598657 B1 KR 101598657B1
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South Korea
Prior art keywords
wafer
machining
processing
chamfering
tables
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Korean (ko)
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KR20130092401A (ko
Inventor
이치로 가타야마
Original Assignee
다이토 일렉트론 가부시키가이샤
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00Drives or gearings; Equipment therefor
    • B24B47/22Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
    • B24B47/225Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation for bevelling optical work, e.g. lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02021Edge treatment, chamfering

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
KR1020127029505A 2010-05-11 2011-02-28 웨이퍼의 모따기 장치 Active KR101598657B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2010-109645 2010-05-11
JP2010109645A JP5491273B2 (ja) 2010-05-11 2010-05-11 ウェーハの面取り装置
PCT/JP2011/054445 WO2011142159A1 (ja) 2010-05-11 2011-02-28 ウェーハの面取り装置

Publications (2)

Publication Number Publication Date
KR20130092401A KR20130092401A (ko) 2013-08-20
KR101598657B1 true KR101598657B1 (ko) 2016-02-29

Family

ID=44914218

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127029505A Active KR101598657B1 (ko) 2010-05-11 2011-02-28 웨이퍼의 모따기 장치

Country Status (5)

Country Link
JP (1) JP5491273B2 (enExample)
KR (1) KR101598657B1 (enExample)
CN (1) CN102869476B (enExample)
TW (1) TWI499482B (enExample)
WO (1) WO2011142159A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6099960B2 (ja) * 2012-12-18 2017-03-22 ダイトエレクトロン株式会社 ウェーハの面取り加工方法およびウェーハの面取り装置
JP6007889B2 (ja) * 2013-12-03 2016-10-19 信越半導体株式会社 面取り加工装置及びノッチレスウェーハの製造方法
JP6141814B2 (ja) * 2014-10-30 2017-06-07 信越半導体株式会社 研磨装置
KR101578713B1 (ko) * 2015-06-22 2015-12-18 황정하 광학렌즈의 양면 모따기 장치
JP6614978B2 (ja) * 2016-01-14 2019-12-04 株式会社荏原製作所 研磨装置及び研磨方法
JP6774263B2 (ja) * 2016-08-19 2020-10-21 株式会社ディスコ 切削装置
CN106181681A (zh) * 2016-08-31 2016-12-07 天通银厦新材料有限公司 一种蓝宝石加工用精确打磨装置
EP3581331B1 (en) 2018-06-13 2022-07-20 W-M GLASS Sp. z o.o. Set of discs for grinding the edges of glass plates
CN109333222B (zh) * 2018-11-01 2023-06-27 浙江中晶新材料研究有限公司 一种全自动硅片倒角加工设备及其加工工艺
JP7153578B2 (ja) * 2019-01-29 2022-10-14 信越半導体株式会社 シリコンウェーハの製造方法
JP7016032B2 (ja) 2019-09-24 2022-02-04 日亜化学工業株式会社 半導体素子の製造方法
CN114888983B (zh) * 2022-05-31 2025-03-04 杭州中为光电技术有限公司 硅片自动倒角清洗一体化设备
CN116673817B (zh) * 2023-06-08 2025-09-02 芜湖众源复合新材料有限公司 一种机械零件边角的打磨设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2186135Y (zh) * 1994-03-04 1994-12-28 廖胜钦 多轴式圆形玻璃磨斜边机

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2554432B2 (ja) * 1992-11-20 1996-11-13 住友シチックス株式会社 半導体ウエーハの外周面加工装置
JP2882458B2 (ja) 1994-11-28 1999-04-12 株式会社東京精密 ウェーハ面取り機
JPH1177501A (ja) * 1997-09-05 1999-03-23 Asahi Glass Co Ltd ガラス板端部の加工方法
ITMI991382A1 (it) * 1999-06-21 2000-12-21 Bavelloni Z Spa Macchina automatica bilaterale per la lavorazione dei bordi di lastredi vetro materiali lapidei e simili
JP4323058B2 (ja) 2000-04-24 2009-09-02 エムテック株式会社 ウェーハのノッチの研摩装置
JP4013778B2 (ja) * 2003-02-04 2007-11-28 坂東機工株式会社 ガラス板の加工装置
JP2006110642A (ja) * 2004-10-12 2006-04-27 Shiraitekku:Kk 研磨装置
JP5112703B2 (ja) 2007-01-18 2013-01-09 ダイトエレクトロン株式会社 ウェーハ面取り加工方法およびその装置
KR100905094B1 (ko) * 2007-08-01 2009-06-30 주식회사 에스에프에이 웨이퍼 연마장치
JP5304020B2 (ja) * 2008-05-14 2013-10-02 新東工業株式会社 板状部材の端面の加工方法
JP4758457B2 (ja) * 2008-05-22 2011-08-31 株式会社東京精密 ウェーハ面取り装置
JP5434014B2 (ja) * 2008-08-22 2014-03-05 坂東機工株式会社 ガラス板の加工方法及びガラス板加工装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2186135Y (zh) * 1994-03-04 1994-12-28 廖胜钦 多轴式圆形玻璃磨斜边机

Also Published As

Publication number Publication date
WO2011142159A1 (ja) 2011-11-17
JP5491273B2 (ja) 2014-05-14
TW201206636A (en) 2012-02-16
CN102869476B (zh) 2015-08-19
CN102869476A (zh) 2013-01-09
JP2011235406A (ja) 2011-11-24
KR20130092401A (ko) 2013-08-20
TWI499482B (zh) 2015-09-11

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