KR101545471B1 - 경화성 수지 조성물 및 이를 사용한 반도체 장치 - Google Patents
경화성 수지 조성물 및 이를 사용한 반도체 장치 Download PDFInfo
- Publication number
- KR101545471B1 KR101545471B1 KR1020157004586A KR20157004586A KR101545471B1 KR 101545471 B1 KR101545471 B1 KR 101545471B1 KR 1020157004586 A KR1020157004586 A KR 1020157004586A KR 20157004586 A KR20157004586 A KR 20157004586A KR 101545471 B1 KR101545471 B1 KR 101545471B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- resin composition
- curable resin
- silsesquioxane
- polyorganosiloxane
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
- C08K5/098—Metal salts of carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/008—Additives improving gas barrier properties
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34924—Triazines containing cyanurate groups; Tautomers thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/549—Silicon-containing compounds containing silicon in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
- C08L2203/162—Applications used for films sealable films
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013160291 | 2013-08-01 | ||
JPJP-P-2013-160291 | 2013-08-01 | ||
PCT/JP2014/067862 WO2015016000A1 (ja) | 2013-08-01 | 2014-07-04 | 硬化性樹脂組成物及びそれを用いた半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150028368A KR20150028368A (ko) | 2015-03-13 |
KR101545471B1 true KR101545471B1 (ko) | 2015-08-18 |
Family
ID=52431540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157004586A KR101545471B1 (ko) | 2013-08-01 | 2014-07-04 | 경화성 수지 조성물 및 이를 사용한 반도체 장치 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5736524B1 (ja) |
KR (1) | KR101545471B1 (ja) |
CN (1) | CN104583326B (ja) |
MY (1) | MY170153A (ja) |
TW (1) | TWI510556B (ja) |
WO (1) | WO2015016000A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014125964A1 (ja) * | 2013-02-14 | 2014-08-21 | 株式会社ダイセル | 硬化性樹脂組成物、硬化物、封止材、及び半導体装置 |
JP6474801B2 (ja) * | 2014-06-06 | 2019-02-27 | 株式会社ダイセル | 硬化性樹脂組成物、硬化物、封止材、及び半導体装置 |
JP2016216642A (ja) * | 2015-05-22 | 2016-12-22 | 株式会社ダイセル | 硬化性樹脂組成物及びその硬化物、封止剤、並びに半導体装置 |
JP2017002172A (ja) * | 2015-06-09 | 2017-01-05 | 株式会社ダイセル | 高硬度ポリシロキサン硬化物を与える硬化性樹脂組成物及びその硬化物 |
JP2017075216A (ja) * | 2015-10-13 | 2017-04-20 | 株式会社ダイセル | 硬化性樹脂組成物、その硬化物、及び半導体装置 |
WO2017122762A1 (ja) * | 2016-01-15 | 2017-07-20 | ペルノックス株式会社 | 縮合反応型シリコーン組成物及び硬化物 |
US10870758B2 (en) | 2016-02-22 | 2020-12-22 | Daicel Corporation | Curable resin composition, cured product thereof, and semiconductor device |
CN109563347A (zh) * | 2016-08-19 | 2019-04-02 | 道康宁东丽株式会社 | 用于保护电气/电子部件的室温可固化的有机聚硅氧烷组合物 |
WO2018131545A1 (ja) * | 2017-01-16 | 2018-07-19 | 株式会社ダイセル | 硬化性樹脂組成物、その硬化物、及び半導体装置 |
JP7390962B2 (ja) * | 2020-04-14 | 2023-12-04 | 信越化学工業株式会社 | 硬化性有機ケイ素樹脂組成物 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011022947A (ja) * | 2009-07-18 | 2011-02-03 | Ati:Kk | 図柄認識装置 |
JP5300148B2 (ja) * | 2009-11-30 | 2013-09-25 | 日本化薬株式会社 | エポキシ樹脂組成物、硬化性樹脂組成物 |
KR20120114237A (ko) * | 2009-11-30 | 2012-10-16 | 닛뽄 가야쿠 가부시키가이샤 | 경화성 수지 조성물 및 그 경화물 |
JP4788837B2 (ja) * | 2010-01-26 | 2011-10-05 | 横浜ゴム株式会社 | シリコーン樹脂組成物およびその使用方法、シリコーン樹脂、シリコーン樹脂含有構造体、ならびに光半導体素子封止体 |
TWI504681B (zh) * | 2010-03-08 | 2015-10-21 | Lintec Corp | A hardening composition, a hardened product, and a hardening composition |
WO2012039322A1 (ja) * | 2010-09-22 | 2012-03-29 | 株式会社カネカ | 多面体構造ポリシロキサン変性体、多面体構造ポリシロキサン系組成物、硬化物、及び、光半導体デバイス |
KR101332171B1 (ko) * | 2010-11-10 | 2013-11-25 | 요코하마 고무 가부시키가이샤 | 열경화형 실리콘 수지 조성물, 및, 이것을 이용하여 얻어지는 실리콘 수지 함유 구조체 및 광반도체 소자 봉지체 |
JP5045862B2 (ja) * | 2010-11-18 | 2012-10-10 | 横浜ゴム株式会社 | 熱硬化型シリコーン樹脂組成物、シリコーン樹脂含有構造体、光半導体素子封止体、および、シラノール縮合触媒 |
JP2012111875A (ja) * | 2010-11-25 | 2012-06-14 | Daicel Corp | 硬化性樹脂組成物及び硬化物 |
JP2012162666A (ja) * | 2011-02-08 | 2012-08-30 | Kaneka Corp | 多面体構造ポリシロキサン系組成物 |
JP2012201706A (ja) * | 2011-03-23 | 2012-10-22 | Kaneka Corp | ポリシロキサン系組成物 |
WO2013005633A1 (ja) * | 2011-07-04 | 2013-01-10 | Jnc株式会社 | イソシアヌル骨格、エポキシ基およびSiH基を有するオルガノポリシロキサンまたはシルセスキオキサン骨格を含む化合物および該化合物を密着付与材として含む熱硬化性樹脂組成物、硬化物、および光半導体用封止材 |
US9181397B2 (en) * | 2011-12-22 | 2015-11-10 | Daicel Corporation | Curable resin composition and cured product thereof |
WO2013176238A1 (ja) * | 2012-05-25 | 2013-11-28 | 株式会社ダイセル | 硬化性樹脂組成物及びその硬化物、封止剤、並びに光半導体装置 |
EP2944675B1 (en) * | 2013-01-09 | 2017-04-12 | Daicel Corporation | Curable resin composition, and cured product of same |
-
2014
- 2014-07-04 WO PCT/JP2014/067862 patent/WO2015016000A1/ja active Application Filing
- 2014-07-04 KR KR1020157004586A patent/KR101545471B1/ko active IP Right Grant
- 2014-07-04 JP JP2014548793A patent/JP5736524B1/ja not_active Expired - Fee Related
- 2014-07-04 CN CN201480002249.4A patent/CN104583326B/zh not_active Expired - Fee Related
- 2014-07-04 MY MYPI2015700025A patent/MY170153A/en unknown
- 2014-07-08 TW TW103123395A patent/TWI510556B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20150028368A (ko) | 2015-03-13 |
CN104583326B (zh) | 2016-03-02 |
JPWO2015016000A1 (ja) | 2017-03-02 |
JP5736524B1 (ja) | 2015-06-17 |
CN104583326A (zh) | 2015-04-29 |
TW201506089A (zh) | 2015-02-16 |
WO2015016000A1 (ja) | 2015-02-05 |
WO2015016000A9 (ja) | 2015-03-12 |
TWI510556B (zh) | 2015-12-01 |
MY170153A (en) | 2019-07-09 |
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A302 | Request for accelerated examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20180718 Year of fee payment: 4 |