KR101510493B1 - 마이크로리소그래피용 투사 대물렌즈 - Google Patents

마이크로리소그래피용 투사 대물렌즈 Download PDF

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Publication number
KR101510493B1
KR101510493B1 KR1020107007804A KR20107007804A KR101510493B1 KR 101510493 B1 KR101510493 B1 KR 101510493B1 KR 1020107007804 A KR1020107007804 A KR 1020107007804A KR 20107007804 A KR20107007804 A KR 20107007804A KR 101510493 B1 KR101510493 B1 KR 101510493B1
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KR
South Korea
Prior art keywords
terminal element
optical
image
surface portion
disposed
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Expired - Fee Related
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KR1020107007804A
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English (en)
Korean (ko)
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KR20100080532A (ko
Inventor
헬뮤트 바이에르
하이코 펠트만
죠켄 헤츨러
마이클 토트젝
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020107007804A 2007-10-02 2008-09-25 마이크로리소그래피용 투사 대물렌즈 Expired - Fee Related KR101510493B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US97693507P 2007-10-02 2007-10-02
DE102007047148 2007-10-02
DE102007047148.5 2007-10-02
US60/976,935 2007-10-02
PCT/EP2008/062835 WO2009043790A2 (en) 2007-10-02 2008-09-25 Projection objective for microlithography

Publications (2)

Publication Number Publication Date
KR20100080532A KR20100080532A (ko) 2010-07-08
KR101510493B1 true KR101510493B1 (ko) 2015-04-08

Family

ID=40298812

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107007804A Expired - Fee Related KR101510493B1 (ko) 2007-10-02 2008-09-25 마이크로리소그래피용 투사 대물렌즈

Country Status (5)

Country Link
US (1) US8436982B2 (https=)
JP (3) JP5498385B2 (https=)
KR (1) KR101510493B1 (https=)
CN (1) CN101815969B (https=)
WO (1) WO2009043790A2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101611178B1 (ko) * 2014-09-17 2016-04-11 한국생산기술연구원 렌즈 부착형 조직세포 가압장치
CN108474926B (zh) * 2016-01-06 2020-09-29 奥林巴斯株式会社 物镜光学系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005268741A (ja) * 2004-02-18 2005-09-29 Nikon Corp 光学素子及び露光装置
WO2006080212A1 (ja) * 2005-01-28 2006-08-03 Nikon Corporation 投影光学系、露光装置、および露光方法
JP2006222222A (ja) * 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP2001044116A (ja) * 1999-01-20 2001-02-16 Asm Lithography Bv 光学補正板、およびリソグラフィ投影装置でのその応用
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP3679736B2 (ja) * 2001-07-04 2005-08-03 キヤノン株式会社 露光装置、露光方法、デバイス製造方法、並びに、デバイス
JP3720788B2 (ja) 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP4496782B2 (ja) 2003-01-21 2010-07-07 株式会社ニコン 反射光学系及び露光装置
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
JP4218475B2 (ja) 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置
JP4492539B2 (ja) * 2003-09-29 2010-06-30 株式会社ニコン 液浸型光学系及び投影露光装置、並びにデバイス製造方法
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
CN1954408B (zh) 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
KR20170010906A (ko) 2004-06-10 2017-02-01 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
RU2346996C2 (ru) 2004-06-29 2009-02-20 ЮРОПИЭН НИКЕЛЬ ПиЭлСи Усовершенствованное выщелачивание основных металлов
US7710653B2 (en) * 2005-01-28 2010-05-04 Nikon Corporation Projection optical system, exposure system, and exposure method
JP2008532273A (ja) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト マイクロ・リソグラフィー投影露光装置のための光学システム
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
JP2006319064A (ja) * 2005-05-11 2006-11-24 Canon Inc 測定装置、露光方法及び装置
JP2007027439A (ja) * 2005-07-15 2007-02-01 Nikon Corp 投影光学系、露光装置、およびデバイスの製造方法
TWI450044B (zh) * 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
US20080100909A1 (en) * 2006-10-30 2008-05-01 Nikon Corporation Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005268741A (ja) * 2004-02-18 2005-09-29 Nikon Corp 光学素子及び露光装置
WO2006080212A1 (ja) * 2005-01-28 2006-08-03 Nikon Corporation 投影光学系、露光装置、および露光方法
JP2006222222A (ja) * 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置

Also Published As

Publication number Publication date
US8436982B2 (en) 2013-05-07
US20100201959A1 (en) 2010-08-12
WO2009043790A2 (en) 2009-04-09
CN101815969B (zh) 2013-07-17
KR20100080532A (ko) 2010-07-08
CN101815969A (zh) 2010-08-25
WO2009043790A3 (en) 2009-06-25
JP2010541264A (ja) 2010-12-24
JP2014140060A (ja) 2014-07-31
JP5498385B2 (ja) 2014-05-21
JP2017194697A (ja) 2017-10-26

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