Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70216—Mask projection systems
  • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
  • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
  • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B21/00—Microscopes
  • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids

Definitions

• the last image oriented optical element in front of the wafer is typically a planar convex lens, whose convex surface is configured almost semispherical.
• the convex surface of the i planar convex lens is disposed object oriented (reticle oriented), the planar surface of the planar convex lens is disposed image oriented (wafer oriented).
• the planar plane of the planar convex lens forms the last transition surface of the optical system towards the image plane, and thus towards the substrate.
• FIG. 1 An embodiment of a typical configuration of an immersion objective is illustrated in Fig. 1 , which depicts a terminal assembly 1 of an immersion objective, in which the immersion liquid 3 is disposed image oriented and adjacent to the planar plane 2a of a planar convex lens 2.
• the assembly comprises an aperture 4.
• the position of said optical element 2 in the optical system can be described so that the planar surface 2a is disposed proximal to the field, while the convex surface 2b has to be considered as proximal to the pupil.
• no optical element is provided most proximal to the wafer, for which both surfaces are not proximal to the pupil.
• an object of the present invention to provide an optical system for microlithography, which facilitates a lasting improvement of the imaging quality.
• an immersion liquid is introduced, in order to prevent reflections, in particular total reflections of the imaging light, when exiting from the optical system.
• an immersion liquid is also introduced between the optical element before the terminal element, in particular a planar convex lens, and the terminal element. This way, a transition of the imaging radiation without problems is also facilitated between the planar convex lens and the optical element of the optical system (terminal element) disposed most proximal to the image plane.
• further scatter light apertures can be inserted e.g. in the portion between the planar convex lens and the terminal element. They can be inserted as mechanical components or they can be configured as absorbing / reflecting layers, disposed on the optical components.
• the first and the second immersion liquid can have the same or different compositions.

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Health & Medical Sciences (AREA)
• Public Health (AREA)
• Epidemiology (AREA)
• Optics & Photonics (AREA)
• Life Sciences & Earth Sciences (AREA)
• Atmospheric Sciences (AREA)
• Chemical & Material Sciences (AREA)
• Crystallography & Structural Chemistry (AREA)
• Engineering & Computer Science (AREA)
• Environmental & Geological Engineering (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
• Lenses (AREA)
• Optical Elements Other Than Lenses (AREA)

Priority Applications (4)

Applications Claiming Priority (4)

Related Child Applications (1)

Publications (2)

Family

ID=40298812

Family Applications (1)

Country Status (5)

Families Citing this family (2)

Family Cites Families (25)

• 2008
  • 2008-09-25 KR KR1020107007804A patent/KR101510493B1/ko not_active Expired - Fee Related
  • 2008-09-25 JP JP2010527410A patent/JP5498385B2/ja not_active Expired - Fee Related
  • 2008-09-25 CN CN2008801098279A patent/CN101815969B/zh not_active Expired - Fee Related
  • 2008-09-25 WO PCT/EP2008/062835 patent/WO2009043790A2/en not_active Ceased
• 2010
  • 2010-03-12 US US12/723,496 patent/US8436982B2/en not_active Expired - Fee Related
• 2014
  • 2014-03-07 JP JP2014045298A patent/JP2014140060A/ja not_active Withdrawn
• 2017
  • 2017-06-06 JP JP2017111353A patent/JP2017194697A/ja active Pending

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