CN101815969B - 用于微光刻的投射物镜 - Google Patents

用于微光刻的投射物镜 Download PDF

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Publication number
CN101815969B
CN101815969B CN2008801098279A CN200880109827A CN101815969B CN 101815969 B CN101815969 B CN 101815969B CN 2008801098279 A CN2008801098279 A CN 2008801098279A CN 200880109827 A CN200880109827 A CN 200880109827A CN 101815969 B CN101815969 B CN 101815969B
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CN
China
Prior art keywords
projection objective
optical
immersion liquid
surface portion
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2008801098279A
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English (en)
Chinese (zh)
Other versions
CN101815969A (zh
Inventor
赫尔穆特·贝耶尔
海科·费尔德曼
约琴·赫茨勒
迈克尔·托特泽克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN101815969A publication Critical patent/CN101815969A/zh
Application granted granted Critical
Publication of CN101815969B publication Critical patent/CN101815969B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
CN2008801098279A 2007-10-02 2008-09-25 用于微光刻的投射物镜 Expired - Fee Related CN101815969B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US97693507P 2007-10-02 2007-10-02
DE102007047148 2007-10-02
DE102007047148.5 2007-10-02
US60/976,935 2007-10-02
PCT/EP2008/062835 WO2009043790A2 (en) 2007-10-02 2008-09-25 Projection objective for microlithography

Publications (2)

Publication Number Publication Date
CN101815969A CN101815969A (zh) 2010-08-25
CN101815969B true CN101815969B (zh) 2013-07-17

Family

ID=40298812

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008801098279A Expired - Fee Related CN101815969B (zh) 2007-10-02 2008-09-25 用于微光刻的投射物镜

Country Status (5)

Country Link
US (1) US8436982B2 (https=)
JP (3) JP5498385B2 (https=)
KR (1) KR101510493B1 (https=)
CN (1) CN101815969B (https=)
WO (1) WO2009043790A2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101611178B1 (ko) * 2014-09-17 2016-04-11 한국생산기술연구원 렌즈 부착형 조직세포 가압장치
CN108474926B (zh) * 2016-01-06 2020-09-29 奥林巴斯株式会社 物镜光学系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068499A1 (en) * 2003-05-30 2005-03-31 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
EP1670042A1 (en) * 2003-09-29 2006-06-14 Nikon Corporation Liquid immersion type lens system and projection aligner, device production method

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP2001044116A (ja) * 1999-01-20 2001-02-16 Asm Lithography Bv 光学補正板、およびリソグラフィ投影装置でのその応用
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
JP3679736B2 (ja) * 2001-07-04 2005-08-03 キヤノン株式会社 露光装置、露光方法、デバイス製造方法、並びに、デバイス
JP3720788B2 (ja) 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP4496782B2 (ja) 2003-01-21 2010-07-07 株式会社ニコン 反射光学系及び露光装置
US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
JP4218475B2 (ja) 2003-09-11 2009-02-04 株式会社ニコン 極端紫外線光学系及び露光装置
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
JP4370992B2 (ja) * 2004-02-18 2009-11-25 株式会社ニコン 光学素子及び露光装置
CN1954408B (zh) 2004-06-04 2012-07-04 尼康股份有限公司 曝光装置、曝光方法及元件制造方法
KR20170010906A (ko) 2004-06-10 2017-02-01 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
RU2346996C2 (ru) 2004-06-29 2009-02-20 ЮРОПИЭН НИКЕЛЬ ПиЭлСи Усовершенствованное выщелачивание основных металлов
KR101236023B1 (ko) * 2005-01-28 2013-02-21 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7710653B2 (en) * 2005-01-28 2010-05-04 Nikon Corporation Projection optical system, exposure system, and exposure method
JP2006222222A (ja) * 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置
JP2008532273A (ja) * 2005-02-25 2008-08-14 カール ツァイス エスエムテー アクチエンゲゼルシャフト マイクロ・リソグラフィー投影露光装置のための光学システム
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
JP2006319064A (ja) * 2005-05-11 2006-11-24 Canon Inc 測定装置、露光方法及び装置
JP2007027439A (ja) * 2005-07-15 2007-02-01 Nikon Corp 投影光学系、露光装置、およびデバイスの製造方法
TWI450044B (zh) * 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
US20080100909A1 (en) * 2006-10-30 2008-05-01 Nikon Corporation Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068499A1 (en) * 2003-05-30 2005-03-31 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
EP1670042A1 (en) * 2003-09-29 2006-06-14 Nikon Corporation Liquid immersion type lens system and projection aligner, device production method
CN1860585A (zh) * 2003-09-29 2006-11-08 株式会社尼康 液浸型透镜系统、投影曝光装置和器件制造方法

Also Published As

Publication number Publication date
US8436982B2 (en) 2013-05-07
US20100201959A1 (en) 2010-08-12
WO2009043790A2 (en) 2009-04-09
KR20100080532A (ko) 2010-07-08
CN101815969A (zh) 2010-08-25
KR101510493B1 (ko) 2015-04-08
WO2009043790A3 (en) 2009-06-25
JP2010541264A (ja) 2010-12-24
JP2014140060A (ja) 2014-07-31
JP5498385B2 (ja) 2014-05-21
JP2017194697A (ja) 2017-10-26

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Granted publication date: 20130717

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