KR101448339B1 - 조명 광학계, 노광 장치, 및 디바이스 제조 방법 - Google Patents

조명 광학계, 노광 장치, 및 디바이스 제조 방법 Download PDF

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Publication number
KR101448339B1
KR101448339B1 KR1020120014805A KR20120014805A KR101448339B1 KR 101448339 B1 KR101448339 B1 KR 101448339B1 KR 1020120014805 A KR1020120014805 A KR 1020120014805A KR 20120014805 A KR20120014805 A KR 20120014805A KR 101448339 B1 KR101448339 B1 KR 101448339B1
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South Korea
Prior art keywords
light
optical system
light beams
beams
illuminated
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KR1020120014805A
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English (en)
Korean (ko)
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KR20120096421A (ko
Inventor
노보루 오사까
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Microscoopes, Condenser (AREA)
KR1020120014805A 2011-02-22 2012-02-14 조명 광학계, 노광 장치, 및 디바이스 제조 방법 Expired - Fee Related KR101448339B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-036334 2011-02-22
JP2011036334A JP5806479B2 (ja) 2011-02-22 2011-02-22 照明光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20120096421A KR20120096421A (ko) 2012-08-30
KR101448339B1 true KR101448339B1 (ko) 2014-10-07

Family

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KR1020120014805A Expired - Fee Related KR101448339B1 (ko) 2011-02-22 2012-02-14 조명 광학계, 노광 장치, 및 디바이스 제조 방법

Country Status (4)

Country Link
US (1) US9280054B2 (enExample)
JP (1) JP5806479B2 (enExample)
KR (1) KR101448339B1 (enExample)
TW (1) TWI475333B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6178588B2 (ja) * 2013-02-28 2017-08-09 キヤノン株式会社 照明光学系、露光装置、デバイスの製造方法及び光学素子
CN104423174B (zh) * 2013-08-27 2017-05-31 上海微电子装备有限公司 一种照明系统
TWI676083B (zh) * 2013-09-25 2019-11-01 荷蘭商Ａｓｍｌ荷蘭公司 光束傳遞裝置及方法
JP6415266B2 (ja) * 2014-11-20 2018-10-31 キヤノン株式会社 照明光学系、光学装置および画像投射装置
CN106707691B (zh) * 2015-07-15 2018-10-16 上海微电子装备（集团）股份有限公司 曝光装置及方法
WO2017194393A1 (en) * 2016-05-11 2017-11-16 Asml Netherlands B.V. Radiation conditioning system, illumination system and metrology apparatus, device manufacturing method
CN107450270B (zh) * 2016-05-31 2019-07-23 上海微电子装备（集团）股份有限公司 照明系统
JP7047761B2 (ja) * 2016-08-02 2022-04-05 ソニーグループ株式会社 投射型表示装置
CN107885042A (zh) * 2016-09-30 2018-04-06 上海微电子装备（集团）股份有限公司 多光谱光源耦合装置
CN108020994B (zh) * 2016-10-31 2020-01-24 上海微电子装备（集团）股份有限公司 一种照明装置
US11175487B2 (en) * 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
CN107656415A (zh) * 2017-11-24 2018-02-02 北京速镭视激光科技有限公司 一种高效、高均匀性被动光束匀光整形照明系统

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KR20010105250A (ko) * 2000-05-18 2001-11-28 미다라이 후지오 조명장치
KR20050046685A (ko) * 2001-09-14 2005-05-18 캐논 가부시끼가이샤 조명장치, 그것을 이용한 노광장치 및 디바이스 제조방법
KR20090048541A (ko) * 2006-07-12 2009-05-14 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 디바이스 제조 방법

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KR20010105250A (ko) * 2000-05-18 2001-11-28 미다라이 후지오 조명장치
KR20050046685A (ko) * 2001-09-14 2005-05-18 캐논 가부시끼가이샤 조명장치, 그것을 이용한 노광장치 및 디바이스 제조방법
KR20090048541A (ko) * 2006-07-12 2009-05-14 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 디바이스 제조 방법

Also Published As

Publication number Publication date
JP5806479B2 (ja) 2015-11-10
US20120212724A1 (en) 2012-08-23
KR20120096421A (ko) 2012-08-30
US9280054B2 (en) 2016-03-08
TWI475333B (zh) 2015-03-01
TW201237566A (en) 2012-09-16
JP2012174936A (ja) 2012-09-10

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