KR101390039B1 - 세라믹을 제조하는 방법, 특히 스퍼터링 타겟으로서의 그 세라믹, 및 그 세라믹의 용도 - Google Patents

세라믹을 제조하는 방법, 특히 스퍼터링 타겟으로서의 그 세라믹, 및 그 세라믹의 용도 Download PDF

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KR101390039B1
KR101390039B1 KR1020087030866A KR20087030866A KR101390039B1 KR 101390039 B1 KR101390039 B1 KR 101390039B1 KR 1020087030866 A KR1020087030866 A KR 1020087030866A KR 20087030866 A KR20087030866 A KR 20087030866A KR 101390039 B1 KR101390039 B1 KR 101390039B1
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ceramic
dopant
ceramics
base material
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KR20090024715A (ko
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기 캉페
이야드 자데딘
카림 자긱
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상뜨르 나쇼날 드 라 러쉐르쉬 샹띠피끄
하이드로-퀘벡
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Priority claimed from CA002553146A external-priority patent/CA2553146A1/fr
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    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
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    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
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    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
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  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Conductive Materials (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
KR1020087030866A 2006-05-18 2007-05-17 세라믹을 제조하는 방법, 특히 스퍼터링 타겟으로서의 그 세라믹, 및 그 세라믹의 용도 Expired - Fee Related KR101390039B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CA2,547,091 2006-05-18
CA002547091A CA2547091A1 (fr) 2006-05-18 2006-05-18 Procede de preparation de ceramiques, ceramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulverisation cathodique
CA002553146A CA2553146A1 (fr) 2006-07-24 2006-07-24 Procede de preparation de ceramiques, ceramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulverisation cathodique
CA2,553,146 2006-07-24
PCT/CA2007/000881 WO2007134439A1 (fr) 2006-05-18 2007-05-17 Procédé de préparation de céramiques, céramiques ainsi obtenues et leurs utilisations notamment comme cible pour pulvérisation cathodique

Publications (2)

Publication Number Publication Date
KR20090024715A KR20090024715A (ko) 2009-03-09
KR101390039B1 true KR101390039B1 (ko) 2014-05-27

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KR1020087030866A Expired - Fee Related KR101390039B1 (ko) 2006-05-18 2007-05-17 세라믹을 제조하는 방법, 특히 스퍼터링 타겟으로서의 그 세라믹, 및 그 세라믹의 용도

Country Status (7)

Country Link
US (2) US9120708B2 (enExample)
EP (2) EP2029500B1 (enExample)
JP (2) JP6091735B2 (enExample)
KR (1) KR101390039B1 (enExample)
CA (1) CA2651705C (enExample)
ES (2) ES2791482T3 (enExample)
WO (1) WO2007134439A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
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KR20190136335A (ko) 2018-05-30 2019-12-10 엘티메탈 주식회사 세라믹 타겟의 제조방법 및 이로부터 제조된 세라믹 타겟

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RU2397576C1 (ru) * 2009-03-06 2010-08-20 ООО "Элионт" Анодный материал для литий-ионных хит и способ его получения
DE102009033417C5 (de) 2009-04-09 2022-10-06 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren und Anlage zur Herstellung eines beschichteten Gegenstands mittels Tempern
US20120027954A1 (en) * 2010-07-30 2012-02-02 Applied Materials, Inc. Magnet for physical vapor deposition processes to produce thin films having low resistivity and non-uniformity
KR101033232B1 (ko) * 2010-08-11 2011-05-06 주식회사 엠엔에이치 세라믹을 이용한 핫 런너 시스템
JP2013153118A (ja) 2011-03-09 2013-08-08 Kobe Steel Ltd 薄膜トランジスタの半導体層用酸化物、上記酸化物を備えた薄膜トランジスタの半導体層および薄膜トランジスタ
US9885109B2 (en) * 2012-08-08 2018-02-06 Umicore ITO ceramic sputtering targets with reduced In2O3 contents and method of producing it
JP6067524B2 (ja) * 2013-09-25 2017-01-25 株式会社東芝 半導体装置および誘電体膜
JP6159867B1 (ja) * 2016-12-22 2017-07-05 Ｊｘ金属株式会社 透明導電膜形成用ターゲット、透明導電膜形成用ターゲットの製造方法及び透明導電膜の製造方法
TWI634081B (zh) * 2017-12-06 2018-09-01 財團法人工業技術研究院 摻雜銀的氧化鋁鋅複合靶材及其製作方法
KR102507549B1 (ko) * 2018-08-31 2023-03-07 주식회사 엘지화학 장식 부재의 제조방법 및 장식 부재
CN111285409A (zh) * 2020-02-20 2020-06-16 复旦大学 基于单层有序氧化锡纳米碗支化氧化铁纳米棒结构的气敏纳米材料、制备工艺及其应用
CN113200681B (zh) * 2021-05-21 2022-05-27 西南科技大学 一种固化含钼高放核废的萤石基玻璃陶瓷基材的制备方法
JP7765633B2 (ja) * 2021-12-01 2025-11-06 香港時代新能源科技有限公司 酸化ニッケルドープターゲット及びその製造方法並びに用途
CN114591070B (zh) * 2022-01-11 2023-04-04 先导薄膜材料有限公司 一种高纯度的Mo掺杂ITO靶材的制备方法
CN117778972A (zh) * 2023-11-13 2024-03-29 常州大学 一种具有快速电致变色响应效果的非晶wo3薄膜及其制备方法和应用

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