KR101334614B1 - 가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극 - Google Patents

가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극 Download PDF

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KR101334614B1
KR101334614B1 KR1020087009797A KR20087009797A KR101334614B1 KR 101334614 B1 KR101334614 B1 KR 101334614B1 KR 1020087009797 A KR1020087009797 A KR 1020087009797A KR 20087009797 A KR20087009797 A KR 20087009797A KR 101334614 B1 KR101334614 B1 KR 101334614B1
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conductive member
elongate conductive
electrode
inner diameter
tube
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KR20080068814A (ko
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토마스 디. 스티겔
리차드 씨. 유재즈도프스키
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사이머 엘엘씨
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020087009797A 2005-09-27 2006-09-25 가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극 Active KR101334614B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/237,535 2005-09-27
US11/237,535 US7542502B2 (en) 2005-09-27 2005-09-27 Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
PCT/US2006/037225 WO2007038412A2 (en) 2005-09-27 2006-09-25 Thermal-expansion tolerant, preionizer electrode for a gas discharge laser

Publications (2)

Publication Number Publication Date
KR20080068814A KR20080068814A (ko) 2008-07-24
KR101334614B1 true KR101334614B1 (ko) 2013-11-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087009797A Active KR101334614B1 (ko) 2005-09-27 2006-09-25 가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극

Country Status (6)

Country Link
US (1) US7542502B2 (https=)
EP (1) EP1929595B1 (https=)
JP (1) JP5349964B2 (https=)
KR (1) KR101334614B1 (https=)
DE (1) DE602006018033D1 (https=)
WO (1) WO2007038412A2 (https=)

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Publication number Priority date Publication date Assignee Title
JP5697677B2 (ja) 2009-10-26 2015-04-08 ネステク ソシエテ アノニム 抗ｔｎｆ薬及び自己抗体の検出用アッセイ
RU2446530C1 (ru) * 2011-01-28 2012-03-27 Владимир Михайлович Борисов Импульсно-периодический газоразрядный лазер
KR20140047628A (ko) 2011-07-06 2014-04-22 네스텍 소시에테아노님 Ｔｎｆ알파로의 생물학적 치료요법에 대한 중화 자가항체의 검출을 위한 검정
CN107250798A (zh) 2014-12-05 2017-10-13 雀巢产品技术援助有限公司 用于检测患者样品中的生物制品的间接均相迁移率变动试验
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
CN114696185B (zh) * 2020-12-30 2025-08-15 北京科益虹源光电技术有限公司 准分子激光器预电离管的定位工装及安装方法
EP4690390A1 (en) 2023-03-28 2026-02-11 Cymer, LLC Laser chamber having discharge gap with acoustic control
WO2024201226A1 (en) 2023-03-29 2024-10-03 Cymer, Llc Laser chamber preionizer having acoustic scattering surface
WO2025120393A1 (en) 2023-12-07 2025-06-12 Cymer, Llc Laser chamber with discharge system having acoustic scattering surfaces
WO2025133792A1 (en) 2023-12-18 2025-06-26 Cymer, Llc Laser chamber gas flow and acoustic control

Citations (4)

* Cited by examiner, † Cited by third party
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US5719896A (en) 1996-03-29 1998-02-17 Cymer Inc. Low cost corona pre-ionizer for a laser
US5847494A (en) * 1993-10-07 1998-12-08 Aea Technology Plc Corona discharge reactor
KR20010062136A (ko) * 1999-12-08 2001-07-07 다나카 아키히로 자외선을 방출하는 가스 레이저 장치
US6757315B1 (en) 1999-02-10 2004-06-29 Lambda Physik Ag Corona preionization assembly for a gas laser

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DE3313811A1 (de) * 1983-04-15 1984-10-18 Siemens AG, 1000 Berlin und 8000 München Transversal angeregter gaslaser
IT1197768B (it) * 1983-12-29 1988-12-06 Selenia Ind Elettroniche Preionizzatore ad effetto corona per laser a gas
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US5847494A (en) * 1993-10-07 1998-12-08 Aea Technology Plc Corona discharge reactor
US5719896A (en) 1996-03-29 1998-02-17 Cymer Inc. Low cost corona pre-ionizer for a laser
US6757315B1 (en) 1999-02-10 2004-06-29 Lambda Physik Ag Corona preionization assembly for a gas laser
KR20010062136A (ko) * 1999-12-08 2001-07-07 다나카 아키히로 자외선을 방출하는 가스 레이저 장치

Also Published As

Publication number Publication date
US7542502B2 (en) 2009-06-02
WO2007038412A2 (en) 2007-04-05
EP1929595A2 (en) 2008-06-11
EP1929595B1 (en) 2010-11-03
KR20080068814A (ko) 2008-07-24
EP1929595A4 (en) 2009-08-12
JP2009510783A (ja) 2009-03-12
US20070091972A1 (en) 2007-04-26
DE602006018033D1 (de) 2010-12-16
JP5349964B2 (ja) 2013-11-20
WO2007038412A3 (en) 2007-06-21

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