KR20010062136A - 자외선을 방출하는 가스 레이저 장치 - Google Patents
자외선을 방출하는 가스 레이저 장치 Download PDFInfo
- Publication number
- KR20010062136A KR20010062136A KR1020000073414A KR20000073414A KR20010062136A KR 20010062136 A KR20010062136 A KR 20010062136A KR 1020000073414 A KR1020000073414 A KR 1020000073414A KR 20000073414 A KR20000073414 A KR 20000073414A KR 20010062136 A KR20010062136 A KR 20010062136A
- Authority
- KR
- South Korea
- Prior art keywords
- electrode
- laser
- gas
- main discharge
- preliminary ionization
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0977—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser having auxiliary ionisation means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
Claims (3)
- 레이저 가스가 봉입되고, 이 레이저 가스를 내부에서 순환시키는 순환수단을 가지는 레이저 챔버와, 이 레이저 챔버내에 소정 간격 이간하여 배치된 한쌍의 주 방전 전극과, 이 한쌍의 주 방전 전극에 병렬로 접속된 피킹 콘덴서로 이루어지는 방전회로와, 유전체를 사이에 두고 제1 전극과 제2 전극이 대향배치되어 이루어지는 예비전리수단을 가지고, 이 예비전리수단이 한쪽 주 방전 전극을 따라 그 양측에 근접하여 배치되어 이루어지는 자외선을 방출하는 가스 레이저 장치에 있어서,상기 한쪽 주 방전 전극과 상기 피킹 콘덴서가 상기 한쪽 주 방전 전극과 상기 예비전리수단과의 사이를 통과하는 통전부재에 의해 접속되어 있는 것을 특징으로 하는 자외선을 방출하는 가스 레이저 장치.
- 제1항에 있어서, 상기 통전부재는 개구를 형성한 도전판으로 구성되고, 그 개구는 상기 주 방전 전극사이의 주 방전 공간을 통과하는 레이저 가스가 통과하고, 또한, 상기 예비전리수단에서의 자외선이 상기 주방전 공간에 도달하도록 배치되어 있는 것을 특징으로 하는 자외선을 방출하는 가스 레이저 장치.
- 제1항에 있어서, 상기 예비전리수단은 유전체 물질로 덮인 제2 전극과, 제2 전극 주위의 유전체 물질의 외면에 접하는 제1 전극으로 구성되며, 상기 통전부재와 상기 제1 전극이 일체화되어 있는 것을 특징으로 하는 자외선을 방출하는 가스레이저 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34863799A JP3399517B2 (ja) | 1999-12-08 | 1999-12-08 | 紫外線を放出するガスレーザ装置 |
JP99-348637 | 1999-12-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010062136A true KR20010062136A (ko) | 2001-07-07 |
KR100505085B1 KR100505085B1 (ko) | 2005-07-29 |
Family
ID=18398348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-0073414A KR100505085B1 (ko) | 1999-12-08 | 2000-12-05 | 자외선을 방출하는 가스 레이저 장치 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6480519B2 (ko) |
EP (1) | EP1107401B1 (ko) |
JP (1) | JP3399517B2 (ko) |
KR (1) | KR100505085B1 (ko) |
DE (1) | DE60018252T2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101334614B1 (ko) * | 2005-09-27 | 2013-11-29 | 사이머 엘엘씨 | 가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6650679B1 (en) | 1999-02-10 | 2003-11-18 | Lambda Physik Ag | Preionization arrangement for gas laser |
US6466599B1 (en) | 1999-04-07 | 2002-10-15 | Lambda Physik Ag | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US6456643B1 (en) | 1999-03-31 | 2002-09-24 | Lambda Physik Ag | Surface preionization for gas lasers |
US6757315B1 (en) | 1999-02-10 | 2004-06-29 | Lambda Physik Ag | Corona preionization assembly for a gas laser |
US6570901B2 (en) | 2000-02-24 | 2003-05-27 | Lambda Physik Ag | Excimer or molecular fluorine laser having lengthened electrodes |
US7006546B2 (en) * | 2000-03-15 | 2006-02-28 | Komatsu Ltd. | Gas laser electrode, laser chamber employing the electrode, and gas laser device |
WO2001084678A2 (en) | 2000-04-18 | 2001-11-08 | Lambda Physik Ag | Stabilization technique for high repetition rate gas discharge lasers |
US6671302B2 (en) | 2000-08-11 | 2003-12-30 | Lambda Physik Ag | Device for self-initiated UV pre-ionization of a repetitively pulsed gas laser |
CN100449887C (zh) * | 2005-11-23 | 2009-01-07 | 中国科学院电子学研究所 | 电晕预电离脉冲气体激光器 |
CN102810810A (zh) | 2012-03-02 | 2012-12-05 | 中国科学院光电研究院 | 单腔双电极放电腔及准分子激光器 |
US9048615B1 (en) | 2013-12-02 | 2015-06-02 | Epilog Corporation | Slab gas laser with pre-ionizing cell |
WO2019143433A1 (en) | 2018-01-17 | 2019-07-25 | Cymer, Llc | Apparatus for tuning discharge performance in a laser chamber |
JP7273944B2 (ja) * | 2019-02-26 | 2023-05-15 | ギガフォトン株式会社 | レーザ用チャンバ装置、ガスレーザ装置、及び電子デバイスの製造方法 |
WO2024009662A1 (ja) * | 2022-07-05 | 2024-01-11 | ギガフォトン株式会社 | ガスレーザ装置のチャンバ、ガスレーザ装置、及び電子デバイスの製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4342114A (en) * | 1980-02-04 | 1982-07-27 | Raytheon Company | TEA Laser configuration |
US4709373A (en) * | 1985-11-08 | 1987-11-24 | Summit Technology, Inc. | Laser excitation system |
JP2794792B2 (ja) | 1989-06-07 | 1998-09-10 | 三菱電機株式会社 | 横方向放電励起パルスレーザー発振装置 |
JPH03145170A (ja) * | 1989-10-30 | 1991-06-20 | Nec Corp | パルスガスレーザ |
DE4113241C2 (de) * | 1991-04-23 | 1994-08-11 | Lambda Physik Forschung | Gepulster Gasentladungslaser |
JPH04326584A (ja) * | 1991-04-25 | 1992-11-16 | Matsushita Electric Ind Co Ltd | 放電励起ガスレーザ装置 |
JP3281032B2 (ja) * | 1992-05-21 | 2002-05-13 | 浜松ホトニクス株式会社 | 放電励起型ガスレーザ装置 |
US5337330A (en) * | 1992-10-09 | 1994-08-09 | Cymer Laser Technologies | Pre-ionizer for a laser |
DE4426723A1 (de) * | 1994-07-22 | 1996-01-25 | Atl Lasertechnik & Accessoires | Gleitentladungsvorionisation für Gaslaser |
US5596593A (en) * | 1996-02-09 | 1997-01-21 | Luxar Corporation | Orthogonal RFDC transverse excited gas laser |
JPH10242553A (ja) | 1997-02-28 | 1998-09-11 | Komatsu Ltd | レーザのコロナ予備電離電極と同電極を備えたレーザ発振器 |
JP3796038B2 (ja) * | 1997-11-18 | 2006-07-12 | 株式会社小松製作所 | ガスレーザ発振装置 |
US6381257B1 (en) * | 1999-09-27 | 2002-04-30 | Cymer, Inc. | Very narrow band injection seeded F2 lithography laser |
-
1999
- 1999-12-08 JP JP34863799A patent/JP3399517B2/ja not_active Expired - Lifetime
-
2000
- 2000-12-05 DE DE60018252T patent/DE60018252T2/de not_active Expired - Lifetime
- 2000-12-05 EP EP00126695A patent/EP1107401B1/en not_active Expired - Lifetime
- 2000-12-05 KR KR10-2000-0073414A patent/KR100505085B1/ko active IP Right Grant
- 2000-12-08 US US09/732,017 patent/US6480519B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101334614B1 (ko) * | 2005-09-27 | 2013-11-29 | 사이머 엘엘씨 | 가스 방전 레이저용의, 열팽창에 내성이 있는 예비이온화기전극 |
Also Published As
Publication number | Publication date |
---|---|
US20010024463A1 (en) | 2001-09-27 |
KR100505085B1 (ko) | 2005-07-29 |
US6480519B2 (en) | 2002-11-12 |
JP2001168432A (ja) | 2001-06-22 |
DE60018252T2 (de) | 2006-01-12 |
DE60018252D1 (de) | 2005-03-31 |
EP1107401A1 (en) | 2001-06-13 |
EP1107401B1 (en) | 2005-02-23 |
JP3399517B2 (ja) | 2003-04-21 |
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