JP5349964B2 - 熱膨張耐性のあるガス放電レーザ用の予備電離器の電極 - Google Patents

熱膨張耐性のあるガス放電レーザ用の予備電離器の電極 Download PDF

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JP5349964B2
JP5349964B2 JP2008533475A JP2008533475A JP5349964B2 JP 5349964 B2 JP5349964 B2 JP 5349964B2 JP 2008533475 A JP2008533475 A JP 2008533475A JP 2008533475 A JP2008533475 A JP 2008533475A JP 5349964 B2 JP5349964 B2 JP 5349964B2
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conductive member
elongate conductive
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トーマス ディー ステイガー
リチャード シー ウジャズドースキー
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サイマー インコーポレイテッド
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388Compositions, materials or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP2008533475A 2005-09-27 2006-09-25 熱膨張耐性のあるガス放電レーザ用の予備電離器の電極 Active JP5349964B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/237,535 2005-09-27
US11/237,535 US7542502B2 (en) 2005-09-27 2005-09-27 Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
PCT/US2006/037225 WO2007038412A2 (en) 2005-09-27 2006-09-25 Thermal-expansion tolerant, preionizer electrode for a gas discharge laser

Publications (3)

Publication Number Publication Date
JP2009510783A JP2009510783A (ja) 2009-03-12
JP2009510783A5 JP2009510783A5 (https=) 2009-11-12
JP5349964B2 true JP5349964B2 (ja) 2013-11-20

Family

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JP2008533475A Active JP5349964B2 (ja) 2005-09-27 2006-09-25 熱膨張耐性のあるガス放電レーザ用の予備電離器の電極

Country Status (6)

Country Link
US (1) US7542502B2 (https=)
EP (1) EP1929595B1 (https=)
JP (1) JP5349964B2 (https=)
KR (1) KR101334614B1 (https=)
DE (1) DE602006018033D1 (https=)
WO (1) WO2007038412A2 (https=)

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JP5697677B2 (ja) 2009-10-26 2015-04-08 ネステク ソシエテ アノニム 抗tnf薬及び自己抗体の検出用アッセイ
RU2446530C1 (ru) * 2011-01-28 2012-03-27 Владимир Михайлович Борисов Импульсно-периодический газоразрядный лазер
KR20140047628A (ko) 2011-07-06 2014-04-22 네스텍 소시에테아노님 Tnf알파로의 생물학적 치료요법에 대한 중화 자가항체의 검출을 위한 검정
CN107250798A (zh) 2014-12-05 2017-10-13 雀巢产品技术援助有限公司 用于检测患者样品中的生物制品的间接均相迁移率变动试验
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
CN114696185B (zh) * 2020-12-30 2025-08-15 北京科益虹源光电技术有限公司 准分子激光器预电离管的定位工装及安装方法
EP4690390A1 (en) 2023-03-28 2026-02-11 Cymer, LLC Laser chamber having discharge gap with acoustic control
WO2024201226A1 (en) 2023-03-29 2024-10-03 Cymer, Llc Laser chamber preionizer having acoustic scattering surface
WO2025120393A1 (en) 2023-12-07 2025-06-12 Cymer, Llc Laser chamber with discharge system having acoustic scattering surfaces
WO2025133792A1 (en) 2023-12-18 2025-06-26 Cymer, Llc Laser chamber gas flow and acoustic control

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DE3313811A1 (de) * 1983-04-15 1984-10-18 Siemens AG, 1000 Berlin und 8000 München Transversal angeregter gaslaser
IT1197768B (it) * 1983-12-29 1988-12-06 Selenia Ind Elettroniche Preionizzatore ad effetto corona per laser a gas
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US4662173A (en) 1985-04-29 1987-05-05 Teledyne Industries, Inc. Exhaust manifold for opposed cylinder engines
JPH02214178A (ja) * 1989-02-15 1990-08-27 Hiromi Kawase ホロー陰極型放電デバイス
US5200970A (en) * 1990-12-03 1993-04-06 Summit Technology, Inc. Methods and compositions for protecting laser excitation gases from contamination
DE69200247T2 (de) * 1991-04-23 1994-11-24 Matsushita Electric Ind Co Ltd Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern.
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Also Published As

Publication number Publication date
US7542502B2 (en) 2009-06-02
WO2007038412A2 (en) 2007-04-05
KR101334614B1 (ko) 2013-11-29
EP1929595A2 (en) 2008-06-11
EP1929595B1 (en) 2010-11-03
KR20080068814A (ko) 2008-07-24
EP1929595A4 (en) 2009-08-12
JP2009510783A (ja) 2009-03-12
US20070091972A1 (en) 2007-04-26
DE602006018033D1 (de) 2010-12-16
WO2007038412A3 (en) 2007-06-21

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