KR101287089B1 - 실록산 폴리머 조성물, 경화막 및 경화막의 형성 방법 - Google Patents
실록산 폴리머 조성물, 경화막 및 경화막의 형성 방법 Download PDFInfo
- Publication number
- KR101287089B1 KR101287089B1 KR1020110090658A KR20110090658A KR101287089B1 KR 101287089 B1 KR101287089 B1 KR 101287089B1 KR 1020110090658 A KR1020110090658 A KR 1020110090658A KR 20110090658 A KR20110090658 A KR 20110090658A KR 101287089 B1 KR101287089 B1 KR 101287089B1
- Authority
- KR
- South Korea
- Prior art keywords
- siloxane polymer
- group
- polymer composition
- organic solvent
- mass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Silicon Polymers (AREA)
- Materials For Photolithography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010212868A JP5617476B2 (ja) | 2010-09-22 | 2010-09-22 | シロキサンポリマー組成物、硬化膜及び硬化膜の形成方法 |
JPJP-P-2010-212868 | 2010-09-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120031126A KR20120031126A (ko) | 2012-03-30 |
KR101287089B1 true KR101287089B1 (ko) | 2013-07-17 |
Family
ID=46134773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110090658A KR101287089B1 (ko) | 2010-09-22 | 2011-09-07 | 실록산 폴리머 조성물, 경화막 및 경화막의 형성 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5617476B2 (ja) |
KR (1) | KR101287089B1 (ja) |
CN (1) | CN102566278B (ja) |
TW (1) | TWI506092B (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101666263B1 (ko) * | 2011-03-07 | 2016-10-13 | 산요가세이고교 가부시키가이샤 | 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법 |
KR101401601B1 (ko) * | 2012-08-17 | 2014-06-02 | 한국과학기술원 | iCVD 공정을 이용한 절연막 형성 방법 |
JP2014056122A (ja) * | 2012-09-12 | 2014-03-27 | Sanyo Chem Ind Ltd | 感光性組成物 |
JP2014055241A (ja) * | 2012-09-12 | 2014-03-27 | Sanyo Chem Ind Ltd | 感光性組成物 |
JP6127497B2 (ja) * | 2012-12-19 | 2017-05-17 | Jsr株式会社 | 着色組成物、カラーフィルタ、表示素子及びポリシロキサン |
KR101492251B1 (ko) * | 2013-05-31 | 2015-02-16 | 이근수 | 개질된 폴리실록산계 공중합체, 이 공중합체를 포함하는 코팅 조성물, 이를 이용하여 얻을 수 있는 코팅 플라스틱 기판과 이의 제조 방법, 및 상기 개질된 폴리실록산계 공중합체의 제조방법 |
KR101631075B1 (ko) * | 2014-06-12 | 2016-06-16 | 주식회사 켐트로닉스 | 실록산 폴리머 조성물 |
JP2016121311A (ja) * | 2014-12-25 | 2016-07-07 | Jsr株式会社 | 硬化膜形成用組成物、硬化膜、表示素子及び硬化膜の形成方法 |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
JP6418248B2 (ja) * | 2015-09-30 | 2018-11-07 | 東レ株式会社 | ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び表示装置、並びにその製造方法 |
JP6973925B2 (ja) * | 2017-10-05 | 2021-12-01 | 日本化薬株式会社 | 感光性樹脂組成物 |
CN107814971A (zh) * | 2017-11-10 | 2018-03-20 | 安徽龙川橡塑科技有限公司 | 一种涉水epdm橡胶表面处理剂及表面处理epdm橡胶 |
KR102617582B1 (ko) * | 2018-03-14 | 2023-12-27 | 도레이 카부시키가이샤 | 네거티브형 감광성 착색 조성물, 경화막, 그것을 이용한 터치 패널 |
CN110832000B (zh) * | 2018-03-22 | 2020-06-19 | 南京邦鼎生物科技有限公司 | 制备薄膜的组合物和方法及其应用 |
JP7026009B2 (ja) * | 2018-06-28 | 2022-02-25 | 大日本塗料株式会社 | 構造物の塗装方法 |
JP2020084105A (ja) * | 2018-11-29 | 2020-06-04 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | アクリル重合化ポリシロキサン、これを含んでなる組成物、およびこれを用いた硬化膜 |
CN111218002B (zh) * | 2020-02-24 | 2021-06-08 | 华南理工大学 | 一种高折射率含硼和环氧基团的有机硅增粘剂及其制备方法与应用 |
JP7463821B2 (ja) * | 2020-04-22 | 2024-04-09 | 信越化学工業株式会社 | オルガノポリシロキサンを含有する組成物の製造方法、硬化膜の製造方法および被覆物品の製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010100880A (ko) * | 2000-04-10 | 2001-11-14 | 마쯔모또 에이찌 | 막 형성용 조성물, 막의 형성 방법 및 실리카계 막 |
KR20020076125A (ko) * | 2001-03-26 | 2002-10-09 | 제이에스알 가부시끼가이샤 | 막형성용 조성물, 막의 형성 방법 및 실리카계 막 |
KR100685333B1 (ko) | 1999-06-04 | 2007-02-23 | 제이에스알 가부시끼가이샤 | 막형성용 조성물 및 절연막 형성용 재료 |
KR20070036721A (ko) * | 2005-09-29 | 2007-04-03 | 칫소가부시키가이샤 | 플루오르를 함유하는 광경화성 중합체 조성물 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003066600A (ja) * | 2001-06-12 | 2003-03-05 | Canon Inc | フォトレジスト、これを用いた基板の加工方法、及びフォトレジストの製造方法 |
JP4333243B2 (ja) * | 2002-08-09 | 2009-09-16 | 住友化学株式会社 | 着色感光性樹脂組成物 |
JP4627617B2 (ja) * | 2003-05-23 | 2011-02-09 | 東洋インキ製造株式会社 | 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法 |
JP2005255753A (ja) * | 2004-03-10 | 2005-09-22 | Mitsubishi Chemicals Corp | 硬化性樹脂組成物、カラーフィルタ、および液晶表示装置 |
JP2008020898A (ja) * | 2006-06-12 | 2008-01-31 | Toray Ind Inc | 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子 |
JP4912058B2 (ja) * | 2006-06-29 | 2012-04-04 | 旭化成イーマテリアルズ株式会社 | ハイブリッド感光性樹脂組成物 |
JP2008122750A (ja) * | 2006-11-14 | 2008-05-29 | Toray Ind Inc | カラーフィルター用感光性レジスト組成物およびカラーフィルター |
-
2010
- 2010-09-22 JP JP2010212868A patent/JP5617476B2/ja active Active
-
2011
- 2011-09-07 KR KR1020110090658A patent/KR101287089B1/ko active IP Right Grant
- 2011-09-19 CN CN201110288607.0A patent/CN102566278B/zh active Active
- 2011-09-21 TW TW100133856A patent/TWI506092B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100685333B1 (ko) | 1999-06-04 | 2007-02-23 | 제이에스알 가부시끼가이샤 | 막형성용 조성물 및 절연막 형성용 재료 |
KR20010100880A (ko) * | 2000-04-10 | 2001-11-14 | 마쯔모또 에이찌 | 막 형성용 조성물, 막의 형성 방법 및 실리카계 막 |
KR20020076125A (ko) * | 2001-03-26 | 2002-10-09 | 제이에스알 가부시끼가이샤 | 막형성용 조성물, 막의 형성 방법 및 실리카계 막 |
KR20070036721A (ko) * | 2005-09-29 | 2007-04-03 | 칫소가부시키가이샤 | 플루오르를 함유하는 광경화성 중합체 조성물 |
Also Published As
Publication number | Publication date |
---|---|
JP2012068417A (ja) | 2012-04-05 |
CN102566278B (zh) | 2015-01-21 |
TWI506092B (zh) | 2015-11-01 |
JP5617476B2 (ja) | 2014-11-05 |
KR20120031126A (ko) | 2012-03-30 |
CN102566278A (zh) | 2012-07-11 |
TW201213445A (en) | 2012-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101287089B1 (ko) | 실록산 폴리머 조성물, 경화막 및 경화막의 형성 방법 | |
JP4911304B2 (ja) | 感放射線性樹脂組成物および液晶表示素子用スペーサー | |
JP6538284B2 (ja) | 感光性シロキサン組成物 | |
JP5636869B2 (ja) | 感放射線性組成物、硬化膜、及びそれらの形成方法 | |
WO2011108705A1 (ja) | 感光性樹脂組成物 | |
JP6487126B2 (ja) | ポジ型感光性シロキサン組成物 | |
JP5051365B2 (ja) | 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル | |
TWI444433B (zh) | 聚矽氧烷組成物、聚矽氧烷組成物之製造方法、顯示元件之硬化膜及顯示元件之硬化膜之形成方法 | |
TWI719070B (zh) | 感光性樹脂組成物及自其製備之固化膜 | |
CN105629663B (zh) | 感光性树脂组合物 | |
JP4947300B2 (ja) | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法 | |
CN105652593B (zh) | 感光性树脂组合物和由其制备的固化膜 | |
JP2017171748A (ja) | 硬化膜、表示素子、硬化膜形成用材料及び硬化膜の形成方法 | |
JPWO2009104680A1 (ja) | 感放射線性樹脂組成物、その硬化物及び該組成物を用いた層間絶縁膜及び光学用デバイス | |
KR20190056088A (ko) | 감광성 수지 조성물 및 이로부터 제조된 경화막 | |
KR101273993B1 (ko) | 폴리실록산 조성물과 그의 제조 방법 및, 경화막과 그의 형성 방법 | |
JP2016139134A (ja) | 感光性樹脂組成物、その感光性樹脂組成物から形成された硬化膜、及びその硬化膜を備えた画像表示装置 | |
KR102493962B1 (ko) | 감광성 수지 조성물 및 이로부터 제조된 경화막 | |
CN109478017B (zh) | 感光性树脂组合物及其制备的固化膜 | |
KR20210081741A (ko) | 포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 | |
JP6913679B2 (ja) | 感光性樹脂組成物及びそれより調製される硬化膜 | |
CN107918249A (zh) | 感光性树脂组合物和由其制备的固化膜 | |
JP4666163B2 (ja) | 感放射線性樹脂組成物、スペーサーおよび液晶表示素子 | |
KR20180037888A (ko) | 감광성 수지 조성물 및 이로부터 제조된 경화막 | |
KR102310794B1 (ko) | 감광성 수지 조성물 및 이로부터 제조된 경화막 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
AMND | Amendment | ||
X701 | Decision to grant (after re-examination) | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20160705 Year of fee payment: 4 |
|
FPAY | Annual fee payment |
Payment date: 20180628 Year of fee payment: 6 |